20090032911 | PATTERNED THIN SOI - A process for treating a structure to prepare it for electronics or optoelectronics applications. The structure includes a bulk substrate, an oxide layer, and a semiconductor layer, and the process includes providing a masking to define on the semiconductor layer a desired pattern, and applying a thermal treatment for removing a controlled thickness of oxide in the regions of the oxide layer corresponding to the desired pattern to assist in preparing the structure. | 02-05-2009 |