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NISSAN CHEMICAL INDUSTRIES, LTD.
TOKYO, JP
1. 20090270300 Composition for removing protective layer in fabrication of mems and method for removing same 10-29-20092. 20090270299 Composition for removing protective layer in fabrication of MEMS and method for removing same 10-29-2009
3. 20090163657 Polymer Structure Whose Surface and/or Interface Is Modified, and Method for Producing the Same 06-25-2009
4. 20090162782 Silicon-Containing Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating 06-25-2009
5. 20090156643 Substituted isoxazoline compound and pesticide 06-18-2009
6. 20090131676 PYRAZOLE COMPOUNDS AND THROMBOPOIETIN RECEPTOR ACTIVATORS 05-21-2009
7. 20090131659 AMIDE COMPOUND AND THROMBOPOIETIN RECEPTOR ACTIVATOR 05-21-2009
8. 20090130594 Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating 05-21-2009
9. 20090118125 Water Dispersible Agricultural Chemical Granules and Method of Producing the Same 05-07-2009
10. 20090117493 Anti-Reflective Coating Forming Composition Containing Reaction Product of Isocyanuric Acid Compound with Benzoic Acid Compound 05-07-2009
11. 20090088313 Production Method of Alkaline Zirconia Sol 04-02-2009
12. 20090082583 Heterogeneous catalyst and process for producing oxirane compound with the catalyst 03-26-2009
13. 20090053647 Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative 02-26-2009
14. 20080318158 Underlayer Coating Forming Composition for Lithography Containing Polysilane Compound 12-25-2008
15. 20080268379 Anti-Reflective Coating Forming Composition For Lithography Containing Polymer Having Ethylenedicarbonyl Structure 10-30-2008
16. 20080268152 Composite sol, process for producing the same, and ink-jet recording medium 10-30-2008
17. 20080234502 Production method of optically active epoxy compound, complex used for the method and production method of the complex 09-25-2008
18. 20080220975 Aqueous suspended agricultural chemical composition 09-11-2008
19. 20080206680 Composition for forming anti-reflective coating for use in lithography 08-28-2008