TOKYO OHKA KOGYO CO., LTD. Patent applications |
Patent application number | Title | Published |
20160111695 | METHOD FOR MANUFACTURING SECONDARY BATTERY SEPARATOR AND METHOD FOR MANUFACTURING LITHIUM SECONDARY BATTERY - A method for manufacturing, a secondary battery separator including a porous resin film in which pores have three-dimensionally ordered structure and are in mutual communication via through-holes. The method includes: uniformly dispersing spherical microparticles having narrow particle size distribution in a dispersion medium to prepare a microparticles-dispersed slurry; drying slurry to obtain a spherical microparticles-dispersed film; heat-treating the film to form a microparticles-resin film in which the microparticles are regularly arrayed in three-dimensions in a resin matrix; and contacting the microparticles-resin film with an organic acid, water, an alkaline solution or an inorganic acid other than hydrofluoric acid to dissolve and remove the microparticles, or heating the microparticles-resin film to remove the microparticles, to form pores which are in mutual communication and regularly arrayed in the resin matrix. The medium has a resin precursor for the resin matrix and surfaces of the microparticles are inactive against the medium. | 04-21-2016 |
20150325463 | ATTACHING APPARATUS - An attaching apparatus, a substrate and a support that can be uniformly attached through an adhesive layer. The attaching apparatus is equipped with a set plate and a press plate formed of ceramics. The set plate and the press plate have a flatness of 1.0 μm or less when not pressed. | 11-12-2015 |
20150261086 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING POLYIMIDE RESIN PATTERNS, AND PATTERNED POLYIMIDE RESIN FILM - A positive photosensitive resin composition containing a polyimide resin that allows patterns to be satisfactorily formed by photolithography, and provides patterns with excellent heat resistance, and a method for forming polyimide resin patterns using the positive photosensitive resin composition. A patterned polyimide resin film formed by the method for forming polyimide resin patterns. To the photosensitive resin composition are added a polyimide resin, and a compound in which an imidazole compound having a specific structure is generated by the action of light. | 09-17-2015 |
20150044813 | METHOD OF FORMING METAL CHALCOGENIDE DISPERSION, METAL CHALCOGENIDE DISPERSION, METHOD OF PRODUCING LIGHT ABSORBING LAYER OF SOLAR CELL, METHOD OF PRODUCING SOLAR CELL - A method of producing a metal chalcogenide dispersion usable in forming a light absorbing layer of a solar cell, the method including: a metal chalcogenide nano particle formation step in which at least one metal or metal compound selected from the group consisting of a group 11, 12, 13, 14 or 15 metal or metal compound, a water-containing solvent and a group 16 element-containing compound are mixed together to obtain metal chalcogenide nano particles; and an addition step in which a compound (1) represented by general formula (1) is added to the metal chalcogenide nano particles, thereby obtaining a metal chalcogenide dispersion (wherein R | 02-12-2015 |
20140363772 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN - A resist composition including a high-molecular weight compound having a constituent unit represented by general formula (a0-1), a constituent unit (a1) containing a group containing a monocyclic group or a chain group among acid decomposable groups whose polarity increases by action of acid, a constituent unit (a1′) containing a group containing a polycyclic group among acid decomposable groups whose polarity increases by the action of an acid, and a constituent unit (a2) containing a lactone-containing monocyclic group, with a proportion of the constituent unit (a1) being equal to a proportion of the constituent unit (a1′) or more; and a method for forming a resist pattern using the resist composition. | 12-11-2014 |
20140357896 | SULFONIUM SALT AND PHOTO-ACID GENERATOR - Provided is a novel sulfonium salt that has high solubility in a solvent and has high light sensitivity to, especially, light having a wavelength not longer than deep-UV (254 nm) and a novel photo-acid generator comprising the sulfonium salt. The invention relates to a sulfonium salt represented by the following general formula (1) and a novel photo-acid generator comprising the sulfonium salt. | 12-04-2014 |
20140356787 | RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORMING RESIST PATTERN - A resist composition comprising a compound (m0) (wherein Rb | 12-04-2014 |
20140332149 | METHOD FOR PROCESSING MOLD MATERIAL AND METHOD FOR MANUFACTURING STRUCTURAL BODY - A method for processing a mold material which includes a heating step of heating a mold material layer formed of the mold material to discharge gas from the mold material constituting the mold material layer. | 11-13-2014 |
20140332147 | STICKING APPARATUS AND STICKING METHOD - A sticking apparatus including a pair of plate members sandwiching a laminate between the pair of plate members, and supporting members supporting the plate members. The supporting members supporting at least one of the plate members are located in a form of multiple dots or lines adjacent to each other at regular intervals on the plate member. | 11-13-2014 |
20140322652 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid and an acid generator which generates acid upon exposure, the base component containing a polymeric compound containing a structural unit represented by general formula (a0-1) and the acid generator containing a compound represented by general formula (b1). In the formulae, R represents H, an alkyl group of C | 10-30-2014 |
20140316054 | METHOD OF FORMING FILM - A method of forming a film including forming a film on a substrate by coating a composition for forming a film containing a solvent and a resin by a spin coating method, in which a maximum radius among the radii from the center to the outer periphery of the substrate is 150 mm or more and a thickness of the film is 50 μm or more, a vapor pressure of the solvent at 25° C. is 0.4 kPa or less, and a viscosity of the solvent measured by a Cannon-Fenske viscometer at 25° C. is 1.5 mPa·s or less. | 10-23-2014 |
20140311680 | LAMINATED BODY AND METHOD FOR SEPARATING LAMINATED BODY - A laminate including a supporting member which is light transmissive; a supported substrate which is supported by the supporting member; an adhesive layer which is provided on a surface of the supported substrate on which surface the supported substrate is supported by the supporting member; and a release layer, which (i) is provided between the supporting member and the supported substrate and (ii) contains a polymer including, in a repeating unit, a structure having a light absorption property, a property of the polymer being changed when the polymer absorbs light irradiated via the supporting member. | 10-23-2014 |
20140295264 | METHOD FOR FORMING PATTERN, STRUCTURAL BODY, METHOD FOR PRODUCING COMB-SHAPED ELECTRODE, AND SECONDARY CELL - A method for forming a pattern, a structural body, a method for producing a comb-shaped electrode, and a secondary cell. The pattern forming method, in which n patterns (n≧2) are formed on a support, includes forming a first resist layer on the support surface; and repeating: forming a guide hole through a kth resist layer by exposure and development, filling a kth pattern material into the guide hole by a screen printing process, removing the kth resist layer, and forming a (k+1)th resist layer on the support and all pattern materials, regarding kth (k=1 to n−1) pattern material and resist layer in order of k=1 to n−1; forming a guide hole and nth pattern material filling similarly, and removing the nth resist layer. | 10-02-2014 |
20140287362 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD - A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of the acid contains a high-molecular weight compound (A1) having a constituent unit (a0) represented by a general formula (a0-1) and a constituent unit (a1-1) including a monocyclic group-containing acid decomposable group whose polarity increases by the action of an acid. In the formula (a0-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Ya | 09-25-2014 |
20140287361 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD - A resist composition includes a high-molecular weight compound having a constituent unit (a0) represented by a general formula (a0-1), an acid generator component (B) which generates an acid upon exposure, and a photodegradable base (D1) which is decomposed upon exposure to lose acid diffusion controlling properties, and a mixing ratio of the component (D1) to the component (B) is 0.5 or more in terms of a molar ratio represented by (D1)/(B). In the formula (a0-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Ya | 09-25-2014 |
20140287360 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD - A resist composition contains a high-molecular weight compound which has a partial structure represented by a general formula (a0-r-1) and has a constituent unit represented by a general formula (a0-1). In the formula (a0-r-1), Y | 09-25-2014 |
20140272727 | METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A method of producing a copolymer, including copolymerizing a monomer (am0) containing a partial structure represented by formula (am0-1) shown below, a monomer (am1) containing an acid decomposable group which exhibits increased polarity by the action of acid and a monomer (am5) containing an —SO | 09-18-2014 |
20140263273 | CHAMBER APPARATUS AND HEATING METHOD - A chamber apparatus including a chamber which accommodates a substrate having a coating film formed thereon; a first heating part which is accommodated in the chamber and disposed on a first face side of the substrate; a second heating part which is accommodated in the chamber and disposed on a second face side of the substrate opposite to the first face; and a pressure control part which is capable of pressurizing and depressurizing inside of the chamber in a heated state. | 09-18-2014 |
20140255853 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND COMPOUND - A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) shown below. In the formula, W | 09-11-2014 |
20140242388 | METHOD OF PRODUCING METAL COMPLEX-SUPPORTING MESOPOROUS MATERIAL - A method of producing a metal complex-supporting mesoporous material that can support a metal complex in the pores thereof without causing aggregation of the metal complex. A metal complex-supporting mesoporous material supporting a metal complex in the pores thereof without causing aggregation of the metal complex. A method of producing a mesoporous material supporting metal-containing nanoparticles using the metal complex supported in the pores of the mesoporous material as a template. A solution of a metal complex prepared by a phenyl azomethine dendrimer compound having a specific structure is brought into contact with a mesoporous material so that the metal complex of the phenyl azomethine dendrimer compound is supported by the mesoporous material. | 08-28-2014 |
20140242284 | COATING APPARATUS AND COATING METHOD - A coating apparatus including a coating nozzle configured to apply a coating liquid to a substrate, and a gas supply part configured to supply a temperature control gas which controls an ejection direction of the coating liquid to the substrate. | 08-28-2014 |
20140238954 | METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, METHOD OF FORMING PATTERN, AND TOP COAT MATERIAL - A method of producing a structure containing a phase-separated structure, including forming, on a substrate, a layer containing a block copolymer having a block of a polyhedral oligomeric silsesquioxane structure-containing structural unit; forming a top coat film by applying, to the layer containing the block copolymer, a top coat material which undergoes a change in polarity upon heating, and controls a surface energy of the layer containing the block copolymer; and subjecting the layer containing the block copolymer on which the top coat film is formed to phase separation by thermal annealing. | 08-28-2014 |
20140234784 | DEVELOPING SOLUTION AND DEVELOPMENT PROCESSING METHOD OF PHOTOSENSITIVE RESIN COMPOSITION - A developing solution for a polyimide precursor containing N,N,N′,N′-tetramethylurea and a lower alcohol having 1 to 5 carbon atoms. The developing solution increases a development margin and results in little or no decrease of the film thickness of a polyimide-based resin film. A development processing method of a photosensitive polyimide resin composition including developing a photosensitive polyimide precursor resin composition, at least a part of which is exposed, with the developing solution; and a pattern formation method including forming a coating film or molding including a photosensitive polyimide precursor resin composition, selectively exposing the coating film or molding, and developing the exposed coating film or molding by the development processing method. | 08-21-2014 |
20140231729 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE - A negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure; a pattern forming method using the resin composition; a cured film, an insulating film, a color filter formed using resin composition; and a display device provided with the cured film, insulating film, or color filter. The resin composition contains a compound represented by the following formula (1). In the formula, R | 08-21-2014 |
20140221673 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND - A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below (R | 08-07-2014 |
20140221649 | NOVEL COMPOUND - A novel compound suitable for obtaining a negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure. The compound is represented by the following formula (1). In the formula, R | 08-07-2014 |
20140220492 | RESIST COMPOSITION, POLYMERIC COMPOUND, COMPOUND AND METHOD OF FORMING RESIST PATTERN - A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component containing a polymeric compound having a structural unit derived from a compound represented by general formula (a0-1). R | 08-07-2014 |
20140205956 | METHOD FOR FORMING RESIST PATTERN - A method for forming a negative type resist pattern having a high residual film rate of exposed areas of a resist film by heating an exposed resist film and subjecting it to patterning by negative type development with a developing solution containing an organic solvent, in which a resist composition containing a high-molecular weight compound having a constituent unit represented by a particular general formula. | 07-24-2014 |
20140186769 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND HIGH-MOLECULAR WEIGHT COMPOUND - A resist composition having excellent lithography properties, which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of an acid, the resist composition containing a base material component (A) which exhibits changed solubility in a developing solution by the action of an acid, and the base material component (A) containing a high-molecular weight compound (A1) having a constituent unit (a0) derived from a compound represented by the following general formula (a0-1); a method for forming a resist pattern using the resist composition; and a high-molecular weight compound (A1) having a constituent unit (a0) derived from a compound represented by the following general formula (a0-1), are disclosed. | 07-03-2014 |
20140178821 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND - A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below. In the formula, R | 06-26-2014 |
20140178808 | PHOTOSENSITIVE RESIN COMPOSITION - A photosensitive resin composition having excellent storage stability which can form a high precision pattern upon a low amount of exposure; a method of forming a pattern including a polysiloxane coating with the photosensitive resin composition; and an electronic component including a pattern including a polysiloxane coating formed with the photosensitive resin composition. A compound which generates an imidazole compound having a predetermined structure by light is added to a photosensitive resin composition including one or more hydrolyzable silane compounds, hydrolysates of the hydrolyzable silane compounds and condensates thereof and a photo-base generator or a photo-acid generator. | 06-26-2014 |
20140169929 | TRANSPORT ARM, TRANSPORT APPARATUS AND TRANSPORT METHOD - A transport arm including a holding unit that holds a substrate by vacuum adsorption. The holding unit has an air discharge port and an adsorption member formed so as to surround the air discharge port. The adsorption member is a squeeze packing. | 06-19-2014 |
20140166209 | LAMINATE AND METHOD FOR SEPARATING THE SAME - A laminate including a supporter which transmits infrared; a substrate supported by the supporter; an adhesive layer via which the supporter and the substrate are attached to each other; and a separation layer positioned on a surface of the supporter to which surface the substrate is attached, and which is made of a compound having an infrared-absorbing structure. A target is tightly attached and supported in the laminate while securing easy separation of a supporter from the target. | 06-19-2014 |
20140162193 | RESIST COMPOSITION FOR EUV, METHOD OF PRODUCING RESIST COMPOSITION FOR EUV, AND METHOD OF FORMING RESIST PATTERN - A resist composition for EUV exhibiting E0 | 06-12-2014 |
20140151328 | METHOD FOR FORMING LAMINATE - A release layer is adequately protected by a protective layer when a laminate is subjected to a desired treatment. A method for forming a laminate | 06-05-2014 |
20140147793 | METHOD OF FORMING RESIST PATTERN - A method of forming a resist pattern using a resist composition containing a base component (A) which exhibits reduced solubility in an organic solvent under action of an acid and an acid-generator component (B) which generates an acid upon exposure, the base component (A) including a resin component (A1) having a structural unit (a0) derived from a compound represented by general formula (a0-1) shown below and a structural unit (a2) containing a lactone-containing cyclic group or the like (in formula (a0-1), Ra | 05-29-2014 |
20140147792 | POLYMERIZATION METHOD OF HIGH-MOLECULAR WEIGHT COMPOUND, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN - A polymerization method of a high-molecular weight compound (A1) having a constituent unit (a0) derived from a compound represented by the following general formula (a0-1), which has excellent lithography properties, and is useful as a resist composition, the method including conducting polymerization using a mixed solvent containing 10 mass % or more of one or more of a cyclic ketone-based solvent, an ester-based solvent, and a lactone-based solvent. A resist composition containing the high-molecular weight compound (A1) and a method for forming a resist pattern using the same. | 05-29-2014 |
20140147790 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resist composition including: a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid generator component (B) which generates an acid upon exposure, the base component (A) including a polymeric compound (A1) having a structural unit (a0) containing an acid decomposable group that exhibits increased polarity by the action of acid and a lactone-containing cyclic group, an —SO | 05-29-2014 |
20140147788 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN - A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of an acid, the resist composition containing a base material component which exhibits changed solubility in a developing solution by the action of an acid; and the base material component containing a resin component having a constituent unit derived from a compound represented by the following general formula (a0-1), at least two or more kinds of a constituent unit containing an acid dissociable group represented by the following general formula (a1-r-1) or (a1-r-2), and a constituent unit containing a lactone-containing, an —SO | 05-29-2014 |
20140147787 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN - A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of an acid, the resist composition containing a base material component which exhibits changed solubility in a developing solution by the action of an acid, the base material component containing a high-molecular weight compound having a constituent unit derived from a compound represented by the following formula (a0-1), a constituent unit containing a lactone-containing, a SO | 05-29-2014 |
20140141373 | COMPOUND, RADICAL POLYMERIZATION INITIATOR, METHOD FOR PRODUCING COMPOUND, POLYMER, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN - A compound represented by formula (I). In the formula, R | 05-22-2014 |
20140141253 | METHOD OF MANUFACTURING MULTILAYER BODY, METHOD OF PROCESSING SUBSTRATE, AND MULTILAYER BODY - A method for forming a release layer which lies between a substrate and a supporting member and has a property that changes when the release layer absorbs light coming through the supporting member, by carrying out plasma CVD with a high-frequency power that is set so as to be higher than a power at which a mode jump occurs. | 05-22-2014 |
20140127626 | RESIST COMPOSITION FOR NEGATIVE DEVELOPMENT WHICH IS USED FOR FORMATION OF GUIDE PATTERN, GUIDE PATTERN FORMATION METHOD, AND METHOD FOR FORMING PATTERN ON LAYER CONTAINING BLOCK COPOLYMER - A negative tone-development resist composition for forming a guide pattern, including a base component (A) and an acid generator component (B), the base component (A) including a resin component (A1) having a structural unit (a1) derived from an acrylate ester containing an acid dissociable group, and at least one of the following structural units (a2): a structural unit derived from an acrylic acid ester containing a lactone-containing cyclic group, a structural unit derived from an acrylic acid ester containing an ether-containing cyclic group and a structural unit derived from an acrylic acid ester containing a carbonate-containing cyclic group, and a constituent unit (a1) derived from an acrylic acid ester containing an acid-labile group, the acid generator component (B) including an acid generator (B1) including at least one compound represented by general formula (b1) or (b2) shown below | 05-08-2014 |
20140120472 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR - A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R | 05-01-2014 |
20140117293 | COATING SOLUTION FOR FORMING LIGHT-ABSORBING LAYER, AND METHOD OF PRODUCING COATING SOLUTION FOR FORMING LIGHT-ABSORBING LAYER - A coating solution for forming a light-absorbing layer of a solar cell obtainable by dissolving at least one metal or metal compound selected from the group consisting of a group 11 metal, a group 12 metal, a group 13 metal, a group 14 metal, a group 11 metal compound, a group 12 metal compound, a group 13 metal compound and a group 14 metal compound in a solvent to obtain a metal complex solution, and adding 0.1 to 50 volume % of an alcohol having 1 to 5 carbon atoms to the metal complex solution. | 05-01-2014 |
20140113236 | SOLVENT DEVELOPABLE NEGATIVE RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND METHOD FOR FORMING PATTERN OF LAYER INCLUDING BLOCK COPOLYMER - A solvent developing negative-tone resist composition containing a base component (A) which exhibits increased polarity and reduced solubility in an organic solvent under action of an acid and an acid generator component (B) which generates an acid upon exposure, the component (A) including a resin component (A1) containing: a structural unit (a2) derived from an acrylate ester containing a 4- to 12-membered lactone-containing cyclic group, a 3- to 7-membered ether-containing cyclic group or a 5- to 7-membered carbonate-containing cyclic group; and a structural unit (a1) derived from an acrylate ester containing an acid decomposable group which exhibited increased polarity by the action of acid, and the acid generator component (B) including an acid generator (B1) containing a compound which generates a sulfonic acid upon exposure. | 04-24-2014 |
20140109941 | RETENTION DEVICE AND RETENTION METHOD - A holding device including a first sucking section for sucking a wafer (substrate) from a side on which a dicing tape (supporting film) is adhered; a structure that supports a dicing frame (frame part) and covers a first region which (i) is on a surface of the dicing tape to which surface the wafer is not adhered and (ii) is between the wafer and the dicing frame; and a second sucking section for sealing a boundary between the structure and at least one of the dicing frame and the first region. | 04-24-2014 |
20140093827 | RESIST PATTERN FORMATION METHOD AND RESIST COMPOSITION - A resist pattern formation method including formation of a resist film, exposure, development, and subsequent rinsing using a resist composition containing a high-molecular compound having a constituent unit represented by the formula (a0-1), a constituent unit containing an acid decomposable group whose polarity increases by the action of an acid, and a constituent unit containing a group represented by the formula (a2-r-1). R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Ra | 04-03-2014 |
20140093824 | RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN - A resist composition including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) and a structural unit (a6) which generates acid upon exposure, and a method of forming a resist pattern using the resist composition. In general formula (a0-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Wa | 04-03-2014 |
20140087313 | STRIPPING SOLUTION FOR PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD - A stripping solution for photolithography which can effectively strip away residual materials of a photoresist pattern and etching residual materials, and has excellent anticorrosion properties on SiO | 03-27-2014 |
20140072500 | METHOD OF PRODUCING HYDRAZINE-COORDINATED CU CHALCOGENIDE COMPLEX - A method of producing a hydrazine-coordinated Cu chalcogenide complex, including: a step (I) in which Cu or Cu | 03-13-2014 |
20140058036 | METHOD OF PRODUCING POLYIMIDE RESIN, METHOD OF PRODUCING POLYIMIDE COATING, METHOD OF PRODUCING POLYAMIC ACID SOLUTION, POLYIMIDE COATING, AND POLYAMIC ACID SOLUTION - A polyimide resin produced by heating a polyamic acid resulting from the reaction of a tetracarboxylic acid dianhydride component and a diamine component in N,N,N′,N′-tetramethylurea. | 02-27-2014 |
20140054265 | METHOD OF FORMING FINE PATTERN, AND DEVELOPER - A method of forming a fine pattern, including: a phase separation step in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a substrate, and then the layer is heated for phase separation of the layer; a decomposition step in which at least a portion of a phase of at least one block of the plurality of blocks constituting the block copolymer is decomposed; a selective removal step in which the layer is immersed in a developing solution to selectively remove a phase containing decomposed blocks to form a nano structure; and an etching step in which the substrate is subjected to etching by using the nano structure as a mask; and a main component of the developing solution is an organic solvent having an SP value of 7.5 to 11.5 (cal/cm | 02-27-2014 |
20140044962 | ADHESIVE COMPOSITION, FILM ADHESIVE, AND BONDING METHOD - An adhesive composition including an elastomer as a main component, an adhesive layer prepared from the adhesive composition having (i) a storage modulus (G′) of not less than 20,000 Pa at 220° C. and/or (ii) a loss modulus (G″) of not less than 20,000 Pa at 220° C. | 02-13-2014 |
20140038111 | PROCESSED SUBSTRATE AND METHOD FOR MANUFACTURING SAME - A processed substrate having a through-hole whose openings in respective surfaces of the processed substrate are matched to each other in size, and a method for easily manufacturing the processed substrate with high efficiency. The processed substrate ( | 02-06-2014 |
20140030839 | METHOD OF DIFFUSING IMPURITY-DIFFUSING COMPONENT AND METHOD OF MANUFACTURING SOLAR CELL - A method of diffusing an impurity-diffusing component including forming a first diffusing agent layer containing a first conductivity type impurity-diffusing component on the surface of a semiconductor substrate; calcining the first diffusing agent layer; forming a second diffusing agent layer containing a second conductivity type impurity-diffusing component on the surface of the semiconductor substrate excluding the region where the first diffusing agent layer is formed; and heating the semiconductor substrate at a temperature higher than the calcination temperature to diffuse the first and second conductivity type impurity-diffusing components to the semiconductor substrate. | 01-30-2014 |
20140018281 | CLEANING LIQUID AND ANTICORROSIVE AGENT - A method of cleaning a substrate having a metal layer including copper or a copper-containing alloy, the method including cleaning the substrate using a cleaning liquid that includes a mercapto compound represented by one or both of the following formulas (1) and (2), and a solvent containing water and a water-soluble organic solvent: | 01-16-2014 |
20140017407 | Coating device - A coating device including a substrate carrying unit which rotatably holds a substrate while the substrate is upright and is able to dispose the held substrate at a first position and a second position; an application unit which includes a liquid material nozzle ejecting a liquid material to each of first and second surfaces of the substrate disposed at the first position; and a removal unit which includes an accommodation mechanism accommodating a part of the peripheral edge portion of the substrate disposed at the second position and a cleaning liquid ejection mechanism ejecting a cleaning liquid to the peripheral edge portion and removes the liquid material of the peripheral edge portion. | 01-16-2014 |
20140004467 | METHOD OF FORMING RESIST PATTERN AND NEGATIVE TONE-DEVELOPMENT RESIST COMPOSITION | 01-02-2014 |
20130316285 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND METHOD OF PRODUCING POLYMERIC COMPOUND - A resist composition which generates acid upon exposure and exhibits changed solubility in an alkali developing solution under action of acid, the resist composition including a polymeric compound containing a base decomposable group in a main chain thereof. | 11-28-2013 |
20130313223 | METHOD FOR PRODUCING SUBSTRATE HAVING SURFACE NANOSTRUCTURE - A method for producing a substrate having a surface nanostructure, including a forming, on a substrate, a layer containing a block copolymer having a plurality of blocks bonded together, and subsequently heating this layer to cause phase separation of the layer; a decomposing at least a portion of the phase including at least one block of the plurality of blocks that constitute the block copolymer of this layer; and immersing the layer in a developing solution and selectively removing the phase containing the decomposed block(s), the developing solution containing, as the main component, an organic solvent having an SP value of 7.5 to 11.5 (cal/cm | 11-28-2013 |
20130309614 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND COMPOUND - There is provided a resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, including a base component (A) which exhibits changed solubility in a developing solution by the action of acid, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0) shown below. In the formula, A″ represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom; R | 11-21-2013 |
20130309408 | COATING APPARATUS AND COATING METHOD - A coating apparatus including: a coating part having a nozzle which ejects a liquid material including a solvent and a plurality of metals to a substrate, a storing part which is connected to the nozzle and stores the liquid material, and an ultrasonic wave oscillating part which oscillates an ultrasonic wave to the liquid material stored in the storing part. | 11-21-2013 |
20130302736 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND - A resist composition including a base material component whose solubility in a developing solution changes by the action of an acid and an acid generator component which generates an acid upon exposure. The acid generator component includes an acid generator that includes a compound containing nitrogen atoms having proton acceptor properties and sites capable of generating an acid upon exposure in the same molecule, the number of the sites being larger than the number of the nitrogen atoms. | 11-14-2013 |
20130295453 | NEGATIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERY, LITHIUM ION SECONDARY BATTERY, AND METHOD FOR PRODUCING NEGATIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERY - An object of the present invention is to provide a negative electrode for a lithium ion secondary battery, capable of obtaining a lithium ion secondary battery which is excellent in initial charge characteristics and is also excellent in charge/discharge cycle characteristics, and a method for producing the same, as well as a lithium ion secondary battery comprising the negative electrode for a lithium ion secondary battery. A negative electrode for a lithium ion secondary battery according to the present invention comprises a current collector layer, and a negative electrode active material layer composed of a tin structure, the tin structure includes a plurality of protrusions which protrude approximately perpendicularly to a main surface of the current collector layer, and a cross-sectional area of the tip portion parallel to the main surface of the current collector layer of the protrusion is smaller than that of the base end portion. | 11-07-2013 |
20130281592 | FILM-FORMING COMPOSITION, DIFFUSING AGENT COMPOSITION, METHOD FOR MANUFACTURING FILM-FORMING COMPOSITION, AND METHOD FOR MANUFACTURING DIFFUSING AGENT COMPOSITION - A film-forming composition according to one embodiment includes a siloxane polymer (A) containing a condensation product (A1) and a condensation product (A2). In the (A), a contained amount of the (A1) is 75 percent or less by mass in terms of SiO | 10-24-2013 |
20130280844 | COATING APPARATUS AND COATING METHOD - A coating apparatus including a coating part which has a nozzle which ejects a liquid material including an oxidizable metal from a tip portion, and a relative driving unit which moves a substrate and the nozzle in relation to each other so that the tip portion passes through the substrate, such that at least the tip portion of the nozzle provides an affinity control part which is formed so that affinity between the affinity control part and the liquid material is less than that between the liquid materials. | 10-24-2013 |
20130273252 | COATING APPARATUS AND COATING METHOD - A coating apparatus including a coating part which coats a liquid material containing a metal on a substrate, a coating-film forming part which subjects the liquid material coated on the substrate to a predetermined treatment to form a coating film, and a removing part which removes a peripheral portion of the coating material formed along the outer periphery of the substrate. | 10-17-2013 |
20130269604 | NOZZLE AND COATING APPARATUS - A nozzle including a main part and a tip part provided at a tip of the main part, wherein a liquid material containing a metal is ejected from the tip part, and the tip part is separably mounted on the main part. | 10-17-2013 |
20130269602 | TRANSPORTING APPARATUS AND COATING APPARATUS - A transporting apparatus which transports a heated substrate, the substrate having a liquid containing a metal coated thereon, the transporting apparatus including a holding part which is moveable and holds the heated substrate, and a temperature control part which controls the temperature of the holding part. | 10-17-2013 |
20130260314 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND POLYMERIC COMPOUND - There is provided a resist composition including a polymeric compound (A1) containing a structural unit derived from a compound represented by general formula (a0-m), and a method of forming a resist pattern using the resist composition. In the formula, R | 10-03-2013 |
20130260312 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND - A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resist composition including a base component that exhibits changed solubility in a developing solution under the action of acid, the base component containing a resin component having a structural unit represented by general formula (a0-1) shown below: | 10-03-2013 |
20130252180 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND - A resist composition including a base component (A) which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the base component (A) containing a polymeric compound (A1) including a structural unit (a0) represented by general formula (a0-1) shown below, a structural unit (a1) containing an acid decomposable group which exhibits increased polarity by the action of acid and a structural unit (a6) which generates acid upon exposure (wherein R | 09-26-2013 |
20130252179 | UNDERCOAT AGENT AND METHOD OF FORMING PATTERN OF LAYER COMPRISING BLOCK COPOLYMER - A undercoat agent used for performing phase separation of a layer formed on a substrate and containing a block copolymer having a plurality of blocks bonded, wherein the undercoat agent contains a resin component, the resin component is formed from a structural unit having an aromatic ring and a structural unit not having an aromatic ring, and the resin component has a group that can interact with the substrate, and also has a 3 to 7-membered, ether-containing cyclic group. | 09-26-2013 |
20130252171 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) including a structural unit (A) represented by general formula (a0-1) and a structural unit (a1) containing an acid decomposable group which exhibits increased polarity by the action of acid (R | 09-26-2013 |
20130252099 | NEGATIVE ELECTRODE BASE MEMBER - A battery having high output voltage, high energy density and excellent charge and discharge cycle characteristics is achieved through the use of one of the following negative electrode base members as a negative electrode base member for lithium ion secondary batteries: a negative electrode base member where a metal film is formed on a support having an organic film; such a negative electrode base member where the surface layer of the organic film is covered with a metal oxide film; a negative electrode base member where a metal film is formed on a support having a composite film formed from a composite film-forming material containing an organic component and an inorganic component; and a negative electrode base member where a silica coating is formed, on a support having a photoresist pattern, from a silica film-forming coating liquid and a metal film is formed on the support after removing the photoresist pattern. | 09-26-2013 |
20130252098 | NEGATIVE ELECTRODE BASE MEMBER - A battery having high output voltage, high energy density and excellent charge and discharge cycle characteristics is achieved through the use of one of the following negative electrode base members as a negative electrode base member for lithium ion secondary batteries: a negative electrode base member where a metal film is formed on a support having an organic film; such a negative electrode base member where the surface layer of the organic film is covered with a metal oxide film; a negative electrode base member where a metal film is formed on a support having a composite film formed from a composite film-forming material containing an organic component and an inorganic component; and a negative electrode base member where a silica coating is formed, on a support having a photoresist pattern, from a silica film-forming coating liquid and a metal film is formed on the support after removing the photoresist pattern. | 09-26-2013 |
20130244176 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure and an organic solvent component (S), the organic solvent component (S) containing an organic solvent (S1) including a compound represented by general formula (s-1) shown below and the acid-generator component (B) being an onium salt (in the formula, X represents a single bond or an alkylene group of 1 to 3 carbon atoms; and n represents an integer of 0 to 3). | 09-19-2013 |
20130243958 | UNDERCOAT AGENT AND METHOD OF FORMING PATTERN OF LAYER CONTAINING BLOCK COPOLYMER - An undercoat agent which is used for phase separating a layer including a block copolymer having a plurality of blocks bonded formed on a substrate, wherein the undercoat agent contains a resin component, the resin component includes a structural unit having an aromatic ring and a structural unit having no aromatic ring, and the resin component includes a group which can interact with the substrate and does not include a 3 to 7-membered, ether-containing cyclic group; and a method of forming a pattern of a layer containing a block copolymer, including: a step (1) in which the undercoat agent is applied to a substrate to form a layer containing the undercoat agent; a step (2) in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a surface of the layer containing the undercoat agent, followed by a phase separation of the layer containing the block copolymer; and a step (3) in which a phase containing at least one block of the plurality of blocks constituting the block copolymer is selectively removed. | 09-19-2013 |
20130241092 | FILM-FORMING COMPOSITION FOR OPTICAL IMPRINT AND METHOD FOR PRODUCING OPTICAL MEMBER - A film-forming composition for optical imprint including (A) a photopolymerizable monomer having a hydrophilic group, (B) inorganic nanoparticles, and (C) a photopolymerization initiator, and the composition has an organic solvent content of 20% by mass or less, contains a monomer having a viscosity of 500 cP or less as component (A) at a proportion of 30% by mass or more relative to the total amount of component (A) and component (B), and has a refractive index after curing of 1.56 or higher. | 09-19-2013 |
20130240481 | BLOCK COPOLYMER-CONTAINING COMPOSITION AND METHOD OF REDUCING PATTERN - The present invention relates to a composition including: a component (A) being a block copolymer including a block P | 09-19-2013 |
20130236947 | SUBSTRATE HAVING ROD-LIKE MOLECULES ON SURFACE THEREOF AND METHOD FOR PRODUCING THE SAME - A substrate having rod-like molecules on a surface thereof including: a substrate in which a pattern including a convex portion with a flat upper surface is formed on at least a portion thereof; and a plurality of rod-like molecules, which are formed into rod-like shape, are aligned in line in a direction crossing a molecular length direction of each of the rod-like molecules an the upper surface of the convex portion, and have liquid crystalline states, wherein the molecular length L | 09-12-2013 |
20130230801 | POSITIVE-TYPE PHOTORESIST COMPOSITION, PHOTORESIST LAMINATE, METHOD FOR PRODUCING PHOTORESIST PATTERN, AND METHOD FOR PRODUCING CONNECTING TERMINAL - What is provided is a positive-type photoresist composition containing an acid generator (A) capable of generating an acid when irradiated with an active ray or radiation, a resin (B) whose solubility in alkali increases under the action of acid, and an organic solvent (S), the photoresist composition further containing an alkali-metal salt (C). | 09-05-2013 |
20130224658 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition including: a base component (A) that exhibits changed solubility in a developing solution by the action of acid; a photoreactive quencher (C); and an acid generator component (B) that generates acid upon exposure, wherein the photoreactive quencher (C) contains a compound (C) represented by general formula (c1) shown below. In the formula, X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent; R | 08-29-2013 |
20130224656 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition including a base component which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and an organic solvent component, the base component containing a resin component having a structural unit which generates acid, and the organic solvent component containing an organic solvent component including a compound represented by general formula (s-1) shown below in which X represents a single bond or an alkylene group of 1 to 3 carbon atoms; and n represents an integer of 0 to 3. | 08-29-2013 |
20130220554 | LAMINATE AND METHOD FOR SEPARATING THE SAME - A laminate including a supporting member which is light transmissive; a supported substrate supported by the supporting member; an adhesive layer provided on a surface of the supported substrate which surface faces toward the supporting member; and a release layer which is made of a fluorocarbon and is provided between the supporting member and the supported substrate, the release layer having a property that changes when it absorbs light coming through the supporting member. | 08-29-2013 |
20130213582 | LAMINATE AND METHOD FOR SEPARATING THE SAME - A laminate including a supporting member which is light transmissive; a supported substrate supported by the supporting member; an adhesive layer provided on a surface of the supported substrate which surface faces toward the supporting member; and a release layer which is made of an inorganic material and is provided between the supporting member and the supported substrate, the release layer having a property that changes when the release layer absorbs light coming through the supporting layer, and the release layer having a flat surface which faces the adhesive layer. | 08-22-2013 |
20130210231 | METHOD OF FORMING CONTACT HOLE PATTERN - A method of forming a contact hole pattern, including: a block copolymer layer forming step in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a substrate having on a surface thereof a thin film with a hole pattern formed, so as to cover the thin film; a phase separation step in which the layer containing the block copolymer is subjected to phase separation; a selective removing step in which phase of at least one block of the plurality of blocks constituting the block copolymer is removed, wherein hole diameter of the hole pattern formed on the thin film is 0.8 to 3.1 times period of the block copolymer, and in the layer forming step, thickness between upper face of the thin film and surface of the layer containing the block copolymer is 70% or less of thickness of the thin film. | 08-15-2013 |
20130209941 | METHOD OF FORMING PATTERN - A method of forming a pattern including applying a resist composition to a substrate to form a resist film, and then subjecting the resist film to exposure and development, thereby forming a first pattern containing a resist film; forming a SiO | 08-15-2013 |
20130209872 | SECONDARY BATTERY POROUS ELECTRODE - An electrode having excellent charge/discharge cycle characteristics and which is capable of improving a secondary battery capacity. An electrode is formed on the surface of a collector as an assembly of multiple porous domain structures that are apart from each other, the porous domain structures each having a polygonal shape without an acute angle in a planar view, the polygonal shape having a maximum diameter of 120 μm or less. | 08-15-2013 |
20130206039 | SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD - A monosilane compound or bissilane compound of a specific structure having dimethylamino groups is contained in a surface treatment agent used in the hydrophobization treatment of substrate surfaces. | 08-15-2013 |
20130189619 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition containing a base component (A) that exhibits changed solubility in a developing solution under action of acid, a photoreactive quencher (C), and an acid generator component (B) that generates acid upon exposure, and further containing an acid (G) having a pKa of 4 or less. | 07-25-2013 |
20130189618 | METHOD OF FORMING RESIST PATTERN - A method of forming a resist pattern, including: step (1) in which a resist composition including a base component, a photobase generator component and an acid supply component is applied to a substrate to form a resist film; step (2) in which the resist film is subjected to exposure without being subjected to prebaking; step (3) in which baking is conducted after step (2), such that, at an exposed portion of the resist film, the base generated from the photobase generator component upon the exposure and an acid derived from the acid supply component are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the action of the acid derived from the acid supply component; and step (4) in which the resist film is subjected to an alkali development, thereby forming a negative-tone resist pattern. | 07-25-2013 |
20130183626 | METHOD FOR FORMING FINE PATTERN, AND COATING AGENT FOR PATTERN FINING - A method for forming a fine pattern, including forming a resist film by applying, on a substrate, a resist composition containing a base material having a solubility, in a developer liquid including an organic solvent, that decreases according to an action of an acid, a compound which generates an acid upon irradiation, and an organic solvent; exposing the resist film; forming a resist pattern using the developer liquid; applying, on the resist pattern, a coating agent for pattern fining including a resin and an organic solvent; and heating the resist pattern on which a coating film is formed. | 07-18-2013 |
20130177854 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND NOVEL COMPOUND - A resist composition including a base component (A) which exhibits changed solubility in a developing solution, and an acidic compound component (J) which is decomposed by exposure to exhibit decreased acidity, wherein the acidic compound component (J) contains a compound represented by formula (J1) [in the formula, R | 07-11-2013 |
20130177853 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A method of forming a resist pattern, including: step (1) in which a resist composition containing a base component (A) that exhibits increased solubility in an alkali developing solution and a compound represented by general formula (C1) is applied to a substrate to form a resist film, step (2) in which the resist film is subjected to exposure, step (3) in which baking is conducted after step (2), and step (4) in which the resist film is subjected to an alkali development, thereby forming a negative-tone resist pattern; and the resist composition used in step (1): | 07-11-2013 |
20130172224 | CLEANING LIQUID, AND ANTICORROSIVE AGENT - In a cleaning liquid containing (A) an anticorrosive agent, and (B) a solvent, a compound represented by the following formula (1): | 07-04-2013 |
20130171572 | METHOD FOR PRODUCING THICK FILM PHOTORESIST PATTERN - A method for producing a thick film photoresist pattern including laminating a thick photoresist layer including a chemically amplified positive-type photoresist composition for thick film on a support; irradiating the thick photoresist layer; and developing the thick photoresist layer to obtain a thick film resist pattern; in which the composition includes an acid generator, a resin whose alkali solubility increases by the action of an acid, and an organic solvent having a boiling point of at least 150° C. and a contact angle on a silicon substrate of no greater than 18°, in an amount of at least 40% by mass with respect to total mass of the organic solvent. | 07-04-2013 |
20130164693 | METHOD OF FORMING RESIST PATTERN - A method of forming a resist pattern including: applying a first resist composition containing a base component that exhibits increased solubility in an alkali developing solution and a photobase generator component that generates a base upon exposure to a substrate to form a first resist film; conducting exposure; conducting baking; conducting an alkali development, thereby forming a negative-tone resist pattern; applying a second resist composition containing a second base component that exhibits increased solubility in an alkali developing solution, an acid generator component that generates acid upon exposure and an organic solvent that does not dissolve the negative-tone resist pattern to the substrate having the negative-tone resist pattern formed thereon to form a second resist film; conducting exposure; and conducting an alkali development, thereby forming a resist pattern. | 06-27-2013 |
20130157201 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND - A resist composition containing a base component (A) which generates acid upon exposure, and exhibits changed solubility in a developing solution under the action of acid, wherein
| 06-20-2013 |
20130157197 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND - A resist composition comprising: a base component (A) that exhibits changed solubility in a developing solution by the action of acid; a photoreactive quencher (C); and an acid-generator component (B) that generates acid upon exposure, wherein the photoreactive quencher (C) contains a compound represented by general formula (c1) shown below. In the formula, R | 06-20-2013 |
20130143159 | RESIST COMPOSITION FOR EUV OR EB, AND METHOD OF FORMING RESIST PATTERN - A resist composition including a base component containing a polymer (A1) having a structural unit (a5) containing a group represented by general formula (a5-0-1) or (a5-0-2), wherein the amount of the monomer that derives the structural unit (a5) is not more than 100 ppm relative to (A1). In the formulas, each of Q | 06-06-2013 |
20130139858 | SUBSTRATE CLEANING APPARATUS - A substrate cleaning apparatus includes a transport section that transports a substrate in a predetermined direction, and an ultrasonic oscillation section that can clean the front surface side of the substrate by applying ultrasonic waves to the back surface of the substrate which is transported in the predetermined direction by the transport section. The ultrasonic oscillation section includes a liquid supply section that brings liquid into contact with the back surface of the substrate by surface tension, and a vibrator that applies ultrasonic vibrations to the liquid. | 06-06-2013 |
20130137049 | METHOD OF FORMING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A method of producing a polymeric compound, including: copolymerizing a monomer containing an —SO | 05-30-2013 |
20130137048 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition containing a base component (A) which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, wherein the base component (A) contains a copolymer (A1) having a structural unit (a0) containing a group represented by the following general formula (a0-1) or (a0-2), a structural unit (a11) containing an acid-decomposable group which exhibits increased polarity by the action of acid and contains a polycyclic group, and a structural unit (a12) containing an acid-decomposable group which exhibits increased polarity by the action of acid and contains a monocyclic group. Each of the groups —R | 05-30-2013 |
20130137047 | METHOD OF FORMING RESIST PATTERN - A method of forming a resist pattern including: step (1) in which a resist composition including a base component and a photobase generator component is applied to a substrate to form a resist film; step (2) in which the resist film is subjected to immersion exposure; step (3) in which baking is conducted after step (2), such that, at an exposed portion of the resist film, the base generated from the photobase generator component and an acid provided to the resist film in advance are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the action of the acid; and step (4) in which the resist film is subjected to an alkali development, thereby forming a negative-tone resist pattern, wherein a receding angle of water on the resist film is 65° or more. | 05-30-2013 |
20130126470 | STRIPPING SOLUTION FOR PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD - A stripping solution for photolithography including hydrofluoric acid, a basic compound represented by general formula (b-1), and water. In the formula, R | 05-23-2013 |
20130122425 | METHOD FOR FORMING FINE PATTERN, AND COATING FORMING AGENT FOR PATTERN FINING - A resist pattern formed by a method including forming a resist film by applying, on a substrate, a resist composition containing a base material having a solubility, in a developer liquid containing an organic solvent, that decreases according to an action of an acid, a compound which generates an acid upon irradiation, and a solvent; exposing the resist film; developing the exposed resist film; forming a first coating film by applying, on the resist pattern, a first coating forming agent containing a resin having a solubility in an organic solvent that decreases under action of an acid, and a solvent; and heating the resist pattern on which the first coating forming agent has been applied. | 05-16-2013 |
20130115555 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - There are provided a method of forming a resist pattern includes: a step ( | 05-09-2013 |
20130115554 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND - A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below (R | 05-09-2013 |
20130113147 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate processing apparatus including a transfer unit for transferring, under reduced pressure, a laminate including a wafer and a support plate which are bonded to each other and supported by use of support pins that supports an inner periphery of a first surface of the wafer, the first surface being opposite to a second surface of the wafer onto which a second surface the support plate is bonded. | 05-09-2013 |
20130109123 | DIFFUSING AGENT COMPOSITION AND METHOD OF FORMING IMPURITY DIFFUSION LAYER | 05-02-2013 |
20130095427 | RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN - The present invention relates to a resist composition for EUV or EB containing a base component (A) which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, and a resin component (W) that contains at least one atom selected from a fluorine atom or a silicon atom and contains a polarity conversion group that exhibits increased polarity after decomposition by the action of base, wherein the base component (A) contains a component (A1) which contains a structural unit (a0) having a group represented by general formula (a0-1) or (a0-2) shown below, and the amount of the resin component (W) relative to 100 parts by weight of the base component (A) is 1 to 15 parts by weight. In the formulas, Q | 04-18-2013 |
20130089821 | RESIST PATTERN FORMATION METHOD AND PATTERN MINIATURIZATION AGENT - A resist pattern formation method that includes a step (1) of forming a resist pattern on a support using a chemically amplified positive-type resist composition, a step (2) of applying a pattern miniaturization agent to the resist pattern, a step (3) of performing a bake treatment of the resist pattern to which the pattern miniaturization agent has been applied, and a step (4) of subjecting the resist pattern that has undergone the bake treatment to alkali developing, wherein the pattern miniaturization agent contains an acid generator component, and an organic solvent that does not dissolve the resist pattern formed in the step (1). Also, a pattern miniaturization agent used in the method. | 04-11-2013 |
20130089819 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND - A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2). | 04-11-2013 |
20130084523 | RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERN - A method of forming a resist pattern, including: a step (1) in which a resist film is formed by coating a resist composition including a base component (A) that exhibits increased solubility in an alkali developing solution, a photo-base generator component (C) that generates a base upon exposure, an acid supply component (Z) and a compound (F) containing at least one selected from the group consisting of a fluorine atom and a silicon atom and containing no acid decomposable group which exhibits increased polarity by the action of acid on a substrate; a step (2) in which the resist film is subjected to exposure; a step (3) in which baking is conducted after the step (2); and a step (4) in which the resist film is subjected to an alkali development, thereby forming a negative-tone resist pattern, and a resist composition used in the step (1). | 04-04-2013 |
20130081760 | ADHESIVE COMPOSITION, ADHESIVE FILM, AND METHOD FOR TREATING SUBSTRATE - An adhesive composition including a hydrocarbon resin, a modified elastomer that is bonded with at least one functional group-containing atom group, and a solvent. | 04-04-2013 |
20130078572 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition used in a method of forming a resist pattern including applying a resist composition comprising a base component that exhibits increased solubility in an alkali developing solution and a photo-base generator component to a substrate to form a resist film; subjecting the resist film to exposure; baking after subjecting the resist film to exposure, wherein at an exposed portion of the resist film, the base generated from the photo-base generator component upon exposure and an acid provided to the resist film in advance are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the action of acid provided to the resist film in advance; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern. | 03-28-2013 |
20130071789 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition for use with EUV or EB including:
| 03-21-2013 |
20130065180 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition comprising: a base component (A) which exhibits changed solubility in a developing solution under action of acid; an acid-generator component (B) which generates acid upon exposure; and a compound (D1) including of a cation moiety which contains a quaternary nitrogen atom, and an anion moiety represented by formula (d1-an1) or (d1-an2) shown below. In the formulas, X represents a cyclic aliphatic hydrocarbon group of 3 to 30 carbon atoms which may have a substituent; and Y | 03-14-2013 |
20130061922 | DIFFUSION AGENT COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR CELL - A diffusion agent composition used in forming an impurity diffusion agent layer on a semiconductor substrate, and containing an impurity diffusion component, a silicon compound, and a solvent containing a solvent having a boiling point of 100° C. or less, a solvent having a boiling point of 120-180° C., and a solvent having a boiling point of 300° C. | 03-14-2013 |
20130053518 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING POLYMERIC COMPOUND - A fluorine-containing polymeric compound which contains a structural unit (f1) that is decomposable in an alkali developing solution as a block copolymer portion, a base component (A) that exhibits increased solubility in an alkali developing solution under the action of acid, and an acid generator component (B) that generates acid upon exposure. | 02-28-2013 |
20130045443 | POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A polymer comprising: an anion part which generates acid upon exposure on at least one terminal of the main chain; and a structural unit (a1) containing an acid decomposable group that exhibits increased polarity by the action of acid, wherein the structural unit (a1) comprises two types of structural units, and a difference in an activation energy of the acid decomposable groups within the two types of structural units is at least 3.0 kJ/mol. | 02-21-2013 |
20130040107 | METHOD FOR PRODUCING SUBSTRATE HAVING DISPERSED PARTICLES OF DENDRIMER COMPOUND ON THE SURFACE THEREOF, AND SUBSTRATE HAVING DISPERSED PARTICLES OF DENDRIMER COMPOUND ON THE SURFACE THEREOF - A method for producing a substrate having dispersed particles of a dendrimer compound on the surface thereof, the method including: an application step including dissolving a phenyl azomethine dendrimer compound in a solvent to prepare a solution, and applying the solution on the surface of a substrate; and a volatilization step including volatilizing the solvent from the solution applied on the surface of the substrate, the phenyl azomethine dendrimer compound included in the solution having a concentration of no greater than 5 μmol/L is employed. | 02-14-2013 |
20130022911 | POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A polymer containing an anion part which generates acid upon exposure on at least one terminal of the main chain, and at least one structural unit selected from the group consisting of a structural unit (a0) containing a —SO | 01-24-2013 |
20130017501 | METHOD OF FORMING RESIST PATTERNAANM Nakamura; TsuyoshiAACI Kawasaki-shiAACO JPAAGP Nakamura; Tsuyoshi Kawasaki-shi JPAANM Ishikawa; KiyoshiAACI Kawasaki-shiAACO JPAAGP Ishikawa; Kiyoshi Kawasaki-shi JP - A method of forming a resist pattern, comprising: a step of forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent under action of acid and an acid-generator component (B) which generates acid upon exposure; a step of subjecting the resist film to exposure; a step of patterning the resist film by a negative-tone development using a developing solution containing the organic solvent to form a resist pattern; a step of applying a coating material to the resist pattern, thereby forming a coating film; a step of performing a thermal treatment at a temperature lower than the softening point of the resist pattern, thereby heat shrinking the coating film to narrow an interval between the resist pattern; and a step of removing the coating film. | 01-17-2013 |
20130017500 | METHOD OF FORMING RESIST PATTERNAANM Yokoya; JiroAACI Kawasaki-shiAACO JPAAGP Yokoya; Jiro Kawasaki-shi JPAANM Nakamura; TsuyoshiAACI Kawasaki-shiAACO JPAAGP Nakamura; Tsuyoshi Kawasaki-shi JPAANM Shimizu; HiroakiAACI Kawasaki-shiAACO JPAAGP Shimizu; Hiroaki Kawasaki-shi JPAANM Takeshita; MasaruAACI Kawasaki-shiAACO JPAAGP Takeshita; Masaru Kawasaki-shi JPAANM Nito; HidetoAACI Kawasaki-shiAACO JPAAGP Nito; Hideto Kawasaki-shi JPAANM Saito; HirokuniAACI Kawasaki-shiAACO JPAAGP Saito; Hirokuni Kawasaki-shi JP - A method of forming a resist pattern, including forming a resist film on a substrate using a resist composition comprising a base component that exhibits increased solubility in an alkali developing solution and a photo-base generator component; exposing the resist film; baking the exposed resist film, such that, at an exposed portion thereof, the base generated from the photo-base generator component upon the exposure and an acid provided to the resist film are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the acid provided to the resist film; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern in which the unexposed portion of the resist film has been dissolved and removed. | 01-17-2013 |
20130000852 | STRIPPING DEVICE AND STRIPPING METHOD - A stripping method for stripping a support plate from a laminate including a substrate and the support plate adhered to the wafer via an adhesive layer, in which the adhesive layer is formed from an adhesive compound soluble in a non-polar solvent or a highly polar solvent; and the stripping method includes supplying the non-polar solvent or the highly polar solvent, so that the non-polar solvent or the highly polar solvent is retained at least on an edge portion of that surface of the laminate which faces the support plate, and on a lateral surface of the laminate. | 01-03-2013 |
20120328993 | METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN - A method of producing a polymeric compound containing a structural unit that decomposes upon exposure to generate an acid, the method including: synthesizing a precursor polymer by polymerizing a water-soluble monomer having an anionic group, washing the precursor polymer with water, and subsequently subjecting the precursor polymer to a salt exchange with an organic cation. Also, a polymeric compound produced using the method of producing a polymeric compound, and a method of forming a resist pattern using the resist composition. | 12-27-2012 |
20120328982 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A positive resist composition including: a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid; an acid generator component (B) which generates acid upon exposure; a fluorine-containing compound component (F); and a photosensitizer (G). | 12-27-2012 |
20120315210 | HYDRAZINE-COORDINATED Cu CHALCOGENIDE COMPLEX AND METHOD OF PRODUCING THE SAME - A hydrazine-coordinated Cu chalcogenide complex obtainable by reacting Cu or Cu | 12-13-2012 |
20120313044 | COATING SOLUTION FOR FORMING LIGHT-ABSORBING LAYER, AND METHOD FOR PRODUCING COATING SOLUTION FOR FORMING LIGHT-ABSORBING LAYER - A coating solution for forming a light-absorbing layer of a CZTS solar cell, including a hydrazine-coordinated Cu chalcogenide complex component (A), a hydrazine-coordinated Sn chalcogenide complex component (B) and a hydrazine-coordinated Zn chalcogenide complex component (C) dissolved in dimethylsulfoxide; and a method of producing a coating solution forming a light-absorbing layer a CZTS solar cell, including preparing dimethylsulfoxide having a hydrazine-coordinated Cu chalcogenide complex dissolved therein as a first solution, dissolving a hydrazine-coordinated Sn chalcogenide complex in dimethylsulfoxide to obtain a second solution, dissolving a hydrazine-coordinated Zn chalcogenide complex in dimethylsulfoxide to obtain a third solution, and mixing together the first solution, the second solution and the third solution. | 12-13-2012 |
20120309179 | SUBSTRATE TREATING APPARATUS AND METHOD OF TREATING SUBSTRATE - A substrate treating apparatus including: a first chamber having a coating part which forms a coating film of a liquid material containing an oxidizable metal and a solvent on a substrate; a second chamber having a first heating part which heats the coating film; and a connection part which connects the first chamber and the second chamber, wherein the connection part is provided with a second heating part which heats the coating film coated on the substrate and a pressure control part which controls the pressure around the coating film. | 12-06-2012 |
20120308931 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and an acid generator containing compounds represented by general formulas (b1) and (b2) shown below | 12-06-2012 |
20120308928 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND METHOD OF PRODUCING THE SAME - A resist composition including a base component (A) that exhibits changed solubility in a developing solution under action of acid and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) contains a resin component (A1) including a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit (a1)) containing an acid decomposable group that exhibits increased polarity under action of acid, and the amount of the structural unit (a0) is less than 50 mol %, | 12-06-2012 |
20120308715 | COATING APPARATUS AND COATING METHOD - A coating apparatus including: a coating part having a nozzle which ejects a liquid material containing an oxidizable metal and a solvent to a substrate; a supplying system which supplies the liquid material to the coating part; and a recycling system which recovers the liquid material from at least one of the supplying system and the coating part, and supplies the recovered liquid material to at least one of the supplying system and the coating part. | 12-06-2012 |
20120308470 | METHOD OF PREPARING CARBON NANOTUBES AND CATALYST FOR PRODUCING CARBON NANOTUBES - A method for preparing carbon nanotubes including attaching a catalyst consisting of a compound in which a transition metal element of Group 8, 9 or 10 is coordinated to a nitrogen-containing dendrimer compound having at least one nitrogen atom, to which a metal element may be coordinated, on a surface of a substrate, and thermally decomposing a carbon compound in the vicinity of the substrate while supplying the carbon compound on the surface of the substrate to which the catalyst is attached. The catalyst for producing the carbon nanotubes is a compound in which a transition metal element of Group 8, 9 or 10 is coordinated to a nitrogen-containing dendrimer compound having at least one nitrogen atom to which a metal element may be coordinated. | 12-06-2012 |
20120304921 | HEATING APPARATUS, COATING APPARATUS AND HEATING METHOD - A heating apparatus including: a first heating part and a second heating part between which a substrate having a coating film is disposed at a substrate position in the film thickness direction; and a distance control part which controls at least one of a first distance between the substrate position and the first heating part and a second distance between the substrate position and the second heating part. | 12-06-2012 |
20120301829 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR - A resist composition comprising a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) comprising an acid generator (B1) composed of a compound represented by general formula (b1-1) shown below [wherein, X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, provided that a ring skelton of the cyclic group contains an —SO | 11-29-2012 |
20120282551 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND - A resist composition including a resin component which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resin component including a resin component having a structural unit represented by a general formula (a0-0-1) shown below | 11-08-2012 |
20120276481 | METHOD OF FORMING RESIST PATTERN AND NEGATIVE TONE-DEVELOPMENT RESIST COMPOSITION - A method of forming a resist pattern, the method including: forming a resist film on a substrate using a resist composition containing a base component (A) that exhibits reduced solubility in an organic solvent under the action of acid, an acid generator component (B) that generates acid upon exposure and a fluorine-containing polymeric compound (F), exposing the resist film, and patterning the resist film by negative tone development using a developing solution containing the organic solvent, thereby forming a resist pattern, wherein the base component (A) contains a resin component (A1) containing a structural unit (a1) derived from an acrylate ester, the dissolution rates of (A1) and (F) in the developing solution are each at least 10 nm/s, and the absolute value of the difference in the dissolution rates of (A1) and (F) in the developing solution is not more than 80 nm/s. | 11-01-2012 |
20120270155 | COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN - There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern
| 10-25-2012 |
20120264061 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR - A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R | 10-18-2012 |
20120264058 | RESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND METHOD OF FORMING RESIST PATTERN - A resist composition for negative development including a base component (A) which exhibits decreased solubility in an organic solvent under the action of acid and an acid generator component (B) which generates acid upon exposure; and the resist composition used in a method of forming a resist pattern which includes: forming a resist film on a substrate using the resist composition; conducting exposure of the resist film; and patterning the resist film by negative development using a developing solution containing the organic solvent to form a resist pattern, wherein the acid generator component (B) contains an acid generator (B1) that generates an acid having a log P value of 2.7 or less and also a pKa value of at least −3.5. | 10-18-2012 |
20120264052 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND - A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a resin component (A1) including a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms). | 10-18-2012 |
20120251951 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition including:
| 10-04-2012 |
20120238075 | COATING APPARATUS AND COATING METHOD - A coating apparatus including a coating part which applies a liquid material containing an oxidizable metal and a solvent to a substrate; a chamber having a coating space in which the coating part applies the liquid material to the substrate and a transport space into which the substrate is transported; and a removal part which removes the liquid material from the atmosphere inside the chamber when a concentration of the solvent in the atmosphere inside the chamber exceeds a threshold value. | 09-20-2012 |
20120225383 | RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RESIST PATTERN - A resist composition for immersion exposure and a method of forming a resist pattern which can satisfy both of excellent resistance to an immersion medium and lithography properties. The resist composition for immersion exposure includes a resin component (A) which exhibits changed alkali solubility under action of acid and an acid-generator component (B) which generates acid upon irradiation, the resin component (A) including a resin (A1) which contains a fluorine atom and a resin (A2) which has a structural unit (a′) derived from acrylic acid and contains no fluorine atom, and the amount of the resin (A1) contained in the resin component (A) being within the range from 0.1 to 50% by weight. | 09-06-2012 |
20120217210 | SUPPORT METHOD, HIGH-TEMPERATURE TREATMENT METHOD USING SAME, AND SUPPORT JIG - A method for supporting a support to which a wafer is attached, by supporting the support against gravitational force by supporting three or more support points of an inner circumference section of a support surface of the support. The support surface of the support is opposite to a side on which the wafer is attached to the support. | 08-30-2012 |
20120214101 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a basic-compound component (C) and an acid-generator component (B) which generates acid upon exposure, the component (B) including a compound represented by formula (b1), and the component (C) including at least one compound represented by formulas (c1) to (c3) (wherein Z | 08-23-2012 |
20120208131 | METHOD OF FORMING RESIST PATTERN - A method of forming a resist pattern including: forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits increased solubility in an organic solvent under action of acid and an acid generator component which generates acid upon exposure; conducting exposure of the resist film; and patterning the resist film by positive development using a developing solution containing the organic solvent to form a resist pattern,
| 08-16-2012 |
20120208128 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND - A resist composition including a base component (A) which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the base component (A) including a resin component (A1) containing a structural unit (a0-1) having a group represented by general formula (a0-1) shown below and a structural unit (a1) derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid. | 08-16-2012 |
20120208124 | RESIST COMPOSITION FOR EUV, METHOD FOR PRODUCING RESIST COMPOSITION FOR EUV, AND METHOD OF FORMING RESIST PATTERN - The present invention is related to a resist composition for EUV exhibiting E0 | 08-16-2012 |
20120196226 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition including a base component (A), which exhibits changed solubility in a developing solution under the action of acid and can be used in a lithography process that employs light having a wavelength of 193 nm or less as the exposure light source, an acid generator component (B) which generates acid upon exposure, and a polymeric compound (C) having a structural unit (c0) represented by general formula (c0) shown below, wherein the amount of the polymeric compound (C) is less than 25 parts by mass relative to 100 parts by mass of the base component (A). | 08-02-2012 |
20120183900 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND - A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-1). In the formula (a5-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; each of R | 07-19-2012 |
20120183899 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition containing a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, dissolved in an organic solvent (S) which contains an alcohol-based solvent, wherein the base component (A) contains a copolymer (A1) that exhibits increased polarity under the action of acid, and the copolymer (A1) is a copolymer in which a structural unit (a2), which is derived from an acrylate ester in which the hydrogen atom bonded to the carbon atom on the α-position may be substituted with a substituent, and includes a lactone-containing cyclic group, is dispersed uniformly within the copolymer molecule. | 07-19-2012 |
20120164580 | NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition including a base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon exposure, the acid-generator including an acid generator consisting of a compound represented by general formula (b1-1) shown below: | 06-28-2012 |
20120164578 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN - A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid, an acid generator component (B) which generates acid upon exposure, and a nitrogen-containing organic compound component (D), wherein the acid generator component (B) includes an acid generator (B1) containing a compound represented by general formula (b1-1) shown below, and the nitrogen-containing organic compound component (D) includes a compound (D1) represented by general formula (d1) shown below. In the formula, Y | 06-28-2012 |
20120160306 | DIFFUSION AGENT COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR CELL - A diffusion agent composition including an impurity-diffusing component (A); a binder resin (B) that thermally decomposes and disappears below a temperature at which the impurity-diffusing component (A) begins to thermally diffuse; SiO | 06-28-2012 |
20120149916 | NOVEL COMPOUND - A compound represented by general formula (c1) (R | 06-14-2012 |
20120148956 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a nitrogen-containing organic compound (C) containing a compound (C1) represented by general formula (c1) shown below and an acid-generator component (B) which generates acid upon exposure (excluding the compound (C1)) (R | 06-14-2012 |
20120148955 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND - A resist composition including: a base component (A) which exhibits changed solubility in a developing solution under action of acid; a nitrogen-containing organic compound component (C) containing a compound (C1) represented by general formula (c1) shown below; and an acid generator component (B) which generates acid upon exposure, provided that the compound (C1) is excluded from the acid generator component (B): | 06-14-2012 |
20120148953 | Resist composition, and method of forming resist pattern - A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-1). In formula (a5-1), R represents a hydrogen atom, an alkyl group or a halogenated alkyl group, X represents single bond or divalent linking group, W represents a cyclic alkylene group which may include an oxygen atom at arbitrary position, each of R | 06-14-2012 |
20120141940 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THICK FILM, AND METHOD FOR PRODUCING THICK FILM RESIST PATTERN - A chemically amplified positive-type photoresist composition for a thick film capable of forming a thick film resist pattern having superior resolving ability and controllability of dimensions, and being favorable in rectangularity, as well as a method for producing a thick film resist pattern using such a composition. The photoresist composition comprises an acid generator including a cationic moiety and an anionic moiety, and a resin whose alkali solubility increases by the action of an acid. | 06-07-2012 |
20120141682 | COATING APPARATUS, COATING METHOD AND COATING-FILM FORMING APPARATUS - A coating method, which uses a coating apparatus including a rotatable tray having a recessed portion for accommodating a substrate and rotatable together with the substrate, a nozzle for supplying a coating liquid, and an applicator for spreading the coating liquid, includes the steps of placing a substrate into the recessed portion of the tray, positioning the nozzle over a non-recessed portion of the upper surface of the tray, supplying a coating liquid from the nozzle, and forming a coating liquid pool only on the non-recessed portion of the upper surface of the tray, moving the applicator in a horizontal direction while maintaining a certain distance with respect to the upper surface of the substrate for spreading the coating liquid of the coating liquid pool over the entire upper surface of the substrate, and releasing the substrate from the recessed portion of the tray. | 06-07-2012 |
20120135347 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND COMPOUND - There are provided a resist composition, a method of forming a resist pattern using the resist composition, a novel polymeric compound and a compound useful as a monomer for the polymeric compound,
| 05-31-2012 |
20120132359 | ATTACHING DEVICE AND ATTACHING APPARATUS FOR SUPPORTING PLATE, AND ATTACHING METHOD FOR SUPPORTING PLATE - An attaching method for attaching a support plate to a surface of a substrate with an adhesive involves the steps of applying an adhesive to the surface of the substrate, heating and thereafter cooling the substrate, positioning centers of the substrate and the supporting plate to coincide with each other, and forming a layered structure by pushing the supporting plate onto the substrate with the adhesive therebetween in a pressure-reduced atmosphere. In the positioning step, after the supporting late has been placed on the substrate, it is possible to finely adjust the alignment of the supporting plate and a semiconductor wafer when attached because the adhesive is applied to the surface of the substrate, and thereafter the substrate is heated and cooled. | 05-31-2012 |
20120132109 | PAINTABLE DIFFUSING AGENT COMPOSITION - A diffusing agent composition of an aspect of the invention contains: a condensation product (A) made from a starting material that is an alkoxysilane represented by the following general formula (1): | 05-31-2012 |
20120118511 | LAMINATE AND METHOD FOR SEPARATING THE SAME - A laminate including a supporter which transmits infrared; a substrate supported by the supporter; an adhesive layer via which the supporter and the substrate are attached to each other; and a separation layer, positioned on a surface of the supporter to which surface the substrate is attached, and made of a compound having an infrared-absorbing structure. | 05-17-2012 |
20120107744 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND AND ACID GENERATOR - A resist composition containing a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) having a group represented by general formula (b1-1) shown below in the cation moiety. | 05-03-2012 |
20120100487 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND - A resist composition including a base component that generates acid upon exposure and also exhibits increased polarity by action of acid, the base component including a polymeric compound having a structural unit that generates acid upon exposure; a structural unit derived from an acrylate ester, in which a hydrogen atom bonded to a carbon atom on the α-position may be substituted with a substituent, and also includes an acid decomposable group that exhibits increased polarity by action of acid; and a structural unit represented by a particular general formula. | 04-26-2012 |
20120083561 | ADHESIVE COMPOSITION - An adhesive composition of this invention includes a hydrocarbon resin and a solvent for dissolving the hydrocarbon resin, the solvent containing a condensed polycyclic hydrocarbon. Thus, an adhesive composition having excellent product stability is provided. | 04-05-2012 |
20120079983 | COATING DEVICE - Provided is a coating device including: a rotating part which rotatably holds a substrate while the substrate is upright; a cup portion disposed to surround an outer periphery of the substrate held by the rotating part and having an opening which exposes a first surface and a second surface of the substrate; a coating part which includes a nozzle ejecting a liquid material to the first surface and to the second surface of the substrate through the opening; and a cover portion which is provided on the first surface and the second surface sides of the substrate and by which the opening is opened and closed. | 04-05-2012 |
20120077125 | RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING COMPOUND - A resist composition for immersion exposure, including a base component that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component that generates acid upon exposure, and a fluorine-containing compound represented by a general formula (c-1) that is decomposable in an alkali developing solution: | 03-29-2012 |
20120073741 | ADHESIVE COMPOSITION - An adhesive composition for forming an adhesive layer for temporarily fixing a substrate, such as a wafer, to a support when processing the substrate, the adhesive composition including a resin (A) produced by polymerizing a monomer component containing a cycloolefin-based monomer, at least one terpene-based resin, rosin-based resin, or petroleum resin (resin B), and an organic solvent capable of dissolving the resins (A) and (B). The resin (A) has a glass transition point of 60° C. or higher, the resin (B) has a softening point of 80 to 160° C. and a molecular weight of 300 to 3000, and the blending ratio of the resin (A) to the resin (B) is (A):(B)=80:20 to 55:45 (mass ratio). | 03-29-2012 |
20120058430 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR - A positive resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) containing a compound represented by general formula (b1-1) shown below (wherein Z | 03-08-2012 |
20120031443 | CLEANING DEVICE, CLEANING METHOD, AND COMPOSITION - A cleaning device for cleaning a substrate adhering to a support film, including a protective film forming measure for forming a protective film on an exposed surface of the support film, wherein the exposed surface is a portion of a surface of the support film to which a first surface of the substrate adheres, but the substrate does not adheres to the exposed surface; and a cleaning measure for cleaning the substrate by use of a cleaning liquid, the substrate adhering to the support film covered with the protective film. The cleaning device can effectively clean a wafer supported by a dicing tape. | 02-09-2012 |
20120015299 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR - A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) represented by general formula (b1-1) [in the formula, Y | 01-19-2012 |
20120009521 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR - A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below:
| 01-12-2012 |
20120009520 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A positive resist composition including a resin component (A1) having a structural unit (a1) derived from an acrylate ester which may have an atom other than hydrogen or a group bonded to the carbon atom on the α position and containing an acid dissociable, dissolution inhibiting group, and a structural unit (a0) containing an —SO | 01-12-2012 |
20110311913 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A positive resist composition including: a base component (A′) that exhibits increased solubility in an alkali developing solution under action of acid, without including an acid generator component other than the base component (A′), wherein the base component (A′) includes a resin component (A1) having a structural unit (a0-1) represented by general formula (a0-1) shown below and a structural unit (a1) containing an acid dissociable, dissolution inhibiting group: | 12-22-2011 |
20110311912 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A positive resist composition including:
| 12-22-2011 |
20110290178 | COATING DEVICE - Provided is a coating device including: a substrate carrying unit which rotatably holds a substrate while the substrate is upright and is able to dispose the held substrate at a first position and a second position; an application unit which includes a liquid material nozzle ejecting a liquid material to each of first and second surfaces of the substrate disposed at the first position; and a removal unit which includes an accommodation mechanism accommodating a part of the peripheral edge portion of the substrate disposed at the second position and a cleaning liquid ejection mechanism ejecting a cleaning liquid to the peripheral edge portion and removes the liquid material of the peripheral edge portion. | 12-01-2011 |
20110287362 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR - A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) represented by general formula (b1-1) shown below (in the formula, R | 11-24-2011 |
20110269076 | SURFACE MODIFYING MATERIAL, METHOD OF FORMING RESIST PATTERN, AND METHOD OF FORMING PATTERN - A surface modifying material for forming a surface modifying layer provided between a substrate and a resist film, the surface modifying material including an epoxy resin having a weight average molecular weight of 1,000 to 50,000;
| 11-03-2011 |
20110265815 | METHOD OF CLEANING SUPPORT PLATE - The present invention achieves a method of cleaning a support plate according to which, while no waste solution is produced after cleaning the support plate, the support plate can be treated at low cost. The method of cleaning the support plate includes the step of performing an organic substance and metal each adhered to the support plate by causing dry ice particle to hit the support plate, the support plate being a support plate from which a substrate has been stripped. | 11-03-2011 |
20110263110 | FILM-FORMING COMPOSITION - A film-forming composition for use in a coating diffusion method, capable of diffusing a dopant at a higher concentration, and further capable of concomitantly forming a silica-based coating film is provided. A film-forming composition for constituting a diffusion film provided for diffusing a dopant element into a silicon wafer, the film-forming composition including: (A) a polymeric silicon compound; (B) an oxide of the dopant element, or a salt including the dopant element; and (C) porogene. | 10-27-2011 |
20110262872 | METHOD OF FORMING RESIST PATTERN AND RESIST COMPOSITION - There are provided a method of forming a resist pattern in which a resist pattern is formed on top of a substrate by using a chemically amplified resist composition and conducting patterning two or more times, the method being capable of reducing the extent of damage, caused by the second patterning, imposed upon the first resist pattern that is formed by the first patterning; as well as a resist composition that is useful for forming the first resist pattern in this method of forming a resist pattern. The method includes forming of a first resist pattern using a resist composition containing a thermal base generator as a chemically amplified resist composition during first patterning, and then conducting a hard bake for baking the first resist pattern under a bake condition such that a base is generated from the thermal base generator, prior to the second patterning. | 10-27-2011 |
20110262864 | Method of forming resist pattern and negative tone-development resist composition - A method of forming a resist pattern, including: forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent under action of an acid and an acid-generator component (B) which generates an acid upon exposure, conducting exposure of the resist film, and patterning the resist film by a negative tone development using a developing solution containing an organic solvent, wherein the base component (A) includes a resin component (A1) containing a structural unit (a0) derived from an acrylate ester containing an acid decomposable group which generates an alcoholic hydroxy group by the action of acid to thereby exhibit increased hydrophilicity. | 10-27-2011 |
20110259527 | STRIPPING DEVICE AND STRIPPING METHOD - A stripping method for stripping a support plate from a laminate including a substrate and the support plate adhered to the wafer via an adhesive layer, in which the adhesive layer is formed from an adhesive compound soluble in a non-polar solvent or a highly polar solvent; and the stripping method includes the step of supplying the non-polar solvent or the highly polar solvent, so that the non-polar solvent or the highly polar solvent is retained at least on an edge portion of that surface of the laminate which faces the support plate, and on a lateral surface of the laminate. | 10-27-2011 |
20110256484 | METHOD FOR PRODUCING COMB-SHAPED ELECTRODE - To provide a method for producing a comb-shaped electrode capable of precisely carrying a large amount of active materials on a surface of current collectors with a fine shape. The method for producing comb-shaped electrodes | 10-20-2011 |
20110254191 | FILM-FORMING COMPOSITION FOR IMPRINTING, METHOD OF MANUFACTURING A STRUCTURE, AND STRUCTURE - A film-forming composition for imprinting that enables a structure to be obtained after coating the composition on a substrate and pressing a mold thereto with low compression pressure, a method of manufacturing a structure using the film-forming composition for imprinting, and a structure obtained thereby. The film-forming composition for imprinting according to the present invention contains a resin and an organic solvent, in which the organic solvent includes a particular solvent having a boiling point of 100 to 200° C. at ambient pressure. When the structure is manufactured, the film-forming composition for imprinting according to the present invention is coated on a substrate to form a resin layer, and after a mold is pressed against the resin layer, the mold is released from the resin layer. | 10-20-2011 |
20110244399 | METHOD OF FORMING RESIST PATTERN AND NEGATIVE TONE-DEVELOPMENT RESIST COMPOSITION - A method of forming a resist pattern, including: forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent under action of an acid and an acid-generator component (B) which generates an acid upon exposure, conducting exposure of the resist film, and patterning the resist film by a negative tone development using a developing solution containing an organic solvent, wherein the base component (A) includes a resin component (A1) containing a structural unit (a1) derived from an acrylate ester containing an acid decomposable group which exhibits increased hydrophilicity by the action of an acid and a structural unit (a0) derived from an acrylate ester containing an —SO | 10-06-2011 |
20110244392 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND - A positive resist composition including a base component (A′) which exhibits increased solubility in an alkali developing solution under the action of acid and generates acid upon exposure, the base component (A′) including a resin component (A1) having a structural unit (a0-1) represented by general formula (a0-1), a structural unit (a0-2) which generates acid upon exposure and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group (wherein R | 10-06-2011 |
20110240231 | STRIPPING METHOD AND STRIPPING SOLUTION - A method for stripping a wafer from a supporting plate to which the wafer is adhered via an adhesive agent, wherein the supporting plate has a through hole penetrating the supporting plate in a thickness direction thereof, the method including dissolving the adhesive agent with a stripping solution by contacting the stripping solution with the adhesive agent via the through hole. The adhesive agent has a hydrocarbon resin as a viscous component, and the stripping solution is a hydrocarbon-based solvent having a viscosity of 1.3 mPa·s or less and a dissolving rate of 30 nm/sec or greater to dissolve the adhesive agent. | 10-06-2011 |
20110236824 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure and a fluorine-containing polymeric compound (C′) which generates acid upon exposure, the base component (A) having a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, and the fluorine-containing polymeric compound (C′) having a structural unit (c0) which generates acid upon exposure and a structural unit (c1) represented by formula (c1) (wherein R | 09-29-2011 |
20110195573 | CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING WIRING - Provided are a cleaning liquid for lithography that exhibits excellent corrosion suppression performance in relation to ILD materials, and excellent removal performance in relation to a resist film and a bottom antireflective coating film, and a method for forming a wiring using the cleaning liquid for lithography. The cleaning liquid for lithography according to the present invention includes a quaternary ammonium hydroxide, a water soluble organic solvent, water, and an inorganic base. The water soluble organic solvent contains a highly polar solvent having a dipole moment of no less than 3.0 D, a glycol ether solvent and a polyhydric alcohol, and the total content of the highly polar solvent and the glycol ether solvent is no less than 30% by mass relative to the total mass of the liquid for lithography. | 08-11-2011 |
20110195190 | SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, HYDROPHOBILIZATION METHOD, AND HYDROPHOBILIZED SUBSTRATE - Disclosed is a surface treatment liquid which enables simple and efficient hydrophobilization of a substrate and prevention of collapse of a resin pattern or etched pattern. Also disclosed are a surface treatment method using the surface treatment liquid, a hydrophobilization method using the surface treatment liquid, and a hydrophobilized substrate. When a substrate is hydrophobilized, the substrate is coated with a surface treatment liquid containing a silylating agent and a hydrocarbon non-polar solvent. When a pattern is prevented from collapse, the surface of a resin pattern formed on a substrate or etched pattern formed on a substrate by etching is treated using a surface treatment liquid containing a silylating agent and a solvent. | 08-11-2011 |
20110189833 | SILICA-BASED FILM FORMING MATERIAL FOR FORMATION OF AIR GAPS, AND METHOD FOR FORMING AIR GAPS - Provided is a silica-based film forming material for formation of air gaps, the material being capable of forming air gaps without employing a CVD method. A silica-based film forming material for formation of air gaps including (a) a certain siloxane polymer, (b) an alkanolamine, and (c) an organic solvent is used when a silica-based film is formed with a spin coating method. According to this silica-based film forming material for formation of air gaps, air gaps with a great degree of opening can be formed even when coated with a spin coating method, without filling the recessed parts. | 08-04-2011 |
20110165512 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition including a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, an acid-generator component (B) that generates acid upon exposure, and a nitrogen-containing organic compound (D), wherein the acid generator component (B) includes an acid generator (B1) consisting of a compound represented by general formula (b0), and the nitrogen-containing organic compound (D) includes a compound represented by general formula (d1) or general formula (d2) [wherein each of R | 07-07-2011 |