Nissan Chemical Industries, Ltd. Patent applications |
Patent application number | Title | Published |
20160141507 | ANILINE DERIVATIVE, CHARGE-TRANSPORTING VARNISH AND ORGANIC ELECTROLUMINESCENT DEVICE - Provided is an aniline derivative represented by formula (1). | 05-19-2016 |
20160139509 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUBSTITUTED CROSSLINKABLE COMPOUND - A resist underlayer film for use in lithography process which generates less sublimate, has excellent embeddability at the time of applying onto a substrate having a hole pattern, and has high dry etching resistance, wiggling resistance and heat resistance, etc. A resist underlayer film-forming composition including a resin and a crosslinkable compound of Formula (1) or Formula (2): | 05-19-2016 |
20160130425 | SILICA-CONTAINING RESIN COMPOSITION AND METHOD FOR PRODUCING SAME, AND MOLDED ARTICLE PRODUCED FROM SILICA-CONTAINING RESIN COMPOSITION - A silica-containing resin composition, characterized by containing a resin and silica particles in an amount of 5 to 300 parts by mass, with respect to 100 parts by mass of the resin, wherein the silica particles satisfy the following requirements (a) to (c): (a) the silica particles have a specific surface area, as determined through a nitrogen absorption method, of 20 to 500 m | 05-12-2016 |
20160130193 | PRODUCTION METHOD FOR OPTICALLY ACTIVE ALCOHOL COMPOUND - A method for stereoselectively producing an optically active alcohol compound. The optically active alcohol compound of Formula (8) can be produced in high yield and high selectivity from the compound of Formula (3), and the production method that is useful industrially and the intermediates therefor can be provided. In formulae, R | 05-12-2016 |
20160130152 | SILICA SOL AND METHOD FOR PRODUCING SILICA SOL - A silica sol which has excellent moisture absorption resistance and stability as well as high purity and which does not cause coloring of a solvent or a resin to which the silica sol has been applied. The silica sol contains high-purity silica particles, water and/or a liquid organic medium serving as a dispersion medium, and an organic base compound, the silica particles being dispersed in the dispersion medium, wherein the silica particles satisfy the following requirements (a) to (c): (a) the silica particles have a specific surface area, as determined through a nitrogen absorption method, of 20 to 500 m | 05-12-2016 |
20160129119 | DISPERSION AND METHOD FOR FORMING HYDROGEL - An object is to provide dispersion containing lipid peptide type compound useful as low molecular weight gelator, such as lipid dipeptide and lipid tripeptide, and dissolution accelerator capable of dissolving the lipid peptide type compound at lower temperature and more easily. It is also an object to provide dispersion that can form hydrogel by simpler method and under milder condition (low temperature) and from which gel can be obtained as gel having high thermal stability, and provide method for forming the gel. Dispersion including: a lipid peptide type compound in which peptide portion formed by repetition of at least two or more identical or different amino acids is bonded to lipid portion including C | 05-12-2016 |
20160108037 | HETEROCYCLIC AMIDE COMPOUND - The present invention provides a heterocyclic amide compound of Formula (1), and an agricultural chemical containing it, particularly a herbicide: | 04-21-2016 |
20160102102 | TRICYCLIC HETEROCYCLIC COMPOUNDS AND JAK INHIBITORS - This disclosure relates to novel tricyclic pyrimidine compounds and tricyclic pyridine compounds having JAK inhibitory activities. A tricyclic heterocyclic compound represented by the formula (I | 04-14-2016 |
20160087220 | TRIPHENYLAMINE DERIVATIVE AND USE THEREFOR - A triphenylamine derivative represented by formula (1) exhibits good solubility in an organic solvent and allows an organic EL element having excellent luminance characteristics to be achieved when formed into a thin film and applied to a positive hole injection layer. | 03-24-2016 |
20160024010 | CRYSTALLINE FORMS OF PITAVASTATIN CALCIUM - The present invention is directed to new crystalline forms of Pitavastatin hemicalcium salt, referred to hereinafter as polymorphic Forms A, B, C, D, E and F, as well as the amorphous form. Furthermore, the present invention is directed to processes for the preparation of these crystalline forms and the amorphous form and pharmaceutical compositions comprising these crystalline forms or the amorphous forms. | 01-28-2016 |
20160017145 | FILM-FORMING COMPOSITION - A film-forming composition that contains a tricarbonyl-benzene hyperbranched-polymer cross-linker and a triazine-containing hyperbranch, as shown for example in the formula, can form a thin film that excels in terms of hardness and heat tolerance and exhibits a reduced decrease in index of refraction despite the addition of the cross-linker. | 01-21-2016 |
20160005975 | CHARGE-TRANSPORTING VARNISH - A charge-transporting varnish including charge-transporting material comprising N,N′-diaryl benzidine derivatives represented by formula (1), a charge-accepting dopant comprising heteropoly acid, and an organic solvent. | 01-07-2016 |
20160005972 | CHARGE-TRANSPORTING VARNISH - Provided is a charge-transporting varnish which includes a charge-transporting material including fluorine atoms, a charge-transporting material not including fluorine atoms, a dopant material comprising heteropoly acid, and an organic solvent, said charge-transporting material including fluorine atoms being a polymer of weight-average 1,000 to 200,000 molecular weight obtained by condensing a triarylamine compound, an aryl aldehyde compound including fluorine atoms, and a fluorine derivative having a carbonyl group, and said charge-transporting material not including fluorine atoms being an oligoaniline compound. The charge-transporting varnish provides a thin film which, even in a case of being used as a single layer in contact with and in between an anode and a luminescent layer, is capable of achieving an organic EL element having superior luminance characteristics and durability. | 01-07-2016 |
20150368245 | TRICYCLIC PYRROLOPYRIDINE COMPOUND, AND JAK INHIBITOR - To provide a novel tricyclic pyrrolopyridine compound having a JAK inhibitory activity and useful for prevention, treatment and/or improvement of particularly autoimmune diseases, inflammatory diseases and allergic diseases. | 12-24-2015 |
20150361257 | METHOD FOR PRODUCING SUBSTRATE HAVING PATTERN AND RESIN COMPOSITION FOR HYDROFLUORIC ACID ETCHING - The method of the invention for producing a substrate having a pattern includes a step of forming a resist film by applying, onto a substrate, a composition containing a resin as component (A), the resin being formed through reaction between a polyol (a1) and a cross-linking agent (a2), the polyol (a1) being selected from among a polybutadiene polyol, a hydrogenated polybutadiene polyol, a polyisoprene polyol, and a hydrogenated polyisoprene polyol, and a step of patterning, through etching, the substrate on which the resist film has been formed. | 12-17-2015 |
20150322219 | BOTTOM LAYER FILM-FORMATION COMPOSITION OF SELF-ORGANIZING FILM CONTAINING POLYCYCLIC ORGANIC VINYL COMPOUND - An underlayer film-forming composition for a self-assembled film having a polymer including 0.2% by mole or more of a unit structure of a polycyclic aromatic vinyl compound relative to all unit structures of the polymer. The polymer includes 20% by mole or more of a unit structure of an aromatic vinyl compound relative to all the unit structures of the polymer and includes 1% by mole or more of a unit structure of the polycyclic aromatic vinyl compound relative to all the unit structures of the aromatic vinyl compound. The aromatic vinyl compound includes an optionally substituted vinylnaphthalene, acenaphthylene, or vinylcarbazole, and the polycyclic aromatic vinyl compound is vinylnaphthalene, acenaphthylene, or vinylcarbazole. The aromatic vinyl compound includes an optionally substituted styrene and an optionally substituted vinylnaphthalene, acenaphthylene, or vinylcarbazole, and the polycyclic aromatic vinyl compound is vinylnaphthalene, acenaphthylene, or vinylcarbazole. | 11-12-2015 |
20150299512 | FILM-FORMING COMPOSITION - A film-forming composition including a triazine ring-containing hyperbranched polymer with a repeating unit structure Indicated by formula (1), and inorganic micro particles is provided. This enables the provision of a film-forming composition capable of hybridizing without reducing dispersion of the inorganic micro particles in a dispersion fluid, capable of depositing a coating film with a high refractive index, and suitable for electronic device film formation. | 10-22-2015 |
20150297469 | Cosmetic Additive And Cosmetic Containing Same - There is provided a cosmetic additive in which the cosmetic obtained by mixing has excellent transparency, and good spread and feeling of use during application, and stickiness when dried can be suppressed, and a cosmetic containing the additive. A cosmetic additive containing cellulose fibers having an average fiber diameter (D) of 0.001 to 0.05 pin, and a ratio (L/D) of average fiber length (L) to average fiber diameter (D) of 5 to 500; and a cosmetic containing the cosmetic additive. | 10-22-2015 |
20150294877 | HYDROGENATION METHOD AND HYDROGENATION APPARATUS - A hydrogenation method according to the present invention includes preparing a plasma generation section ( | 10-15-2015 |
20150252147 | AROMATIC POLYAMIDE AND FILM-FORMING COMPOSITION CONTAINING SAME - An aromatic polyamide, which is obtained by reacting a benzene tricarboxylic acid or a derivative thereof with a diamine compound in the presence of a terminally blocked compound having a crosslinkable group and a functional group that is reactive with a benzene tricarboxylic acid such as 1-amino-2-propanol or a derivative thereof as expressed by scheme (1), and which has a weight average molecular weight of 1,000-100,000 in terms of polystyrene as determined by gel permeation chromatography, has good solubility in organic solvents, while maintaining heat resistance and transparency. A thick film can be formed using a film-forming composition that contains this aromatic polyamide. | 09-10-2015 |
20150239899 | PRODUCTION METHOD OF HIGH-PURITY NITROGEN-CONTAINING HETEROCYCLIC COMPOUND - A method for producing a high-purity nitrogen-containing heterocyclic compound includes: a process (a) and a process (b): (a) a process of mixing a mixture containing a compound and as an impurity compound with a solvent and a metal salt, and (b) a process of obtaining a mixture in a solution state in which the content of the compound has decreased compared to that in the mixture in the process (a) by filtering a mixed solution obtained in the process (a), or a process of obtaining a mixture in which the content of the compound has decreased compared to that in the mixture in the process (a) by further evaporating the solvent or crystallizing following the filtering; | 08-27-2015 |
20150228982 | COMPOSITE CURRENT COLLECTOR FOR ENERGY STORAGE DEVICE ELECTRODE, AND ELECTRODE - A hyper-branched polymer dispersant represented by, for example, formula (I) has high adhesion properties to a current collector substrate and therefore enables the formation of an electrically conductive bonding layer having high carbon nanotube concentration. When a composite current collector for an energy storage device electrode which is equipped with the electrically conductive bonding layer is used, it becomes possible to produce an energy storage device from which an electrical current can be extracted without causing the decrease in a voltage particularly in use applications that require a large electrical current instantaneously, such as electrical automotive applications, and which has a long cycle life. | 08-13-2015 |
20150210808 | TRIAZINE RING-CONTAINING POLYMER AND FILM-FORMING COMPOSITION CONTAINING SAME - A polymer containing a repeating unit structure having a triazine ring such as, for example, that which is represented by formula (25): can exhibit alone high heat resistance, high transparency, high refractive index, high solubility and low volume shrinkage; and can be used as a component in a film-forming composition as appropriate. | 07-30-2015 |
20150210630 | OXIME-SUBSTITUTED AMIDE COMPOUND AND PEST CONTROL AGENT - To provide a novel pesticide, especially a fungicide and a nematocide. | 07-30-2015 |
20150202586 | DISPERSION AND METHOD FOR FORMING HYDROGEL - There is provided a dispersion containing a lipid peptide type compound useful as a low molecular weight gelator and a solvent capable of dissolving the lipid peptide type compound at a lower temperature. There is provided also a dispersion from which a hydrogel can be formed by a simpler method and from which a gel can be obtained as a gel having high thermal stability, and provide a method for forming the gel. A dispersion including a lipid peptide type compound in which a peptide portion having an amino acid repeating bonding structure is bonded to a lipid portion consisting of a C | 07-23-2015 |
20150184044 | ADHESIVE COMPOSITION OR UNDERFILL COMPOSITION - An adhesive or underfill composition includes: a polymer exclusively including at least one structural unit of Formula (1) as a repeating unit except a terminal: | 07-02-2015 |
20150158816 | CRYSTAL FORM OF QUINOLINE COMPOUND AND PROCESS FOR ITS PRODUCTION - A method for producing a drug substance of crystalline pitavastatin calcium excellent in stability, is presented. In the production of a compound (pitavastatin calcium) represented by the formula (1): | 06-11-2015 |
20150126755 | METHOD FOR PRODUCING STEREOSELECTIVE EPOXYKETONE COMPOUND - A novel method for producing a stereoselective epoxyketone compound is provided. A method for producing an epoxyketone compound represented by the formula (1), as represented by the following scheme, whereby it is possible to obtain an epoxyketone derivative in good yield and at high selectivity and to provide an industrially useful production method and an intermediate thereof. wherein R | 05-07-2015 |
20150115247 | FILM-FORMING COMPOSITION - This film-forming composition includes, for example, a polymer, crosslinking agent and light-diffusing agent that contain a triazine ring-containing repeating unit structure such as that represented formula (17), and is able to provide cured films with good light diffusing properties. Furthermore, this film-forming composition, which includes the same polymer, crosslinking agent and fine inorganic particles having a cross-linkable functional group, is able to provide cured films with good high temperature and high humidity resistance. | 04-30-2015 |
20150094420 | FILM-FORMING COMPOSITION AND EMBEDDING MATERIAL - Provided is a film-forming composition containing organic monomers represented by formula (A) that are capable of providing triazine ring-containing polymers, crosslinking agents, and linear polymers, which contain a repeating unit structure represented by formula (1). Thus, a film-forming composition that is suitable as an embedding material can be provided, said film-forming composition: including triazine ring-containing polymers that are capable of achieving, by polymer alone, high heat resistance, high transparency, a high refractive index, high solubility and low volume shrinkage; and is capable of minimizing occurrences of cracks when embedding films are manufactured. Furthermore, a solvent-free film-forming composition that does not contain any solvents conducive to organic electroluminescent film degradation, can be cured at a low temperature, and is suitable for forming top-emission type organic electroluminescent elements, can be provided. | 04-02-2015 |
20150087155 | RESIST UNDERLAYER FILM-FORMING COMPOSITION - A composition forms a resist underlayer film showing improved adhesiveness to a resist pattern. A resist underlayer film-forming composition for lithography, including: a polymer that has a structure of Formula (1a), Formula (1b), or Formula (2) below on an end of the polymer; and an organic solvent: | 03-26-2015 |
20150021470 | METHOD FOR IMAGING MASS ANALYSIS USING PHYSICAL VAPOR DEPOSITION OF PLATINUM NANOPARTICLES - The present invention provides an improved method for imaging mass spectrometry using an ionization-assisting matrix of a test sample, wherein the ionization efficiency is high, migration and visual information reduction are inhibited, no interference peaks originating from the matrix occur, and the analysis can be performed at high spatial resolution. | 01-22-2015 |
20150011092 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING COPOLYMER RESIN HAVING HETEROCYCLIC RING - A resist underlayer film-forming composition for forming a resist underlayer film having both dry etching resistance and heat resistance. A resist underlayer film-forming composition comprising a polymer containing a unit structure of Formula (1): | 01-08-2015 |
20140371421 | CARBAZOLE POLYMER - A carbazole polymer including a repeating unit represented by formula (1) and having excellent one electron oxidation-state stability. | 12-18-2014 |
20140370182 | ORGANIC SILICON COMPOUND AND SILANE COUPLING AGENT CONTAINING THE SAME - There is provided a novel organic silicon compound that can be used for a silane coupling agent. An organic silicon compound of Formula (1): | 12-18-2014 |
20140364614 | CRYSTALLINE FORMS OF PITAVASTATIN CALCIUM - The present invention is directed to new crystalline forms of Pitavastatin hemicalcium salt, referred to hereinafter as polymorphic Forms A, B, C, D, E and F, as well as the amorphous form. Furthermore, the present invention is directed to processes for the preparation of these crystalline forms and the amorphous form and pharmaceutical compositions comprising these crystalline forms or the amorphous forms. | 12-11-2014 |
20140350261 | METHOD FOR CATALYTIC ASYMMETRIC SYNTHESIS OF OPTICALLY ACTIVE ISOXAZOLINE COMPOUND, AND OPTICALLY ACTIVE ISOXAZOLINE COMPOUND - There is provided a method for catalytic asymmetric synthesis of optically active isoxazoline compound and an optically active isoxazoline compound. A method for catalytic asymmetric synthesis of optically active isoxazoline compound of a formula (6) including reacting an α,β-unsaturated carbonyl compound of a formula (1) and a hydroxylamine in a solvent in the presence of a base by adding a chiral phase transfer catalyst. An optically active isoxazoline compound of a formula (13) that can be synthesized by the method. | 11-27-2014 |
20140330038 | METHOD FOR PRODUCING PHENYLPHOSPHONIC ACID METAL SALT COMPOSITION, AND CRYSTAL NUCLEATING AGENT THEREFROM - A method for producing a phenylphosphonic acid metal salt composition, including reacting a phenylphosphonic acid compound (a) with a metal salt, metal oxide or metal hydroxide (b) that is present in an amount beyond the equivalent, the phenylphosphonic acid metal salt composition containing phenylphosphonic acid metal salt, and a surplus amount of the metal salt, the metal oxide or the surplus metal hydroxide (b). A crystal nucleating agent comprises the phenylphosphonic acid metal salt composition produced by the method. | 11-06-2014 |
20140319411 | SEMICONDUCTOR WAFER POLISHING LIQUID COMPOSITION - There is provided a polishing liquid composition that can effectively reduce LPDs having a size of 50 nm or less on a wafer surface in polishing of semiconductor wafers. A semiconductor wafer polishing liquid composition including: water; silica particles; an alkaline compound; a water-soluble polymer compound; and polyethylene glycol, wherein the semiconductor wafer polishing liquid composition satisfies conditions (a) to (c): (a) a shape factor SF1 of the silica particles is 1.00 to 1.20, (b) a mean primary particle diameter of the silica particles that is obtained by a nitrogen adsorption method is 5 nm to 100 nm, and a coefficient of particle diameter variation CV value obtained from image analysis of the transmission electron microscope image is in a range of 0% to 15%, and (c) the polyethylene glycol has a number average molecular weight of 200 to 15,000. | 10-30-2014 |
20140303062 | SURFACTANT FOR STABILIZING WATER/SUPERCRITICAL CARBON DIOXIDE MICROEMULSION - There is provided a highly branched hydrocarbon based surfactant for stabilizing a water/supercritical carbon dioxide microemulsion. A surfactant comprising: a sulfate compound of Formula (1): | 10-09-2014 |
20140288264 | METAL FINE PARTICLE DISPERSANT CONTAINING BRANCHED POLYMER COMPOUND HAVING AMMONIUM GROUP - A metal fine particle dispersant for forming a disperse system of metal fine particles, the metal fine particle dispersant having a branched polymer compound having an ammonium group and having a weight average molecular weight of 500 to 5,000,000. | 09-25-2014 |
20140285897 | METAL OXIDE COMPOSITE SOL, COATING COMPOSITION, AND OPTICAL MEMBER - There is provided a sol of modified metal oxide composite colloidal particles including titanium oxide having a high refractive index and excellent light resistance and weather resistance that discoloration of the colloidal particles by photoexcitation is almost completely inhibited. A titanium oxide-tin oxide-zirconium oxide-tungsten oxide composite colloidal particle having a primary particle diameter of 2 to 50 nm, and a SnO | 09-25-2014 |
20140256921 | METHOD FOR PRODUCING TETRAHYDROPYRAN COMPOUND AND INTERMEDIATE THEREOF - Disclosed is a method for producing a tetrahydropyran compound represented by general formula (5) shown in the scheme. Accordingly, a tetrahydropyran derivative is obtained in high yield and with high selectivity without using a highly toxic reagent, and an industrially useful method for producing a tetrahydropyran derivative and an intermediate thereof can be provided. In formulae (1) to (5), R | 09-11-2014 |
20140235743 | FLATTENING FILM FORMING COMPOSITION FOR HARD DISK - A flattening film forming composition for a hard disk that can prevent a magnetic material from migrating to the nonmagnetic layer, including a photopolymerizable coating material containing at least one polymer selected from a homopolymer that has a divinyl aromatic compound-derived unit structure and a copolymer having the unit structure or containing a mixture of the polymer and a photopolymerizable compound. The photopolymerizable compound may include an acrylate group, a methacrylate group, or a vinyl group. The polymer may be a copolymer further containing an addition polymerizable compound as a component to be copolymerized. A method for producing a hard disk, including: a first step of forming projections and recesses on a magnetic body; a second step of coating the projections and recesses with the flattening film forming composition; and a third step of flattening the coating by means of etching and exposing a surface of the magnetic body. | 08-21-2014 |
20140235060 | RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH CONTAINS ALICYCLIC SKELETON-CONTAINING CARBAZOLE RESIN - There is provided a resist underlayer film used in lithography process that has a high n value and a low k value, and can effectively reduce reflection of light having a wavelength of 193 nm from the substrate in a three-layer process in which the resist underlayer film is used in combination with a silicon-containing intermediate layer. A resist underlayer film-forming composition used in lithography process including: a polymer containing a unit structure including a product obtained by reaction of a condensed heterocyclic compound and a bicyclo ring compound. The condensed heterocyclic compound is a carbazole compound or a substituted carbazole compound. The bicyclo ring compound is dicyclopentadiene, substituted dicyclopentadiene, tetracyclo[4.4.0.1 | 08-21-2014 |
20140235059 | DIARYLAMINE NOVOLAC RESIN - A novel diarylamine novolac resin such as a phenylnaphthylamine novolac resin, and further a resist underlayer film-forming composition in which the resin is used in a lithography process for manufacturing a semiconductor device. A polymer including a unit structure (A) of Formula (1): | 08-21-2014 |
20140216538 | IMPRINT MATERIAL - An imprint material which is in a transparent and homogeneous varnish form, is not peeled off in cross-cut tests, in which the adhesion of coating films is evaluated, and forms films that can have a mold release force of 0.5 g/cm or less. An imprint material including: a component (A): a compound containing at least one alkylene oxide unit having carbon atom number of 2, 3 or 4 and at least two polymerizable groups; a component (B): a photopolymerization initiator; a component (C): a solvent that swells or dissolves a surface portion of a film base material to which the imprint material is applied; and a component (D): a silicone compound. | 08-07-2014 |
20140206719 | CRYSTAL FORM OF QUINOLINE COMPOUND AND PROCESS FOR ITS PRODUCTION - A method for producing a drug substance of crystalline pitavastatin calcium excellent in stability, is presented. In the production of a compound (pitavastatin calcium) represented by the formula (1): | 07-24-2014 |
20140206135 | COATING LIQUID FOR GATE INSULATING FILM, GATE INSULATING FILM AND ORGANIC TRANSISTOR - To provide a coating fluid for a gate insulating film, which can be baked at a low temperature of at most 180° C.; a gate insulating film having excellent solvent resistance and further having good characteristics in e.g. specific resistance or semiconductor mobility; and an organic transistor employing the gate insulating film. | 07-24-2014 |
20140200344 | TRICYCLIC HETEROCYCLIC COMPOUNDS AND JAK INHIBITORS - Novel tricyclic pyrimidine compounds and tricyclic pyridine compounds having JAK inhibitory activities are provided. A tricyclic heterocyclic compound represented by the formula (I | 07-17-2014 |
20140200304 | RESIN COMPOSITION - There is provided a resin composition. A resin composition includes: a copolymer having structural units of the following Formula (1), Formula (2) and Formula (3): | 07-17-2014 |
20140199554 | METAL OXIDE PARTICLES CONTAINING TITANIUM OXIDE COATED WITH SILICON DIOXIDE-STANNIC OXIDE COMPLEX OXIDE - A metal oxide particle containing titanium oxide coated with silicon dioxide-stannic oxide complex oxide including: a titanium oxide-containing core particle (A); and a coating layer with which the titanium oxide-containing core particle (A) is coated and that is made of silicon dioxide-stannic oxide complex oxide colloidal particles (B) having a mass ratio of silicon dioxide/stannic oxide of 0.1 to 5.0, wherein one or more intermediate thin film layers that are made of any one of an oxide; a complex oxide of at least one element selected from the group consisting of Si, Al, Sn, Zr, Zn, Sb, Nb, Ta, and W; and a mixture of the oxide and the complex oxide are interposed between the titanium oxide-containing core particle (A) and the coating layer made of the silicon dioxide-stannic oxide complex oxide colloidal particles (B). | 07-17-2014 |
20140199038 | HIGH REFRACTIVE INDEX CLADDING MATERIAL AND ELECTRO-OPTICAL POLYMER OPTICAL WAVEGUIDE - There is provided an optical waveguide which has appropriate orientation properties, a production process of which is simple so as to be suitable for producing an electro-optical element, and is able to reduce power consumption of the element due to excellent electro-optical properties, and further can be formed into a thin film and be layered; and a material for the optical waveguide. A cladding material of an optical waveguide, characterized by comprising a polymer compound including a triarylamine structure, and a nonlinear optical compound; and an optical waveguide produced by using the cladding material. | 07-17-2014 |
20140183419 | CONDUCTIVE COMPOSITION, AND CONDUCTIVE COMPLEX - A conductive composition containing carbon nanotubes, a carbon nanotube dispersant, and a dopant precursor, wherein the dispersant is a non-conjugated polymer compound having an aromatic ring as the repeating unit, and the dopant precursor is an acid-generating agent which generates cation by being subjected to light and/or heat. The aforementioned conductive composition is capable of stably dispersing carbon nanotubes and of efficiently doping same without damaging the conductive properties of the carbon nanotubes. | 07-03-2014 |
20140170855 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING SULFONE STRUCTURE - A composition for forming a resist underlayer film for lithography, including: as a silane, a hydrolyzable organosilane, a hydrolysate of the hydrolyzable organosilane, or a hydrolysis-condensation product of the hydrolyzable organosilane, wherein the hydrolyzable organosilane is a compound of Formula (1): | 06-19-2014 |
20140170567 | RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR EUV LITHOGRAPHY CONTAINING CONDENSATION POLYMER - There is provided a resist underlayer film composition for EUV lithography that is used in a device production process using EUV lithography, reduces adverse effects of EUV, and is effective for obtaining a good resist pattern, and to a method for forming a resist pattern that uses the resist underlayer film composition for EUV lithography. A resist underlayer film-forming composition for EUV lithography, including: a polymer having a repeating unit structure of formula (1): | 06-19-2014 |
20140162318 | ENHANCING INGREDIENTS FOR PROTEIN PRODUCTION FROM VARIOUS CELLS - [Summary] The present invention relates to a protein production accelerating agent that has enabled to largely increase the produced amount of a desired protein by adding polysaccharides to a medium for animal cells containing a serum or serum alternative, and a production method of a protein using a medium containing the protein production accelerating agent. | 06-12-2014 |
20140155546 | POLYIMIDE PRECURSOR, POLYIMIDE, AND COATING SOLUTION FOR UNDER LAYER FILM FOR IMAGE FORMATION - There is provided a polyimide precursor which can alter the hydrophilicity/hydrophobicity of the surface of a cured film formed readily even by a low level of ultraviolet ray irradiation; and a polyimide produced from the polyimide precursor. The polyimide precursor having a structure represented by the following formula (1): | 06-05-2014 |
20140135496 | ISOXAZOLINE-SUBSTITUTED BENZAMIDE COMPOUND AND PESTICIDE - An isoxazoline-substituted benzamide compound of formula (1) or a salt thereof: | 05-15-2014 |
20140135426 | RESIN COMPOSITION - There is provided a resin composition including a copolymer having structural units of Formula (1), Formula (2), and Formula (3), and a solvent; or a resin composition including a copolymer having structural units of Formula (1), Formula (4), and Formula (5), and a solvent. | 05-15-2014 |
20140120730 | THIN FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING TITANIUM AND SILICON - A thin film forming composition for forming resist underlayer film useable in the production of a semiconductor device, and a resist upper layer film absorbs undesirable UV light with a thin film as an upper layer of the EUV resist before undesirable UV light reaches the EUV resist layer in EUV lithography, an underlayer film (hardmask) for an EUV resist, a reverse material, and an underlayer film for a resist for solvent development. The thin film forming composition useable together with a resist in a lithography process, comprising a mixture of titanium compound (A) selected from: | 05-01-2014 |
20140116505 | RESIN COMPOSITION - There is provided a resin composition capable of forming a cured film having excellent light resistance, high transparency, and a high refractive index. A resin composition including: a component (A); a component (B); and a component (C) below, in which the composition is formed into a film and is then heated at 150° C. or higher to achieve a refractive index of 1.65 or higher: the component (A): a triazine compound having at least two nitrogen atoms substituted with a hydroxymethyl group and/or an alkoxymethyl group; the component (B): an ethylene glycol compound having at least one acrylic moiety and having an aromatic group substituted with an organic group or a condensed aromatic group; and the component (C): an acid compound having a pKa of 2 or lower. | 05-01-2014 |
20140114027 | CAGE-SHAPED CYCLOPENTANOIC DIANHYDRIDE, METHOD FOR PRODUCTION THEREOF, AND POLYIMIDE - A cage 1,2,3,4-cyclopentanetetracarboxylic acid (1,3:2,4)-dianhydride compound represented by formula [1], and a polyimide obtained by condensing the compound with a diamine. With the compound, it is possible to provide a polyimide which shows no absorption in the ultraviolet region and is highly transparent to light, has high insulating properties, has improved heat resistance and processability, and has excellent solubility in organic solvents. | 04-24-2014 |
20140113976 | PRODUCTION METHOD OF COSMETIC, PREPARATION METHOD OF GEL FOR COSMETICS, AND METHOD OF REDUCING USE AMOUNT OF POLYMER THICKENER BLENDED IN COSMETIC RAW MATERIALS - A production method of a cosmetic that includes blending at least one lipid peptide-type gelator that contains a low-molecular lipid peptide or a pharmaceutically usable salt thereof at a ratio of 0.1% by weight to 0.5% by weight based on a mass of the polymer thickener to form a thickening gel; a preparation method of a gel for cosmetics that includes blending, into an aqueous medium for cosmetics, a polymer thickener and at least one lipid peptide-type gelator that contains a low-molecular lipid peptide or a pharmaceutically usable salt thereof at the above-mentioned ratio to form a gel; and a method of reducing the use amount of a polymer thickener in production of a cosmetic that includes blending at least one lipid peptide-type gelator that contains a low-molecular lipid peptide or a pharmaceutically usable salt thereof at the above-mentioned ratio. | 04-24-2014 |
20140106570 | COMPOSITION FOR FORMING ORGANIC HARD MASK LAYER FOR USE IN LITHOGRAPHY CONTAINING POLYMER HAVING ACRYLAMIDE STRUCTURE - Whereas, conventionally, ashing had been used at the time of removal, the present invention provides a material for forming an organic hard mask that can be removed by an alkaline aqueous solution, and thus can be expected to reduce damage to the substrate at the time of the removal. A composition for forming an organic hard mask layer comprising: a polymer (A) including a structural unit of Formula (1) and a structural unit of Formula (2); a crosslinkable compound (B) including at least two of blocked isocyanate groups, methylol groups, or C | 04-17-2014 |
20140099791 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY - A method for producing a semiconductor device includes the steps of: applying a composition for forming a resist underlayer film for EUV lithography including a novolac resin containing a halogen atom onto a substrate having a film to be fabricated for forming a transferring pattern and baking the composition so as to form a resist underlayer film for EUV lithography; and applying a resist for EUV lithography onto the resist underlayer film for EUV lithography, irradiating, with EUV through a mask, the resist underlayer film for EUV lithography and a film of the resist for EUV lithography on the resist underlayer film, developing the film of the resist for EUV lithography, and transferring an image formed in the mask onto the substrate by dry etching so as to form an integrated circuit device. | 04-10-2014 |
20140094420 | HYDROGEL-FORMING MATERIAL - There is provided a hydrogel-forming material from which a hydrogel can be formed with a simpler method and under milder conditions. A hydrogel-forming material comprising a lipid peptide-type gelator that is formed of at least one selected from compound of the following formula (1): | 04-03-2014 |
20140088216 | HIGHLY BRANCHED LIPOPHILIC POLYMER, AND PHOTOPOLYMERIZABLE COMPOSITION CONTAINING THE SAME - There is provided a highly branched lipophilic polymer that is excellent in blending and dispersing properties in a matrix resin, and is possible to provide surface modification properties such as excellent lipophilicity (anti-fingerprint property) and the like to a coating that is obtained from the resin composition while the intrinsic transparency of the resin is not impaired; and a photopolymeizable composition comprising the highly branched lipophilic polymer. A highly branched lipophilic polymer obtained by polymerizing a monomer A containing two or more radically polymerizable double bonds per molecule and a monomer B containing a C | 03-27-2014 |
20140080971 | HIGHLY BRANCHED POLYMER AND DISPERSANT FOR CARBON NANOTUBES - A highly branched polymer comprising repeating units which each have an acid group such as sulfo group, said repeating units being represented by formula [1] or the like, and a dispersant for carbon nanotubes (CNTs) which comprises the highly branched polymer can disperse CNTs in a medium such as an organic solvent to the individual sizes and can yield thin films having improved conductivity. | 03-20-2014 |
20140080937 | PHOTOSENSITIVE RESIN COMPOSITION - There is provided provide a photosensitive resin composition which can markedly improve transparency, heat resistance, heat discoloration resistance, solvent resistance, and patterning properties. A photosensitive resin composition including: a polymer (A) in which a content of a unit structure containing a boronic acid group, a unit structure containing a boronic acid ester group, or a combination of these unit structures is 20 mol % to 100 mol % of a total molar number of unit structures constituting the polymer; and a photosensitizer (B). The polymer (A) preferably has a weight average molecular weight of 1,000 to 50,000. A cured film obtained from the photosensitive resin composition. A microlens prepared from the photosensitive resin composition. | 03-20-2014 |
20140073744 | METHOD FOR PRODUCING CHLORINATED HYPERBRANCHED POLYMER - There is provided a novel production method of a chlorinated hyperbranched polymer that is optically stable and is capable of derivatizing the chlorinated hyperbranched polymer into various compounds. A production method of a chlorinated hyperbranched polymer for producing a chlorinated hyperbranched polymer of Formula (1): | 03-13-2014 |
20140072822 | PRIMER FOR ELECTROLESS PLATING COMPRISING HYPERBRANCHED POLYMER AND METAL FINE PARTICLES - There is provided a novel, environmentally friendly primer for use in the pretreatment steps in electroless plating, which can be easily used in fewer steps with a lower cost. A primer for forming a metallic plating film on a substrate by electroless plating, the primer including: a hyperbranched polymer having an ammonium group at a molecular terminal and a weight-average molecular weight of 500 to 5,000,000; and a metal fine particle. | 03-13-2014 |
20140066590 | POLYIMIDE PRECURSOR MODIFIED WITH DICARBOXYLIC ACID ANHYDRIDE, IMIDIZED POLYIMIDE AND LIQUID CRYSTAL ALIGNING AGENT USING IT - To provide a polyimide precursor and/or polyimide which has an excellent solubility in various organic solvents, and with which a liquid crystal alignment film can be obtained which is excellent in a rubbing resistance and which is hardly deteriorated even by irradiation with backlight. | 03-06-2014 |
20140058109 | CRYSTAL FORM OF QUINOLINE COMPOUND AND PROCESS FOR ITS PRODUCTION - A method for producing a drug substance of crystalline pitavastatin calcium excellent in stability, is presented. In the production of a compound (pitavastatin calcium) represented by the formula ( | 02-27-2014 |
20140057353 | METHOD FOR PRODUCING HEMATOPOIETIC STEM CELLS USING PYRAZOLE COMPOUNDS - An expanding agent for hematopoietic stem cells and/or hematopoietic progenitor cells useful as a therapy for various hematopoietic diseases and useful for improvement in the efficiency of gene transfer into hematopoietic stem cells for gene therapy is provided. | 02-27-2014 |
20140045119 | PHOTOSENSITIVE ORGANIC PARTICLES - A material forms a pattern by applying a photosensitive composition to a base material and drying to form a photosensitive coating and performing exposure and development, and a method for forming the pattern. A photosensitive composition includes water-soluble organic particles, and a solvent, wherein the solvent is a poor solvent for the water-soluble organic particles. Preferably, the water-soluble organic particles of the photosensitive composition includes a polymer which contains a unit structure (A) for forming organic particles, a unit structure (B) for forming interparticle crosslinkage, and a unit structure (C) for imparting dispersibility, and the photosensitive composition further includes a photoacid generator. In addition, the water-soluble organic particles of the photosensitive composition includes a polymer which contains the unit structure (A) for forming organic particles, the unit structure (B) for forming interparticle crosslinkage, the unit structure (C) for imparting dispersibility, and a unit structure (D) having a photoacid generating group. | 02-13-2014 |
20140038415 | POLYMER-CONTAINING DEVELOPER - Disclosed is a developer, one that does not cause pattern collapse during the formation process, for the formation of a fine pattern and a method for pattern formation using the developer. A developer used in a lithography process includes a polymer for forming a dry-etching mask and an organic solvent. The polymer is preferably a curable resin different from a curable resin forming a resist film. The developer is preferably used after exposure of the resist film. The organic solvent in the developer is preferably butyl acetate or a mixed solvent of butyl acetate and an alcohol, or 2-pentanone or a mixed solvent of 2-pentanone and an alcohol. Also disclosed is a method for producing a semiconductor device. | 02-06-2014 |
20140017896 | COMPOSITION FOR FORMING PATTERN REVERSAL FILM AND METHOD FOR FORMING REVERSAL PATTERN - There is provided a silicon-containing composition for forming a pattern reversal film that can be reworked by an organic solvent that is normally used for the removal of resist patterns. A composition for forming a pattern reversal film, characterized by comprising: polysiloxane; an additive; and an organic solvent, wherein the polysiloxane has a structural unit of Formula (1) and a structural unit of Formula (2): | 01-16-2014 |
20140005402 | CRYSTALLINE FORMS OF PITAVASTATIN CALCIUM | 01-02-2014 |
20140004465 | RESIST UNDERLAYER FILM FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME | 01-02-2014 |
20130338367 | PYRAZOLE DERIVATIVES AND PESTICIDES - Novel pesticide, especially insecticides or miticides are provided. | 12-19-2013 |
20130338197 | PARASITE- AND HYGIENIC PEST-CONTROLLING AGENT - There is provided a novel agent for controlling harmful arthropods or nematodes that are parasites and hygienic pests for animals. An ecto- or endo-parasiticide for mammals or the like comprising as active ingredient, one or more selected from substituted benzamide compounds of formula (1) or salts thereof: | 12-19-2013 |
20130331463 | METHOD FOR PRODUCING RUTILE TITANIUM OXIDE SOL - A method for producing a rutile titanium oxide sol having a particle diameter measured by dynamic light scattering of 5 nm to 100 nm, the method comprising: a process (a): mixing a tin oxalate aqueous solution, a titanium alkoxide, oxalic acid, a quaternary ammonium hydroxide, and water, while adjusting, per mole of titanium atoms, a proportion of tin atoms to be from 0.1 mol to 0.8 mol, a proportion of the oxalic acid to be from 0.01 mol to 5 mol, and a proportion of the quaternary ammonium hydroxide to be from 0.1 mol to 3.5 mol to prepare a titanium-containing aqueous solution having a concentration in terms of TiO | 12-12-2013 |
20130324634 | PHOTOCURABLE FILM-FORMING COMPOSITION AND MANUFACTURING METHOD FOR CURED FILM - A composition comprising both a polymer which contains triazine-ring-containing repeating units represented by formula (17) and a crosslinking agent which consists of either a poly-functional epoxy compound or a polyfunctional (meth)acrylic compound can be photo-cured even without the addition of an initiator to yield a cured film having a high refractive index and high heat resistance. Thus, a photocurable film-forming composition that comprises a triazine-ring-containing polymer, which can achieve, even without the addition of a metal oxide by the polymer alone, high heat resistance, high transparency, a high refractive index, high solubility and low volume shrinkage, and that is curable even without the addition of an acid generator can be provided. | 12-05-2013 |
20130313669 | AMINO ACID GENERATOR AND POLYSILOXANE COMPOSITION CONTAINING THE SAME - A coating film forming composition includes an amino acid generator including a protecting group that is eliminated to generate an amino acid. A coating film forming composition includes a component (A): the amino acid generator; a component (B): a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis-condensation product thereof, or a mixture thereof; and a component (C): a solvent. | 11-28-2013 |
20130310480 | PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING MICROLENS - There is provided a photosensitive resin composition for forming a microlens. A photosensitive resin composition for forming a microlens, the photosensitive resin composition comprising: a component (A), a component (B), a component (C) and a solvent. The component (A) is a copolymer having a maleimide structural unit of formula (1) below, a vinyl ether structural unit of formula (2) below, and at least one of the three structural units of formula (3), formula (4), and formula (5) below, the component (B) is a photosensitizer, and the component (C) is a cross-linking agent | 11-21-2013 |
20130302991 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, CONTAINING SILICON THAT BEARS DIKETONE-STRUCTURE-CONTAINING ORGANIC GROUP - A composition for forming a lithographic resist underlayer film, including, as a silane, a hydrolyzable organosilane, a hydrolysate thereof, or a hydrolytic condensate thereof, wherein the silane includes a hydrolyzable organosilane of Formula (1) below: | 11-14-2013 |
20130302598 | CURABLE COMPOSITION FOR COATING CONTAINING FLUORINE-CONTAINING HIGHLY BRANCHED POLYMER - A curable composition for coating comprising: (a) a fluorine-containing highly branched polymer obtained by polymerization of a monomer A having two or more radical polymerizable double bonds in a molecule of the monomer A and a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in a molecule of the monomer B, in the presence of a polymerization initiator C at an amount of 5% by mole to 200% by mole per the number of moles of the monomer A, (b) at least one surface modifier selected from the group consisting of a perfluoropolyether compound and a silicone compound, (c) an active energy ray-curable polyfunctional monomer, and (d) a polymerization initiator that generates radicals by irradiation with an active energy ray; a cured film obtained from the composition; and a hard coating film obtained by use of the composition. | 11-14-2013 |
20130296761 | GEL SHEET CONTAINING LIPID PEPTIDE GELATOR AND POLYMERIC COMPOUND - There is provided a gel sheet that has high biocompatibility and safety, can contain both a hydrophilic medicinal agent and a hydrophobic medicinal agent, and provides an excellent feel in use during the application onto human skin or others. A gel sheet including: a lipid peptide gelator including a low molecular weight lipid peptide having a molecular weight of 1,000 or less or a pharmaceutically usable salt of the lipid peptide; and a polymeric compound, wherein the polymeric compound is included in an amount of more than 1% (w/w) and less than 50% (w/w) with respect to the total mass of the gel sheet. | 11-07-2013 |
20130296456 | HIGHLY ABRASION-RESISTANT IMPRINT MATERIAL CONTAINING URETHANE COMPOUND - There is provided an imprint material forming a film having high abrasion resistance even after a pattern has been transferred thereto, specifically an imprint material forming a film having a small number of pieces of scratch when the film after a pattern has been transferred thereto is subjected to a steel wool abrasion test. An imprint material comprising: a component (A): a compound having at least one ethylene oxide unit and having at least one polymerizable group; a component (B): a polycaprolactone-modified urethane compound having a C | 11-07-2013 |
20130289203 | TRIAZINE RING-CONTAINING POLYMER AND FILM-FORMING COMPOSITION CONTAINING SAME - A polymer containing a repeating unit structure having a triazine ring such as, for example, that which is represented by formula (25): can exhibit alone high heat resistance, high transparency, high refractive index, high solubility and low volume shrinkage; and can be used as a component in a film-forming composition as appropriate. | 10-31-2013 |
20130284262 | FILM-FORMING MATERIAL - There is provided a novel material used for solar cells that can contribute to the improvement in maximum output of solar cells. A film-forming material for forming a light-collecting film on a transparent electrode of a solar cell, including an aromatic group-containing organic polymer compound (A), wherein the film-forming material exhibits an index of refraction of 1.5 to 2.0 at a wavelength of 633 nm and a transmittance of 95% or more with respect to light having a wavelength of 400 nm, and a solar cell obtained by coating a cured film made from the film-forming material on a surface of a transparent electrode. | 10-31-2013 |
20130284261 | FILM-FORMING MATERIAL - There is provided a novel material used for solar cells that can contribute to the improvement in maximum output of solar cells without using the conventional MPPT system. A film-forming material for forming a light-collecting film on a transparent electrode of a solar cell, including an aromatic group-containing organic polymer compound (A) and a cross-linker (B), wherein the film-forming material exhibits an index of refraction of 1.5 to 2.0 at a wavelength of 633 nm and a transmittance of 95% or more with respect to light having a wavelength of 400 nm, and a solar cell obtained by coating a cured film made from the film-forming material on a surface of a transparent electrode. | 10-31-2013 |
20130281620 | FILM-FORMING COMPOSITION - A film-forming composition is characterized by containing: a triazine ring-containing hyperbranched polymer containing a repeating unit structure represented by formula (1); and a dissolution-enhancing agent for breaking a hydrogen bond formed at least within the hyperbranched polymer and/or between molecules, between a nitrogen atom in the triazine ring, and a diarylamine-derived NH group. The film-forming composition has excellent dissolvability in organic solvents such as resist solvents, and has good handling and filtration properties at low viscosity. | 10-24-2013 |
20130280913 | COMPOSITION FOR FORMING A RESIST UNDERLAYER FILM INCLUDING HYDROXYL GROUP-CONTAINING CARBAZOLE NOVOLAC RESIN - There is provided a composition for forming a resist underlayer film having heat resistance for use in a lithography process in semiconductor device production. A composition for forming a resist underlayer film, comprising a polymer that contains a unit structure of formula (1) and a unit structure of formula (2) in a proportion of 3 to 97:97 to 3 in molar ratio: | 10-24-2013 |
20130274433 | POLYFUNCTIONAL EPOXY COMPOUND - There is provided an epoxy resin composition having low viscosity and a high cationic curing property. An epoxy compound of Formula (1): | 10-17-2013 |
20130270222 | FILM FORMING COMPOSITION FOR HARD DISK - There is provided a planarizing film-forming composition for a hard disk. A planarizing film-forming composition for a hard disk comprising a hydrophobic coating material having a photopolymerizable group and an aromatic group, containing a polymer or a combination of a polymer and a compound selected from the group consisting of a polymer (A1), a polymer (A2), a polymer (A3), a compound (a1), a compound (a2), and a compound (a3). | 10-17-2013 |
20130267610 | NOVEL LIPID DIPEPTIDE AND GEL - There is provided a gelator that is capable of forming a gel by an extremely small amount of addition in a wide pH range from acidic to alkaline regions, and a gel having high environmental compatibility, biocompatibility, and biodegradability. A gelator comprising: a lipid peptide of Formula (1) wherein R | 10-10-2013 |
20130267609 | NOVEL LIPID DIPEPTIDE AND GEL - There is provided a gelator that is capable of forming a gel by an extremely small amount of addition in a wide pH range from acidic to alkaline regions, and a gel having high environmental compatibility, biocompatibility, and biodegradability. A gelator comprising: a lipid peptide of Formula (1) wherein R | 10-10-2013 |
20130253204 | PYRAZOLE COMPOUNDS HAVING THERAPEUTIC EFFECT ON MULTIPLE MYELOMA - Novel therapeutic agents for myeloma are provided. | 09-26-2013 |
20130245305 | METHOD FOR PRODUCING ISOTHIOCYANATE COMPOUND - The object of the present invention is to provide a novel method for producing an isothiocyanate compound having a carboxyl group(s) by a reaction of the corresponding amino compound having a carboxyl group(s), thiocarbonyldiimidazole and a base, in one step with high purity. | 09-19-2013 |
20130245255 | HETEROCYCLIC COMPOUNDS AND EXPANSION AGENTS FOR HEMATOPOIETIC STEM CELLS - An expansion agent for hematopoietic stem cells and/or hematopoietic progenitor cells useful for improvement in the efficiency of gene transfer into hematopoietic stem cells for gene therapy useful for treatment of various disorders is provided. | 09-19-2013 |
20130245152 | PHOTOSENSITIVE RESIN COMPOSITION FOR MICROLENSES - There is provided a photosensitive resin composition for microlenses. A photosensitive resin composition for microlenses including a component (A), a component (B) and a solvent. The component (A): a copolymer having a maleimide structural unit of Formula (1) and a repeating structural unit of Formula (2). The component (B): a photosensitizer | 09-19-2013 |
20130240795 | ARYLSULFONIC ACID COMPOUND AND USE THEREOF AS ELECTRON-ACCEPTOR MATERIAL - Disclosed is an arylsulfonic acid compound characterized by being represented by formula (1). By using this compound as an electron-acceptor material, highly uniform film formability can be achieved. By using a thin film containing the arylsulfonic acid compound in an OLED device or a PLED device, there can be obtained excellent EL device characteristics such as low driving voltage, high luminous efficiency and long life. | 09-19-2013 |
20130230809 | RESIST UNDERLAYER FILM FORMING COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN USING THE SAME - There is provided a composition for forming a resist underlayer film that has a high selectivity of dry etching rate even though the composition contains an aromatic ring such as a benzene ring, and that is useful in lowering LER that presents a large problem in EUV (wavelength 13.5 nm) lithography. Moreover, another object is to obtain a composition for forming a resist underlayer film that provides a resist pattern having a desired shape on the resist underlayer film. A resist underlayer film forming composition for lithography which includes a polymer and a solvent, wherein in the polymer, diphenyl sulfone or a derivative thereof is introduced in the main chain of the polymer through an ether bond. | 09-05-2013 |
20130224957 | SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING FLUORINE-BASED ADDITIVE - A resist underlayer film forming composition for lithography includes: as a component (I), a fluorine-containing highly branched polymer obtained by polymerizing a monomer A having two or more radical polymerizable double bonds in the molecule thereof, a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in the molecule thereof, and a monomer D having a silicon atom-containing organic group and at least one radical polymerizable double bond in the molecule thereof, in the presence of a polymerization initiator C in a content of 5% by mole or more and 200% by mole or less, based on the total mole of the monomer A, the monomer B, and the monomer D; and as a component (II), a hydrolyzable silane compound, a hydrolysis product thereof, a hydrolysis-condensation product thereof, or a silicon-containing compound that is a combination of these compounds. | 08-29-2013 |
20130224396 | PLASMA ANNEALING METHOD AND DEVICE FOR THE SAME - There is provided a plasma annealing device that can change the crystal structure of a film by processing the film (coating) on a substrate and that has excellent productivity. A method for producing a film includes step (A) irradiating a film on a substrate with atmospheric pressure plasma, wherein the crystal structure of a constituent of the film is changed. The step (A) may include generating plasma under atmospheric pressure by energization at a frequency of 10 hertz to 100 megahertz and a voltage of 60 volts to 1,000,000 volts, and directly irradiating the film on the substrate with the generated plasma. A method for changing a crystal structure of a constituent of a film includes step (A). A plasma generation device used in step (A). An electronic device produced through step (A). | 08-29-2013 |
20130217894 | ORGANIC AMINE SALTS OF AMINOBENZOIC ACID DERIVATIVES AND METHOD FOR PRODUCING SAME - A novel organic amine salt or salt with quaternary ammonium ion of 3-{[((2E)-2-{1-[5-(4-t-butylphenyl)-4-hydroxy-3-thienyl]ethylidene}hydrazino)carbonothioyl]amino}benzoic acid having useful properties as a drug is provided. | 08-22-2013 |
20130216956 | MONOLAYER OR MULTILAYER FORMING COMPOSITION - There is provided a composition for forming a monolayer or a multilayer on the substrate. A composition for forming a monolayer or a multilayer containing a silane compound of Formula (1A) or Formula (1B): | 08-22-2013 |
20130214372 | TRIAZINE RING-CONTAINING POLYMER AND MEMBRANE-FORMING COMPOSITION CONTAINING THE SAME - Disclosed is a triazine ring-containing hyperbranched polymer containing a repeating unit structure represented by the expression (1). By this means, it is possible to achieve a triazine ring-containing polymer which, alone, has high heat resistance, high transparency, high refractive index, high light resistance, high solubility, low volume shrinkage without adding metal oxides; and also a membrane-forming composition containing the same. | 08-22-2013 |
20130209940 | COMPOSITION FOR FORMING RESIST OVERLAYER FILM FOR EUV LITHOGRAPHY - There is provided a composition for forming an EUV resist overlayer film that is used in an EUV lithography process, that does not intermix with the EUV resist, that blocks unfavorable exposure light for EUV exposure, for example, UV light and DUV light and selectively transmits EUV light alone, and that can be developed with a developer after exposure. A composition for forming an EUV resist overlayer film used in an EUV lithography process including a resin containing a naphthalene ring in a main chain or in a side chain and a solvent, in which the resin may include a hydroxy group, a carboxy group, a sulfo group, or a monovalent organic group having at least one of these groups as a hydrophilic group. | 08-15-2013 |
20130204013 | PROCESS FOR PRODUCING THIOPHENE COMPOUND AND INTERMEDIATE THEREOF - To provide a novel process for producing a 2-aryl-3-hydroxy-4-substituted carbonyl thiophene compound or an intermediate thereof useful as an intermediate for production of medicines and agricultural chemicals. | 08-08-2013 |
20130204000 | CRYSTAL FORM OF QUINOLINE COMPOUND AND PROCESS FOR ITS PRODUCTION - A method for producing a drug substance of crystalline pitavastatin calcium excellent in stability, is presented. In the production of a compound (pitavastatin calcium) represented by the formula (1): | 08-08-2013 |
20130203687 | NOVEL LIPID TRIPEPTIDE-BASED HYDROGELATOR AND HYDROGEL - A hydrogel that includes an aqueous solution or an alcohol aqueous solution, and a hydrogelator containing a lipid peptide represented by Formula (1), or a pharmaceutically usable salt thereof. In Formula (1), R | 08-08-2013 |
20130189850 | RESIST UNDERLAYER COATING FORMING COMPOSITION FOR FORMING PHOTO-CROSSLINKING CURED RESIST UNDERLAYER COATING - An underlayer coating is used as an underlayer of photoresists in lithography process of the manufacture of semiconductor devices and has a high dry etching rate in comparison to the photoresists, does not intermix with the photoresists, and is capable of flattening the surface of a semiconductor substrate having holes of a high aspect ratio; and an underlayer coating forming composition can form the underlayer coating. The underlayer coating forming composition for forming by light irradiation an underlayer coating used as an underlayer of a photoresist in a lithography process of the manufacture of semiconductor devices, includes a polymerizable substance and a photopolymerization initiator. | 07-25-2013 |
20130189533 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYETHER STRUCTURE-CONTAINING RESIN - There is provided a resist underlayer film forming composition for forming a resist underlayer film providing heat resistance properties and hardmask characteristics. A resist underlayer film forming composition for lithography, comprising: a polymer containing a unit structure of Formula (1): | 07-25-2013 |
20130189197 | LONG-CHAIN OXYAMINOPOLYOL BASED GELATOR AND GEL - [PROBLEMS TO BE SOLVED] | 07-25-2013 |
20130183830 | SILICON-CONTAINING COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM, WHICH CONTAINS ORGANIC GROUP CONTAINING PROTECTED ALIPHATIC ALCOHOL - Described herein are compositions for forming an underlayer film for a solvent-developable resist. These compositions can include a hydrolyzable organosilane having a silicon atom bonded to an organic group containing a protected aliphatic alcohol group, a hydrolysate of the hydrolyzable organosilane, a hydrolysis-condensation product of the hydrolyzable organosilane, or a combination thereof and a solvent. The composition can form a resist underlayer film including, a hydrolyzable organosilane, a hydrolysate of the hydrolyzable organosilane, a hydrolysis-condensation product of the hydrolyzable organosilane, or a combination thereof, the silicon atom in the silane compound having a silicon atom bonded to an organic group containing a protected aliphatic alcohol group in a ratio of 0.1 to 40% by mol based on the total amount of silicon atoms. Also described is a method for applying the composition onto a semiconductor substrate and baking the composition to form a resist underlayer film. | 07-18-2013 |
20130177849 | EPOXY RESIN COMPOSITION HAVING MONOCYCLIC ALIPHATIC HYDROCARBON RING - There is provided a curable composition having a low viscosity and high cationic curability. A curable composition including an epoxy compound of Formula (1): | 07-11-2013 |
20130177763 | ADHESIVE COMPOSITION CONTAINING RESIN HAVING CARBON-CARBON MULTIPLE BOND - An adhesive composition has a polymer that contains a unit structure of Formula (1): | 07-11-2013 |
20130172525 | METHOD FOR PRODUCING EPOXY COMPOUND HAVING CYANURIC ACID SKELETON - There is provided an epoxy compound that provides properties of cured products combining high transparency with high flexural strength by being thermally cured while maintaining advantageous handling properties in a liquid state thereof; and a method for producing a composition by using the epoxy compound. A method for producing an epoxy compound of Formula (1): | 07-04-2013 |
20130172522 | EPOXY COMPOUND WITH NITROGEN-CONTAINING RING - There is provided an epoxy compound that provides properties of cured products combining high transparency with high flexural strength by being thermally cured while maintaining advantageous handling properties in a liquid state thereof. An epoxy compound of Formula (1): | 07-04-2013 |
20130154043 | FILM-FORMING COMPOSITION - A film-forming composition including a triazine ring-containing hyperbranched polymer with a repeating unit structure indicated by formula (1), and inorganic micro particles is provided. This enables the provision of a film-forming composition capable of hybridizing without reducing dispersion of the inorganic micro particles in a dispersion fluid, capable of depositing a coating film with a high refractive index, and suitable for electronic device film formation. | 06-20-2013 |
20130144066 | PRODUCTION METHOD OF ISOXAZOLINE-SUBSTITUTED BENZOIC ACID AMIDE COMPOUND - A production method of an isoxazoline-substituted benzoic acid amide compound of Formula (1) where X is a halogen atom, C | 06-06-2013 |
20130144037 | NOVEL LIPID PEPTIDE AND HYDROGEL - There is provided a lipid peptide that is capable of forming a hydrogel with an extremely small amount thereof over a liquid property range from acidic to alkaline, and a hydrogel having high environmental suitability, biocompatibility and biodegradability. A lipid peptide represented by Formula (1): | 06-06-2013 |
20130143035 | HYDROPHOBIC-ORGANIC-SOLVENT DISPERSION OF SURFACE-MODIFIED COLLOIDAL PARTICLES OF ANHYDROUS ZINC ANTIMONATE, COATING COMPOSITION CONTAINING THE SAME, AND COATED MEMBER - There is provided a hydrophobic-organic-solvent dispersion containing colloidal particles of anhydrous zinc antimonate having high transparency which has not been attained hitherto, a coating composition containing the hydrophobic-organic-solvent dispersion and a member coated with the coating composition. A hydrophobic-organic-solvent dispersion comprising colloidal particles of anhydrous zinc antimonate having a primary particle diameter of 5 to 500 nm, which are surface-modified with azi alkylamine and a surfactant having an acid group is used. The surfactant has a carboxylic acid group, a sulfonic acid group, or a phosphoric acid group. | 06-06-2013 |
20130141719 | METAL PARTICLES FOR SURFACE-ENHANCED RAMAN SCATTERING AND MOLECULAR SENSING - There is provided a high-sensitive Raman scattering sensing by regulating in metal nanoparticles for enhanced Raman scattering, particularly the strength of the enhanced electric field by controlling the distance between the particles to impart very strong Raman scattering properties. A metal nanoparticle material for molecular sensing, the metal nanoparticle material comprising: a metal nanoparticle aggregate including three to ten metal nanoparticles connected to each other through an organic molecule so that adjacent metal nanoparticles are bonded and spaced apart a predetermined distance, the aggregate containing a Raman active molecule within a field applied to the aggregate, wherein the metal nanoparticle material emits enhanced Raman scattering light from the Raman active molecule in an enhanced electric field; a method for producing the metal nanoparticle material for molecular sensing; and a molecular sensing by use of the metal nanoparticle material for molecular sensing. | 06-06-2013 |
20130140503 | PRECURSOR COMPOSITION FOR FORMING AMORPHOUS METAL OXIDE SEMICONDUCTOR LAYER, AMORPHOUS METAL OXIDE SEMICONDUCTOR LAYER, METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE - The invention provides a precursor composition for forming an amorphous metal oxide semiconductor layer, containing a metal salt, a primary amide, and a water-based solution. An amorphous metal oxide semiconductor layer is formed by use of the composition. | 06-06-2013 |
20130131282 | PRODUCTION METHOD OF POLYHYDROXYIMIDE AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION CONTAINING POLYHYDROXYIMIDE OBTAINED BY THE PRODUCTION METHOD - There is provided a simple production method of polyhydroxyimide and a positive photosensitive resin composition containing the polyhydroxyimide. A production method of a polyhydroxyimide comprising: adding an acid component that is at least one type of carboxylic acid having a pKa of 0 to 5 to a polyhydroxyimide precursor of Formula (1): | 05-23-2013 |
20130123397 | CRYSTALLINE RESIN COMPOSITION - It is an object to provide a nucleating agent that is suitable for promoting crystallization of a crystalline resin and is derived from a natural product, in order to improve the moldability and the heat resistance of crystalline resins such as a poly(lactic acid) resin and a polyolefin resin; and to provide a crystalline resin composition including the nucleating agent. There is provided a crystalline resin composition including a crystalline resin and an amino acid metal salt; and a nucleating agent including the amino acid metal salt. | 05-16-2013 |
20130122710 | CARBAZOLE NOVOLAK RESIN - There is provided a resist underlayer film having heat resistance that is used for a lithography process in the production of semiconductor devices, and a high refractive index film having transparency that is used for an electronic device. A polymer comprising a unit structure of Formula (1): | 05-16-2013 |
20130108871 | BASIC ZINC CYANURATE FINE PARTICLES, AND METHOD FOR PRODUCING SAME | 05-02-2013 |
20130095085 | METHOD FOR PRODUCING HEMATOPOIETIC STEM CELLS - An expanding agent for hematopoietic stem cells and/or hematopoietic progenitor cells useful as a therapy for various hematopoietic diseases and useful for improvement in the efficiency of gene transfer into hematopoietic stem cells for gene therapy is provided. | 04-18-2013 |
20130092871 | COMPOSITION FOR POLISHING SILICON CARBIDE SUBSTRATE AND METHOD FOR POLISHING SILICON CARBIDE SUBSTRATE - A silicon carbide substrate polishing composition for polishing a surface of a silicon carbide substrate contains water and colloidal silica particles having a true specific gravity of 2.10 to 2.30, and has a free alkali metal ion concentration of 1 ppm to 150 ppm. | 04-18-2013 |
20130084305 | COSMETIC, EXTERNAL SKIN PREPARATION, AND MEDICAL INSTRUMENT - It is an object of the present invention to provide a cosmetic or external skin preparation that has an improved feel in use, e.g., excellent stretching on the skin surface, excellent permeation into the skin, and no stickiness, or crinkles. A cosmetic or an external skin preparation, and a medical instrument, comprising at least one lipid peptide-based gelator that contains a low-molecular lipid peptide of Formula (1): | 04-04-2013 |
20130078814 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING ANION GROUP - There is provided a method of making a semiconductor device utilizing a resist underlayer film forming composition comprising a silane compound containing an anion group, wherein the silane compound containing an anion group is a hydrolyzable organosilane in which an organic group containing an anion group is bonded to a silicon atom and the anion group forms a salt structure, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. The anion group may be a carboxylic acid anion, a phenolate anion, a sulfonic acid anion, or a phosphonic acid anion. The hydrolyzable organosilane may be a compound of Formula (1): R | 03-28-2013 |
20130075651 | METHOD FOR PRODUCING PURIFIED ACTIVE SILICIC ACID SOLUTION AND SILICA SOL - A method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. The method fulfills the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 μm is 50% or more. | 03-28-2013 |
20130060050 | PROCESS FOR PRODUCING THIOPHENE COMPOUND AND INTERMEDIATE THEREOF - Provided are γ-ketosulfide compounds represented by the formula (5): | 03-07-2013 |
20130059951 | HIGH HEAT-RESISTANT POLYGERMANE COMPOUND WITH SULFUR-CONTAINING ORGANIC GROUP - There is provided a polygermane compound forming a film having a high refractive index and thermal stability, and containing a sulfur atom-containing organic group as a group bonded to a germanium atom. A polygermane compound comprising a sulfur atom-containing organic group as a group bonded to a germanium atom, in which the sulfur atom-containing organic group is a group of Formula [1]: | 03-07-2013 |
20130055646 | Method for producing purified alkali silicate aqueous solution and silica sol - To provide a method for producing an alkali silicate aqueous solution containing a reduced amount of foreign substance of plate-like fine particles and a method for producing a silica sol containing a reduced amount of foreign substance of plate-like fine particles. A method for producing an alkali silicate aqueous solution fulfilling the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm is determined to be 0 to 30%. The method for producing an alkali silicate aqueous solution includes the steps of adjusting a silica concentration of an alkali silicate aqueous solution to 0.5 to 10.0% by mass and filtering the alkali silicate aqueous solution through a filter having a removal rate of particles with a primary particle size of 1.0 μm of 50% or more. | 03-07-2013 |
20130053413 | CRYSTALLINE FORMS OF PITAVASTATIN CALCIUM - The present invention is directed to new crystalline forms of Pitavastatin hemicalcium salt, referred to hereinafter as polymorphic Forms A, B, C, D, E and F, as well as the amorphous form. Furthermore, the present invention is directed to processes for the preparation of these crystalline forms and the amorphous form and pharmaceutical compositions comprising these crystalline forms or the amorphous forms. | 02-28-2013 |
20130040139 | SURFACE-MODIFIED FINE FIBERS - There are provided surface-modified fine fibers that preserve the inherent physical properties of a matrix polymer, the surface of which is efficiently modified, that can be easily produced, and that are formed by an electrospinning method from a spinning material that is a resin composition including a fluorine-containing highly branched polymer (a) and a thermoplastic resin (b); a method for producing the fiber; and a method for modifying the surface of fine fibers. | 02-14-2013 |
20130029087 | COMPOSITION FOR FORMING THERMOSET FILM HAVING PHOTO-ALIGNMENT PROPERTIES - There is provided a material that after the formation of a cured film, exhibits high solvent resistance, liquid crystal-alignment properties, heat resistance, and high transparency. A composition for forming thermoset film having photo-alignment properties and containing a component (A) that is a compound having a photo-aligning group and a hydroxy group, a component (B) that is a polymer having any one of or both of a hydroxy group and a carboxy group, and a component (C) that is a crosslinker. | 01-31-2013 |
20130026132 | PLANARIZING FILM-FORMING COMPOSITION FOR HARD DISK AND HARD DISK PRODUCTION METHOD USING SAME - A planarizing film-forming composition for a hard disk that is a non-magnetic filler is sufficiently filled into fine grooves on a magnetic material surface (surface), and is required not to cause contraction in the filled parts at the time of photo-curing (at the time of exposure) and post-exposure baking; and a method for producing a hard disk using the composition. The composition comprising at least one polyfunctional (meth)acrylate compound being in a liquid state at room temperature and atmospheric pressure and having a molecular weight of 300 to 10,000. The compound preferably has 2 to 20 (meth)acrylate groups in the molecule, or the compound preferably has a molecular weight of 300 to 2,300. A method for producing a hard disk comprising: forming a concave-convex shape on the surface; covering the surface having the concave-convex shape with the composition; and etching the covered surface for planarization until the surface is exposed. | 01-31-2013 |
20130025502 | COMPOSITION FOR FORMING THERMOSET FILM HAVING PHOTO-ALIGNMENT PROPERTIES - There is provided a material that exhibits high solvent resistance after the formation of a cured film, excellent photo-alignment capability relative to a polymerizable liquid crystal, satisfactory heat resistance, and high transparency and moreover, that can be dissolved in a glycol-based solvent, a ketone-based solvent, or a lactic acid ester-based solvent that is applicable to the production of an overcoating of a color filter, during the formation of the cured film. A composition for forming thermoset film having photo-alignment properties, including: a component (A) that is a compound having a photo-aligning group and a hydroxy group; and a component (B) that is a silicon isocyanate compound. A liquid crystal alignment layer formed from the thermoset film forming composition, and an optical device with a retardation layer obtained by use of the thermoset film forming composition. | 01-31-2013 |
20130023687 | SURFACTANT FOR STABILIZING WATER/SUPERCRITICAL CARBON DIOXIDE MICROEMULSION - There is provided a highly branched hydrocarbon based surfactant for stabilizing a water/supercritical carbon dioxide microemulsion. A surfactant comprising: a sulfate compound of Formula (1): | 01-24-2013 |
20130023018 | METHOD FOR PRODUCING ACYLOXYPYRANONE COMPOUND, METHOD FOR PRODUCING ALKYNE COMPOUND, AND METHOD FOR PRODUCING DIHYDROFURAN COMPOUND - An acylating agent and a hydrolase are caused to act on a hydroxypyranone represented by formula (I) in a water-containing organic solvent, to thereby produce an acyloxypyranone compound represented by formula (II) (wherein R | 01-24-2013 |
20130021565 | COMPOSITION FOR FORMING THERMOSET FILM HAVING PHOTO-ALIGNMENT PROPERTIES - There is provided a material that exhibits high solvent resistance after the formation of a cured film, excellent photo-alignment capability relative to a polymerizable liquid crystal, satisfactory heat resistance, and high transparency and moreover, that can be dissolved in a glycol-based solvent, a ketone-based solvent, or a lactic acid ester-based solvent that is applicable to the production of an overcoating of a color filter, during the formation of the cured film. A composition for forming thermoset film having photo-alignment properties and containing a component (A) that is a compound having a photo-aligning group and a hydroxy group, a component (B) that is a melamine formaldehyde resin, and a component (C) that is a crosslinker. | 01-24-2013 |
20120318662 | METHOD FOR FORMING BOND BETWEEN DIFFERENT ELEMENTS - The present invention provides a doping technique that forms a stable amorphous silicon film and a stable polycrystalline silicon film at a low temperature and simultaneously that imparts conductivity in an atmospheric pressure environment. A method for producing a compound containing a bond between different elements belonging to Group 4 to Group 15 of the periodic table, the method included: applying, at a low frequency and atmospheric pressure, high voltage to an inside of an electric discharge tube obtained by attaching high-voltage electrodes to a metal tube or an insulator tube or between flat plate electrodes while passing an introduction gas, so as to convert molecules present in the electric discharge tube or between the flat plate electrodes into a plasma; and applying the plasma to substances to be irradiated, the substances to be irradiated being two or more elementary substances or compounds. | 12-20-2012 |
20120316266 | SILANE SURFACE-TREATED METAL OXIDE FINE PARTICLES AND PRODUCTION METHOD FOR SAME - There is provided a colloidal particle of an oxide of at least one metal selected from the group consisting of Ti, Fe, Zr, Sn, Ta, Nb, Y, Mo, W, Pb, In, Bi, and Sr, which is capable of being dispersed in a hydrophobic organic solvent, and a hydrophilic organic solvent dispersed sol thereof or a sol thereof dispersed in a hydrophobic organic solvent having a solubility of water of 0.05 to 12% by mass, and further, a fine powder of a metal oxide colloidal particle capable of being redispersed in various organic solvents. A silane treated modified metal oxide colloidal particle on the surface of which an amine compound and 1 to 4 silyl group(s) per 1 nm | 12-13-2012 |
20120316177 | EXTENDED RELEASE PREPARATION - Disclosed is a sustained release preparation which releases a poorly soluble medicinal agent in a pH-independent manner. Also disclosed is a sustained release preparation which is capable of controlling the C | 12-13-2012 |
20120315765 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING NITROGEN-CONTAINING RING - There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming composition for lithography, includes as a silane compound, a hydrolyzable organosilane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof, wherein the hydrolyzable organosilane is a hydrolyzable organosilane of Formula (1): | 12-13-2012 |
20120310005 | METHOD FOR PRODUCING 2-AZAADAMANTANE - To provide a method whereby a 2-azaadamantane can easily be obtained in good yield. | 12-06-2012 |
20120301942 | CHIP PROVIDED WITH FILM HAVING HOLE PATTERN WITH THE USE OF THERMORESPONSIVE POLYMER AND METHOD OF PRODUCING THE SAME - A chip useful for treating cells and the like which has a mechanism and a structure wherein the size of a hole pattern is arbitrarily changed so that cells can easily move in and get out from the hole in scattering or collecting cells but can hardly get out from the hole during washing or antigen-stimulation. The chip comprises a crosslinked product of a temperature-responsive polymer as a constituting member and being provided with a film having a hole pattern on the surface of a baseboard. A method of producing the chip comprises applying a composition containing a crosslinkable temperature-responsive polymer on the surface of a baseboard to thereby form a coating film, crosslinking the coating film to thereby form the crosslinked product as described above and then forming a hole pattern on the coating film of the crosslinked product. | 11-29-2012 |
20120301827 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND LYOPHOBIC FILM - A positive photosensitive resin composition that forms an image for a liquid crystal display device and an organic EL display device, for example. The resin is made of a cured film that is highly water repellent and highly oleophobic on the surface. The resin has insulating properties, retains an excellent image and causes no reflow, for example, when being cured to form a film having excellent reworkability. A positive photosensitive resin composition comprising component (A), component (B), component (C) and component (D); Component (A) is an acrylic polymer containing an acid dissociable group, an aliphatic hydroxy group, and an N-substituted maleimide group; Component (B) is an acrylic polymer containing an acid dissociable group and a blocked isocyanate group; Component (C) is an acrylic polymer containing an acid dissociable group, an aliphatic hydroxy group, a C | 11-29-2012 |
20120298842 | PRODUCTION METHOD OF MICROLENS - A production method of a solid-state imaging device in which microlenses are arranged adjacent to each other on a substrate, includes: a first process of forming first microlenses on a surface of the substrate leaving space therebetween for providing second microlenses; and a second process of applying an overcoating material onto the surface of the substrate on which the first microlenses are formed, drying the overcoating material, exposing the overcoating material to light using a gray scale mask, and developing the exposed overcoating material, so as to form second microlenses in the space between the first microlenses adjacent to each other. | 11-29-2012 |
20120295199 | LONG-CHAIN ALKYLENE-CONTAINING CURABLE EPOXY RESIN COMPOSITION - A curable composition that maintains good handleability in the liquid form and that can be photo- or heat-cured to form a cured product having physical properties including both high transparency and high flexural strength. A curable composition includes, an epoxy compound of (1): | 11-22-2012 |
20120292487 | POSITIVE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS - There is provided a resist composition suitable for forming a microlens which is excellent in transparency, heat resistance, and sensitivity characteristics, excellent in solubility in a developer, and as the result thereof has high resolution. A positive resist composition comprising; a component (A): an alkali-soluble polymer; a component (B): a compound having an organic group to be photolyzed to generate an alkali-soluble group; a component (C): a crosslinkable compound of Formula (1): | 11-22-2012 |
20120288795 | COMPOSITION FOR FORMATION OF PHOTOSENSITIVE RESIST UNDERLAYER FILM AND METHOD FOR FORMATION OF RESIST PATTERN - A composition for forming a photosensitive resist underlayer film and a method for forming a resist pattern. The composition for forming a photosensitive resist underlayer film includes a polymer having a structural unit of Formula (1), a compound having at least two vinyl ether groups, a photo-acid generator; and a solvent: | 11-15-2012 |
20120268840 | CARBON NANO-TUBE DISPERSANT - Disclosed is a carbon nano-tube dispersant comprising a highly branched polymer having a repeating unit represented by, for example, formula (12) or (13), wherein the highly branched polymer is produced by the polycondensation of a triarylamine compound and an aldehyde compound and/or a ketone compound in the presence of an acid catalyst. The carbon nano-tube dispersant enables the dispersion of CNTs in a medium such as an organic solvent until the CNTs are so decomposed as to have an individual size. | 10-25-2012 |
20120258059 | COSMETIC, EXTERNAL SKIN PREPARATION, AND MEDICAL INSTRUMENT - It is an object of the present invention to provide a cosmetic or external skin preparation that has an improved feel in use, e.g., excellent stretching on the skin surface, excellent permeation into the skin, and no stickiness, or crinkles. A cosmetic or an external skin preparation, and a medical instrument, comprising at least one lipid peptide-based gelator that contains a low-molecular lipid peptide of Formula (1): | 10-11-2012 |
20120253012 | METHOD FOR PREPARING LIPOPEPTIDE COMPOUND - There is provided a practical method for preparing lipopeptide compounds, which method is capable of inexpensive mass production without requiring complicated operations. The lipopeptide compound of formula (3): | 10-04-2012 |
20120251955 | COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM - There is provided a composition for forming a resist underlayer film for electron beam or EUV lithography that is used in a device manufacture process using EUV lithography, reduces the adverse effects caused by an electron beam or EUV, and is effective for the formation of a good resist pattern and a resist pattern formation method using the composition for forming a resist underlayer film for lithography. A composition for forming a resist underlayer film for electron beam or EUV lithography, comprising: a polymer having a repeating unit structure of Formula (1): | 10-04-2012 |
20120251950 | COMPOSITION FOR FORMING PHOTOSENSITIVE RESIST UNDERLAYER FILM - A composition for forming a resist underlayer film to be used in a lithography process, that includes: a polymer containing unit structures of Formula (1), Formula (2), and Formula (3): | 10-04-2012 |
20120245200 | CRYSTAL FORM OF QUINOLINE COMPOUND AND PROCESS FOR ITS PRODUCTION - A method for producing a drug substance of crystalline pitavastatin calcium excellent in stability, is presented. In the production of a compound (pitavastatin calcium) represented by the formula ( | 09-27-2012 |
20120220461 | CRYSTAL FORMS OF SULFONYLUREA COMPOUND AND METHOD FOR PRODUCING THE SAME - Crystal forms of sulfonylurea compound and method for producing the same. It has been found that a sulfonylurea compound of Formula (1): | 08-30-2012 |
20120209005 | FUSED HETEROCYCLIC COMPOUNDS AND THROMBOPOIETIN RECEPTOR ACTIVATORS - Fused heterocyclic compounds useful for prevention, treatment or improvement of diseases against which activation of the thrombopoietin receptor is effective are provided. | 08-16-2012 |
20120178261 | SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM - There is provided a lithographic resist underlayer film-forming composition for forming a resist underlayer film which can be used as a hard mask. A lithographic resist underlayer film-forming composition including a silane compound having sulfonamide group, wherein the silane compound having sulfonamide group is a hydrolyzable organosilane having a sulfonamide group in the molecule, a hydrolyzate thereof, or a hydrolytic condensation product thereof. The composition including a silane compound having sulfonamide group and a silane compound lacking a sulfonamide group, wherein the silane compound having sulfonamide group is present within the silane compounds overall in a proportion of less than 1 mol %, for example 0.1 to 0.95 mol %. | 07-12-2012 |
20120172615 | ISOXAZOLINE-SUBSTITUTED BENZAMIDE COMPOUND AND PESTICIDE - A substituted alkenylbenzene compound of formula (4): | 07-05-2012 |
20120172557 | PHOTOSENSITIVE RESIN COMPOSITION CONTAINING COPOLYMER - There is provided a photosensitive resin composition having desired properties. A photosensitive resin composition comprising: a component (A) that is a copolymer including a structural unit of Formula (1) and at least one structural unit of Formula (2), and a component (B) that is a photosensitizer: | 07-05-2012 |
20120156598 | PHOTOSENSITIVE RESIN COMPOSITION FOR MICROLENS - There is provided a photosensitive resin composition for a microlens. A photosensitive resin composition for a microlens, comprising a component (A), a component (B) and a component (C), wherein the component (A) is a polymer having a maleimide structural unit of Formula (1), the component (B) is a cross-linking agent, and the component (C) is a photosensitizing agent. | 06-21-2012 |
20120148809 | HIGH HARDNESS IMPRINT MATERIAL - There is provided an imprint material from which a film having a high hardness can be formed. An imprint material comprising a component (A), a component (B) and a component (C), the component (A) being a compound having, in the molecule thereof, five or more polymerizable groups, the component (B) being a compound having, in the molecule thereof, two polymerizable groups, and the component (C) being a photo-radical generator. | 06-14-2012 |
20120148808 | TRANSPARENT FLUORINE-CONTAINING POLYMER - Disclosed is a fluorine-containing polymer obtained by polymerizing a 1,6-diene-type ether compound represented by formula [1] and, for example, a (meth)acrylic acid compound represented by formula [2]. The fluorine-containing polymer shows high transparency, has a high glass transition point, and is soluble in a solvent and therefore has moldability. In the case where a (meth)acrylic unit has a reactive substituent, by utilizing the crosslinking reaction thereof, a thin film having high solvent resistance can be produced. | 06-14-2012 |
20120142195 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR LITHOGRAPHY INCLUDING RESIN CONTAINING ALICYCLIC RING AND AROMATIC RING - There is provided a resist underlayer film having both heat resistance and etching selectivity. A composition for forming a resist underlayer film for lithography, comprising a reaction product (C) of an alicyclic epoxy polymer (A) with a condensed-ring aromatic carboxylic acid and monocyclic aromatic carboxylic acid (B). The alicyclic epoxy polymer (A) may include a repeating structural unit of Formula (1): | 06-07-2012 |
20120135206 | FLUORINE-CONTAINING HIGHLY BRANCHED POYMER AND RESIN COMPOSITION CONTAINING THE SAME - It is an object to provide a compound that can provide a molded article and a coating film excellent not only in solubility in an organic solvent, but also in miscibility with/dispersibility in a matrix resin, causing no aggregation in a matrix resin, excellent in surface modification property, and having high transparency. A fluorine-containing highly branched polymer obtained by polymerizing a monomer A having two or more radical polymerizable double bonds in the molecule thereof with a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in the molecule thereof in the presence of a polymerization initiator C in a content of 5% by mol or more and 200% by mol or less, based on the total molar amount of the monomer A and the monomer B; and a resin composition comprising the polymer. | 05-31-2012 |
20120129102 | PHOTOSENSITIVE COMPOSITION INCLUDING PHOTOPOLYMERIZABLE POLYMER HAVING FLUORENE SKELETON - A material for a planarization film, a spacer, and a microlens that satisfies heat resistance and transparency requirements without impairing a refractive index. A negative photosensitive composition includes a photopolymerizable polymer (A) having a fluorene skeleton, a monomer (B) having a fluorene skeleton and a photopolymerization initiator (C). The photopolymerizable polymer (A) having a fluorene skeleton may include a moiety that is soluble in an alkaline developer solution, or a unit structure of Formula (1): | 05-24-2012 |
20120128891 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT - There is provided a composition for curing a resist underlayer film used as an underlayer of a resist for nanoimprint in nanoimprint lithography of a pattern forming process by heat-baking, light-irradiation or both of them to form the resist underlayer film. A composition for forming a resist underlayer film used for nanoimprint in a pattern forming process using nanoimprint by performing heat-baking, light-irradiation, or both of them, the composition comprising a silicon atom-containing polymerizable compound (A), a polymerization initiator (B) and a solvent (C). The polymerizable compound (A) may contain silicon atoms in a content of 5 to 45% by mass. The polymerizable compound (A) may be a polymerizable compound having at least one cation polymerizable reactive group, a polymerizable compound having at least one radical polymerizable reactive group, or a combination of them, and the polymerization initiator (B) may be a photopolymerization initiator. | 05-24-2012 |
20120128640 | HETEROCYCLIC COMPOUNDS AND EXPANSION AGENTS FOR HEMATOPOIETIC STEM CELLS - An expansion agent for hematopoietic stem cells and/or hematopoietic progenitor cells useful for improvement in the efficiency of gene transfer into hematopoietic stem cells for gene therapy useful for treatment of various disorders is provided. | 05-24-2012 |
20120114879 | COMPOSITION FOR FORMING THERMOSET FILM HAVING PHOTO ALIGNMENT PROPERTIES - A material from which a cured film exhibiting high solvent resistance, liquid crystal-alignment performance, heat resistance and high transparency can be formed. A composition for forming a thermoset film having photo alignment properties, the composition comprising: a component (A) that is an acrylic copolymer having a photodimerizing moiety and a thermal cross-linking moiety; a component (B) that is an acrylic polymer having at least one of a C | 05-10-2012 |
20120108759 | CAGE-SHAPED CYCLOPENTANOIC DIANHYDRIDE, METHOD FOR PRODUCTION THEREOF, AND POLYIMIDE - A cage 1,2,3,4-cyclopentanetetracarboxylic acid ( | 05-03-2012 |
20120108680 | LONG-CHAIN GLYCYL POLYOL TYPE GELATOR AND GEL - A gelator made of an aliphatic oxyglycyl polyol that is capable of forming a gel by a small amount of addition in a pH range from acidic to alkaline regions, and a gel having high environmental compatibility, biocompatibility and biodegradability. A gelator including an aliphatic oxyglycyl polyol of Formula (1) wherein R is a C | 05-03-2012 |
20120101236 | POLYIMIDE PRECURSOR COMPOSITION CONTAINING POLYAMIC ACID ALKYL ESTER - To provide a polyamic acid ester-containing polyimide precursor composition having a good storage stability, from which a polyimide film having a high imidization degree and excellent adhesion to an inorganic substrate can be obtained. | 04-26-2012 |
20120101126 | CRYSTALLINE FORMS OF PITAVASTATIN CALCIUM - The present invention is directed to new crystalline forms of Pitavastatin hemicalcium salt, referred to hereinafter as polymorphic Forms A, B, C, D, E and F, as well as the amorphous form. Furthermore, the present invention is directed to processes for the preparation of these crystalline forms and the amorphous form and pharmaceutical compositions comprising these crystalline forms or the amorphous form. | 04-26-2012 |
20120095043 | TRIGLYCERIDE-LOWERING AGENT AND HYPERINSULINISM-AMELIORATING AGENT - The present invention is directed to a triglyceride-lowering agent, exhibiting excellent triglyceride-lowering effect and a hyperinsulinemia-ameliorating agent. | 04-19-2012 |
20120094232 | PRODUCTION METHOD OF POLYHYDROXYIMIDE - There is provided a simple production method of a polyhydroxyimide. A production method of a polyhydroxyimide, characterized by comprising adding to a polyhydroxyimide precursor containing a repeating structure of Formula (1): | 04-19-2012 |
20120088888 | POLYIMIDE PRECURSOR, POLYIMIDE, AND LIQUID CRYSTAL ALIGNING AGENT - To provide a novel polyimide precursor or polyimide which can provide a liquid crystal alignment film having a low volume resistivity, a liquid crystal aligning agent containing these polymers, a liquid crystal alignment film and a novel diamine which is useful as the starting material of these polymers. | 04-12-2012 |
20120082805 | COMPOSITION FOR FORMING THERMOSET FILM HAVING PHOTO ALIGNMENT PROPERTIES - A material from which a cured film exhibiting high solvent resistance, liquid crystal-alignment performance, heat resistance and high transparency can be formed. A composition for forming a thermoset film having photo alignment properties, including: a component (A) that is an acrylic copolymer having a photodimerizing moiety and a thermal cross-linking moiety; and a component (B) that is a cross-linking agent. | 04-05-2012 |
20120077345 | CARBAZOLE NOVOLAK RESIN - There is provided a resist underlayer film having heat resistance that is used for a lithography process in the production of semiconductor devices, and a high refractive index film having transparency that is used for an electronic device. A polymer comprising a unit structure of Formula ( | 03-29-2012 |
20120070994 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING SULFIDE BOND - There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hard mask; and a forming method of a resist pattern using the underlayer film forming composition for lithography. A resist underlayer film forming composition for lithography comprising: as a silicon atom-containing compound, a hydrolyzable organosilane containing a sulfur atom-containing group, a hydrolysis product thereof, or a hydrolysis-condensation product thereof, wherein in the whole silicon atom-containing compound, the ratio of a sulfur atom to a silicon atom is less than 5% by mole. The hydrolyzable organosilane is preferably a compound of Formula (1): [R | 03-22-2012 |
20120065320 | FLUORINE-CONTAINING 1,6-DIENE ETHER COMPOUND AND FLUORINE-CONTAINING POLYMER - A fluorine-containing polymer obtained using a 1,6-diene ether compound represented by formula [1] is a high-performance polymer exhibiting a low refractive index, high glass transition point, a high degree of transparency, and solubility in solvents. There are many potential uses, such as use as a coating material or bulk material. For example, said polymer could be effectively used in high-tech fields such as: optical materials such as low-reflection films and optical waveguide cladding; semiconductor materials such as pellicles and resists in semiconductor lithography; and protective film materials, insulating film materials, and water-repellent materials. | 03-15-2012 |
20120059169 | NOVEL CRYSTAL FORM OF TRICYCLIC BENZOPYRAN COMPOUND AND PRODUCTION METHOD THEREOF - Crystal forms of (3R,4S)-7-hydroxymethyl-2,2,9-trimethyl-4-(phenethylamino)-3,4-dihydro-2H-pyrano[2,3-g]quinolin-3-ol that are excellent as a drug, and production methods thereof. Production methods include crystallizing (3R,4S)-7-hydroxymethyl-2,2,9-trimethyl-4-(phenethylamino)-3,4-dihydro-2H-pyrano[2,3-g]quinolin-3-ol from an acetate ester solvent, an aliphatic hydrocarbon solvent, a nitrile solvent, an aromatic hydrocarbon solvent, a ketone solvent or an ether solvent, and crystal forms obtained according to the methods. | 03-08-2012 |
20120059136 | METHOD FOR PRODUCING HIGHLY BRANCHED POLYMER - A method for producing a highly branched polymer, with which a molecular weight can be controlled without using a polymerization inhibitor and a polymer having a controlled molecular weight can be produced safely even in a case of mass production in an industrial scale. A method for producing a highly branched polymer including polymerizing a monomer A having two or more radical polymerizable double bonds in a molecule, in the presence of a polymerization initiator B in an amount of 5% by mol to 200% by mol with respect to 1 mol of the monomer A at a temperature 20° C. higher than a 10-hour half-life temperature of the polymerization initiator B or higher. | 03-08-2012 |
20120046397 | METHOD FOR PRODUCING PHOSPHONIC ACID METAL SALT FINE PARTICLES - There is provided to a method for efficiently producing phosphonic acid metal salt fine particles with an average particle diameter of 0.5 μm or less with high efficiency. A method for producing phosphonic acid metal salt fine particles, comprising: a) causing a reaction of a phosphonic acid compound of Formula (I): | 02-23-2012 |
20120045899 | PATTERN REVERSAL FILM FORMING COMPOSITION AND METHOD OF FORMING REVERSED PATTERN - There is provided to a pattern reversal film forming composition that is capable of forming a pattern reversal film which is not mixed with a resist pattern formed on a substrate, and that is only capable of forming a pattern reversal film advantageously covering the pattern, but also irrespective of whether the resist pattern is coarse or fine, capable of forming a planar film excellent in temporal stability on the pattern. A pattern reversal film forming composition including a polysiloxane, an additive and an organic solvent, characterized in that the polysiloxane is a product of a hydrolysis and/or condensation reaction of a silane compound containing a tetraalkoxysilane of Si(OR | 02-23-2012 |
20120040291 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY - There is provided a compositions of resist underlayer films for EUV lithography that is used in a production process of devices employing EUV lithography, that reduces adverse effects caused by EUV, and that has a beneficial effect on the formation of a favorable resist pattern; and a method for forming resist patterns using the composition of resist underlayer films for EUV lithography. A composition for forming a resist underlayer film for an EUV lithography process used in production of a semiconductor device, comprising a novolac resin containing a halogen atom. The novolac resin may include a cross-linkable group composed of an epoxy group, a hydroxy group, or a combination thereof. The halogen atom may be a bromine atom or an iodine atom. The novolac resin may be a reaction product of a novolac resin or an epoxidized novolac resin and a halogenated benzoic acid; or a reaction product of a glycidyloxy novolac resin and diiodosalicylic acid. | 02-16-2012 |
20120035108 | SPRAY BASE MATERIAL INCLUDING LOW-MOLECULAR GELATOR - There is provided a spray base material that can be safely used with a sense of security, that prevents leakage of liquid from a spray container, that is sprayable under any condition (when inverted, for example), that is sprayable to achieve uniform coating of the surface of an object (surface to be sprayed) without scattering, that causes no dripping from a sprayed surface, and that is safe when sprayed on a skin surface and the like; and a spray base material with an excellent sprayability that can include both hydrophilic and hydrophobic low-molecular compounds such as physiologically active compounds and perfume components to be used in pharmaceuticals, agrochemicals, and cosmetics, and that has a sustained release property. A spray base material comprising an aqueous medium that is gelled by a low-molecular gelator in the medium, wherein the low-molecular gelator includes one, two, or more compounds selected from a group consisting of low-molecular compounds capable of gelling the aqueous medium via self-assembly. | 02-09-2012 |
20120029187 | HALOALKYLSULFONANILIDE DERIVATIVE - Novel herbicides are provided. | 02-02-2012 |
20120027760 | ADIPONECTIN RECEPTOR AND GENE ENCODING THE SAME - The object is to isolate and identify human and mouse adiponectin receptors, to provide a novel protein having adiponectin binding ability, and to provide a screening method and screening kit for a ligand, agonist and antagonist to an adiponectin receptor using such protein. To achieve this object, a protein is used, as novel protein having adiponectin binding ability, that is (a) a protein comprising an amino acid sequence according to Seq. No. 2, 4, 6 or 8, or (b) a protein comprising an amino acid sequence according to Seq. No. 2, 4, 6 or 8 with one or more amino acids deleted, replaced or added, and having adiponectin binding ability. | 02-02-2012 |
20110319624 | CRYSTAL FORM OF QUINOLINE COMPOUND AND PROCESS FOR ITS PRODUCTION - A method for producing a drug substance of crystalline pitavastatin calcium excellent in stability, is presented. In the production of a compound (pitavastatin calcium) represented by the formula (1): | 12-29-2011 |
20110319589 | LONG CHAIN ALKYLENE GROUP-CONTAINING EPOXY COMPOUND - It is an object to provide a liquid thermosetting composition that yields an epoxy resin having physical properties of the cured product such as high flexural strength along with adequate handleability as liquid, to be used in transparent sealants for optical semiconductors, such as transparent sealants for LEDs (light-emitting devices) and the like. There is provided a thermosetting composition containing an epoxy compound that a side chain between a triazinetrione ring and an epoxy group substituted on the triazinetrione ring is long (elongated). | 12-29-2011 |