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Tokyo Electron Limited
MINATO-KU, JP
1. 20090275207 PLASMA PROCESSING METHOD AND COMPUTER READABLE STORAGE MEDIUM 11-05-20092. 20090254226 TEMPERATURE SETTING METHOD OF HEAT PROCESSING PLATE, TEMPERATURE SETTING APPARATUS OF HEAT PROCESSING PLATE, PROGRAM, AND COMPUTER-READABLE RECORDING MEDIUM RECORDING PROGRAM THEREON 10-08-2009
3. 20090133715 CLEANING METHOD - process chamber of a substrate processing apparatus such as an RTP apparatus a carrier is placed and configured to carry out a 05-28-2009
4. 20090114296 VALVE ELEMENT, VALVE, SELECTOR VALVE, AND TRAP DEVICE 05-07-2009
5. 20090108452 Semiconductor device and method for manufacturing the same 04-30-2009
6. 20090065146 PLASMA PROCESSING APPARATUS - Gas delivery ports 15 are equidistantly formed at a plurality of positions along the inner wall of the chamber 1 and are 03-12-2009
7. 20090008369 PROCESSING DEVICE - processing apparatus for performing a specified process on a target object at a predetermined process pressure 01-08-2009
8. 20090000740 Vaporizer and Processor - vaporizer for vaporizing a force-fed liquid source material in a depressurized atmosphere to generate a source gas and 01-01-2009
9. 20080228311 SUBSTRATE PROCESSING APPARATUS, CONTROL METHOD FOR THE APPARATUS, AND PROGRAM FOR IMPLEMENTING THE METHOD 09-18-2008
10. 20080214017 Forming Method and Forming System for Insulation Film 09-04-2008
11. 20080213504 Plasma Film-Forming Apparatus and Plasma Film-Forming Method 09-04-2008
12. 20080197121 METHOD AND DEVICE FOR CONTROLLING TEMPERATURE OF A SUBSTRATE USING AN INTERNAL TEMPERATURE CONTROL DEVICE 08-21-2008