ABLEPRINT TECHNOLOGY CO., LTD. Patent applications |
Patent application number | Title | Published |
20130119119 | SOLDER SPATTERING SUPPRESSED REFLOW METHOD - A solder spattering suppressed reflow method includes the following steps: (A) preparing a carrier; (B) placing at least one solderable object on the carrier by means of printing, dispensing, mounting or plating; and (C) moving the carrier into an enclosed chamber and carrying out a high-temperature and high-pressure reflow process to have the solderable object heated and melted to bond to the carrier. | 05-16-2013 |
20130065362 | FLIP CHIP PACKAGE MANUFACTURING METHOD - A flip chip package manufacturing method is provided. A non-conductive film is pressed onto a wafer with multiple conductive bumps. The wafer is cut to multiple single chips. A carrier is provided, and a thermo-compression flip chip bonding process is executed to bond the non-conductive film onto the carrier. The carrier is transferred into a chamber with enclosed, pneumatic pressurized and heatingable characteristics to execute a de-void process to eliminate the bubbles and to execute a high-temperature soldering process to solder the single chip onto the carrier. The sequence of the de-void process and the high-temperature soldering process may exchange. | 03-14-2013 |
20130037126 | GAS CONCENTRATION CONTROL DEVICE FOR PRESSURE VESSEL - A gas concentration control device for pressure vessel is provided for controlling gas concentration inside an accommodation space that is set in an interior of a chamber formed inside a pressure vessel curing oven. The pressure vessel curing oven includes a gas inlet tube with a first valve and a gas outlet tube with a second valve, which are in communication with the accommodation space. The gas concentration control device includes a gas concentration detection device, which is operative for timed detection of concentration of a gas inside the accommodation space, and a control unit for setting a predetermined concentration, performing a judgment if the gas concentration inside the accommodation space reaches the predetermined concentration according to a detection result of the gas concentration detection device, and thereby controls the first valve and the second valve according to result of the judgment. | 02-14-2013 |