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ALYTUS CORPORATION S.A.
| ALYTUS CORPORATION S.A. Patent applications | ||
| Patent application number | Title | Published |
|---|---|---|
| 20110030617 | PLASMA SYSTEM - System and technique for plasma enhanced chemical deposition (PECVD) wherein selective surfaces of tubular substrates may be treated to deposit thin films of a desired matter, wherein one of the electrodes employed in the plasma system is conformed by the substrate or workpiece without the need of bulky plasma reactors. | 02-10-2011 |