| ASML Netherlands B. V. Patent applications |
| Patent application number | Title | Published |
|---|
| 20110102757 | Lithographic Method and Apparatus - A method is disclosed. A change in position of a substrate in a direction substantially parallel to a direction of propagation of a radiation beam that is, or is to be, projected on to that substrate is determined, which change in position would result in a lithographic error in the application of a pattern to that substrate using that radiation beam. The change in position of the substrate is used to control a property of the radiation beam when, or as, the radiation beam is projected onto the substrate in order to reduce the lithographic error. | 05-05-2011 |
| 20100309447 | LITHOGRAPHIC APPARATUS, A PROJECTION SYSTEM AND A DEVICE MANUFACTURING METHOD - A lithographic apparatus is disclosed that includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate, a vacuum chamber through which the patterned beam of radiation is projected during use, and a purge system configured to provide a purge gas flow in the chamber. | 12-09-2010 |
| 20090296081 | Metrology Tool, System Comprising a Lithographic Apparatus and a Metrology Tool, and a Method for Determining a Parameter of a Substrate - A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table, a sensor, a displacement system, a balance mass, and a bearing. The substrate table is constructed and arranged to hold the substrate. The sensor is constructed and arranged to measure a parameter of the substrate. The displacement system is configured to displace the substrate table or the sensor with respect to the other in a first direction. The bearing is configured to movably support the first balance mass so as to be substantially free to translate in a direction opposite of the first direction in order to counteract a displacement of the substrate table or sensor in the first direction. | 12-03-2009 |
| 20090159819 | Pulse Modifier, Lithographic Apparatus and Device Manufacturing Method - A pulse modifier, and associated lithographic apparatus and a method for manufacturing a device, is disclosed. The pulse modifier is configured to receive an input pulse of radiation and further configured to emit a plurality of corresponding output pulse portions of radiation, wherein the respective pulse portions are respectively mirrored about an axis transverse to the optical axis and mirrored about a point of the optical axis of the pulse portions. | 06-25-2009 |
| 20090094005 | Method of Optimizing a Model, a Method of Measuring a Property, A Device Manufacturing Method, a Spectrometer and a Lithographic Apparatus - A set of parameters used in a model of a spectrometer includes free parameters and fixed parameters. A first set of values for the parameters is set and the model is used to generate a first spectrum. A value of one of the fixed parameters is changed and a second spectrum is generated. An inverse of the model of the spectrometer is then applied to the second spectrum to generate a set of values for the parameters, the values being the same as the first set of values except for one or more of the free parameters. If the free parameter has significantly changed the fixed parameter is designated a free parameter. | 04-09-2009 |
| 20080218712 | Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus - An immersion lithographic apparatus includes a cleaning system for cleaning a component in the immersion lithographic apparatus in situ. The cleaning system is arranged to provide a cleaning environment in proximity of a predetermined position on a component to be cleaned. The system is also arranged to provide the cleaning environment substantially independent of a type of contamination present at the predetermined position. | 09-11-2008 |
