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ASML Neitherlands B.V.

ASML Neitherlands B.V. Patent applications
Patent application numberTitlePublished
20120026477Lithographic Apparatus, Aberration Detector and Device Manufacturing Method - An aberration detector for a lithographic apparatus is used. An imaging device captures an image of at least one pinhole feature of a target projected onto the imaging device by the projection system of the lithographic apparatus at two different locations separated in a direction parallel to the optical axis of the projection system. A controller obtains a representation of the aberration of the projection system from the captured images.02-02-2012