| AIXTRON AG Patent applications |
| Patent application number | Title | Published |
|---|
| 20110293832 | Method and apparatus for depositing thin layers of polymeric para-xylylene or substituted para-xylylene - The invention relates to an apparatus and a method for depositing one or more thin layers of polymeric para-xylylene. Said apparatus comprises a heated evaporator ( | 12-01-2011 |
| 20110081504 | Method for depositing a thin-film polymer in a low-pressure gas phase - The invention relates to a method for depositing one or more thin layers. In said method, a process gas forming a polymer streams into a deposition chamber ( | 04-07-2011 |
| 20110070370 | THERMAL GRADIENT ENHANCED CHEMICAL VAPOUR DEPOSITION (TGE-CVD) - A chemical vapor deposition (CVD) apparatus is configured for thermal gradient enhanced CVD operation by the inclusion of multiple heaters, positioned so as to provide a desired thermal gradient profile across a vertical dimension of a substrate or other work piece within the chamber. So configured, the chamber may also be used for controlled growth of thin films via diffusion through intermediate films, either top down or bottom parallel to the direction of the thermal gradient. | 03-24-2011 |
