| Advanced Energy Industries, Inc. Patent applications |
| Patent application number | Title | Published |
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| 20120327970 | Compensation of Stray Light Interference in Substrate Temperature Measurement - This disclosure describes systems, methods, and apparatuses for making a non-contact measurement of a substrate in a plasma processing chamber that accounts for stray blackbody radiation. In particular, a photocurrent is calculated that can be attributed to the stray blackbody radiation based upon a temperature of the stray blackbody radiation, a reflectance of a target substrate, and a temperature of the substrate. Knowing the photocurrent attributable to the stray blackbody radiation, a non-contact temperature measurement can be made, and the photocurrent attributable to the stray blackbody radiation can be subtracted out to arrive at a more accurate non-contact substrate temperature measurement. | 12-27-2012 |
| 20120319584 | METHOD OF CONTROLLING THE SWITCHED MODE ION ENERGY DISTRIBUTION SYSTEM - Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis. | 12-20-2012 |
| 20120318456 | METHOD OF CONTROLLING THE SWITCHED MODE ION ENERGY DISTRIBUTION SYSTEM - Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis. | 12-20-2012 |
| 20120285620 | Current Threshold Response Mode for Arc Management - This disclosure describes systems, methods, and apparatuses for extinguishing electrical arcs in a plasma processing chamber. Once an arc is detected, the steady state voltage provided to the plasma processing chamber can be reduced, and the current being provided to the chamber decays below a steady state value as the arc is extinguished. When the current falls to or below a current threshold, the voltage can be ramped back up bringing the voltage and current back to steady state values. This technique enables power to return to a steady state level faster than traditional arc mitigation techniques. | 11-15-2012 |
| 20120242229 | REMOTE PLASMA SOURCE GENERATING A DISC-SHAPED PLASMA - Disclosed herein are systems, methods and apparatuses for dissociating a non-activated gas through a disc-shaped plasma in a remote plasma source. Two inductive elements, one on either side of the disc-shaped plasma, generate a magnetic field that induces electric fields that sustain the disc-shaped plasma. The inductive elements can be coiled conductors having any number of loops and can be arranged in planar or vertical coils or a combination of planar and vertical coils. Additionally, the ratio of inductive element radius to gap distance between the two inductive elements can be configured to achieve a desired vertical plasma confinement. | 09-27-2012 |
| 20120218042 | METHOD AND APPARATUS FOR MODIFYING THE SENSITIVITY OF AN ELECTRICAL GENERATOR TO A NONLINEAR LOAD - A method and generator for modifying interactions between a load and the generator are described. The method includes applying output power to the load using a power amplifier, controlling a level of the output power responsive to a power control setting, and adjusting a conduction angle of the power amplifier to reduce a level of sensitivity of the power amplifier to variations of an impedance of the load. The generator includes a compensation subsystem coupled to the power amplifier that controls a conduction angle of the power amplifier to enable a sensitivity of the power amplifier to be adjusted. | 08-30-2012 |
| 20120217221 | SYSTEM, METHOD AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTION OF A PROJECTED PLASMA - Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber via a remotely generated ionizing electromagnetic field that extends into the plasma chamber from a remote projected source, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis. | 08-30-2012 |
| 20120188007 | Impedance-Matching Network Using BJT Switches in Variable-Reactance Circuits - This disclosure describes systems, methods, and apparatuses for impedance-matching radio frequency power transmitted from a radio frequency generator to a plasma load in a semiconductor processing chamber. Impedance-matching can be performed via a match network having a variable-reactance circuit. The variable-reactance circuit can comprise one or more reactive elements all connected to a first terminal and selectively shorted to a second terminal via a switch. The switch can comprise a bipolar junction transistor (BJT) or insulated gate bipolar transistor (IGBT) controlled via bias circuitry. In an on-state, the BJT base-emitter junction is forward biased, and AC is conducted between a collector terminal and a base terminal. Thus, AC passes through the BJT primarily from collector to base rather than from collector to emitter. Furthermore, the classic match network topology used with vacuum variable capacitors can be modified such that voltages do not overload the BJT's in the modified topology. | 07-26-2012 |
| 20120187844 | ELECTROSTATIC REMOTE PLASMA SOURCE - This disclosure describes systems, methods, and apparatus for capacitively coupling energy into a plasma to ignite and sustain the plasma within a remote plasma source. The power is provided by a first electrode that at least partially surrounds or is surrounded by a second electrode. The second electrode can be grounded or floating. First and second dielectric components can be arranged to separate one or both of the electrodes from the plasma and thereby DC isolate the plasma from one or both of the electrodes. | 07-26-2012 |
| 20120171390 | METHODS AND APPARATUS FOR SPUTTERING USING DIRECT CURRENT - An apparatus and methods for plasma-based sputtering deposition using a direct current power supply is disclosed. In one embodiment, a plasma is generated by connecting a plurality of electrodes to a supply of current, and a polarity of voltage applied to each of a plurality of electrodes in the processing chamber is periodically reversed so that at least one of the electrodes sputters material on to the substrate. And an amount of power that is applied to at least one of the plurality of electrodes is modulated so as to deposit the material on the stationary substrate with a desired characteristic. In some embodiments, the substrate is statically disposed in the chamber during processing. And many embodiments utilize feedback indicative of the state of the deposition to modulate the amount of power applied to one or more electrodes. | 07-05-2012 |
| 20120112815 | HIGH FREQUENCY SOLID STATE SWITCHING FOR IMPEDANCE MATCHING - In accordance with this invention the above and other problems are solved by a switching apparatus and method that uses a switching circuit having a pair of parallel solid-state diodes (e.g., PN diodes), one of which is connected to a transistor (e.g., power MOSFET or IGBT), to switch a capacitor in or out of a variable capacitance element of an impedance matching network. Charging a body capacitance of the transistor reverse biases one of the two diodes so as to isolate the transistor from the RF signal enabling a low-cost high capacitance transistor to be used. Multiple such switching circuits and capacitors are connected in parallel to provide variable impedance for the purpose of impedance matching. | 05-10-2012 |
| 20120091817 | SYSTEM, METHOD, AND APPARATUS FOR AC GRID CONNECTION OF SERIES-CONNECTED INVERTERS - A system, method and apparatus are disclosed for converting DC power to AC power. The system includes a master controller that couples to a phase of a power distribution system and provides a synchronization signal, the phase of the power distribution system having a phase voltage. The system also includes a plurality of DC-to-AC series-connectable power converters, that receive and use the synchronization signal to convert a variable DC voltage from a corresponding one a plurality of photovoltaic panels to a variable AC voltage so that a plurality of corresponding variable AC voltages are generated by the plurality series-connectable power converters, and collectively the plurality of corresponding variable AC voltages add up the phase voltage, and each of the series-connectable power converters controls, responsive to the synchronization signal, the variable AC voltage so that the plurality of corresponding variable AC voltages are in phase. | 04-19-2012 |
| 20120074506 | Semiconductor Package for Higher Power Transistors - A semiconductor package for mounting multiple field effect transistors (FETs) is disclosed. The package includes a drain conductor between each FET's drain connection point and a drain terminal connector on the semiconductor package; a source conductor between each FET's source connection point and a source terminal connector of the source conductor on the semiconductor package, the source conductor containing the common inductance; a dielectric substantially overlaying said source conductor; a gate conductor on the dielectric substantially overlaying the source conductor; and said gate conductor, said dielectric and said source conductor forming a transformer, the transformer creating voltage in the gate conductor which almost exactly cancels voltage in said source conductor. | 03-29-2012 |
| 20110307104 | Adaptive On-Tool Mass Flow Controller Tuning - One embodiment comprises a method of providing accurate mass flow controller flow rate data for a non-manufacturing-tuning-gas. The mass flow controller may be operated at a setpoint greater than 50%. Data may be recorded to a mass flow controller memory. The setpoint may then be changed to 0%. The recorded data may then be analyzed and one or more non-manufacturing-tuning-gas correction algorithm parameters may be calculated. The one or more non-manufacturing-tuning-gas correction algorithm parameters may be stored in a mass flow controller memory and subsequently used in at least one future mass flow controller operation involving the non-manufacturing-tuning-gas. | 12-15-2011 |
| 20110264281 | METHOD AND SYSTEM OF ON-TOOL AND ON-SITE MFC OPTIMIZATION PROVIDING CONSISTENT RESPONSE - One method of obtaining an initial adjusted mass flow controller valve start position comprises obtaining a mass flow controller delay period and setting a mass flow controller valve to an initial valve opening position that is less than an expected optimal valve opening position. An initial desired flow rate and initial operating conditions are input into a control system that is in communication with the valve, and the control system is initiated. The control system is adapted to adjust the valve opening position to achieve the initial desired flow rate, while taking into account flow rate and valve position feedback to the control system. During operation of the MFC and control system, the valve position and the flow rate are recorded in one embodiment and a flow rate that one of meets and exceeds a threshold is detected. An initial-flow time-period extending from the time of control system initiation to detection of the threshold being one of met and exceeded is determined and the mass flow controller delay period from the initial flow time period is subtracted from the initial-flow time-period to obtain an adjusted start time. The valve opening position at the adjusted start time is set as the initial adjusted mass flow controller valve start position. | 10-27-2011 |
| 20110259851 | SYSTEM, METHOD AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTION - Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis. | 10-27-2011 |
| 20110248633 | METHODS AND APPARATUS FOR APPLYING PERIODIC VOLTAGE USING DIRECT CURRENT - Methods and apparatus for applying pulsed DC power to a plasma processing chamber are disclosed. In some implementations, frequency of the applied power is varied to achieve desired processing effects such as deposition rate, arc rate, and film characteristics. In addition, a method and apparatus are disclosed that utilize a relatively high potential during a reverse-potential portion of a particular cycle to mitigate possible nodule formation on the target. The relative durations of the reverse-potential portion, a sputtering portion, and a recovery portion of the cycle are adjustable to effectuate desired processing effects. | 10-13-2011 |
| 20110247696 | MASS FLOW CONTROLLER WITH ENHANCED OPERATING RANGE - A mass flow controller among other embodiments and method is described. The mass flow controller including a thermal mass flow sensor including at least two sensing elements coupled to a sensor tube of the mass flow controller, the thermal mass flow sensor being designed to provide a first signal indicative of flow of a gas within a first flow-rate-range and a second signal indicative of flow of the gas within a second flow-rate-range; and a control portion figured to control a valve position of the mass flow controller responsive to the first signal when the flow of the gas is within the first flow-rate-range and control the valve position of the mass flow controller responsive to the second signal when the flow of the gas is within a second flow-rate-range. | 10-13-2011 |
| 20110247390 | METHOD AND MASS FLOW CONTROLLER FOR ENHANCED OPERATING RANGE - A mass flow controller (MFC), a method for calibrating an MFC, and a method for operating an MFC are disclosed. The method for calibrating the MFC includes obtaining data relative to two signals from a thermal mass flow sensor when operating the mass flow controller at different flow rates with a calibration gas, and storing the data relating to the two signals in connection with corresponding flow-rate values. The method for operating the MFC includes obtaining data relative to the two signals from the thermal mass flow controller and accessing the calibration data to determine an unknown flow rate for a process gas that may be the same gas as the calibration gas or may be another gas that is different from the calibration gas. | 10-13-2011 |
| 20110061841 | TEMPERATURE INSENSTIVE MASS FLOW CONTROLLER - A temperature insensitive mass flow controller comprising a main flow line, a capillary tube coupled to the main flow line across a bypass a thermal sensing element coupled to the capillary tube and a mass flow controller housing adapted to at least cover the capillary tube. A first heat sink has been coupled to the mass flow controller internal to the mass flow controller housing and coupled to the capillary tube. The heat sink being adapted to control a temperature of a gas in the capillary tube. | 03-17-2011 |
| 20110054702 | MULTI-MODE CONTROL LOOP WITH IMPROVED PERFORMANCE FOR MASS FLOW CONTROLLER - One embodiment of the invention comprises a mass flow controller comprising a digital controller, a valve, and a sensor. The digital controller is adapted to implement a control loop having a proportional signal modifier in series with an integral signal modifier. The integral signal modifier is adapted to receive a combination signal and output an integrated signal. The valve is adapted to receive the integrated signal and adjust a valve opening in accordance with the integrated signal. The sensor is adapted to output a measured flow rate signal indicative of an actual fluid flow rate in the mass flow controller. The measured flow rate signal is received by the proportional signal modifier and used in conjunction with a setpoint signal to determine the error signal. | 03-03-2011 |
| 20110015791 | THERMAL MASS FLOW SENSOR WITH IMPROVED RESPONSE ACROSS FLUID TYPES - One embodiment of the present invention comprises a mass flow controller. The mass flow controller may comprise a pair of thermal sensing elements, a bridge circuit adapted to receive at least one first signal from the pair of thermal sensing elements and a differential amplifier adapted to (i) receive at least one bridge signal from the bridge circuit, and (ii) emit an output signal generally proportional to a flow rate of fluid passing through the mass flow controller. The mass flow controller is also comprised in one embodiment of a filter portion of a control module having one or more first filters comprising substantially permanent parameters adapted to provide a more accurate output signal for a baseline fluid upon a change in the flow rate and one or more second filters comprising variable parameters, with each of the one or more second filters being adapted to provide a more accurate output signal for non-baseline fluids upon a change in the flow rate. | 01-20-2011 |
| 20100326539 | Thermal Flow Sensor with Zero Drift Compensation - One embodiment of the present invention comprises a thermal flow sensor having a first capillary tube coupled to a mass flow controller main flow line across a mass flow controller bypass. A first pair of sensing elements is coupled to the first capillary tube. The thermal sensor also comprise a second capillary tube having a substantially similar cross-sectional area to the first capillary tube, a first end thermally coupled to one of a mass flow controller base and the first tube proximal the first tube inlet port, and a second end thermally coupled to one of the mass flow controller base and the first tube proximal the outlet port. The second tube is not adapted to receive and eject a fluid flow. A second pair of sensing elements is coupled to the second tube. | 12-30-2010 |
| 20100315161 | Power Inductor - A power inductor comprising a tube and one or more coils. The tube in one embodiment is generally cylindrical and comprises a liquid-cooled center portion, the tube further comprising an inner diameter, an outer diameter, and an outer surface. The coils of one embodiment are coupled to the tube outer surface, with each of the one or more coils having a coil thickness, and at least a portion of a coil turn. | 12-16-2010 |
| 20100276273 | METHOD AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTION - Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary system includes an ion-energy control portion, and the ion-energy control portion provides at least one ion-energy control signal responsive to at least one ion-energy setting that is indicative of a desired distribution of energies of ions bombarding a surface of a substrate. A controller is coupled to the switch-mode power supply, and the controller provides at least two drive-control signals. In addition, a switch-mode power supply is coupled to the substrate support, the ion-energy control portion and the controller. The switch-mode power supply includes switching components configured to apply power to the substrate responsive to the drive signals and the ion-energy control signal so as to effectuate the desired distribution of the energies of ions bombarding the surface of the substrate. | 11-04-2010 |
| 20100270141 | Detecting and Preventing Instabilities in Plasma Processes - Systems, methods and apparatus for reducing instabilities in a plasma-based processing system are disclosed. An exemplary method includes applying power to a plasma with a power amplifier; determining whether low frequency instability oscillations are present or high frequency instability oscillations are present in the plasma; and altering, based upon whether high or low frequency instability oscillations are present, an impedance of a load that is experienced by the power amplifier, the load experienced by the power amplifier including at least an impedance of the plasma. | 10-28-2010 |
| 20100264901 | DIRECTIONAL COUPLER - One embodiment comprises a directional coupler system comprising a substrate having a top surface and a backside surface, with the backside surface comprising a metalization ground portion and an unmetalized portion. A power line is coupled to the top surface, with the power line having an input adapted to receive a power signal, a first trace coupled to the input, a second trace in parallel with the first trace and coupled to the input, and an output coupled to the first and second traces and adapted to emit the power signal. A sensor line is coupled to the backside surface unmetalized portion, with the sensor line adapted to emit a sensor line signal having a sensor line signal level generally proportional to the power signal. Finally, a thermo-conductive base platform coupled to the metalized portion of the backside surface. | 10-21-2010 |
| 20100194281 | Passive Power Distribution for Multiple Electrode Inductive Plasma Source - Systems, methods, and Apparatus for controlling the spatial distribution of a plasma in a processing chamber are disclosed. An exemplary system includes a primary inductor disposed to excite the plasma when power is actively applied to the primary inductor; at least one secondary inductor located in proximity to the primary inductor such that substantially all current that passes through the secondary inductor results from mutual inductance through the plasma with the primary inductor. In addition, at least one terminating element is coupled to the at least one secondary inductor, the at least one terminating element affecting the current through the at least one secondary inductor so as to affect the spatial distribution of the plasma. | 08-05-2010 |
| 20100180951 | Mass Flow Controller Hysteresis Compensation System & Method - A method of characterizing hysteresis as a function of a device output comprising, applying an input signal across a first input signal range to a device, the input signal inducing a device function having a first output with a first output value range dependent upon the first input signal range. The input signal is further applied across a second input signal range to the device, the input signal inducing the device function to have a second output with a second output value range dependent upon (i) the second input signal range and (ii) device hysteresis. A difference between the second input signal range and the first input signal range is then measured across the first and second output value ranges. A method of operating a mass flow controller valve and a mass flow controller are also contemplated. | 07-22-2010 |
| 20100141224 | DIGITAL CHARGE-MODE CONTROL OF A POWER SUPPLY - Disclosed herein are an apparatus and method for charge-mode control. An embodiment of a charge mode controller may include an analog/digital converter configured to monitor the current through a duty cycle switch and convert the current to a switch current value; an accumulator module configured to integrate the switch current value during the switching cycle and output an accumulated charge value; and a comparator module responsive to the accumulated charge value and a charge set point configured to generate a gate drive signal for the duty cycle switch that turns the duty cycle switch ON when the accumulated charge value is less than the charge set point and turns the duty cycle switch OFF when the accumulated charge value reaches the charge set point and thereby controls the duty cycle of the converter and the power supplied by the power stage. | 06-10-2010 |
| 20100089459 | MASS FLOW CONTROLLER AND METHOD OF OPERATING THE SAME - One embodiment of the present invention involves a thermal sensor and a method of using the same. One thermal sensor is adapted to output a signal which is unaffected by external longitudinal and orthogonal thermal gradients. In one embodiment, the mass flow controller thermal sensor comprises a capillary tube having an upstream tube portion, a tube bend portion, and a downstream tube portion, the downstream portion being substantially parallel to the upstream portion. A distance between the upstream tube portion and the downstream tube portion in one embodiment is no greater than half the upstream portion and downstream portion lengths, a first pair of thermal sensing elements are coupled to the upstream tube portion and a second pair of thermal sensing elements are coupled to the downstream tube portion. | 04-15-2010 |
| 20100080262 | METHOD AND SYSTEM FOR OPERATING A MASS FLOW CONTROLLER - A system and method for operating a mass flow controller is described. One embodiment validates the operation of a mass flow controller thermal sensor, including detecting zero drift and span drift in the sensor by comparing the thermal sensor output to a pressure sensor output. In one embodiment, each sensor provides a signal to a digital controller or other processing unit and the controller calculates the mass flow rates of a gas flowing through the unit as measured by the sensors. The mass flow rates may then be compared to determine if one of the thermal sensor is operating properly. | 04-01-2010 |
| 20100026186 | POWER SUPPLY IGNITION SYSTEM AND METHOD - One embodiment comprises a plasma processing system having a plasma chamber, a generator, a feedback component, and a controller. The feedback component is adapted to receive at least one first signal having a level dependent upon the power signal supplied from the generator to the chamber. A feedback output is adapted to emit a second signal to the controller, which is adapted to supply a third signal to the power generator. The third signal is configured to control the power generator to supply the power signal at a power level for a particular processing application. The power generator is further controlled by the controller to one of reduce and remove power from the plasma processing chamber and subsequently increase the voltage level until the power level reaches a threshold level. The power generator is further controlled to subsequently modulate the voltage until the voltage returns to a first voltage level. | 02-04-2010 |
| 20080291706 | COMMON MODE FILTER SYSTEM AND METHOD FOR A SOLAR POWER INVERTER - A photovoltaic system, method and apparatus are disclosed. In an exemplary embodiment, the system includes a photovoltaic array, a distribution system that distributes power within a premises of a demand-side energy consumer, an inverter coupled to the distribution system that is configured to convert DC power from the photovoltaic array to AC power and apply the AC power to the distribution system, a damping portion configured to damp high frequency voltages derived from the inverter, and trapping circuitry coupled to the damping portion that is configured to reduce a level of low frequency current traveling through the damping portion. | 11-27-2008 |
