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TOKYO ELECTRON LIMITED
MINATO-KU, JP
1. 20090291564 APPARATUS AND METHOD FOR PLASMA PROCESSING 11-26-20092. 20090285991 COATING APPARATUS AND METHOD - coating apparatus includes a liquid film forming mechanism configured to form a liquid film of a process liquid for 11-19-2009
3. 20090277895 MOUNTING TABLE STRUCTURE, AND PROCESSING APPARATUS 11-12-2009
4. 20090277389 PROCESSING APPARATUS - is provided for performing a process on a target object in a processing chamber which can be vacuumized 11-12-2009
5. 20090269686 SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND SUBSTRATE PROCESSING SYSTEM 10-29-2009
6. 20090268021 Imaging Position Correction Method, Imaging Method, and Substrate Imaging Apparatus 10-29-2009
7. 20090267626 PROBING APPARATUS AND PROBING METHOD - There is provided a probing apparatus capable of modifying an existing probing apparatus having a single loading 10-29-2009
8. 20090266809 HIGH RATE METHOD FOR STABLE TEMPERATURE CONTROL OF A SUBSTRATE 10-29-2009
9. 20090266300 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PLACING TABLE 10-29-2009
10. 20090260762 Process gas introducing mechanism and plasma processing device 10-22-2009
11. 20090258304 SUBSTRATE PROCESSING METHOD, PROGRAM, COMPUTER-READABLE STORAGE MEDIUM AND SUBSTRATE PROCESSING SYSTEM 10-15-2009
12. 20090253221 METHOD OF MEASURING NITROGEN CONTENT, METHOD OF FORMING SILICON OXYNITRIDE FILM AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE 10-08-2009
13. 20090250008 GAS TREATMENT APPARATUS - film forming apparatus includes a chamber for accommodating a wafer 10-08-2009
14. 20090241837 CERAMIC MEMBER, CERAMIC HEATER, SUBSTRATE PLACING MECHANISM, SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING CERAMIC MEMBER 10-01-2009
15. 20090239364 METHOD FOR FORMING INSULATING FILM AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 09-24-2009
16. 20090239352 METHOD FOR PRODUCING SILICON OXIDE FILM, CONTROL PROGRAM THEREOF, RECORDING MEDIUM AND PLASMA PROCESSING APPARATUS 09-24-2009
17. 20090230558 Semiconductor device and method for manufacturing the same 09-17-2009
18. 20090228215 SYSTEM AND METHOD FOR DETECTING PARTICLE GENERATION SOURCE, AND STORAGE MEDIUM THEREFOR 09-10-2009
19. 20090220692 METHOD OF SUBSTRATE TREATMENT, RECORDING MEDIUM AND SUBSTRATE TREATING APPARATUS 09-03-2009
20. 20090211213 EXHAUST TRAP DEVICE - Three exhaust trap units are arranged in series in an exhaust trap device for trapping substances solidified from exhaust gas and 08-27-2009
21. 20090208650 Ti-BASED FILM FORMING METHOD AND STORAGE MEDIUM 08-20-2009
22. 20090208132 Image Binarizing Method, Image Processing Device, and Computer Program 08-20-2009
23. 20090204252 SUBSTRATE PROCESSING METHOD AND APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND STORAGE MEDIUM 08-13-2009
24. 20090203228 PLASMA CVD METHOD, METHOD FOR FORMING SILICON NITRIDE FILM, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND PLASMA CVD METHOD 08-13-2009
25. 20090197376 PLASMA CVD METHOD, METHOD FOR FORMING SILICON NITRIDE FILM AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 08-06-2009
26. 20090185151 SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE TRANSFER METHOD 07-23-2009
27. 20090163038 HEAT TREATMENT METHOD, HEAT TREATMENT APPARATUS AND SUBSTRATE PROCESSING APPARATUS 06-25-2009
28. 20090163036 Substrate Treating Method - substrate processing method includes the step of forming an oxide film by oxidizing a silicon substrate surface and the step 06-25-2009
29. 20090159214 MICROWAVE PLASMA SOURCE AND PLASMA PROCESSING APPARATUS 06-25-2009
30. 20090157343 METHOD OF CORRECTING SYSTEMATIC ERROR IN A METROLOGY SYSTEM 06-18-2009
31. 20090153842 OPTICAL MEASUREMENT SYSTEM WITH SYSTEMATIC ERROR CORRECTION 06-18-2009
32. 20090146673 Manufacturing method of probe card and the probe card 06-11-2009
33. 20090145484 GAS SUPPLY SYSTEM, SUBSTRATE PROCESSING APPARATUS AND GAS SUPPLY METHOD 06-11-2009
34. 20090143890 SUBSTRATE PROCESSING APPARATUS, PROGRAM, STORAGE MEDIUM AND CONDITIONING NECESSITY DETERMINING METHOD 06-04-2009
35. 20090142513 FILM FORMATION METHOD, CLEANING METHOD AND FILM FORMATION APPARATUS 06-04-2009
36. 20090139979 PLACING TABLE STRUCTURE, METHOD FOR MANUFACTURING PLACING TABLE STRUCTURE AND HEAT TREATMENT APPARATUS 06-04-2009
37. 20090136336 EXHAUST SYSTEM AND EXHAUSTING PUMP CONNECTED TO A PROCESSING CHAMBER OF A SUBSTRATE PROCESSING APPARATUS 05-28-2009
38. 20090134121 PLASMA PROCESSING APPARATUS AND METHOD - There is provided a plasma processing apparatus including a plasma generating unit for generating a plasma in a 05-28-2009
39. 20090133835 PROCESSING APPARATUS - Provided is a structure of an improved processing vessel for a processing apparatus which processes a target object 05-28-2009
40. 20090133717 CERAMIC SPRAYED MEMBER-CLEANING METHOD, PROGRAM FOR IMPLEMENTING THE METHOD, STORAGE MEDIUM STORING THE PROGRAM, AND CERAMIC SPRAYED MEMBER 05-28-2009
41. 20090104548 SUBSTRATE-PROCESSING APPARATUS, SUBSTRATE-PROCESSING METHOD, SUBSTRATE-PROCESSING PROGRAM, AND COMPUTER-READABLE RECORDING MEDIUM RECORDED WITH SUCH PROGRAM 04-23-2009
42. 20090104351 FILM FORMING APPARATUS AND METHOD, GAS SUPPLY DEVICE AND STORAGE MEDIUM 04-23-2009
43. 20090087991 Manufacturing method, manufacturing apparatus, control program and program recording medium of semicontructor device 04-02-2009
44. 20090087990 Manufacturing method, manufacturing apparatus, control program and program recording medium of semiconductor device 04-02-2009
45. 20090087289 Structure for storing a substrate and semiconductor manufacturing apparatus 04-02-2009
46. 20090085175 SEMICONDUCTOR DEVICE CONTAINING A BURIED THRESHOLD VOLTAGE ADJUSTMENT LAYER AND METHOD OF FORMING 04-02-2009
47. 20090082911 TEMPERATURE SETTING METHOD OF THERMAL PROCESSING PLATE, COMPUTER-READABLE RECORDING MEDIUM RECORDING GPROGRAM THEREON, AND TEMPERATURE SETTING APPARATUS FOR THERMAL PROCESSING PLATE 03-26-2009
48. 20090081005 Substrate transfer apparatus and method for controlling down flow 03-26-2009
49. 20090079948 DEVELOPING METHOD AND DEVELOPING APPARATUS 03-26-2009
50. 20090078695 TEMPERATURE SETTING METHOD OF THERMAL PROCESSING PLATE, COMPUTER-READABLE RECORDING MEDIUM RECORDING PROGRAM THEREON, AND TEMPERATURE SETTING APPARATUS FOR THERMAL PROCESSING PLATE 03-26-2009
51. 20090075475 METHOD OF SUBSTRATE TREATMENT, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, SUBSTRATE TREATING APPARATUS, AND RECORDING MEDIUM 03-19-2009
52. 20090065486 PLASMA TREATMENT APPARATUS, AND SUBSTRATE HEATING MECHANISM TO BE USED IN THE APPARATUS 03-12-2009
53. 20090053835 VACUUM APPARATUS INCLUDING A PARTICLE MONITORING UNIT, PARTICLE MONITORING METHOD AND PROGRAM, AND WINDOW MEMBER FOR USE IN THE PARTICLE MONITORING 02-26-2009
54. 20090051280 LIGHT-EMITTING DEVICE, METHOD FOR MANUFACTURING LIGHT-EMITTING DEVICE, AND SUBSTRATE PROCESSING APPARATUS 02-26-2009
55. 20090047778 PLASMA OXIDATION METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 02-19-2009
56. 20090047586 SUBSTRATE-PROCESSING APPARATUS, SUBSTRATE-PROCESSING METHOD, SUBSTRATE-PROCESSING PROGRAM, AND COMPUTER-READABLE RECORDING MEDIUM RECORDED WITH SUCH PROGRAM 02-19-2009
57. 20090047103 STAGE APPARATUS AND APPLICATION PROCESSING APPARATUS 02-19-2009
58. 20090045167 PLASMA ETCHING METHOD AND APPARATUS THEREFOR 02-19-2009
59. 20090041640 PLASMA PROCESSING APPARATUS - includes a chamber for containing a substrate to be processed a gas supply unit for supplying a processing gas into the 02-12-2009
60. 20090014412 FILM FORMING APPARATUS AND METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT 01-15-2009
61. 20090011149 SUBSTRATE PROCESSING METHOD - method of forming a low-K dielectric film comprises the steps of placing a substrate carrying thereon a low-K dielectric 01-08-2009
62. 20090003825 SUBSTRATE PROCESSING SYSTEM - cassette waiting block is connected to a transfer in/out block of a coating and developing treatment system 01-01-2009
63. 20080311313 Film Forming Method and Film Forming Apparatus 12-18-2008
64. 20080311297 CVD METHOD USING METAL CARBONYL GAS AND COMPUTER STORAGE MEDIUM STORING PROGRAM FOR CONTROLLING SAME 12-18-2008
65. 20080309239 MAGNETRON CONTROL METHOD, MAGNETRON SERVICE LIFE JUDGMENT METHOD, MICROWAVE GENERATION DEVICE, MAGNETRON SERVICE LIFE JUDGMENT DEVICE, PROCESSING DEVICE, COMPUTER PROGRAM, AND STORAGE MEDIUM 12-18-2008
66. 20080302781 Processing Apparatus and Heater Unit - processing apparatus has a placement stage that prevents generation of a crack due to heating of an embedded 12-11-2008
67. 20080297801 METHOD FOR CALCULATING OPTICAL CONSTANTS AND SUBSTRATE PROCESSING SYSTEM 12-04-2008
68. 20080280437 Substrate Processing Method and Substrate Processing Apparatus 11-13-2008
69. 20080274433 Rinse Treatment Method and Development Process Method 11-06-2008
70. 20080268383 COATING AND DEVELOPING SYSTEM, COATING AND DEVELOPING METHOD AND STORAGE MEDIUM 10-30-2008
71. 20080261404 METHOD OF MAKING SEMICONDUCTOR DEVICE - plasma processing method, which enables the etching controllability for a high-dielectric-constant insulating 10-23-2008
72. 20080254220 Plasma processing apparatus - includes a vacuum processing container and a placing table for placing an object which is arranged in the container and is 10-16-2008
73. 20080251018 GAS SUPPLY SYSTEM FOR SEMICONDUCTOR MANUFACTURING APPARATUS 10-16-2008
74. 20080245389 METHOD FOR CLEANING ELEMENTS IN VACUUM CHAMBER AND APPARATUS FOR PROCESSING SUBSTRATES 10-09-2008
75. 20080245388 METHOD FOR CLEANING ELEMENTS IN VACUUM CHAMBER AND APPARATUS FOR PROCESSING SUBSTRATES 10-09-2008
76. 20080245387 METHOD FOR CLEANING ELEMENTS IN VACUUM CHAMBER AND APPARATUS FOR PROCESSING SUBSTRATES 10-09-2008
77. 20080243297 METHOD AND APPARATUS FOR VERIFYING A SITE-DEPENDENT WAFER 10-02-2008
78. 20080243294 Method and apparatus for verifying a site-dependent procedure 10-02-2008
79. 20080241379 Method and apparatus for reducing substrate temperature variability 10-02-2008
80. 20080236753 PLASMA PROCESSING APPARATUS - includes a processing chamber, a high frequency electrode provided in the processing chamber 10-02-2008
81. 20080233288 METHOD OF FORMING CRYSTALLOGRAPHICALLY STABILIZED DOPED HAFNIUM ZIRCONIUM BASED FILMS 09-25-2008
82. 20080226272 HEATING APPARATUS, HEAT TREATMENT APPARATUS, COMPUTER PROGRAM AND STORAGE MEDIUM 09-18-2008
83. 20080223298 RECOVERY PROCESSING METHOD TO BE ADOPTED IN SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING APPARATUS AND PROGRAM 09-18-2008
84. 20080223136 Minute structure inspection device, inspection method, and inspection program 09-18-2008
85. 20080220621 SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD 09-11-2008
86. 20080218744 TEMPERATURE MEASURING APPARATUS AND TEMPERATURE MEASURING METHOD 09-11-2008
87. 20080213478 VERTICAL CVD APPARATUS AND CVD METHOD USING THE SAME 09-04-2008
88. 20080212093 PARTICLE MONITOR SYSTEM AND SUBSTRATE PROCESSING APPARATUS 09-04-2008
89. 20080210379 SUBSTRATE PROCESSING APPARATUS AND FOCUS RING 09-04-2008
90. 20080204734 METHOD AND SYSTEM FOR MONITORING PHOTOLITHOGRAPHY PROCESSING BASED ON A BATCH CHANGE IN LIGHT SENSITIVE MATERIAL 08-28-2008
91. 20080200002 Plasma Sputtering Film Deposition Method and Equipment 08-21-2008
92. 20080196744 In-chamber member, a cleaning method therefor and a plasma processing apparatus 08-21-2008