TWD METAL PRODUCTION CO., LTD. Patent applications |
Patent application number | Title | Published |
20090014334 | Partial Chemical Plating Technique for Apertures of Aluminum Radiator - This invention involves the technical area of chemical plating in aluminum radiators, referring specifically to the partial chemical plating technique in the inner cavity of aluminum radiator. It undergoes the inner cavity shielding before zinc impregnation and continues chemical oxidization in other parts in the chemical the based on the existing oxidization trough, making the unshielded area unable to sediment a layer of zinc and be plated with nickel and phosphors alloy. Then, it is applied with enclosure technique. The chemical oxidization and enclosure enable the sections other than the inner cavity in the aluminum radiator to be covered with a layer of oxidization film against erosion from acid and alkali, so the sections covered with a oxidization film will not accumulate a layer of zinc nor be plated with nickel and phosphor alloy in the subsequent zinc impregnation and nickel plating. Only the surface of the inner cavity is plated with nickel and phosphor alloy. The technique in this invention is simple and easy to achieve, with only the walls in inner cavity being plated with nickel and phosphor alloy, which can save up nickel and effectively cut the aluminum radiators' costs. | 01-15-2009 |
20090000952 | Plating, Chemical Plating Technique Using Partial Chemicaloxidation for Aluminum or Aluminum Copper Radiator - This invention involves the technological area of plating, chemical electrodeposit of aluminum and aluminum copper radiator, referring specifically to some electrodeposit and chemical electrodeposit techniques of the partial chemical oxidation in aluminum and aluminum copper radiator. This invention is to conduct partial chemical oxidation and enclosure to the radiator before it undergoes the galvanization. It has to oxidize the non surfacing with chemical oxidation and cover a layer of porous film, and then utilize the sealing compound to fill up the holes of porous film, which makes the porous film form a layer of film against the erosion of acid and alkali, and connect the current existing chemical electrodeposit or electrodeposit techniques, only electrodeposit a wieldable nickel-phosphorus alloy in the connected part where the aluminum radiator or the aluminums and copper radiator with the main frame. This invention's technique only applies the chemical electrodeposit or electrodeposit to the surface that need electrodeposit in the radiator, which is simple and easy to be implemented, saving the expensive metal resource and reducing the product costs. | 01-01-2009 |