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Accretech USA, Inc.
| Accretech USA, Inc. Patent applications | ||
| Patent application number | Title | Published |
|---|---|---|
| 20090122304 | Apparatus and Method for Wafer Edge Exclusion Measurement - A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system uses a light diffuser with a plurality of lights disposed at its exterior or interior for providing uniform diffuse illumination of a substrate. An optic and imaging system exterior of the light diffuser are used to inspect the plurality of surfaces of the substrate including specular surfaces. An automatic defect characterization processor is provided. | 05-14-2009 |
| 20090116727 | Apparatus and Method for Wafer Edge Defects Detection - A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system a image processor to automatically detect and characterize defects on the wafer's edge. | 05-07-2009 |