HORIBA STEC, CO., LTD. Patent applications |
Patent application number | Title | Published |
20160103030 | CAPACITIVE PRESSURE SENSOR - Provided is a capacitive pressure sensor that prevents not only a change in temperature but also electromagnetic noise in the air from affecting the measurement value of pressure. In the capacitive pressure sensor, an electrode member includes: a measurement electrode fixed to an insulating positioning member and having an electrode face; a signal extraction electrode fixed with an insulating seal sealing the other end of the body; and a flexible connection member for electrically connecting the measurement electrode and the signal electrode. Moreover, the flexible connection member is accommodated in the accommodating depressed portion formed in the measurement electrode or the signal extraction electrode. | 04-14-2016 |
20160103021 | CHROMATOGRAPH DATA PROCESSING DEVICE, CHROMATOGRAPH DATABASE, CHROMATOGRAPH DATA PROCESSING METHOD, AND PROGRAM FOR CHROMATOGRAPH DATA PROCESSING DEVICE - To provide a chromatograph data processing device and the like that can estimate and calculate a retention index or a retention time that would be measured by performing programmed-temperature analysis with any desired rate of temperature increase from known retention indices measured by programmed-temperature analysis, a receiving unit that receives a rate of temperature increase, an RI-r relationship storage unit that stores an RI-r relationship, the RI-r relationship being a relationship between a retention index and a rate of temperature increase and being identified based on a plurality of retention indices with respect to different rates of temperature increase and the corresponding rates of temperature increase, and a retention index calculation unit that calculates an estimated retention index based on the RI-r relationship, the estimated retention index being a retention index corresponding to the received rate of temperature increase received by the receiving unit. | 04-14-2016 |
20160097747 | GAS CHROMATOGRAPH - In order to provide a gas chromatograph in which any adverse effects on a reduction reaction unit that are caused by the degradation of a reduction catalyst, and any adverse effects on an analyzing unit are prevented, a gas chromatograph is provided with: a column that, by causing a sample gas to pass through itself, is able to separate constituents for measurement that are contained in the sample gas; an oxidation reaction unit that uses an oxidizing gas to oxidize the sample gas that has passed through the column so as to create an oxidation sample gas; a reduction reaction unit that uses a reducing gas to reduce the oxidation sample gas created by the oxidation reaction unit so as to create an oxidation reduction sample gas; and an analyzing unit that analyzes the sample gas. | 04-07-2016 |
20140356796 | HEATING VAPORIZATION SYSTEM AND HEATING VAPORIZATION METHOD - A heating vaporization system provided with: a container that heats and vaporizes a source to produce source gas; a pipe for leading out the source gas; a sensor flow path that is provided in the pipe; a flow rate detecting part that is provided with a thermal type flow rate sensor provided in the sensor flow path, and measures a flow rate of the source gas flowing through the pipe; a flow rate regulating part that regulates the flow rate of the source gas flowing through the pipe located upstream of the flow rate detecting part; and a control part that uses a result of the detection by the flow rate detecting part to control the flow rate regulating part. | 12-04-2014 |
20140324233 | FLUID CONTROL DEVICE - The present invention is intended to inhibit a communication program from crashing in the case where a power source is turned off while writing or rewriting of a measurement control program from an external device is performed by a communication part, and includes: a first recording part for storing the communication program for controlling the communication part; a second recording part for storing a measurement control program for controlling the measurement control part; and a central processing unit. In this configuration, the communication program stored in the first recording part is configured to be unrewritable by the central processing unit and the measurement control program stored in the second recording part is configured to be rewritable by the central processing unit. | 10-30-2014 |
20140319705 | VAPOR CONCENTRATION CONTROL SYSTEM, VAPOR CONCENTRATION CONTROL DEVICE AND CONTROL PROGRAM - The present claimed invention includes a first flow channel where a carrier gas or a mixed gas flows, a switch valve that is for flowing the mixed gas or the carrier gas to the first flow channel selectively, a fluid adjusting valve that adjusts a concentration of a gas flowing in the first flow channel, and a control part that conducts a feedback control on an opening degree of the fluid adjusting valve, and is characterized such that the control part initiates the feedback control by the use of an opening degree of the fluid adjusting valve at a time just before the gas flowing in the first flow channel is switched from the mixed gas to the carrier gas as an initial opening degree of the fluid adjusting valve at a time when the gas flowing in the first flow channel is again switched to the mixed gas afterward. | 10-30-2014 |
20140309946 | DATA PROCESSING DEVICE FOR GAS CHROMATOGRAPH, DATA PROCESSING METHOD, AND RECORDING MEDIUM THAT STORES DATA PROCESSING PROGRAM - A data processing device for gas chromatograph includes an actually measured retention time storage part, a predicted retention time storage part, and an actual temperature condition estimation part configured to estimate an actual temperature condition in the column on the basis of an actually measured retention time and a predicted retention time. | 10-16-2014 |
20140290778 | FLUID CONTROL VALVE - In order to make it possible to increase a diameter and output thereof, a diaphragm structure is provided that has low repulsiveness, can be largely deformed to increase a stroke even without being applied with a large force from an actuator, and is unlikely to give rise to a defect or fault even when formed thin, and a fluid control valve is provided with the diaphragm structure and the actuator that presses the diaphragm structure, wherein the diaphragm structure is provided with: a protruding part that is formed in a tubular shape and pressed by the actuator; a brim part that spreads from a base end of the protruding part outward with respect to the protruding part; and a support part that is formed on an outer circumference of the brim part and attached to another member, and the brim part is formed in a film shape. | 10-02-2014 |
20140230559 | STRUCTURE FOR USE WITH FLUID DIAPHRAGM - A structure comprising: a base; a diaphragm; a peripheral wall member of which one end surface is attached to a circumferential edge part of the diaphragm and the other end surface is attached on the top surface of the base to form an internal space together with the base and the diaphragm; a protruding part that protrudes from the top surface of the base; and a communicatively connecting path that extends from a bottom surface side of the base toward the diaphragm, and communicatively connects the internal space and the outside to each other to flow fluid, wherein on an outer lateral surface of the protruding part, an opening is formed in a part intersecting with an inner lateral surface of the communicatively connecting path, and a part of a fore end inner surface of the communicatively connecting path is formed in the protruding part. | 08-21-2014 |
20140219868 | REACTION APPARATUS, CONTROL DEVICE, AND CONTROL PROGRAM - The present invention is mainly intended to provide a reaction apparatus that can prevent a problem due to heat generated by heat treatment in a reaction part, and accurately perform detection, and the reaction apparatus is provided with: a reaction part that is introduced with sample gas having passed through a column and reaction gas, and as a result of a reaction between the sample gas and the reaction gas, produces measurement gas containing a predetermined compound; a protruding pipe that is integrally protruded from the reaction part; and a connecting part that is disposed separately from the reaction part and removably fitted with the protruding pipe. | 08-07-2014 |
20140190578 | FLUID CONTROL VALVE AND MASS FLOW CONTROLLER - In order to, in a short period of time, reduce to zero a measured flow rate value measured after fully closing a fluid control valve, the fluid control valve having a configuration suitable to decrease the inside volume of the fluid control valve is configured together with a valve element member, and a valve seat block provided with: an in-valve flow path that is formed inside of the valve seat block; and a valve seat surface that is brought into contact with or separated from a seating surface of the valve element member is provided with a cutout that is formed in a part of a protruded rim so as to be communicatively connected to a downstream side flow path. | 07-10-2014 |
20140188403 | DATA PROCESSING DEVICE FOR GAS CHROMATOGRAPH AND DATA PROCESSING PROGRAM USED IN SAME - As a data processing device and data processing program for a gas chromatograph, which enable composition, a name, and the like of a registered substance to be extracted from an actually measured retention index by a reverse search, a known RI data storage part that stores a plurality of pieces of known RI data each in which an identifier G | 07-03-2014 |
20140182726 | FLUID MIXING ELEMENT - The fluid mixing element in accordance with this invention forms a first internal flow channel whose starting end opens on an end surface of one end part and whose terminal end opens on an end surface of the other end part and a second internal flow channel whose starting end opens on a side peripheral surface of a middle part and whose terminal end opens on an end surface of the other end part. It is possible for the fluid mixing element to securely mix a first fluid flowing in a main flow channel with a second fluid flowing in a sub-flow channel by the use of a pipe with a short length with a simple arrangement. | 07-03-2014 |
20140167366 | SEALING MEMBER AND METHOD OF MANUFACTURING THE SAME - The present invention is mainly intended to provide a sealing member which can be easily manufactured and which is capable of sealing with high accuracy and a method of manufacturing the sealing member, wherein the sealing member is a metallic sealing member that is arranged so as to be interposed between a first surface and a second surface which are facing each other. The sealing member is provided with a first protrusion protruded toward the first surface and a pair of second protrusions protruded toward the second surface, wherein the first protrusion is arranged between the paired second protrusions and distal end portions of the first protrusion and second protrusions are mutually parallel flat surfaces. | 06-19-2014 |
20140165841 | PLATE-TYPE CAPILLARY COLUMN, CAPILLARY COLUMN UNIT, AND CHROMATOGRAPH USING SAME - A plate-type capillary column has extensibility that enables a capillary to be extended as a whole to improve resolution of a chromatograph by stacking respective plate-type capillary columns. The capillary column is provided with a plate having first and second face plate parts that face each other; a capillary that is formed inside the plate; a first bottom-equipped hole connected to one end part of the capillary and formed to open in the first face plate part; and a second bottom-equipped hole connected to the other end part and formed to open in the second face plate part, wherein as viewed from a direction vertical to the first face plate part or the second face plate part, on a capillary column first virtual circle, passing through the second bottom-equipped hole, one or more through-holes penetrating through the first face plate part and the second face plate part are formed. | 06-19-2014 |
20140116538 | FLUID CONTROL SYSTEM - At a time when control of a flow rate adjusting valve is initiated from a fully closed state in order to make a measured flow rate equal to a target flow rate, an initial value of a driving signal is set as a parameter by making use of at least one of the type, pressure, and temperature of a fluid. | 05-01-2014 |
20140076424 | FLOW RATE CONTROLLER AND RECORDING MEDIUM RECORDED WITH PROGRAM FOR FLOW RATE CONTROLLER - A flow rate controller is provided that includes a setting flow rate shaping part that, in the case of receiving an input setting flow rate having a discontinuous point at which a target value discontinuously changes from a first target value to a second target value, outputs a shaped setting flow rate in which a continuously changing interval is inserted in place of the discontinuous point in the input setting flow rate; and a valve control part that controls a flow rate control valve opening so as to reduce a deviation between the shaped setting flow rate and a measured flow rate, wherein the setting flow rate shaping part is configured to, depending on the magnitude of an absolute deviation between the first target value and the second target value in the input setting flow rate, change a rate of change in target value in the continuously changing interval. | 03-20-2014 |
20140070128 | Valve Element and Fluid Control Valve - The present invention is directed a valve element which is intended to improve a sealing property at a time of closing a fluid control valve and to improve stability while maintaining durability for a long time period, wherein the valve element constitutes one of a valve seat surface or a seating surface and the valve element includes a concave portion formed in an opposing surface facing the valve seat surface and a resin coating film which is formed in the concave portion and contacts the valve seat surface. | 03-13-2014 |
20140067304 | GAS CHROMATOGRAPH DATA PROCESSING DEVICE, RECORDING MEDIUM RECORDING DATA PROCESSING PROGRAM, AND DATA PROCESSING METHOD - Provided in order to permit accurate calculation of an adjusted retention time of alkane at a arbitrary temperature and thus permit more improvement in accuracy in calculation of a retention index at the arbitrary temperature based on a known retention index is a column inlet pressure setting part which receives at least a second sample temperature and outputs a second column inlet pressure such that a void time as a retention time of a non-retained substance as a substance not retained in a column at the second sample temperature becomes substantially equal to a void time at a first sample temperature. | 03-06-2014 |
20140034164 | Flow Rate Control Device - The flow rate control device comprises a basal plate block wherein a single input port into which a fluid flows, a single output port from which the fluid flows out, two inflow channels whose proximal ends are connected to the input port and two outflow channels whose terminal ends are connected to the output port are formed, and two flow rate control units arranged on the basal plate block, and one of the flow rate control units is arranged between one of the inflow channels and one of the outflow channels, the other flow rate control unit is arranged between the other inflow channel and the other outflow channel, and each of the flow rate control units is configured to be capable of operating independently. | 02-06-2014 |
20130269795 | FLUID CONTROLLER - A fluid controller is disclosed, having a body unit, a fluid controlling valve, pressure sensors, and a casing. The fluid controlling valve is attached to a component part attachment face of the body unit. The pressure sensors are attached to the component part attachment face so that the pressure sensing surfaces thereof are positioned substantially perpendicular to the component part attachment face and substantially parallel to the longitudinal direction. On the lateral walls of the casing, the inner surfaces thereof are arranged to be uneven, so that such sections facing the fluid controlling valve and the pressure sensors are arranged to be thin sections, whereas at least a part of such a section that does not face the fluid controlling valve and the pressure sensors is arranged to be a thick section that is thicker than the thin sections. | 10-17-2013 |
20130186499 | FLUID RESISTANCE DEVICE - In order to provide a fluid resistance device that is easily manufactured, compact, accurate, and uniform in performance, the fluid resistance device comprises two members that have facing surfaces that face each other and a downstream end of the upstream side flow channel and an upstream end of the downstream side flow channel open at positions displaced from each other on the facing surfaces, and a ring body that is arranged to surround the downstream end opening and the upstream end opening and that forms the fluid resistance channel between the downstream end opening and the upstream end opening by being sandwiched by the facing surfaces, and is so configured that the ring body is made of a material harder than that of each member, and the ring body breaks into the facing surfaces by fastening two members so as to make the facing surfaces approach each other. | 07-25-2013 |
20130174635 | MASS FLOW CONTROLLER VERIFYING SYSTEM, VERIFYING METHOD AND VERIFYING PROGRAM - In a mass flow controller verifying system, there are provided a verifying gas line arranged in parallel to influent flow gas lines and joined into a post-confluent flow gas line, a reference volume calculating portion adapted to calculate a reference volume determined for a specified piping of a gas piping system, a verifying parameter calculating portion adapted to calculate a verifying parameter based on time series data of a measurement pressure measured by a pressure measurement unit during a control of a flow rate by a mass flow controller to be verified, and a comparing portion adapted to compare a reference parameter set based on the reference volume and the verifying parameter, whereby the verifying system can be introduced into an existing gas piping system used in a semiconductor manufacturing process and so forth at a low cost and is capable of verifying a mass flow controller quickly and accurately. | 07-11-2013 |
20130162270 | CAPACITANCE TYPE MEASURING DEVICE - A capacitance type measuring device for measuring a physical quantity of an object to be measured by measuring a capacitance of a variable capacitor is provided, which achieves compactness, simplicity of structure, and improved measurement accuracy. The capacitance type measuring device may include a primary measuring circuit that is configured with the variable capacitor and a reference electronic element that is a reference to measure a capacitance of the variable capacitor, a secondary measuring circuit that has an impedance conversion element with sufficiently high input impedance and is connected to the primary measuring circuit, and a substrate in which a part or all of the each measuring circuit is formed. The high impedance circuit part may be formed between the variable capacitor and an impedance conversion element, and the reference electronic element may be embedded inside the substrate between a front surface and a rear surface thereof. | 06-27-2013 |
20130160540 | THERMAL FLOW RATE SENSOR - A thermal flow rate sensor is provided which includes a main flow path through which a fluid flows, and a sensor flow path that branches off from the main flow path so as to cause the fluid to flow in a split flow and that is provided with a flow rate detecting mechanism configured to detect a flow rate of the fluid. The flow rate detecting mechanism includes an upstream-side coil and a downstream-side coil, each configured by using a heat-generating resistance wire wound around a sensor flow pipe forming the sensor flow path. A peak position of a temperature distribution generated in the sensor flow path by the upstream-side coil and the downstream-side coil is positioned on the upstream-side coil side relative to the middle position between the upstream-side coil and the downstream-side coil on the sensor flow path. | 06-27-2013 |
20130092258 | FLOW RATE CONTROL DEVICE, AND DIAGNOSTIC DEVICE AND RECORDING MEDIUM RECORDED WITH DIAGNOSTIC PROGRAM USED FOR FLOW RATE CONTROL DEVICE - In order to be able to diagnose an abnormality occurring in a flow rate control valve with high reliability, and for example, if an abnormality occurs in the flow rate control valve, quickly perform appropriate maintenance or the like, a first measured flow rate diagnostic part that, on the basis of a second measured flow rate value or a measured pressure value, diagnoses an abnormality of a first measured flow rate value, and a valve diagnostic part that, when the first measured flow rate diagnostic part diagnoses that the first measured flow rate value has no abnormality, diagnoses an abnormality of the flow rate control valve are provided. | 04-18-2013 |
20130092257 | FLOW RATE CONTROL DEVICE, DIAGNOSTIC DEVICE FOR USE IN FLOW RATE MEASURING MECHANISM OR FOR USE IN FLOW RATE CONTROL DEVICE INCLUDING THE FLOW RATE MEASURING MECHANISM AND RECORDING MEDIUM HAVING DIAGNOSTIC PROGRAM RECORDED THEREON FOR USE IN THE SAME - The flow rate control device is provided with: a fluid resistor provided on the flow channel; a pressure sensor provided in any one of an upstream side or a downstream side of the fluid resistor; a pressure calculating part configured to calculate a pressure in a side with respect to the fluid resistor where the pressure sensor is not provided; a flow rate calculating part configured to calculate a flow rate based on the measurement pressure value and a calculation pressure value calculated by the pressure calculating part; and an abnormality diagnosing part configured to diagnose an abnormality of the measurement flow rate value based on the measurement flow rate value and a calculation flow rate value. | 04-18-2013 |
20130092256 | FLOW RATE CONTROL DEVICE, DIAGNOSTIC DEVICE FOR USE IN FLOW RATE MEASURING MECHANISM OR FOR USE IN FLOW RATE CONTROL DEVICE INCLUDING THE FLOW RATE MEASURING MECHANISM AND RECORDING MEDIUM HAVING DIAGNOSTIC PROGRAM RECORDED THEREON FOR USE IN THE SAME - The flow rate control device is provided with: a fluid resistor provided on the flow channel; a pressure sensor provided in any one of an upstream side or a downstream side of the fluid resistor; a stable state judging part configured to judge, based on the measurement flow rate value or a measurement pressure value measured by the pressure sensor, whether or not a state of the fluid flowing through the flow channel is in a stable state; and an abnormality diagnosing part configured to diagnose an abnormality of the measurement flow rate value based on a variation amount of the measurement pressure value in the case where the stable state judging part judges that the state of the fluid is in a stable state. | 04-18-2013 |
20130087230 | FLUID MECHANISM, SUPPORT MEMBER CONSTITUTING FLUID MECHANISM AND FLUID CONTROL SYSTEM - This invention provides a fluid mechanism that can arrange a plurality of fluid device units and external fluid devices mounted as a set on the fluid device units effectively and compactly. Each of the fluid device units is arranged with respective side surfaces in a longitudinal direction of the fluid device unit tightly attached, and the external fluid devices are arranged side-by-side external to and outside of the fluid device unit in the width direction. Furthermore, as for an introducing path and a discharging path that connect the external fluid devices and the fluid device unit, the introducing path, which is short, is connected to the discharging path, which is long. | 04-11-2013 |
20130037974 | LIQUID MATERIAL VAPORIZER - A liquid material vaporizer comprises a gas-liquid mixing section for mixing a liquid material and a carrier gas to generate a gas-liquid mixture, and a heating type vaporizing section for vaporizing the gas-liquid mixture from the gas-liquid mixing section and exhausting outside the gas generated by the vaporization with assistance of the carrier gas, wherein the vaporizing section is configured with an arrangement of one or a plurality of flat plates formed in a spiral shape by an inwardly twisting path. Such an arrangement provides an excellent liquid material vaporizer capable of, even if a liquid material composed of a plurality of materials having different boiling points is vaporized, preventing a residue from being generated, and performing the vaporization in a preferable manner. | 02-14-2013 |
20130025715 | GAS SUPPLY SYSTEM - A gas supply system is provided. The system includes a plurality of component gas supply pipes, a plurality of flow rate control mechanisms for controlling flow rates of the component gases flowing in the component gas supply pipes, and a material gas supply pipe connected with downstream ends of the component gas supply pipes, and connected with one of the gas supply ports at a downstream. The flow rate control mechanism includes flow rate control valves, individual pressure sensors, and fluid resistance elements provided to the component gas supply pipes in this order from upstream, respectively, a common pressure sensor, and controllers for calculating the flow rates of the gases flowing in the component gas supply and controlling the flow rate control valves of the corresponding component gas supply pipes so that the calculated component gas flow rate approaches a predetermined gas flow rate, respectively. | 01-31-2013 |
20120318383 | FLOW RATE MEASURING DEVICE AND FLOW RATE CONTROLLER - A flow rate measuring device includes a fluid resistance member through which measurement target fluid flows; an upstream side pressure sensor configured to measure pressure on an upstream side of the fluid resistance member from a change of electrical resistance of a resistive element attached to a pressure sensitive surface onto which the target fluid is introduced, and also to measure a temperature of the pressure sensitive surface from a temperature-dependent change of the electrical resistance of the resistive element; a temperature sensor to measure a temperature of the target fluid flowing through the fluid resistance member; and a flow rate calculation part that calculates a flow rate of the target fluid based on the pressure measured by the upstream side pressure sensor, pressure-flow rate characteristics of the fluid resistance member, the upstream side pressure sensor temperature, and the target fluid temperature in the fluid resistance member. | 12-20-2012 |
20120298221 | MASS FLOW CONTROLLER SYSTEM - A mass flow controller with high accuracy flow rate output control is disclosed. In the mass flow controller, relation data that indicates a corresponding relation between a flow rate of a reference gas and a CF value of a sample gas is stored, a target flow rate is converted into a reference gas flow rate by the use of a predetermined CF value, a sample gas flow rate is calculated from the converted reference gas flow rate and a CF value corresponding to the reference gas flow rate, the sample gas flow rate is compared with the target flow rate, and the CF value that is used for conversion of the reference gas flow rate or calculation of the sample gas flow rate is updated by the use of the corresponding relation based on the error between the sample gas flow rate and the target flow rate. | 11-29-2012 |
20120267525 | GAS ANALYZER - The present invention is directed to a gas analyzer that hardly generates noise peaks and facilitates reading of a molecular peak, even when a low-molecular-weight alkane is an analysis target. The analyzer analyzes an alkane of the carbon number 1 through 12 contained in a sample gas as an analysis target. The analyzed includes an ionization module for ionizing the sample gas by thermoelectrons having energy of 10 through 30 eV, an ion extraction electrode for extracting ions from the ionization module, a quadrupole module for selectively passing the ions extracted from the ionization module by the ion extraction electrode, through the quadrupole module, and an ion detection module for detecting the ions passed through the quadrupole module. | 10-25-2012 |
20120255630 | FLUID CONTROL VALVE - In order to provide a fluid control valve that can flow a large amount of fluid with a compact arrangement, ring-shaped bottom formed grooves that are in communication with an upstream side flow channel through a valve inner flow channel and ring-shaped bottom formed grooves that are in communication with a downstream side flow channel through a valve inner flow channel are arranged alternatively and plurally between a seating surface and a valve seat surface, and a communication bore, which is an opening in communication with the bottom formed groove of the valve inner flow channel, is formed at least on the side surface of the bottom formed groove. | 10-11-2012 |
20120250014 | SPECTROPHOTOMETER AND METHOD FOR CALIBRATING THE SAME - The disclosure provides a spectrophotometer, including a light source for irradiating light into a sample gas, a photodetector for detecting light transmitted through the sample gas, an optical filter, and an operation device for calculating a concentration of an actual gas to be measured, contained in the sample gas based on a detection signal value obtained from the photodetector. The operation device calculates the concentration of the actual gas based on function a for associating a concentration of a substitute gas with the actual gas obtained from a reference instrument, function β for associating a relation between a light absorption of the actual gas and the substitute gas in the reference instrument, with a relation between a light absorption of the actual gas the substitute gas in a calibration instrument, and a function indicating a relation between the concentration of the substitute gas and the detection signal value. | 10-04-2012 |
20120227848 | INTEGRATED GAS PANEL APPARATUS - Provided is an integrated gas panel apparatus which has excellent responsiveness, stabilizes gas concentration, and furthermore, can keep a conventional panel shape as it is. A panel body comprises at least a main flow channel block body for forming a main flow channel, and a branch flow channel block body for forming a branch flow channel. The branch flow channel block bodies are arranged on the both right and left sides to face each other by having the main flow channel block body at the center. | 09-13-2012 |
20120209436 | FLUID CONTROL DEVICE AND PRESSURE CONTROL DEVICE - A fluid control device that can, with a digitally controlled valve controller, achieve responsiveness close to conventional analog control is provided with: a fluid control valve in a flow path through which fluid flows; fluid measurement parts that measure a physical quantity related to the fluid; and a valve controller configured to control, on the basis of a deviation between a physical quantity value measured in the fluid measurement part and a preliminarily set setting value, a fluid control valve's opening level by digital control. The valve controller | 08-16-2012 |
20120191381 | FLOW RATE SENSOR - A flow rate sensor is disclosed, comprising a flow rate calculation part that calculates a flow rate of a fluid based on an expression using X | 07-26-2012 |
20120180876 | FLOW RATE MEASURING MECHANISM, MASS FLOW CONTROLLER, AND PRESSURE SENSOR - The present invention is a flow rate measuring mechanism provided with: a body unit that has an internal flow path through which a target fluid to be measured is configured to flow; and a pressure sensor that is attached to the body unit and senses a pressure of the internal flow path, and configured to calculate a flow rate of the fluid on the basis of the fluid pressure sensed by the pressure sensor, wherein the body unit has a length direction and a surface parallel to the length direction, which is set as a component attachment surface, and to the component attachment surface, the pressure sensor is attached such that a pressure sensitive surface thereof is substantially vertical to the component attachment surface and substantially parallel to the length direction, and thereby, without causing a reduction in pressure measurement sensitivity, makes a width direction size dramatically smaller than before. | 07-19-2012 |
20120174990 | FLOW RATE RATIO CONTROLLING APPARATUS - The flow rate ratio controlling apparatus comprises differential pressure flow rate controllers (MFC | 07-12-2012 |
20120152364 | GAS CONCENTRATION CONTROLLER SYSTEM - The present invention is one that prevents standard gas from remaining in a standard gas line to prevent a concentration of standard gas from being reduced due to adsorption, modification, or the like, and has: a diluent gas line provided with a diluent gas flow rate controlling mechanism; a standard gas line provided with a standard gas flow rate controlling mechanism; an output gas line joined by the diluent gas line and standard gas line and outputs the standard gas having a predetermined concentration; an exhaust gas line connected to an upstream side of the standard gas flow rate controlling mechanism in the standard gas line and provided with an on/off valve and a flow rate control part; and a control part that, depending on a flow rate of the standard gas flowing through the standard gas line or the type of the standard gas, switches on/off the on/off valve. | 06-21-2012 |
20120139238 | PIPE CONNECTION STRUCTURE - To prevent attachment in an inclined state, a coupling ring with an inner concave groove is fitted to an outer circumferences of abutting flange portions, and is fastened to reduce an inner diameter thereof so that an inclined surface formed on each side surface of the concave groove presses an inclined surface formed on an opposite surface of each of the flange portions. The pair of flange portions are coupled by force generated at the time of pressing. An attachment correcting surface is provided on each of the flange portions or each of the pipes so that, only where the coupling ring is attached and fastened in an orientation inclined at an angle equal to or larger than a prescribed angle, the attachment correcting surface is abutted to a part of the coupling ring prior to completion of the fastening so as to prohibit the part from being brought closer. | 06-07-2012 |
20120116596 | MASS FLOW CONTROLLER - The present invention comprises a flow rate sensor part and control valve; a calculation part that performs a proportional calculation on a deviation between a flow rate measurement value and setting value to calculate a feedback control value for the flow rate control valve; and an opening level control signal output part that generates an opening level control signal on the basis of the feedback control value to output the opening level control signal to the flow rate control valve. A gain value to be multiplied by the deviation is calculated by using a function that, in a predetermined period after the time point when the flow rate setting value decreases by a predetermined amount or more, calculates a larger value as a calculation value obtained by using a variation between the flow rate setting value before the decrease and a flow rate setting value after the decrease decreases. | 05-10-2012 |
20120101744 | FLUID MEASUREMENT SYSTEM - This invention is to improve procedures of maintenance of a fluid measurement system having a fluid measurement device and a control device. The fluid measurement system has a fluid measurement device and a control device to control the fluid measurement device, and the fluid measurement device comprises a fluid sensor and a related data store part configured to store fluid calculation related data for calculation of one or more fluid parameters with measurement data obtained by the fluid sensor, and the control device obtains the fluid calculation related data from the related data store part and calculates the one or more fluid parameters with the measurement data of the fluid sensor and the fluid calculation related data. | 04-26-2012 |
20120080104 | DIAGNOSTIC MECHANISM - A diagnostic mechanism includes: a flow rate control part configured to control an opening degree of a flow rate control valve provided in a flow passage so that a measurement flow rate value outputted from a flow rate sensor becomes a target flow rate value; an inspection value output part configured to output an inspection value related to a time integral of the measurement flow rate value in a diagnostic period which is defined in correspondence with a part of a period from a time point of closing the flow passage upstream of the flow rate sensor to a time point of expiration of a state that the measurement flow rate value and the target flow rate value are substantially nearly equal; and a diagnosing part configured to compare the inspection value and a predetermined specified value to diagnose whether an abnormality relating to the flow rate sensor is present. | 04-05-2012 |
20120042838 | LIQUID SOURCE VAPORIZER - The present invention is one that is intended to prevent bubbles from being recombined to suppress the bubbles from being enlarged, and also homogenize a temperature distribution of a stored liquid source, and provided with: a liquid source container; a first heater that is provided on a side wall of the liquid source container and intended to heat the stored liquid source to a predetermined temperature; a second heater that is provided in an inside central part of the liquid source container and intended to heat the stored liquid source to the predetermined temperature; a plurality of bubble generators that are immersed into the stored liquid source, provided between the second heater and the side wall, and release carrier gas into the liquid source to perform bubbling; and a gas supply pipe that supplies the carrier gas to the bubble generators. | 02-23-2012 |
20120011943 | LIQUID SAMPLE HEATING VAPORIZER - The present invention is intended to improve response property and accuracy of temperature control of a liquid sample, and is provided with a vaporization tank that retains the liquid sample, one or more heaters that are provided in the vaporization tank and respectively have heating parts that come into contact with the liquid sample to heat the liquid sample, a temperature detection part that is provided in contact with an outer surface including the heating part of any of the heaters and detects a temperature of the outer surface, and a control part that receives a temperature detection signal from the temperature detection part to control electric power supplied to the heaters. | 01-19-2012 |
20120006425 | FLUID SYSTEM - In order to simplify a configuration of a fluid system without increasing the number of parts of an intermediate support body while using a common intermediate support body, the fluid system includes a fluid circuit device configured by connecting a plurality of fluid units for controlling or measuring a state of fluid using pipes and pipe joints and a holding mechanism for holding the fluid circuit device, wherein the holding mechanism includes a base member and the intermediate support body interposed between the fluid circuit device and the base member so as to couple the fluid circuit device and the base member, and wherein one end of the intermediate support body is attached to a respective pipe joint and the other end thereof is attached to the base member so that each of the pipe joints is connected to the base member. | 01-12-2012 |
20110314838 | GAS SUPPLY DEVICE - The present invention relates to a gas supply device having a compact configuration that enables prevention of vaporized gas by requisite minimum heating means from being liquefied again and an installation area to be considerably reduced. The gas supply device is provided with: a tank configured to retain material liquid; and a mass flow controller that is connected to an inside of the tank through a first valve unit, and controls a flow rate of gas resulting from vaporizing the material liquid, in which inside an outer wall of the tank, an internal flow path is formed, and the internal flow path is provided with a generated gas lead-out line provided with: a first valve flow-in flow path connecting the inside of the tank and a first inlet port; and a first valve flow-out flow path connecting a first outlet port and an introduction port of the mass flow controller . | 12-29-2011 |
20110291002 | GAS ANALYZER - This invention is to high-pressurize the maximum pressure for use of a gas analyzer, and comprises an ionizing part having an opening part to lead out ions of a sample gas to the outside, an ion drawing electrode arranged outside of the opening part of the ionizing part, a quadrupole part that selectively passes the ions lead out to the outside by the ion drawing electrode, and an ion detecting part that detects the ions passing the quadrupole, and an opening size of the opening part of the ionizing part is set to be smaller than an imaginary inscribing circle inscribed on all of four pole electrodes constituting the quadrupole part. | 12-01-2011 |
20110290031 | CAPACITANCE TYPE PRESSURE SENSOR - The present invention is adapted to prevent a diaphragm from being deformed by a thermal stress caused by thermal expansion coefficients of a sensor main unit and a fixing member and includes a sensor main unit to which a fixed electrode is fixed, a diaphragm structure that forms a sealed space between the diaphragm structure and the sensor main unit and a fixing member that is jointed to the diaphragm structure in a manner of surrounding a pressure receiving part of the diaphragm structure so as to lead a fluid to the pressure receiving part, wherein the diaphragm structure includes a flat plane diaphragm main unit and first and second ring members each having a known thermal expansion coefficient that are respectively provided on both sides of a circumference of the diaphragm main unit. | 12-01-2011 |
20110155264 | SOURCE GAS CONCENTRATION CONTROL SYSTEM - To prevent loss of control of a pressure of a source gas within a movable range of a control valve, a source gas concentration control system is provided. The system may include a first valve that is provided on an outlet line, a concentration measurement part that measures a concentration of the source gas in mixed gas, and a concentration control part that controls a stroke of the first valve such that the measured concentration of the source gas becomes equal to a predetermined concentration setting. The measured concentration may be measured in the concentration measurement part. The system may further include a temperature controller that controls a temperature inside the tank to meet a temperature setting, and a temperature setting part that sets the temperature setting of the temperature controller. | 06-30-2011 |
20110127770 | COUPLING RING - A coupling ring is provided, including a series of unit members with adjacent unit members rotatably coupled to each other, and a fastener coupling unit members on both ends to each other. A concave groove provided to extend circumferentially is externally fitted into an outer circumference of each of two opposing flanges. The unit members on the both ends are coupled to each other by the fastener to be turned into an annular state. The fastener is fastened to thereby press an inclined surface. The flanges are pressure-bonded to each other by forces generated during pressing. A stopper member is provided to restrict a separation angle between the unit member on one end and an adjacent unit member to fall within a certain angle in an open state in which the unit members on the both ends are not coupled to each other provided on at least one of the unit members. | 06-02-2011 |
20110126930 | FLUID DEVICE - In a fluid device composed of vertical and horizontal fluid lines, for a purpose of improving a compact size and of assuring ease of assembly, a plurality of vertical fluid lines are arranged in parallel to each other, and in the fluid device where, between the adjoining vertical fluid lines, a plurality of horizontal fluid lines for connecting them are arranged in parallel, one of the horizontal fluid lines connects pipes by using a flange joint to be fastened with a coupling ring, and the other one connects pipes by using joint pipes. | 06-02-2011 |
20110115104 | LIQUID MATERIAL VAPORIZATION APPARATUS - An object of this invention is to provide a liquid material vaporization apparatus that is capable of increasing the flow rate of a carrier gas without changing the shape of a nozzle. The liquid material vaporization apparatus comprises a gas-liquid mixing chamber in which a liquid material and the carrier gas are mixed, a liquid material introduction path that introduces the liquid material into the gas-liquid mixing chamber, a carrier gas introduction path that introduces the carrier gas into the gas-liquid mixing chamber, a vaporization nozzle section that is communicated with the gas-liquid mixing chamber to subject a mixture of the liquid material and the carrier gas to flash boiling, and a mixed gas derivation path that is communicated with the vaporization nozzle section to derive the mixed gas vaporized by the vaporization nozzle section. | 05-19-2011 |
20110106319 | MASS FLOW CONTROLLER - To improve PI performance of a mass flow controller, the mass flow controller changes a proportional coefficient, an integral coefficient, and a derivative coefficient used for PID operation in a stable state based on at least two out of a primary pressure, a time change amount of the primary pressure, and a flow rate set value. | 05-05-2011 |
20110048551 | FLOW RATE CONTROL DEVICE - A mass flow controller comprises a flow rate measuring part that measures a flow rate of a fluid flowing in a flow channel and outputs a measured flow rate value, a control valve, a valve control part that controls an opening degree of the control valve based on an entirely-close command to entirely close the control valve compulsorily or a set flow rate value set as a target value, and an external output part that outputs an external output flow rate value based on the measured flow rate value to the outside, and at a time when the valve control part receives the entirely close command or zero as the set flow rate value, the external output part outputs zero as the external output flow rate value, irrespective of the measured flow rate value. | 03-03-2011 |
20100269924 | FLOW RATE RATIO CONTROLLING APPARATUS - An object of this invention is to provide a flow rate ratio controlling apparatus that does not need devices of a plurality of types and that enables reduction of the number of types of components and the manufacturing cost. The flow rate ratio controlling apparatus comprises differential pressure flow rate controllers (MFC | 10-28-2010 |
20100243076 | FLOW CONTROL VALVE - A flow control valve is disclosed that includes a valve body member having a seating surface that is seated on a valve seated surface. Multiple inflow orifices and multiple outflow orifices may be formed on the valve seated surface or the seating surface, and may be formed so as not to overlap each other in a state in which the seating surface is seated on the valve seated surface. An inside inflow channel that is in communication with the inflow channel and the inflow orifice may be formed inside a member where the inflow orifices are formed and an inside outflow channel that is in communication with the outflow channel and the outflow orifice is formed inside a member where the outflow orifices are formed. | 09-30-2010 |
20100229967 | MASS FLOW CONTROLLER VERIFYING SYSTEM, VERIFYING METHOD AND VERIFYING PROGRAM - In a mass flow controller verifying system, there are provided a verifying gas line arranged in parallel to influent flow gas lines and joined into a post-confluent flow gas line, a reference volume calculating portion adapted to calculate a reference volume determined for a specified piping of a gas piping system, a verifying parameter calculating portion adapted to calculate a verifying parameter based on time series data of a measurement pressure measured by a pressure measurement unit during a control of a flow rate by a mass flow controller to be verified, and a comparing portion adapted to compare a reference parameter set based on the reference volume and the verifying parameter, whereby the verifying system can be introduced into an existing gas piping system used in a semiconductor manufacturing process and so forth at a low cost and is capable of verifying a mass flow controller quickly and accurately. | 09-16-2010 |
20100229965 | MASS FLOW METER, MASS FLOW CONTROLLER, MASS FLOW METER SYSTEM AND MASS FLOW CONTROL SYSTEM CONTAINING THE MASS FLOW METER AND THE MASS FLOW CONTROLLER - An object of this invention is to provide a superior mass flow meter or the like that can flexibly cope with a change of a sample fluid such as a gas kind without requiring a special troublesome labor and that can measure a flow rate with high accuracy. The mass flow meter comprises a sensor section that detects a flow rate of a sample fluid flowing in a flow channel, a setting section that sets a flow rate characteristic function that is intrinsic to each fluid to determine a flow rate based on a flow rate detected value output by the sensor section and an instrumental error correction parameter that is independent from the flow rate characteristic function and common to multiple sample fluids to correct an instrumental error of each mass flow meter, and a flow rate calculating section that calculates a flow rate measurement value of the sample fluid by applying the flow rate characteristic function and the instrumental error correction parameter to the flow rate detected value. | 09-16-2010 |
20100163119 | MASS FLOW METER AND MASS FLOW CONTROLLER - In order to improve a measurement accuracy of a mass flow meter, the mass flow meter comprises a flow rate calculating section that obtains an output signal from a sensor section having a thermosensitive resistive element arranged in a flow channel where a sample gas flows and that calculates a flow rate of the sample gas, a pressure measuring section that measures a primary side pressure in the flow channel, and a flow rate correcting section that corrects the measured flow rate obtained by the flow rate calculating section by the use of the primary side pressure obtained by the pressure measuring section and a gas coefficient determined by an isobaric specific heat of the sample gas. | 07-01-2010 |
20100145633 | FLOW CONTROLLER, FLOW MEASURING DEVICE TESTING METHOD, FLOW CONTROLLER TESTING SYSTEM, AND SEMICONDUCTOR MANUFACTURING APPARATUS - A testing method for testing a flow controller with high accuracy by shortening as much as possible the time required for the test including the wait time. A testing-subject flow controller and a testing-standard flow controller are arranged in that order in series from the upstream side in a flow channel through which a fluid whose flow is to be controlled flows. In a flow-uncontrolled state in which the valve of the testing-subject flow controller is practically in the full-open state, and with the fluid flow controlled to a predetermined flow rate by the testing-standard flow controller, whether the actual flow-rate measurement according to the testing-subject flow controller falls within a predetermined range of actual flow-rate measurements according to the testing-standard flow controller is determined. | 06-10-2010 |
20100108154 | MATERIAL GAS CONCENTRATION CONTROL SYSTEM - A material gas concentration control system for keeping a concentration of a material gas in a mixed gas constant comprising a tank to accommodate the material, an inlet line to input a carrier gas for evaporating the accommodated material into the tank, and an outlet line to output the mixed gas consisting of the material gas evaporated in the tank and the carrier gas, and further comprising a first valve arranged in the inlet line, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a concentration control part that controls an open degree of the first valve so as to make the measured concentration of the material gas measured by the concentration measuring part become the previously determined set concentration. | 05-06-2010 |
20100108153 | MATERIAL GAS CONCENTRATION CONTROL SYSTEM - An object of this invention is to provide a responsive material gas concentration control system that can be mounted on a bubbling system and that can control a concentration of a material gas in a mixed gas at a constant value even though a partial pressure of the material gas fluctuates. The material gas concentration control system is used for a material evaporation system, and comprises a body that is connected to an outlet line and that has an internal flow channel for flowing the mixed gas, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a first valve that is arranged downstream of the concentration measuring part and that adjusts the measured concentration measured by the concentration measuring part at a previously determined set concentration, wherein the concentration measuring part and the first valve are mounted on the body. | 05-06-2010 |
20100076712 | GAS ANALYZER - A gas analyzer using a quadrupole mass spectrometric method etc. is provided with an ionizer | 03-25-2010 |
20100070240 | DIAGNOSTIC MECHANISM IN DIFFERENTIAL PRESSURE TYPE MASS FLOW CONTROLLER - This invention provides a diagnostic mechanism of a differential pressure type mass flow controller comprising a diagnostic parameter calculating section that obtains a mass flow rate integrated value by means of an integrating calculation from the lowering pressure value of an inlet side sensor among the inlet side sensor and an outlet side sensor arranged in communication respectively at the inlet side and the outlet side of a differential pressure generating resistive element that generates a differential pressure between the inlet and the outlet by changing a flow rate control valve arranged on the channel where a fluid flows from a flow rate control state to a closed state, and further obtains a diagnostic volume value from the obtained mass flow rate integrated value, and a comparing section that compares the diagnostic volume value obtained at the diagnostic parameter calculating section with a specified volume value. | 03-18-2010 |
20100037688 | FLOWMETER - Provided is a flowmeter which performs stable large flow volume measurement with improved linearity without increasing sizes of the entire apparatus. The flowmeter is provided with a flow tube ( | 02-18-2010 |
20100030390 | FLOW RATE RATIO CONTROL DEVICE - A flow rate ratio control device having: a main channel (RM); branch channels (R | 02-04-2010 |
20090320754 | INTEGRATED GAS PANEL APPARATUS - Provided is an integrated gas panel apparatus which has excellent responsiveness, stabilizes gas concentration, and furthermore, can keep a conventional panel shape as it is. A panel body ( | 12-31-2009 |
20090312876 | MASS FLOW CONTROLLER - This invention provides a mass flow controller that can prevent a flow rate change due to a pressure change without sacrificing the speed of response to a change of a flow rate setting value and can be used in a system that can generate a crosstalk. | 12-17-2009 |
20090097831 | LIQUID MATERIAL VAPORIZER - A liquid material vaporizer comprises a gas-liquid mixing section ( | 04-16-2009 |
20080295892 | MASS FLOW CONTROLLER - A mass flow controller has: a flow rate sensor section that measures the flow rate of a fluid and outputs a flow rate measurement signal indicating the measurement value; a flow rate control valve disposed upstream or downstream of the flow rate sensor section; a calculation section that calculates a feedback control value to the supplied to the flow rate control valve by performing at least a proportional calculation on the deviation of the flow rate measurement value indicated by the flow rate measurement signal from a flow rate setting value; and an opening control signal output section that generates an opening control signal based on the feedback control value and outputs the opening control signal to the flow rate control valve. The function used for calculating the gain value in the proportional calculation differs between a changing period and a stable period. | 12-04-2008 |