Advanced Mask Inspection Technology Inc. Patent applications |
Patent application number | Title | Published |
20110229009 | PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD - A pattern inspection apparatus includes: an optical image acquiring unit configured to acquire optical image data of a target object on which each of a plurality of identical patterns is respectively formed at a respective corresponding position of a plurality of forming positions with distortion; a cut-out unit configured to cut out a plurality of partial optical image data from the optical image data; a correction unit configured to correct positions of the plurality of partial optical image data by using distortion information from which each amount of distortion of the plurality of identical patterns respectively formed at the respective corresponding position of the plurality of forming positions on the target object can be acquired; and a comparison unit configured to compare a plurality of corrected partial optical image data against each other on a pixel to pixel basis. | 09-22-2011 |
20110044528 | INSPECTION SYSTEM - The entire surface of a photomask | 02-24-2011 |
20100247085 | AUTOMATIC FOCUS ADJUSTING MECHANISM AND OPTICAL IMAGE ACQUISITION APPARATUS - In an automatic focus adjusting mechanism, a test sample having a patterned surface is mounted on a mount table, and an light beam passing through a slit formed in a field stop is applied to the patterned surface of the test sample. The light beam reflected from the test sample is split into two segment light beams. Focus adjusting aperture stops having respective apertures formed rhomboid are provided across the optical paths of the segment light beams. The amounts of the segment light beams passing through the rhomboid apertures are detected by light receiving units. Based on the difference between the detected light amounts, the position of the mount table is controlled by the focus adjusting unit. | 09-30-2010 |
20100128343 | WAVELENGTH CONVERSION LIGHT SOURCE APPARATUS AND WAVELENGTH CONVERSION METHOD - A wavelength conversion light source apparatus includes a fundamental wave light source configured to emit a fundamental wave, a nonlinear crystal configured to convert a wavelength of the fundamental wave by being irradiated with the fundamental wave and making the fundamental wave pass therethrough, and a movement unit configured to place the nonlinear crystal thereon and continuously move the nonlinear crystal within a plane, where a phase matching condition is not violated, so that a passage path of the fundamental wave passing through the nonlinear crystal is changed. | 05-27-2010 |
20100074512 | PHOTOMASK INSPECTION METHOD - A photomask inspection method that identifies a foreign particle such as dirt on a photomask with high sensitivity by suppressing erroneous identification due to an influence of noise is provided. The photomask inspection method includes acquiring image data of a photomask having regions with different layer structures on a surface thereof, creating inverted image data by subtracting the image data from pixel value data of the regions, creating offset inverted image data by raising pixel values of the inverted image data by a fixed amount, creating normalized correlation image data by computing a normalized correlation of the offset inverted image data and an offset Gaussian distribution-type kernel, and identifying foreign particles by comparing the normalized correlation image data and a predetermined threshold. | 03-25-2010 |
20090304262 | ULTRAFINE PATTERN DISCRIMINATION USING TRANSMITTED/REFLECTED WORKPIECE IMAGES FOR USE IN LITHOGRAPHY INSPECTION SYSTEM - A technique for discriminating a specific pattern, such as an assist pattern, from an integrate circuit pattern of a workpiece by using transmission and reflection images of the workpiece pattern is disclosed. A pattern discrimination device includes an optical image acquisition unit for acquiring a transmissive image of a workpiece having a pattern and a reflective image of the workpiece pattern simultaneously, and a specific pattern detection unit which detects for extraction a specific pattern from among pattern shapes of the transmissive and reflective images in conformity with a distinguishing condition of the specific pattern. A workpiece pattern inspection apparatus using the device is also disclosed. | 12-10-2009 |
20090245619 | IMAGE DENSITY-ADAPTED AUTOMATIC MODE SWITCHABLE PATTERN CORRECTION SCHEME FOR WORKPIECE INSPECTION - An image correction device for use in a pattern inspection apparatus is disclosed, which has automatic adaptability to variations in density of a pattern image of a workpiece being tested. The device is operable to identify a two-dimensional (2D) linear predictive model parameters from the pattern image of interest and determine the value of a total sum of these identified parameters. This value is then used to switch between a corrected pattern image due to the 2D linear prediction modeling and a corrected image that is interpolated by bicubic interpolation techniques. A pattern inspection method using the image correction technique is also disclosed. | 10-01-2009 |
20090244530 | MASK INSPECTION APPARATUS - A lightweight and inexpensive mask inspection apparatus having highly efficient environmental radiation resistance is provided. The mask inspection apparatus is a mask inspection apparatus for inspecting for mask defects and includes a light source, an illuminating optical system configured to irradiate a mask with an inspection light emitted from the light source, a magnifying optical system configured to cause the inspection light with which the mask is irradiated to form an image as an optical image, and image sensor configured to acquire the optical image. The image sensor has an environmental radiation shielding member of heavy metal having a specific gravity equal to or greater than that of tantalum (Ta) at least on a side opposite to a receiving surface of a sensor chip. | 10-01-2009 |
20090238446 | ULTRAFINE LITHOGRAPHY PATTERN INSPECTION USING MULTI-STAGE TDI IMAGE SENSORS WITH FALSE IMAGE REMOVABILITY - A workpiece inspection apparatus includes a measured image generator unit configured to measure a pattern of a workpiece and generate a measured image; and a comparator unit configured to compare the measured image to a fiducial image, wherein said measured image generator unit includes a light-receiving device having an interconnection of two or more time delay integration (TDI) sensors each being arranged by two or more line sensors each being arranged by two or more pixels, for generating as the measured image an average value of pixel values excluding an abnormal pixel value from pixels of each TDI sensor with respect to a position of the pattern of the workpiece. | 09-24-2009 |
20090238441 | PATTERN INSPECTION APPARATUS, PATTERN INSPECTION METHOD, AND COMPUTER-READABLE RECORDING MEDIUM STORING A PROGRAM - A pattern inspection apparatus includes a magnification conversion unit configured to input first sample optical image data, and to convert the first sample optical image data to second sample optical image data which has a resolution N times that of the first sample optical image data, a low-pass filter configured to input first design image data which has a resolution N times that of the first sample optical image data and in which a gray level value corresponding to the first sample optical image data is defined, and to calculate second design image data by convolving the first design image data with a predetermined low-pass filtering function, an optical filter configured to calculate third design image data by convolving the second design image data with a predetermined optical model function, a coefficient acquisition unit configured to acquire a coefficient of the predetermined optical model function by performing a predetermined calculation by using the second sample optical image data and the third design image data, an optical image acquisition unit configured to acquire actual optical image data of an inspection target workpiece on which a pattern is formed, a reference image data generation unit configured to generate reference image data corresponding to the actual optical image data by using the coefficient, and a comparison unit configured to input the actual optical image data, and to compare the actual optical image data with the reference image data. | 09-24-2009 |
20090237909 | LIGHT POLARIZATION CONTROL USING SERIAL COMBINATION OF SURFACE-SEGMENTED HALF WAVELENGTH PLATES - A light polarization control apparatus includes a linear polarized light generation device for generating a linearly polarized light ray; and a pair of first and second four-division type half-wave plate located at front and back positions of a light axis, each said half-wave plate having a surface divided into four regions by a couple of boundary lines crossing together at right angles, wherein the linearly polarized light ray is guided to pass through said pair of first and second four-division type half-wave plate to thereby divide this light ray into eight areas each having its polarization state as converted to any one of a azimuthally polarized state and a radially polarized state. | 09-24-2009 |
20090214104 | PATTERN IMAGE CORRECTING APPARATUS, PATTERN INSPECTION APPARATUS, AND PATTERN IMAGE CORRECTING METHOD - The present invention provides an apparatus and method for correcting an inspection reference pattern image in order to properly inspect a pattern image of a specimen. The pattern image correcting apparatus is characterized by including: a first pattern synthesizing unit for synthesizing an assist pattern image and a pattern image to be inspected, thereby generating a pattern image to be inspected with an assist pattern; an assist pattern shift processor; a second pattern synthesizing unit for synthesizing the shifted assist pattern image and the inspection reference pattern image, thereby generating an inspection reference pattern image with an assist pattern; a model generating unit for generating a position shift model by using the pattern image to be inspected with the assist pattern and the inspection reference pattern image with the assist pattern; and a correction pattern image computing unit for correcting the inspection reference pattern image. | 08-27-2009 |
20090084989 | BEAM IRRADIATION APPARATUS WITH DEEP ULTRAVIOLET LIGHT EMISSION DEVICE FOR LITHOGRAPHIC PATTERN INSPECTION SYSTEM - An illumination beam irradiation apparatus for use in pattern inspection systems is disclosed, which is less in deterioration of optical components and in attenuation of illumination light. The illumination apparatus includes a light source which yields a fundamental wave, a beam-shaper unit which performs beam-shaping of the fundamental wave so that this wave has a prespecified shape, and a pattern generator unit which operates, upon receipt of the beam-shaped fundamental wave, to convert this incoming wave into illumination light with a shorter wavelength to thereby generate illumination light of a prespecified shape. The illuminator also includes an image relay unit for guiding the illumination light that was generated by the pattern generator to fall onto a workpiece under inspection, such as a photomask or else. | 04-02-2009 |
20090075184 | MASK BLANK FOR EUV EXPOSURE AND MASK FOR EUV EXPOSURE - Provided are a mask for EUV exposure and a mask blank for EUV exposure for manufacturing the same, so as to improve the contrast of ultraviolet inspection light and improve the inspection performance for the mask. This mask blank for EUV exposure includes a substrate, a reflecting layer which is provided on the substrate and reflects EUV light, and an absorbent layer which is provided on the reflecting layer and absorbs EUV light. Reflectance of light at a wavelength between 150 nm and 300 nm is greater at the absorbent layer than that of the reflecting layer. The mask for EUV exposure can be manufactured by processing this mask blank for EUV exposure. | 03-19-2009 |
20080291528 | WAVELENGTH CONVERTER SYSTEM, CRYSTAL STORAGE APPARATUS, AND CRYSTAL REPLACEMENT METHOD OF WAVELENGTH CONVERTER - A wavelength converter system capable of replacing a nonlinear crystal in a wavelength converter in a short time with ease is provided. The wavelength converter system includes the wavelength converter for converting a wavelength by passing light through the nonlinear crystal and a crystal storage apparatus for storing a nonlinear crystal for replacement used by the wavelength converter, wherein the wavelength converter has a first crystal holder for fixing the nonlinear crystal and a first heater for heating the nonlinear crystal and the crystal storage apparatus has a container, a second crystal holder that is in the container to fix the nonlinear crystal for replacement and interchangeable with the first crystal holder, and a second heater for heating the nonlinear crystal for replacement. | 11-27-2008 |
20080259328 | RETICLE DEFECT INSPECTION APPARATUS AND INSPECTION METHOD USING THEREOF - A reticle defect inspection apparatus that suppresses deterioration of optical components resulting from luminescent spots generated by an integrator and can sustain a defect inspection with high precision for a long time is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. And the apparatus includes an illuminating optical system for irradiating the reticle with an inspection light and a detecting optical system for detecting a pattern image of the reticle irradiated with the inspection light, wherein the illuminating optical system comprises an integrator for equalizing illumination distribution of the inspection light and a moving mechanism for enabling the integrator to slightly move in a direction perpendicular to an optical axis of the integrator. | 10-23-2008 |
20080259323 | RETICLE DEFECT INSPECTION APPARATUS AND RETICLE DEFECT INSPECTION METHOD - A reticle defect inspection apparatus that controls damage of a reticle by irradiation with an inspection light when the reticle is caused to be at rest is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. The reticle defect inspection apparatus has a dose monitoring part for measuring a dose of the light to the reticle, a comparing part for comparing, after calculating accumulated irradiation from the dose measured by the dose monitoring part, the accumulated irradiation with a preset threshold, and a stop mechanism for stopping irradiation of the reticle with the light when, as a result of the comparison, the accumulated irradiation exceeds the threshold. | 10-23-2008 |
20080239290 | RETICLE DEFECT INSPECTION APPARATUS AND RETICLE DEFECT INSPECTION METHOD - A reticle defect inspection apparatus that can carry out a defect inspection with high detection sensitivity are provided. The apparatus includes an optical system of transmitted illumination for irradiating one surface of a sample with a first inspection light, an optical system of reflected illumination for irradiating another surface of the sample with a second inspection light, and a detecting optical system that can simultaneously detect a transmitted light obtained by the first inspection light being passed through the sample and a reflected light obtained by the second inspection light being reflected by the sample. And the optical system of transmitted illumination includes a focusing lens driving mechanism for correcting a focal point shift of the transmitted light resulting from thickness of the sample. | 10-02-2008 |
20080237489 | LIGHTING OPTICAL APPARATUS AND SAMPLE INSPECTION APPARATUS - A lighting optical apparatus using a deep ultraviolet light source that are easy to adjust due to a configuration with fewer components, has high illuminant and illuminant uniformity on an irradiated surface are provided. The apparatus has a deep ultraviolet light source from which deep ultraviolet rays are emitted, a first double-sided cylindrical lens which has a cylindrical lens array on both sides with a configuration of cylinder axes intersecting at right angles, a second double-sided cylindrical lens which has a cylindrical lens array on both sides with a configuration of cylinder axes intersecting at right angles, and a condenser lens. | 10-02-2008 |
20080231846 | LEVEL DETECTION APPARATUS - A level detection apparatus includes an illumination slit in which a rectangular first opening which causes illumination light to pass is formed, an optical system configured to illuminate a target object surface by illumination light passing through the illumination slit and focuses reflected light from the target object surface, first and second detection slits which are arranged in front of and in back of a focal point and in each of which a second opening is formed such that a short side of a rectangle is shorter than a short side of a illumination slit image formed by the illumination slit and a long side of the rectangle is larger than a long side of the illumination slit image, first and second light amount sensors configured to detect amounts of light of the reflected lights passing through the first and second detection slits, and a calculating unit configured to calculate a level of the target object surface based on outputs from the first and second light amount sensors. | 09-25-2008 |
20080204737 | MASK PATTERN INSPECTION APPARATUS WITH KOEHLER ILLUMINATION SYSTEM USING LIGHT SOURCE OF HIGH SPATIAL COHERENCY - A semiconductor device fabrication-use mask pattern inspection apparatus having an optical configuration adaptable for achievement of a Koehler illumination system using a light source high in spatial coherency is disclosed. This apparatus includes a laser light source, a beam expander which is disposed between the laser source and a mask for expanding laser light to form an optical path of collimated light rays, and a beam splitter placed in the collimated light ray optical path for splitting the optical path into two optical paths. In one of these paths, a transmissive illumination optics is placed which irradiates transmission light onto the mask; in the other path, a reflective illumination optics is placed for irradiation of reflected light onto the mask. A pattern image of this mask is detected by a photosensitive device to generate a detected pattern image, which is sent to a comparator for comparison with a fiducial image thereof. | 08-28-2008 |