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TOKYO ELECTRON LIMITED

TOKYO, JP

1. 20090291560 FORMING METHOD OF ETCHING MASK, CONTROL PROGRAM AND PROGRAM STORAGE MEDIUM 11-26-2009
2. 20090291549 METAL FILM DECARBONIZING METHOD, FILM FORMING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD 11-26-2009
3. 20090291399 COATING/DEVELOPING APPARATUS AND METHOD - coating/developing apparatus includes a first storage section that stores data comprising correlations of 11-26-2009
4. 20090291198 COATING TREATMENT METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND COATING TREATMENT APPARATUS 11-26-2009
5. 20090289179 MULTI-PLASMA NEUTRAL BEAM SOURCE AND METHOD OF OPERATING 11-26-2009
6. 20090289031 METHOD FOR FORMING MICRO LENSES - includes the step of performing an etching treatment to an object to be processed 11-26-2009
7. 20090286405 SHOWER PLATE, AND PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD USING THE SHOWER PLATE 11-19-2009
8. 20090285984 COATING APPARATUS AND METHOD - coating apparatus includes a driving unit configured to rotate a substrate holding member about a vertical axis to spread 11-19-2009
9. 20090284277 PROBE APPARATUS AND METHOD FOR CORRECTING CONTACT POSITION 11-19-2009
10. 20090284272 PROBE DEVICE AND METHOD OF REGULATING CONTACT PRESSURE BETWEEN OBJECT TO BE INSPECTED AND PROBE 11-19-2009
11. 20090283038 FILM FORMING METHOD AND APPARATUS - film forming method for depositing a thin film on a surface of a substrate mounted on a mounting table disposed in a 11-19-2009
12. 20090277585 PLASMA PROCESSING APPRATUS AND METHOD AND APPARATUS FOR MEASURING DC POTENTIAL 11-12-2009
13. 20090276076 SERVER DEVICE AND PROGRAM - server device is provided with a measurement information storage unit 1201 which can store plural measurement information, i 11-05-2009
14. 20090275201 SUBSTRATE PROCESSING SYSTEM - substrate processing method implemented in a substrate processing system that includes an etching apparatus that carries 11-05-2009
15. 20090269940 METHOD FOR NITRIDING SUBSTRATE AND METHOD FOR FORMING INSULATING FILM 10-29-2009
16. 20090269682 METHOD OF FORMING ETCHING MASK, ETCHING METHOD USING THE ETCHING MASK, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE INCLUDING THE ETCHING METHOD 10-29-2009
17. 20090269494 FILM-FORMING APPARATUS, FILM-FORMING METHOD AND RECORDING MEDIUM 10-29-2009
18. 20090269171 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE TRANSFER METHOD ADOPTED THEREIN 10-29-2009
19. 20090266711 SUBSTRATE PROCESSING APPARATUS - The substrate processing apparatus includes: at least one processing chamber in which a semiconductor wafer is 10-29-2009
20. 20090266487 MICROWAVE INTRODUCTION DEVICE - includes a microwave generator for generating a microwave of a predetermined frequency 10-29-2009
21. 20090265039 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM 10-22-2009
22. 20090265027 SERVER DEVICE AND PROGRAM - server device 12 constituting a group management system includes one or more manufacturing apparatuses 11 for performing a 10-22-2009
23. 20090263975 FILM FORMATION METHOD AND APPARATUS FOR FORMING SILICON-CONTAINING INSULATING FILM DOPED WITH METAL 10-22-2009
24. 20090263577 LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD 10-22-2009
25. 20090258148 METHOD OF PRODUCING CERAMIC SPRAY-COATED MEMBER, PROGRAM FOR CONDUCTING THE METHOD, STORAGE MEDIUM AND CERAMIC SPRAY-COATED MEMBER 10-15-2009
26. 20090258139 COATING PROCESS APPARATUS AND COATING FILM FORMING METHOD 10-15-2009
27. 20090255902 FOCUS RING, PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD 10-15-2009
28. 20090255800 PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND COMPUTER READABLE STORAGE MEDIUM 10-15-2009
29. 20090255324 SEALING STRUCTURE OF PLASMA PROCESSING APPARATUS, SEALING METHOD, AND PLASMA PROCESSING APPARATUS INCLUDING THE SEALING STRUCTURE 10-15-2009
30. 20090253258 SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING METHOD 10-08-2009
31. 20090251163 ALIGNMENT METHOD, TIP POSITION DETECTING DEVICE AND PROBE APPARATUS 10-08-2009
32. 20090250005 REACTION TUBE AND HEAT PROCESSING APPARATUS FOR A SEMICONDUCTOR PROCESS 10-08-2009
33. 20090248341 PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA 10-01-2009
34. 20090248340 APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA 10-01-2009
35. 20090248339 DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA 10-01-2009
36. 20090248192 SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE CONVEYANCE METHOD 10-01-2009
37. 20090246974 METHOD OF FORMING A STRESSED PASSIVATION FILM USING A MICROWAVE-ASSISTED OXIDATION PROCESS 10-01-2009
38. 20090246973 METHOD OF FORMING A STRESSED PASSIVATION FILM USING A NON-IONIZING ELECTROMAGNETIC RADIATION-ASSISTED OXIDATION PROCESS 10-01-2009
39. 20090246971 IN-SITU HYBRID DEPOSITION OF HIGH DIELECTRIC CONSTANT FILMS USING ATOMIC LAYER DEPOSITION AND CHEMICAL VAPOR DEPOSITION 10-01-2009
40. 20090246965 ETCHING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE 10-01-2009
41. 20090246952 METHOD OF FORMING A COBALT METAL NITRIDE BARRIER FILM 10-01-2009
42. 20090246941 DEPOSITION APPARATUS, DEPOSITION SYSTEM AND DEPOSITION METHOD 10-01-2009
43. 20090246723 METHOD AND HEAT TREATMENT APPARATUS FOR UNIFORMLY HEATING A SUBSTRATE DURING A BAKE PROCESS 10-01-2009
44. 20090246718 METHOD OF CREATING A GRADED ANTI-REFLECTIVE COATING 10-01-2009
45. 20090246713 OXYGEN-CONTAINING PLASMA FLASH PROCESS FOR REDUCED MICRO-LOADING EFFECT AND CD BIAS 10-01-2009
46. 20090246406 PLASMA PROCESSING APPARATUS, CHAMBER INTERNAL PART, AND METHOD OF DETECTING LONGEVITY OF CHAMBER INTERNAL PART 10-01-2009
47. 20090246397 RESIST SOLUTION SUPPLY APPARATUS, RESIST SOLUTION SUPPLY METHOD, AND COMPUTER STORAGE MEDIUM 10-01-2009
48. 20090246374 GAS DISTRIBUTION SYSTEM AND METHOD FOR DISTRIBUTING PROCESS GAS IN A PROCESSING SYSTEM 10-01-2009
49. 20090245971 COUPLING MEMBER AND PLASMA PROCESSING APPARATUS 10-01-2009
50. 20090244910 METHOD AND SYSTEM FOR LAMP TEMPERATURE CONTROL IN OPTICAL METROLOGY 10-01-2009
51. 20090243236 ELECTROSTATIC CHUCK AND MANUFACTURING METHOD THEREOF 10-01-2009
52. 20090242791 Two-grid ion energy analyzer and methods of manufacturing and operating 10-01-2009
53. 20090242790 ION ENERGY ANALYZER AND METHODS OF MANUFACTURING AND OPERATING 10-01-2009
54. 20090242545 WAFER THERMOMETER, TEMPERATURE MEASURING DEVICE, HEAT TREATMENT DEVICE AND METHOD FOR MEASURING TEMPERATURE OF HEAT TREATMENT UNIT 10-01-2009
55. 20090242520 PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD 10-01-2009
56. 20090242516 PLASMA ETCHING METHOD AND COMPUTER READABLE STORAGE MEDIUM 10-01-2009
57. 20090242515 PLASMA PROCESSING APPARATUS AND PLASMA ETCHING METHOD 10-01-2009
58. 20090242513 Multi-Layer/Multi-Input/Multi-Output (MLMIMO) Models and Method for Using 10-01-2009
59. 20090242385 METHOD OF DEPOSITING METAL-CONTAINING FILMS BY INDUCTIVELY COUPLED PHYSICAL VAPOR DEPOSITION 10-01-2009
60. 20090242383 APPARATUS AND METHOD FOR RF GROUNDING OF IPVD TABLE 10-01-2009
61. 20090242135 PLASMA PROCESSING APPARATUS - includes: a vacuum-evacuable processing chamber 10-01-2009
62. 20090242134 PLASMA PROCESSING APPARATUS - includes a processing chamber, a lower center electrode mounting thereon a target substrate 10-01-2009
63. 20090242133 ELECTRODE STRUCTURE AND SUBSTRATE PROCESSING APPARATUS 10-01-2009
64. 20090242132 PLASMA PROCESSING APPARATUS AND FEEDER ROD USED THEREIN 10-01-2009
65. 20090242128 PLASMA PROCESSING APPARATUS AND METHOD - plasma processing apparatus includes an radio frequency power supply for applying an RF power for generating a 10-01-2009
66. 20090242127 PLASMA ETCHING APPARATUS AND METHOD, AND COMPUTER-READABLE STORAGE MEDIUM 10-01-2009
67. 20090241995 SUBSTRATE CLEANING METHOD AND APPARATUS - method of removing a film residue from a wafer in a substrate processing system a surface of the wafer is 10-01-2009
68. 20090241992 CLEANING SUBSTRATE AND CLEANING METHOD - cleaning substrate that can prevent a decrease in the operating rate of a substrate processing apparatus 10-01-2009
69. 20090241310 RLSA CVD DEPOSITION CONTROL USING HALOGEN GAS FOR HYDROGEN SCAVENGING 10-01-2009
70. 20090240537 APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED FOR OPERATING TIME BUDGET 09-24-2009
71. 20090237496 SUBSTRATE FOR OBSERVATION AND OBSERVATION SYSTEM 09-24-2009
72. 20090236314 MONO-ENERGETIC NEUTRAL BEAM ACTIVATED CHEMICAL PROCESSING SYSTEM AND METHOD OF USING 09-24-2009
73. 20090236043 PLASMA PROCESSING APPARATUS - includes a processing gas supplying unit for supplying a desired processing gas to a processing space between an upper 09-24-2009
74. 20090236041 SHOWER HEAD AND SUBSTRATE PROCESSING APPARATUS 09-24-2009
75. 20090234687 METHOD OF DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED FOR OPERATING TIME BUDGET 09-17-2009
76. 20090233454 FILM FORMATION APPARATUS FOR SEMICONDUCTOR PROCESS AND METHOD FOR USING SAME 09-17-2009
77. 20090233443 SUBSTRATE MOUNTING TABLE, SUBSTRATE PROCESSING APPARATUS AND TEMPERATURE CONTROL METHOD 09-17-2009
78. 20090230342 GATE VALVE AND SEMICONDUCTOR MANUFACTURING APPARATUS 09-17-2009
79. 20090229759 ANNULAR ASSEMBLY FOR PLASMA PROCESSING, PLASMA PROCESSING APPARATUS, AND OUTER ANNULAR MEMBER 09-17-2009
80. 20090229757 PLASMA PROCESSING APPARATUS - The plasma processing apparatus includes: a chamber including an upper electrode and a lower electrode 09-17-2009
81. 20090229754 SHOWER HEAD AND SUBSTRATE PROCESSING APPARATUS 09-17-2009
82. 20090229753 METHOD FOR MANUFACTURING SHOWER PLATE, SHOWER PLATE MANUFACTURED USING THE METHOD, AND PLASMA PROCESSING APPARATUS INCLUDING THE SHOWER PLATE 09-17-2009
83. 20090228234 TEMPERATURE MEASUREMENT APPARATUS AND METHOD 09-10-2009
84. 20090226077 DEFECT INSPECTION METHOD AND COMPUTER-READABLE STORAGE MEDIUM 09-10-2009
85. 20090221148 PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS AND COMPUTER-READABLE STORAGE MEDIUM 09-03-2009
86. 20090220898 PATTERN FORMING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME 09-03-2009
87. 20090220892 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RESIST COATING AND DEVELOPING SYSTEM 09-03-2009
88. 20090219046 PROBE CARD INCLINATION ADJUSTING METHOD, INCLINATION DETECTING METHOD AND STORAGE MEDIUM STORING A PROGRAM FOR PERFORMING THE INCLINATION DETECTING METHOD 09-03-2009
89. 20090218212 HOLLOW CATHODE DEVICE AND METHOD FOR USING THE DEVICE TO CONTROL THE UNIFORMITY OF A PLASMA PROCESS 09-03-2009
90. 20090218044 MICROWAVE PLASMA PROCESSING APPARATUS, DIELECTRIC WINDOW FOR USE IN THE MICROWAVE PLASMA PROCESSING APPARATUS, AND METHOD FOR MANUFACTURING THE DIELECTRIC WINDOW 09-03-2009
91. 20090215274 Plasma processing apparatus and plasma processing method 08-27-2009
92. 20090215205 SHOWER HEAD STRUCTURE FOR PROCESSING SEMICONDUCTOR 08-27-2009
93. 20090214985 METHOD FOR REDUCING SURFACE DEFECTS ON PATTERNED RESIST FEATURES 08-27-2009
94. 20090214963 SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND SUBSTRATE PROCESSING SYSTEM 08-27-2009
95. 20090214759 SOLUTION TREATMENT APPARATUS AND SOLUTION TREATMENT METHOD 08-27-2009
96. 20090214758 A PROCESSING METHOD FOR PROCESSING A SUBSTRATE PLACED ON A PLACEMENT STAGE IN A PROCESS CHAMBER 08-27-2009
97. 20090214400 PLASMA PROCESSING APPARATUS - Provided is a plasma processing apparatus capable of generating a uniform plasma by preventing a nonuniformity of a 08-27-2009
98. 20090212804 NEEDLE TRACE TRANSFER MEMBER AND PROBE APPARATUS 08-27-2009
99. 20090212803 PROBE APPARATUS, PROBING METHOD, AND STORAGE MEDIUM 08-27-2009
100. 20090212017 PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS 08-27-2009
101. 20090212014 METHOD AND SYSTEM FOR PERFORMING MULTIPLE TREATMENTS IN A DUAL-CHAMBER BATCH PROCESSING SYSTEM 08-27-2009
102. 20090211604 System and Method For Removing Edge-Bead Material 08-27-2009
103. 20090211603 System and Method For Removing Post-Etch Residue 08-27-2009
104. 20090209108 SUBSTRATE PROCESSING METHOD - that can prevent a decrease in the yield of semiconductor devices manufactured from substrates 08-20-2009
105. 20090209105 PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS 08-20-2009
106. 20090208879 SUBSTRATE PROCESSING METHOD, PROGRAM, COMPUTER-READABLE RECORDING MEDIUM, AND SUBSTRATE PROCESSING SYSTEM 08-20-2009
107. 20090208852 PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS 08-20-2009
108. 20090208707 THIN FILM FORMING METHOD AND LAYERED STRUCTURE OF THIN FILM 08-20-2009
109. 20090206253 SUBSTRATE INSPECTION METHOD, SUBSTRATE INSPECTION APPARATUS AND STORAGE MEDIUM 08-20-2009
110. 20090206058 PLASMA PROCESSING APPARATUS AND METHOD, AND STORAGE MEDIUM 08-20-2009
111. 20090206055 PLASMA PROCESSING APPARATUS AND METHOD, AND BAFFLE PLATE OF THE PLASMA PROCESSING APPARATUS 08-20-2009
112. 20090206053 PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS, CONTROL PROGRAM AND COMPUTER-READABLE STORAGE MEDIUM 08-20-2009
113. 20090205684 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM 08-20-2009
114. 20090205678 DEPOSIT REMOVING METHOD AND SUBSTRATE PROCESSING METHOD 08-20-2009
115. 20090205676 CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS 08-20-2009
116. 20090205155 LIQUID PROCESSING APPARATUS - capable of preventing a cleaning solution from remaining on a lifting member of a target object 08-20-2009
117. 20090203227 Film Formation method and apparatus for forming silicon-containing insulating film 08-13-2009
118. 20090203223 SUBSTRATE MOUNTING TABLE FOR PLASMA PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS AND INSULATING FILM FORMING METHOD 08-13-2009
119. 20090203219 PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS AND COMPUTER-READABLE STORAGE MEDIUM 08-13-2009
120. 20090203218 PLASMA ETCHING METHOD AND COMPUTER-READABLE STORAGE MEDIUM 08-13-2009
121. 20090202951 CLEANING APPARATUS AND CLEANING METHOD, COATER/DEVELOPER AND COATING AND DEVELOPING METHOD, AND COMPUTER READABLE STORING MEDIUM 08-13-2009
122. 20090200949 PLASMA PROCESSING SYSTEM WITH LOCALLY-EFFICIENT INDUCTIVE PLASMA COUPLING 08-13-2009
123. 20090199967 MOUNTING STAGE AND PLASMA PROCESSING APPARATUS 08-13-2009
124. 20090198368 MANUFACTURING APPARATUS, INFORMATION PROCESSING METHOD, AND PROGRAM 08-06-2009
125. 20090197423 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS 08-06-2009
126. 20090197420 METHOD FOR ETCHING A SILICON-CONTAINING ARC LAYER TO REDUCE ROUGHNESS AND CD 08-06-2009
127. 20090197410 METHOD OF FORMING TASIN FILM - substrate is disposed in a processing chamber 08-06-2009
128. 20090195263 PROBE APPARATUS, PROBING METHOD AND STORAGE MEDIUM 08-06-2009
129. 20090194503 METHOD FOR ETCHING SILICON-CONTAINING ARC LAYER WITH REDUCED CD BIAS 08-06-2009
130. 20090194264 SUBSTRATE MOUNTING TABLE, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE TEMPERATURE CONTROL METHOD 08-06-2009
131. 20090194238 PLASMA PROCESSING APPARATUS - Provided is a plasma processing apparatus capable of easily processing a top surface of a mounting table to have a smooth 08-06-2009
132. 20090194237 PLASMA PROCESSING SYSTEM - includes: a plasma processing apparatus which processes a substrate in a processing container by turning a processing gas 08-06-2009
133. 20090191722 Film formation method and apparatus for semiconductor process 07-30-2009
134. 20090191721 SEQUENTIAL TANTALUM-NITRIDE DEPOSITION - iPVD system is programmed to deposit uniform material such as barrier material into high aspect ratio nano-size 07-30-2009
135. 20090191716 POLYSILICON LAYER REMOVING METHOD AND STORAGE MEDIUM 07-30-2009
136. 20090191338 Film-Deposition Apparatus and Film-Deposition Method 07-30-2009
137. 20090191337 GAS SUPPLY SYSTEM, SUBSTRATE PROCESSING APPARATUS AND GAS SUPPLY METHOD 07-30-2009
138. 20090191109 EXHAUST STRUCTURE OF FILM-FORMING APPARATUS, FILM-FORMING APPARATUS, AND METHOD FOR PROCESSING EXHAUST GAS 07-30-2009
139. 20090188892 METHOD OF CHECKING SUBSTRATE EDGE PROCESSING APPARATUS 07-30-2009
140. 20090188565 PROCESSING LIQUID MIXING APPARATUS AND METHOD, SUBSTRATE PROCESSING APPARATUS, AND STORAGE MEDIUM 07-30-2009
141. 20090188428 SUBSTRATE PROCESSING APPARATUS - includes a processing vessel, a mounting table for mounting the substrate thereon in the processing vessel 07-30-2009
142. 20090187383 Noise-Reduction Metrology Models - The invention can provide apparatus and methods for processing wafers using Noise-Reduction metrology models that can 07-23-2009
143. 20090186483 ETCHING AMOUNT CALCULATING METHOD, STORAGE MEDIUM, AND ETCHING AMOUNT CALCULATING APPARATUS 07-23-2009
144. 20090186479 Semiconductor processing system including vaporizer and method for using same 07-23-2009
145. 20090186184 COMPONENT OF SUBSTRATE PROCESSING APPARATUS AND METHOD FOR FORMING A FILM THEREON 07-23-2009
146. 20090184729 INSPECTION METHOD AND PROGRAM STORAGE MEDIUM STORING THE METHOD 07-23-2009
147. 20090184234 METHOD FOR ADJUSTING POSITION OF LASER EMITTING DEVICE 07-23-2009
148. 20090183832 SEAL MECHANISM, SEAL TRENCH, SEAL MEMBER, AND SUBSTRATE PROCESSING APPARATUS 07-23-2009
149. 20090183677 TEMPERATURE CONTROL DEVICE AND PROCESSING APPARATUS USING THE SAME 07-23-2009
150. 20090183676 COATING SOLUTION SUPPLY APPARATUS - of the present invention has a closed-type coating solution supply source which stores the coating solution therein 07-23-2009
151. 20090183476 GAS PURIFYING APPARATUS AND SEMICONDUCTOR MANUFACTURING APPARATUS 07-23-2009
152. 20090179003 SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND RECORDING MEDIUM 07-16-2009
153. 20090178714 FLOW CONTROL SYSTEM AND METHOD FOR MULTIZONE GAS DISTRIBUTION 07-16-2009
154. 20090177311 IN-LINE LITHOGRAPHY AND ETCH SYSTEM - The invention can provide a method of processing a wafer using Site-Dependent processing sequences that can 07-09-2009
155. 20090177308 SERVER AND PROGRAM - It is possible to compose a chart by filtering measurement information using a product wafer number in a server device including: 07-09-2009
156. 20090176374 PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS AND STORAGE MEDIUM 07-09-2009
157. 20090173715 LIGHT SOURCE DEVICE, SUBSTRATE TREATING DEVICE, AND SUBSTRATE TREATING METHOD 07-09-2009
158. 20090170335 PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS, CONTROL PROGRAM AND COMPUTER-READABLE STORAGE MEDIUM 07-02-2009
159. 20090170332 PROCESSING GAS SUPPLYING SYSTEM AND PROCESSING GAS SUPPLYING METHOD 07-02-2009
160. 20090165720 SUBSTRATE TREATING APPARATUS - comprising a treatment chamber for housing a substrate a stage on which the substrate is placed within the treatment 07-02-2009
161. 20090163012 METHOD OF FORMING HIGH-DIELECTRIC CONSTANT FILMS FOR SEMICONDUCTOR DEVICES 06-25-2009
162. 20090162759 SUBSTRATE-PROCESSING APPARATUS, SUBSTRATE-PROCESSING METHOD, SUBSTRATE-PROCESSING PROGRAM, AND COMPUTER-READABLE RECORDING MEDIUM RECORDED WITH SUCH PROGRAM 06-25-2009
163. 20090159105 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM 06-25-2009
164. 20090157214 MAINTENANCE SYSTEM, SUBSTRATE PROCESSING APPARATUS, REMOTE OPERATION UNIT AND COMMUNICATION METHOD 06-18-2009
165. 20090156084 LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING LIGHT EMITTING DEVICE 06-18-2009
166. 20090155731 Method and system for reducing line edge roughness during pattern etching 06-18-2009
167. 20090153170 INSPECTION APPARATUS - includes a movable mounting table having a temperature control device an elevation drive unit for vertically moving the mounting 06-18-2009
168. 20090151870 Silicon carbide focus ring for plasma etching system 06-18-2009
169. 20090151638 PLASMA PROCESSING APPARATUS - includes: a lift mechanism which in a process vessel moves down a stage to a standby position when plasma processing is 06-18-2009
170. 20090146145 PROCESSING CONDITION INSPECTION AND OPTIMIZATION METHOD OF DAMAGE RECOVERY PROCESS, DAMAGE RECOVERING SYSTEM AND STORAGE MEDIUM 06-11-2009
171. 20090145553 Suppressor of hollow cathode discharge in a shower head fluid distribution system 06-11-2009
172. 20090145230 Displacement Measurement apparatus for microstructure and displcement measurement method thereof 06-11-2009
173. 20090143894 BEVEL/BACKSIDE POLYMER REMOVING METHOD AND DEVICE, SUBSTRATE PROCESSING APPARATUS AND STORAGE MEDIUM 06-04-2009
174. 20090142929 Method for plasma processing over wide pressure range 06-04-2009
175. 20090142713 SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD 06-04-2009
176. 20090140257 FILM FORMATION METHOD, THIN-FILM TRANSISTOR AND SOLAR BATTERY 06-04-2009
177. 20090138118 SERVER AND PROGRAM - server device includes: an abnormality information output unit for storing a plurality of measurement information 05-28-2009
178. 20090137127 PLASMA ETCHING METHOD AND STORAGE MEDIUM 05-28-2009
179. 20090137125 ETCHING METHOD AND ETCHING APPARATUS - etching method for etching a target layer formed on a surface of a target object 05-28-2009
180. 20090135384 SUBSTRATE PROCESSING APPARATUS - includes a substrate holding stage to hold a substrate having a surface facing up 05-28-2009
181. 20090134894 INSPECTION APPARATUS - includes a movable mounting table for mounting thereon a target object a probe card disposed above the mounting table and a 05-28-2009
182. 20090134518 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE 05-28-2009
183. 20090133839 PLASMA PROCESSING APPARATUS - includes a processing chamber a first radio frequency power supply for outputting a first radio frequency power 05-28-2009
184. 20090133838 Plasma Processor Apparatus - electromagnetic field generating coil included in plasma processing apparatus is realized with a balanced transmission line 05-28-2009
185. 20090133627 SUBSTRATE PROCESSING APPARATUS AND METHOD, AND GAS NOZZLE FOR IMPROVING PURGE EFFICIENCY 05-28-2009
186. 20090132078 CONTROLLING DEVICE FOR SUBSTRATE PROCESSING APPARATUS AND METHOD THEREFOR 05-21-2009
187. 20090130863 Method and system for forming an air gap structure 05-21-2009
188. 20090130843 METHOD OF FORMING LOW-RESISTIVITY RECESSED FEATURES IN COPPER METALLIZATION 05-21-2009
189. 20090128787 SUBSTRATE PROCESSING APPARATUS - enables an efficient collection of a solvent vapor discharged via a nozzle onto a wafer on which a resist pattern is 05-21-2009
190. 20090126871 PLASMA PROCESSING APPARATUS - includes a vacuum evacuable processing chamber 05-21-2009
191. 20090126634 PLASMA PROCESSING APPARATUS - includes a processing chamber, a first electrode for mounting thereon a target substrate in the processing chamber 05-21-2009
192. 20090125276 SUBSTRATE PROCESSING APPARATUS CHECKING METHOD AND STORAGE MEDIUM 05-14-2009
193. 20090120582 SHOWER PLATE AND SUBSTRATE PROCESSING APPARATUS 05-14-2009
194. 20090118872 TEMPERATURE CONTROL DEVICE FOR TARGET SUBSTRATE, TEMPERATURE CONTROL METHOD AND PLASMA PROCESSING APPARATUS INCLUDING SAME 05-07-2009
195. 20090118857 Method of Controlling a Fabrication Process Using an Iso-Dense Bias 05-07-2009
196. 20090117746 GAS SUPPLY DEVICE, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 05-07-2009
197. 20090116938 CHECK VALVE AND SUBSTRATE PROCESSING APPARATUS USING SAME 05-07-2009
198. 20090116040 Method of Deriving an Iso-Dense Bias Using a Hybrid Grating Layer 05-07-2009
199. 20090116010 Apparatus for Deriving an Iso-Dense Bias 05-07-2009
200. 20090115422 JIG FOR DETECTING POSITION - transfer point of a transfer arm is detected accurately and stably by using a position detecting wafer having an 05-07-2009
201. 20090113991 APPARATUS AND METHOD FOR MEASURING THE CONCENTRATION OF ORGANIC GAS 05-07-2009
202. 20090111275 PLASMA ETCHING METHOD AND STORAGE MEDIUM 04-30-2009
203. 20090104781 PLASMA PROCESSING APPARATUS, RING MEMBER AND PLASMA PROCESSING METHOD 04-23-2009
204. 20090104571 Method for air gap formation using UV-decomposable materials 04-23-2009
205. 20090104352 Method of film formation and computer-readable storage medium 04-23-2009
206. 20090101283 PLASMA PROCESSING APPARATUS - plasma etching apparatus a first high frequency for plasma generation and a second high frequency for ion attraction are 04-23-2009
207. 20090099991 METHOD AND SYSTEM FOR PREDICTING PROCESS PERFORMANCE USING MATERIAL PROCESSING TOOL AND SENSOR DATA 04-16-2009
208. 20090098736 DRY-ETCHING METHOD - main etching step is effected in a state shown in FIG 04-16-2009
209. 20090098298 COATER/DEVELOPER, METHOD OF COATING AND DEVELOPING RESIST FILM, AND COMPUTER READABLE STORING MEDIUM 04-16-2009
210. 20090096475 TEST DEVICE - includes a movable mounting table having a temperature controlling mechanism therein 04-16-2009
211. 20090095733 MOUNTING TABLE STRUCTURE AND HEAT TREATMENT APPARATUS 04-16-2009
212. 20090095731 MOUNTING TABLE STRUCTURE AND HEAT TREATMENT APPARATUS 04-16-2009
213. 20090095714 Method and system for low pressure plasma processing 04-16-2009
214. 20090095451 Method and apparatus for temperature change and control 04-16-2009
215. 20090095095 MICROSTRUCTURE INSPECTING APPARATUS, MICROSTRUCTURE INSPECTING METHOD AND SUBSTRATE HOLDING APPARATUS 04-16-2009
216. 20090090852 Neutral beam source and method for plasma heating 04-09-2009
217. 20090088000 METHOD FOR GROWING AN OXYNITRIDE FILM ON A SUBSTRATE 04-02-2009
218. 20090087995 METHOD OF SUBSTRATE TREATMENT, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, SUBSTRATE TREATING APPARATUS, AND RECORDING MEDIUM 04-02-2009
219. 20090087981 VOID-FREE COPPER FILLING OF RECESSED FEATURES FOR SEMICONDUCTOR DEVICES 04-02-2009
220. 20090087932 SUBSTRATE SUPPORTING APPARATUS, SUBSTRATE SUPPORTING METHOD, SEMICONDUCTOR MANUFACTURING APPARATUS AND STORAGE MEDIUM 04-02-2009
221. 20090087559 COATING TREATMENT METHOD, COATING TREATMENT APPARATUS, AND COMPUTER-READABLE STORAGE MEDIUM 04-02-2009
222. 20090087550 SEQUENTIAL FLOW DEPOSITION OF A TUNGSTEN SILICIDE GATE ELECTRODE FILM 04-02-2009
223. 20090085594 PROBE APPARATUS AND PROBING METHOD - probe apparatus includes an imaging unit imaging probes and a first and a second imaging unit imaging the wafer 04-02-2009
224. 20090085211 ELECTRICAL CONTACTS FOR INTEGRATED CIRCUITS AND METHODS OF FORMING USING GAS CLUSTER ION BEAM PROCESSING 04-02-2009
225. 20090084672 METHOD AND SYSTEM FOR ADJUSTING BEAM DIMENSION FOR HIGH-GRADIENT LOCATION SPECIFIC PROCESSING 04-02-2009
226. 20090084502 PLASMA PROCESSING APPARATUS - includes a barrier wall member disposed between a plasma generation chamber and a processing chamber to separate the 04-02-2009
227. 20090084501 Processing system for producing a negative ion plasma 04-02-2009
228. 20090084403 SUBSTRATE CLEANING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE CLEANING METHOD, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM 04-02-2009
229. 20090083013 DETERMINING PROFILE PARAMETERS OF A STRUCTURE FORMED ON A SEMICONDUCTOR WAFER USING A DISPERSION FUNCTION RELATING PROCESS PARAMETER TO DISPERSION 03-26-2009
230. 20090082993 AUTOMATED PROCESS CONTROL OF A FABRICATION TOOL USING A DISPERSION FUNCTION RELATING PROCESS PARAMETER TO DISPERSION 03-26-2009
231. 20090082983 Method and Apparatus for Creating a Spacer-Optimization (S-O) Library 03-26-2009
232. 20090081815 Method and Apparatus for Spacer-Optimization (S-O) 03-26-2009
233. 20090081565 METHOD FOR FORMING ETCHING MASK, CONTROL PROGRAM AND PROGRAM STORAGE MEDIUM 03-26-2009
234. 20090081009 SUBSTRATE TREATMENT APPARATUS - is disclosed 03-26-2009
235. 20090080136 ELECTROSTATIC CHUCK MEMBER - comprises an electrode layer and an electric insulating layer wherein a spray coating layer of an oxide of a Group 3A 03-26-2009
236. 20090078694 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE STAGE USED THEREIN 03-26-2009
237. 20090078196 TREATMENT DEVICE, TREATMENT DEVICE CONSUMABLE PARTS MANAGEMENT METHOD, TREATMENT SYSTEM, AND TREATMENT SYSTEM CONSUMABLE PARTS MANAGEMENT METHOD 03-26-2009
238. 20090076782 GENERATING SIMULATED DIFFRACTION SIGNAL USING A DISPERSION FUNCTION RELATING PROCESS PARAMETER TO DISPERSION 03-19-2009
239. 20090076763 METHOD OF DETECTING EXTRANEOUS MATTER ON HEAT PROCESSING PLATE, HEAT PROCESSING APPARATUS, PROGRAM, AND COMPUTER-READABLE RECORDING MEDIUM WITH PROGRAM RECORDED THEREON 03-19-2009
240. 20090076648 SYSTEM, METHOD AND STORAGE MEDIUM FOR CONTROLLING A PROCESSING SYSTEM 03-19-2009
241. 20090076647 DEVICE FOR CONTROLLING PROCESSING SYSTEM, METHOD FOR CONTROLLING PROCESSING SYSTEM AND COMPUTER-READABLE STORAGE MEDIUM STORED PROCESSING PROGRAM 03-19-2009
242. 20090076640 SYSTEM, METHOD AND STORAGE MEDIUM FOR CONTROLLING A PROCESSING SYSTEM 03-19-2009
243. 20090075491 Method for curing a dielectric film - method of curing a low dielectric constant dielectric film on a substrate is described wherein the dielectric 03-19-2009
244. 20090074632 PLASMA PROCESSING APPARATUS - includes a chamber for carrying out plasma processing inside a top plate made of a dielectric material for sealing the 03-19-2009
245. 20090072327 Semiconductor Storage Device and Method for Manufacturing the Same 03-19-2009
246. 20090065939 METHOD FOR INTEGRATING SELECTIVE RUTHENIUM DEPOSITION INTO MANUFACTURING OF A SEMICONDUCTIOR DEVICE 03-12-2009
247. 20090064760 CONTAINER CLEANLINESS MEASUREMENT APPARATUS AND METHOD, AND SUBSTRATE PROCESSING SYSTEM 03-12-2009
248. 20090063077 AUTOMATED PROCESS CONTROL USING PARAMETERS DETERMINED WITH APPROXIMATION AND FINE DIFFRACTION MODELS 03-05-2009
249. 20090061643 SUBSTRATE PROCESSING METHOD AND RECORDING MEDIUM 03-05-2009
250. 20090061634 Method for metallizing a pattern in a dielectric film 03-05-2009
251. 20090061541 SEMICONDUCTOR FABRICATION SYSTEM, AND FLOW RATE CORRECTION METHOD AND PROGRAM FOR SEMICONDUCTOR FABRICATION SYSTEM 03-05-2009
252. 20090060697 CONTAINER CHANGING SYSTEM AND CONTAINER CHANGING METHOD 03-05-2009
253. 20090060692 SUBSTRATE POSITIONAL MISALIGNMENT DETECTION SYSTEM 03-05-2009
254. 20090060691 SUBSTRATE RECEIVING APPARATUS AND SUBSTRATE RECEIVING METHOD 03-05-2009
255. 20090058446 INSPECTION APPARATUS AND INSPECTION METHOD 03-05-2009
256. 20090057578 METHOD OF PLASMA PARTICLE SIMULATION, STORAGE MEDIUM, PLASMA PARTICLE SIMULATOR AND PLASMA PROCESSING APPARATUS 03-05-2009
257. 20090057574 METHODS FOR MODIFYING FEATURES OF A WORKPIECE USING A GAS CLUSTER ION BEAM 03-05-2009
258. 20090056758 TREATMENT APPARATUS, TREATMENT METHOD AND STORAGE MEDIUM 03-05-2009
259. 20090053904 SUBSTRATE PROCESSING METHOD AND COMPUTER STORAGE MEDIUM 02-26-2009
260. 20090053895 FILM FORMING METHOD OF POROUS FILM AND COMPUTER-READABLE RECORDING MEDIUM 02-26-2009
261. 20090051370 METHOD OF ADJUSTING MOVING POSITION OF TRANSFER ARM AND POSITION DETECTING JIG 02-26-2009
262. 20090050895 SEMICONDUCTOR MANUFACTURING METHOD, SEMICONDUCTOR MANUFACTURING APPARATUS, AND DISPLAY UNIT 02-26-2009
263. 20090050052 PLASMA PROCESSING APPARATUS - Provided is a plasma processing apparatus capable of preventing an unnecessary adhesion film from being deposited in a 02-26-2009
264. 20090049981 MECHANISM FOR VARYING CYLINDER STOP POSITION AND SUBSTRATE PROCESSING APPARATUS INCLUDING SAME 02-26-2009
265. 20090047795 PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE MEDIUM 02-19-2009
266. 20090045514 SEMICONDUCTOR DEVICE CONTAINING AN ALUMINUM TANTALUM CARBONITRIDE BARRIER FILM AND METHOD OF FORMING 02-19-2009
267. 20090044752 PLASMA PROCESSING APPARATUS, ELECTRODE TEMPERATURE ADJUSTMENT DEVICE AND ELECTRODE TEMPERATURE ADJUSTMENT METHOD 02-19-2009
268. 20090043419 SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, SEALED CONTAINER STORING APPARATUS, PROGRAM FOR IMPLEMENTING THE SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM STORING THE PROGRAM 02-12-2009
269. 20090042398 Method for etching low-k material using an oxide hard mask 02-12-2009
270. 20090042397 COPPER RE-DEPOSITION PREVENTING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND SUBSTRATE PROCESSING APPARATUS 02-12-2009
271. 20090042384 SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND TARGET SUBSTRATE PROCESSING SYSTEM 02-12-2009
272. 20090041950 METHOD AND SYSTEM FOR IMPROVING SIDEWALL COVERAGE IN A DEPOSITION SYSTEM 02-12-2009
273. 20090041926 COATING AND DEVELOPING APPARATUS, SUBSTRATE PROCESSING METHOD AND COMPUTER-READABLE RECORDING MEDIUM 02-12-2009
274. 20090039908 MICROSTRUCTURE INSPECTING APPARATUS AND MICROSTRUCTURE INSPECTING METHOD 02-12-2009
275. 20090039903 Contact load measuring apparatus and inspecting apparatus 02-12-2009
276. 20090039518 Method for forming a damascene structure 02-12-2009
277. 20090037699 APPARATUS AND METHOD FOR PROCESSING SEMICONDUCTOR 02-05-2009
278. 20090037015 METHOD AND SYSTEM FOR INCREASING THROUGHPUT DURING LOCATION SPECIFIC PROCESSING OF A PLURALITY OF SUBSTRATES 02-05-2009
279. 20090035950 NITRIDING METHOD OF GATE OXIDE FILM - substrate processing method comprises the step of forming an oxide film on a silicon substrate surface 02-05-2009
280. 20090035466 RUTHENIUM FILM FORMATION METHOD AND COMPUTER READABLE STORAGE MEDIUM 02-05-2009
281. 20090035463 THERMAL PROCESSING SYSTEM AND METHOD FOR FORMING AN OXIDE LAYER ON SUBSTRATES 02-05-2009
282. 20090033908 JIG FOR DETECTING POSTION - position alignment of a transfer point of a transfer arm is performed by using a position detecting wafer capable of being 02-05-2009
283. 20090032950 FILM FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE, PROGRAM AND RECORDING MEDIUM 02-05-2009
284. 20090032725 APPARATUS AND METHODS FOR TREATING A WORKPIECE USING A GAS CLUSTER ION BEAM 02-05-2009
285. 20090032495 Method for etching metal nitride with high selectivity to other materials 02-05-2009
286. 20090029564 PLASMA TREATMENT APPARATUS AND PLASMA TREATMENT METHOD 01-29-2009
287. 20090029557 PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS AND STORAGE MEDIUM 01-29-2009
288. 20090029046 SUBSTRATE PROCESSING APPARATUS, METHOD FOR PROCESSING SUBSTRATE, AND STORAGE MEDIUM 01-29-2009
289. 20090028672 SUBSTRATE TRANSFER MODULE AND SUBSTRATE PROCESSING SYSTEM 01-29-2009
290. 20090026171 PROCESSING METHOD - multichamber-type processing apparatus and processing method using same in which a substrate is reliably neutralized without being 01-29-2009
291. 20090026170 PLASMA PROCESSING APPARATUS AND METHOD OF PLASMA DISTRIBUTION CORRECTION 01-29-2009
292. 20090025637 SUBSTRATE TREATMENT APPARATUS - of the present invention includes: a holding means for rotatably holding a substrate to be treated 01-29-2009
293. 20090025631 GAS-TIGHT MODULE AND EXHAUST METHOD THEREFOR 01-29-2009
294. 20090025552 GAS PURIFICATION APPARATUS AND METHOD - gas purification apparatus capable of removing fine particles of substantially any size without lowering the 01-29-2009
295. 20090022946 Membrane Structure and Method for Manufacturing the Same 01-22-2009
296. 20090021704 COATING/DEVELOPING APPARATUS AND OPERATION METHOD THEREOF 01-22-2009
297. 20090020228 PLASMA PROCESSING APPARATUS AND PLASMA GENERATION CHAMBER 01-22-2009
298. 20090016860 SUBSTRATE CONVEY PROCESSING DEVICE, TROUBLE COUNTERMEASURE METHOD IN SUBSTRATE CONVEY PROCESSING DEVICE, AND TROUBLE COUNTERMEASURES PROGRAM IN SUBSTRATE CONVEY PROCESSING DEVICE 01-15-2009
299. 20090014414 SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM, AND COMPUTER-READABLE STORAGE MEDIUM 01-15-2009
300. 20090014125 SUBSTRATE PROCESSING SYSTEM AND METHOD - substrate processing system includes a resist pattern forming apparatus including modules each configured to 01-15-2009
301. 20090013932 SUBSTRATE PROCESSING APPARATUS - of the present invention includes a holding means for rotatably holding a substrate 01-15-2009
302. 20090013927 STAGE APPARATUS AND COATING TREATMENT DEVICE 01-15-2009
303. 20090011602 Film Forming Method of Amorphous Carbon Film and Manufacturing Method of Semiconductor Device Using the Same 01-08-2009
304. 20090010525 METHOD AND APPARATUS FOR DETECTING POSITIONS OF ELECTRODE PADS 01-08-2009
305. 20090008381 TEMPERATURE SETTING METHOD OF THERMAL PROCESSING PLATE, TEMPERATURE SETTING APPARATUS OF THERMAL PROCESSING PLATE, PROGRAM, AND COMPUTER-READABLE RECORDING MEDIUM RECORDING PROGRAM THEREON 01-08-2009
306. 20090008034 PLASMA PROCESSING APPARATUS - plasma generation chamber and a processing chamber are isolated from each other by a barrier wall member disposed between 01-08-2009
307. 20090002011 INSPECTING METHOD AND STORAGE MEDIUM FOR STORING PROGRAM OF THE METHOD 01-01-2009
308. 20090002008 Inspection Method, Inspection Apparatus and Control Program 01-01-2009
309. 20090001046 SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND RECORDING MEDIUM 01-01-2009
310. 20090000743 SUBSTRATE PROCESSING APPARATUS AND SHOWER HEAD 01-01-2009
311. 20080315904 METHOD FOR REGISTERING PROBE CARD AND A STORAGE MEDIUM STORING PROGRAM THEREOF 12-25-2008
312. 20080314564 TEMPERATURE CONTROL DEVICE - controls the temperature of a controlled object by circulating a fluid in a temperature adjustment unit arranged near the 12-25-2008
313. 20080314523 GAS SUPPLY MECHANISM AND SUBSTRATE PROCESSING APPARATUS 12-25-2008
314. 20080311755 Method for treating a dielectric film to reduce damage 12-18-2008
315. 20080311688 Method and Apparatus for Creating a Gate Optimization Evaluation Library 12-18-2008
316. 20080311687 Method and Apparatus for Optimizing a Gate Channel 12-18-2008
317. 20080308409 EMBEDDED MULTI-INDUCTIVE LARGE AREA PLASMA SOURCE 12-18-2008
318. 20080308230 PLASMA PROCESSING APPARATUS - 1 in which a substrate W is mounted on a mounting table 11 in a processing chamber 10 and processing gas supplied in the 12-18-2008
319. 20080306615 CONTROL DEVICE OF SUBSTRATE PROCESSING APPARATUS AND CONTROL PROGRAM THEREFOR 12-11-2008
320. 20080304543 TEMPERATURE MEASURING APPARATUS AND TEMPERATURE MEASURING METHOD 12-11-2008
321. 20080303744 PLASMA PROCESSING SYSTEM, ANTENNA, AND USE OF PLASMA PROCESSING SYSTEM 12-11-2008
322. 20080301972 EVACUATION METHOD AND STORAGE MEDIUM - evacuation method which can reduce evacuation time without causing moisture-related problems 12-11-2008
323. 20080299728 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 12-04-2008
324. 20080295964 EXHAUST ASSEMBLY FOR A PLASMA PROCESSING SYSTEM 12-04-2008
325. 20080292973 Method for etching using a multi-layer mask 11-27-2008
326. 20080291467 DETERMINING ONE OR MORE PROFILE PARAMETERS OF A PHOTOMASK COVERED BY A PELLICLE 11-27-2008
327. 20080291429 AUTOMATED PROCESS CONTROL USING PARAMETERS DETERMINED FROM A PHOTOMASK COVERED BY A PELLICLE 11-27-2008
328. 20080290886 PROBE APPARATUS - prove apparatus includes a first and a second loading port for mounting therein two carriers facing each other 11-27-2008
329. 20080290298 METHOD AND SYSTEM FOR TREATING AN INTERIOR SURFACE OF A WORKPIECE USING A CHARGED PARTICLE BEAM 11-27-2008
330. 20080286491 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 11-20-2008
331. 20080284989 Developing method and developing unit - developing method for performing developing treatment of a substrate by supplying a developing solution onto a 11-20-2008
332. 20080284455 PROBE APPARATUS - includes a load port for mounting therein a carrier having therein a plurality of substrates 11-20-2008
333. 20080284020 SEMICONDUCTOR CONTACT STRUCTURE CONTAINING AN OXIDATION-RESISTANT DIFFUSION BARRIER AND METHOD OF FORMING 11-20-2008
334. 20080283515 TEMPERATURE CONTROL FOR PERFORMING HEAT PROCESS IN COATING/DEVELOPING SYSTEM FOR RESIST FILM 11-20-2008
335. 20080282979 METHOD AND SYSTEM FOR INTRODUCING PROCESS FLUID THROUGH A CHAMBER COMPONENT 11-20-2008
336. 20080280536 SURFACE TREATMENT METHOD - that enables a surface of an electrostatic chuck to be smoothed so as to improve the efficiency of heat transfer between the 11-13-2008
337. 20080280054 COATING FILM FORMING APPARATUS, USE OF COATING FILM FORMING APPARATUS, AND RECORDING MEDIUM 11-13-2008
338. 20080277062 Plasma Processor - This invention includes a first filter connected between a susceptor and ground and having a variable impedance 11-13-2008
339. 20080274624 METHOD FOR DEPOSITING TITANIUM NITRIDE FILMS FOR SEMICONDUCTOR MANUFACTURING 11-06-2008
340. 20080274616 METHOD FOR DEPOSITING TITANIUM NITRIDE FILMS FOR SEMICONDUCTOR MANUFACTURING 11-06-2008
341. 20080274370 Method for Forming Insulation Film - process involving the formation of an insulating film on a substrate for an electronic device 11-06-2008
342. 20080274288 VACUUM PROCESSING APPARATUS AND METHOD - gas exhaust unit evacuates the inside of a vacuum transfer chamber at a constant exhaust rate 11-06-2008
343. 20080273893 SUBSTRATE TRANSFER MEMBER CLEANING METHOD, SUBSTRATE TRANSFER APPARATUS, AND SUBSTRATE PROCESSING SYSTEM 11-06-2008
344. 20080269937 SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM, AND COMPUTER-READABLE STORAGE MEDIUM 10-30-2008
345. 20080267741 SUBSTRATE ATTRACTING DEVICE AND SUBSTRATE TRANSFER APPARATUS 10-30-2008
346. 20080267619 DEVELOPING APPARATUS, DEVELOPING METHOD, COATING AND DEVELOPING SYSTEM AND STORAGE MEDIUM 10-30-2008
347. 20080266532 COATER/DEVELOPER, COATING/DEVELOPING METHOD, AND STORAGE MEDIUM 10-30-2008
348. 20080261406 ETCHING METHOD AND SEMICONDUCTOR DEVICE FABRICATION METHOD 10-23-2008
349. 20080257537 TEMPERATURE CONTROL METHOD, TEMPERATURE CONTROL APPARATUS AND HIGH/LOW TEMPERATURE PROCESSING SYSTEM 10-23-2008
350. 20080257498 PLASMA PROCESSING APPARATUS - includes a chamber 11 for confining a plasma therein 10-23-2008
351. 20080257496 TEMPERATURE SETTING METHOD FOR THERMAL PROCESSING PLATE, TEMPERATURE SETTING APPARATUS FOR THERMAL PROCESSING PLATE, AND COMPUTER-READABLE STORAGE MEDIUM 10-23-2008
352. 20080257495 TEMPERATURE SETTING METHOD FOR THERMAL PROCESSING PLATE, TEMPERATURE SETTING APPARATUS FOR THERMAL PROCESSING PLATE, AND COMPUTER-READABLE STORAGE MEDIUM 10-23-2008
353. 20080257494 SUBSTRATE PROCESSING APPARATUS - capable of rapidly raising and lowering the processing temperature of a substrate 10-23-2008
354. 20080246125 Semiconductor device and method for manufacturing semiconductor device 10-09-2008
355. 20080243295 Method and apparatus for creating a site-dependent evaluation library 10-02-2008
356. 20080242116 Method for forming strained silicon nitride films and a device containing such films 10-02-2008
357. 20080242113 FILM FORMING METHOD OF HIGH-K DIELECTRIC FILM 10-02-2008
358. 20080242109 METHOD FOR GROWING A THIN OXYNITRIDE FILM ON A SUBSTRATE 10-02-2008
359. 20080242088 METHOD OF FORMING LOW RESISTIVITY COPPER FILM STRUCTURES 10-02-2008
360. 20080242086 PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS 10-02-2008
361. 20080242077 Strained metal silicon nitride films and method of forming 10-02-2008
362. 20080241971 Method and apparatus for performing a site-dependent dual patterning procedure 10-02-2008
363. 20080241970 Method and apparatus for performing a site-dependent dual damascene procedure 10-02-2008
364. 20080241778 APPARATUS AND METHOD FOR PREDICTIVE TEMPERATURE CORRECTION DURING THERMAL PROCESSING 10-02-2008
365. 20080241763 METHOD OF FORMING A DUAL DAMASCENE STRUCTURE UTILIZING A DEVELOPABLE ANTI-REFLECTIVE COATING 10-02-2008
366. 20080241715 SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND COMPUTER READABLE STORAGE MEDIUM 10-02-2008
367. 20080241555 Strained metal nitride films and method of forming 10-02-2008
368. 20080241403 COATING AND DEVELOPING SYSTEM, COATING AND DEVELOPING METHOD AND STORAGE MEDIUM 10-02-2008
369. 20080241402 COATING AND DEVELOPING SYSTEM, COATING AND DEVELOPING METHOD AND STORAGE MEDIUM 10-02-2008
370. 20080241400 VACUUM ASSIST METHOD AND SYSTEM FOR REDUCING INTERMIXING OF LITHOGRAPHY LAYERS 10-02-2008
371. 20080241388 Strained metal silicon nitride films and method of forming 10-02-2008
372. 20080241385 Method of Forming Thin Film, Thin Film Forming Apparatus, Program and Computer-Readable Information Recording Medium 10-02-2008
373. 20080241381 METHOD FOR PRE-CONDITIONING A PRECURSOR VAPORIZATION SYSTEM FOR A VAPOR DEPOSITION PROCESS 10-02-2008
374. 20080241380 METHOD FOR PERFORMING A VAPOR DEPOSITION PROCESS 10-02-2008
375. 20080241377 VAPOR DEPOSITION SYSTEM AND METHOD OF OPERATING 10-02-2008
376. 20080241357 METHOD FOR HEATING A SUBSTRATE PRIOR TO A VAPOR DEPOSITION PROCESS 10-02-2008
377. 20080241354 APPARATUS AND METHODS FOR CURING A LAYER BY MONITORING GAS SPECIES EVOLVED DURING BAKING 10-02-2008
378. 20080241016 PLASMA PROCESSING SYSTEM, PLASMA MEASUREMENT SYSTEM, PLASMA MEASUREMENT METHOD, AND PLASMA CONTROL SYSTEM 10-02-2008
379. 20080240948 DEVICE FOR CONTAINING CATASTROPHIC FAILURE OF A TURBOMOLECULAR PUMP 10-02-2008
380. 20080240910 TURBO-MOLECULAR PUMP, SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR SUPPRESSING ATTACHMENT OF DEPOSITIONS TO TURBO-MOLECULAR PUMP 10-02-2008
381. 20080240905 EXHAUST PUMP, COMMUNICATING PIPE, AND EXHAUST SYSTEM 10-02-2008
382. 20080240891 TRANSFER AND INSPECTION DEVICES OF OBJECT TO BE INSPECTED 10-02-2008
383. 20080239937 Mitigation of Interference and Crosstalk in Communications Systems 10-02-2008
384. 20080239691 THERMALLY CONDUCTIVE SHEET AND SUBSTRATE MOUNTING DEVICE INCLUDING SAME 10-02-2008
385. 20080239259 HEAT TREATMENT APPARATUS AND METHODS FOR THERMALLY PROCESSING A SUBSTRATE USING A PRESSURIZED GASEOUS ENVIRONMENT 10-02-2008
386. 20080238463 PROBE APPARATUS, PROBING METHOD AND STORAGE MEDIUM 10-02-2008
387. 20080238455 PROBING METHOD, PROBE APPARATUS AND STORAGE MEDIUM 10-02-2008
388. 20080238440 MEASURING SYSTEM - measuring an impedance of an object to be measured including an impedance measuring instrument 10-02-2008
389. 20080237860 INTERCONNECT STRUCTURES CONTAINING A RUTHENIUM BARRIER FILM AND METHOD OF FORMING 10-02-2008
390. 20080237859 DIFFUSION BARRIER FOR INTEGRATED CIRCUITS FORMED FROM A LAYER OF REACTIVE METAL AND METHOD OF FABRICATION 10-02-2008
391. 20080237492 METHODS AND PROCESSING SYSTEMS FOR USING A GAS CLUSTER ION BEAM TO OFFSET SYSTEMATIC NON-UNIFORMITIES IN WORKPIECES PROCESSED IN A PROCESS TOOL 10-02-2008
392. 20080237491 APPARATUS AND METHODS FOR SYSTEMATIC NON-UNIFORMITY CORRECTION USING A GAS CLUSTER ION BEAM 10-02-2008
393. 20080237214 METHODS AND HEAT TREATMENT APPARATUS FOR UNIFORMLY HEATING A SUBSTRATE DURING A BAKE PROCESS 10-02-2008
394. 20080237182 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 10-02-2008
395. 20080237031 PLASMA PROCESSING APPARATUS, RADIO FREQUENCY GENERATOR AND CORRECTION METHOD THEREFOR 10-02-2008
396. 20080237030 SURFACE PROCESSING METHOD FOR MOUNTING STAGE 10-02-2008
397. 20080236754 PLASMA PROCESSING APPARATUS - which generates a plasma by a radio frequency discharge in a processing chamber 10-02-2008
398. 20080236752 PLASMA PROCESSING APPARATUS - capable of over a prolonged period of time controlling a decrease in the value of a DC current flowing within an 10-02-2008
399. 20080236750 PLASMA PROCESSING APPARATUS - includes a processing chamber a first electrode and a second electrode attached to the processing chamber via an insulator 10-02-2008
400. 20080236749 PLASMA PROCESSING APPARATUS - includes a processing chamber a first electrode and a second electrode disposed to face each other 10-02-2008
401. 20080236747 GAS ANALYZING APPARATUS AND SUBSTRATE PROCESSING SYSTEM 10-02-2008
402. 20080236746 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE MOUNTING STAGE ON WHICH FOCUS RING IS MOUNTED 10-02-2008
403. 20080236634 SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE CLEANING APPARATUS 10-02-2008
404. 20080236629 CLEANING METHOD FOR TURBO MOLECULAR PUMP 10-02-2008
405. 20080236493 PLASMA PROCESSING APPARATUS - performs a plasma processing on a substrate to be processed by generating plasma between a first electrode and a second 10-02-2008
406. 20080236492 PLASMA PROCESSING APPARATUS - comprising an evacuable processing chamber a first electrode disposed in the processing chamber via an insulating body and 10-02-2008
407. 20080236491 MULTIFLOW INTEGRATED ICP SOURCE - Different gases are separately exposed to RF energy in different zones in inlets to a processing chamber 10-02-2008
408. 20080233766 ASHING METHOD AND APPARATUS THEREFOR - ashing method of a target substrate is applied after plasma-etching a part of a low-k film by using a patterned 09-25-2008
409. 20080233757 PLASMA PROCESSING METHOD - for processing a target substrate uses a plasma processing apparatus which includes a vacuum evacuable processing vessel for 09-25-2008
410. 20080233754 SUBSTRATE PERIPHERAL FILM-REMOVING APPARATUS AND SUBSTRATE PERIPHERAL FILM-REMOVING METHOD 09-25-2008
411. 20080233269 APPARATUS AND METHODS FOR APPLYING A LAYER OF A SPIN-ON MATERIAL ON A SERIES OF SUBSTRATES 09-25-2008
412. 20080231301 INSPECTION APPARATUS - includes a mounting table movable in X and Y directions and an alignment mechanism which performs an alignment of a target object 09-25-2008
413. 20080231298 INSPECTION APPARATUS AND METHOD - inspection apparatus for inspecting electrical characteristics of an inspection target object includes a movable 09-25-2008
414. 20080230866 RFID TEMPERATURE SENSING WAFER, SYSTEM AND METHOD 09-25-2008
415. 20080230854 SEMICONDUCTOR DEVICE CONTAINING CRYSTALLOGRAPHICALLY STABILIZED DOPED HAFNIUM ZIRCONIUM BASED MATERIALS 09-25-2008
416. 20080230714 APPARATUS AND METHODS OF FORMING A GAS CLUSTER ION BEAM USING A LOW-PRESSURE SOURCE 09-25-2008
417. 20080230534 BAKE PLATE LID CLEANER AND CLEANING METHOD 09-25-2008
418. 20080230519 METHOD AND SYSTEM FOR DRY ETCHING A METAL NITRIDE 09-25-2008
419. 20080230371 METHOD AND APPARATUS FOR EXTENDING CHAMBER COMPONENT LIFE IN A SUBSTRATE PROCESSING SYSTEM 09-25-2008
420. 20080230181 PLASMA PROCESSING APPARATUS AND STRUCTURE THEREIN 09-25-2008
421. 20080230180 Processing Equipment for Object to be Processed 09-25-2008
422. 20080230096 SUBSTRATE CLEANING DEVICE AND SUBSTRATE PROCESSING APPARATUS 09-25-2008
423. 20080228308 CRITICAL DIMENSION UNIFORMITY OPTIMIZATION 09-18-2008
424. 20080227227 DYNAMIC TEMPERATURE BACKSIDE GAS CONTROL FOR IMPROVED WITHIN-SUBSTRATE PROCESS UNIFORMITY 09-18-2008
425. 20080226518 SUBSTRATE PROCESSING APPARATUS - includes: a processing chamber for accommodating and processing a target substrate therein 09-18-2008
426. 20080224364 METHOD FOR FLEXING A SUBSTRATE DURING PROCESSING 09-18-2008
427. 20080223825 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM 09-18-2008
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