| Air Liquide Electronics U.S. LP Patent applications |
| Patent application number | Title | Published |
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| 20110310694 | SYSTEMS AND METHODS FOR MANAGING FLUIDS IN A PROCESSING ENVIRONMENT USING A LIQUID RING PUMP AND RECLAMATION SYSTEM - Methods and systems for chemical management. In one embodiment, a blender is coupled to a processing system and configured to supply an appropriate solution or solutions to the system. Solutions provided by the blender are then reclaimed from the system and subsequently reintroduced for reuse. The blender may be operated to control the concentrations of various constituents in the solution prior to the solution being reintroduced to the system for reuse. Some chemicals introduced to the system may be temperature controlled. A back end vacuum pump subsystem separates gases from liquids as part of a waste management system. | 12-22-2011 |
| 20110171836 | METHODS FOR FORMING A RUTHENIUM-BASED FILM ON A SUBSTRATE - Methods for forming a film on a substrate in a semiconductor manufacturing process. A reaction chamber a substrate in the chamber are provided. A ruthenium based precursor, which includes ruthenium tetroxide dissolved in a mixture of at least two non-flammable fluorinated solvents, is provided and a ruthenium containing film is produced on the substrate. | 07-14-2011 |
| 20110171381 | SILICON PRECURSORS AND METHOD FOR LOW TEMPERATURE CVD OF SILICON-CONTAINING FILMS - Novel silicon precursors for low temperature deposition of silicon films are described herein. The disclosed precursors possess low vaporization temperatures, preferably less than about 500° C. In addition, embodiments of the silicon precursors incorporate a —Si—Y—Si— bond, where Y may comprise an amino group, a substituted or unsubstituted hydrocarbyl group, or oxygen. In an embodiment a silicon precursor has the formula: | 07-14-2011 |
| 20110117696 | CdTe SURFACE TREATMENT FOR STABLE BACK CONTACTS - Disclosed are etching compositions and processes of using the same for etching the surface of CdTe-containing layers. | 05-19-2011 |
| 20100189898 | MANUFACTURING OF ADDUCT FREE ALKALINE-EARTH METAL Cp COMPLEXES - Methods and compositions for the deposition of a metal containing film on a substrate. The film is deposited with a substantially adduct free precursor which is prepared by a process to remove the adduct from an adducted starting material. | 07-29-2010 |
| 20100116738 | Process Of Purifying Ruthenium Precursors - The present invention provides for two separate processes for removing impurities from an organic solvent based ruthenium precursor. The first process comprises the steps of contacting the organic solvent based ruthenium precursor with one or more drying agents under an inert gas blanket for a sufficient period of time to allow at least a portion of the impurities in the organic solvent based ruthenium precursor to be adsorbed by the one or more drying agents; and separating the one or more drying agents which have at least a portion of the impurities adsorbed thereon from the organic solvent based ruthenium precursor. The second process comprises the steps of providing a column that contains one or more drying agents and is equipped with a filtration unit; passing the organic solvent based ruthenium precursor through the column in order to allow at least a portion of the impurities in the solvent based ruthenium precursor to be adsorbed by the one or more drying agents, said passing of the solvent based ruthenium precursor taking place under a blanket of inert gas; and further passing the ruthenium precursor through the filtration unit in order ro remove any residual particles that may result from the passage of the ruthenium precursor through the column containing the one or more drying agents in order to obtain a purified ruthenium precursor. | 05-13-2010 |
| 20090151419 | Methods For Checking And Calibrating Concentration Sensors In A Semiconductor Processing Chamber - The present invention provides methods for checking and calibrating one or more concentration sensors in an open or closed system. More specifically, in one embodiment of the present invention, the disclosed method allows for the checking and calibration of one or more concentration sensors in which removal of the liquid from the system is required. In two additional embodiments, the disclosed methods allow for the checking and calibration of one or more concentration sensors without having to remove the liquid from the closed system thereby minimizing contamination of the system while at the same time greatly reducing or eliminating contact of the user with the liquid. | 06-18-2009 |
| 20090141583 | Reclaim Function for Semiconductor Processing Systems - In one embodiment, a method of controlling fluids in a semiconductor processing system includes mixing two or more chemical compounds in a blender to produce a solution and supplying the solution to a reclaim tank, where the solution is dispense to a process station. The solution can be monitored at a location between the tank and the process station to determine whether at least one of the chemical compounds is at a predetermined concentration. Upon determining that the at least one chemical compound in the solution is at the predetermined concentration the solution is flowed to the process station. The method further includes removing at least a portion of the solution from the process station and returning the removed portion of the solution to the reclaim tank. The removed portion of the solution is monitored at a location between the process station and the reclaim tank to determine whether at least one of the chemical compounds in the removed portion of the solution is at a predetermined concentration. Upon determining that the at least one chemical compound in the removed portion of the solution is at the predetermined concentration, the removed portion of solution is flowed to the process station. | 06-04-2009 |
| 20090090164 | METHOD FOR VOLUMETRICALLY CALIBRATING A LIQUID FLOW CONTROLLER WHILE MAINTAINING THE LIQUID IN A CLOSED SYSTEM - Methods and apparatus for determining if it is necessary to calibrate a liquid flow controller which is contained in a liquid distribution system, where the liquid distribution system supplies a fluid to a semiconductor processing tool. The determination is made while maintaining system as closed, such that fluid does not need to be removed from the liquid distribution system. | 04-09-2009 |
| 20090020140 | NON-FLAMMABLE SOLVENTS FOR SEMICONDUCTOR APPLICATIONS - Methods and compositions for purging and cleaning a semiconductor fabrication system are disclosed herein. In general, the disclosed methods utilize solvents comprising hydrofluoroethers. Hydrofluoroethers are non-toxic and have low moisture content, preventing heat generation from organometallic precursor hydrolysis. In an embodiment, a method of cleaning a semiconductor fabrication system comprises dissolving at least one chemical precursor used in semiconductor fabrication in at least one delivery line with a solvent to clean the at least one delivery line. The solvent generally comprises a hydrofluoroether. The methods and compositions may be used in a variety of semiconductor film deposition processes. | 01-22-2009 |
