PATTERSON & SHERIDAN, LLP - - APPM/TX

HOUSTON, TX US

1. 20110045349 3D APPROACH ON BATTERY AND SUPERCAPACITOR FABRICATION BY INITIATION CHEMICAL VAPOR DEPOSITION TECHNIQUES 02-24-2011
2. 20110045206 IN-SITU DEPOSITION OF BATTERY ACTIVE LITHIUM MATERIALS BY PLASMA SPRAYING 02-24-2011
3. 20110045170 IN-SITU DEPOSITION OF BATTERY ACTIVE LITHIUM MATERIALS BY THERMAL SPRAYING 02-24-2011
4. 20110041764 BATCH PROCESSING PLATFORM FOR ALD AND CVD 02-24-2011
5. 20110036709 PROCESS KIT FOR RF PHYSICAL VAPOR DEPOSITION 02-17-2011
6. 20110034034 DUAL TEMPERATURE HEATER - method and apparatus for heating a substrate in a chamber are provided 02-10-2011
7. 20110033966 GROWTH OF N-FACE LED WITH INTEGRATED PROCESSING SYSTEM 02-10-2011
8. 20110033957 INTEGRATED THIN FILM METROLOGY SYSTEM USED IN A SOLAR CELL PRODUCTION LINE 02-10-2011
9. 20110033638 METHOD AND APPARATUS FOR DEPOSITION ON LARGE AREA SUBSTRATES HAVING REDUCED GAS USAGE 02-10-2011
10. 20110033620 COMPOUND LIFT PIN TIP WITH TEMPERATURE COMPENSATED ATTACHMENT FEATURE 02-10-2011
11. 20110031113 ELECTROPLATING APPARATUS - Embodiments of the invention contemplate the formation of a low cost solar cell using a novel high speed electroplating 02-10-2011
12. 20110031112 IN-SITU PROFILE MEASUREMENT IN AN ELECTROPLATING PROCESS 02-10-2011
13. 20110030615 METHOD AND APPARATUS FOR DRY CLEANING A COOLED SHOWERHEAD 02-10-2011
14. 20110026254 METHOD AND APPARATUS FOR LIGHT SIMULATION IN A DESIRED SPECTRUM 02-03-2011
15. 20110021008 Directional Solid Phase Crystallization of Thin Amorphous Silicon for Solar Cell Applications 01-27-2011
16. 20110014396 RECIRCULATING LINEAR ROLLING BUSHING - method and apparatus for a linear motion device is described 01-20-2011
17. 20110013669 EMI/RF SHIELDING OF THERMOCOUPLES - Embodiments disclosed herein generally relate to a temperature sensor disposed in an apparatus 01-20-2011
18. 20110012635 WET HIGH POTENTIAL QUALIFICATION TOOL FOR SOLAR CELL FABRICATION 01-20-2011
19. 20110011828 ORGANICALLY MODIFIED ETCH CHEMISTRY FOR ZNO TCO TEXTURING 01-20-2011
20. 20110011743 LOW POWER RF TUNING USING OPTICAL AND NON-REFLECTED POWER METHODS 01-20-2011
21. 20110011338 FLOW CONTROL FEATURES OF CVD CHAMBERS - Apparatus and methods for gas distribution assemblies are provided 01-20-2011
22. 20110009039 METHOD AND APPARATUS FOR MANUFACTURING AN ABRASIVE WIRE 01-13-2011
23. 20110008947 APPARATUS AND METHOD FOR PERFORMING MULTIFUNCTION LASER PROCESSES 01-13-2011
24. 20110008740 RAPID CONDUCTIVE COOLING USING A SECONDARY PROCESS PLANE 01-13-2011
25. 20110006038 PLASMA PROCESSING CHAMBER WITH ENHANCED GAS DELIVERY 01-13-2011
26. 20110006034 METHOD FOR REMOVING IMPLANTED PHOTO RESIST FROM HARD DISK DRIVE SUBSTRATES 01-13-2011
27. 20110005458 METHOD AND APPARATUS FOR IMPROVING SCRIBE ACCURACY IN SOLAR CELL MODULES 01-13-2011
28. 20110003404 DRY HIGH POTENTIAL TESTER AND SOLAR SIMULATOR TOOL 01-06-2011
29. 20110000433 PLASMA, UV AND ION/NEUTRAL ASSISTED ALD OR CVD IN A BATCH TOOL 01-06-2011
30. 20100330805 METHODS FOR FORMING HIGH ASPECT RATIO FEATURES ON A SUBSTRATE 12-30-2010
31. 20100330711 METHOD AND APPARATUS FOR INSPECTING SCRIBES IN SOLAR MODULES 12-30-2010
32. 20100330425 PASSIVATION FILM FOR SOLID ELECTROLYTE INTERFACE OF THREE DIMENSIONAL COPPER CONTAINING ELECTRODE IN ENERGY STORAGE DEVICE 12-30-2010
33. 20100323532 METHOD OF THERMAL PROCESSING STRUCTURES FORMED ON A SUBSTRATE 12-23-2010
34. 20100323503 INTEGRATED EMITTER FORMATION AND PASSIVATION 12-23-2010
35. 20100317186 ENHANCING NAND FLASH FLOATING GATE PERFORMANCE 12-16-2010
36. 20100316800 MULTI-STATION DEPOSITION APPARATUS AND METHOD 12-16-2010
37. 20100313929 CELL ISOLATION ON PHOTOVOLTAIC MODULES FOR HOT SPOT REDUCTION 12-16-2010
38. 20100311249 MULTI-GAS FLOW DIFFUSER - Embodiments of the disclosure generally provide a method and apparatus for processing a substrate in a vacuum process chamber 12-09-2010
39. 20100311237 FORMATION OF A TANTALUM-NITRIDE LAYER - method of forming a material on a substrate is disclosed 12-09-2010
40. 20100311228 METHOD FOR FORMING TRANSPARENT CONDUCTIVE OXIDE 12-09-2010
41. 20100311204 METHOD FOR FORMING TRANSPARENT CONDUCTIVE OXIDE 12-09-2010
42. 20100311203 Passivation process for solar cell fabrication 12-09-2010
43. 20100308014 METHOD AND APPARATUS FOR ETCHING - Embodiments of the invention relate to a substrate etching method and apparatus 12-09-2010
44. 20100307022 DRYING APPARATUS AND METHOD FOR SILICON-BASED ELECTRONIC CIRCUITS 12-09-2010
45. 20100304527 METHODS OF THERMAL PROCESSING A SOLAR CELL 12-02-2010
46. 20100304027 SUBSTRATE PROCESSING SYSTEM AND METHODS THEREOF 12-02-2010
47. 20100300877 HIGH UTILIZATION ROTATABLE TARGET USING CERAMIC TITANIUM OXIDE RING 12-02-2010
48. 20100300259 SUBSTRATE SIDE MARKING AND IDENTIFICATION 12-02-2010
49. 20100297856 PULSE TRAIN ANNEALING METHOD AND APPARATUS 11-25-2010
50. 20100296903 END EFFECTOR FOR HANDLING SUBSTRATES - Embodiments of the present invention provide an end effector for a substrate handling robot 11-25-2010
51. 20100291842 POLISHING HEAD ZONE BOUNDARY SMOOTHING - method and apparatus for chemical mechanical polishing of substrates and more particularly a method and 11-18-2010
52. 20100288940 FRONT PLATE FOR AN ION SOURCE - that is suitable for an ion implanter 11-18-2010
53. 20100288197 ANODIZED SHOWERHEAD - Embodiments disclosed herein generally relate to an apparatus having an anodized gas distribution showerhead 11-18-2010
54. 20100285666 PROCESS SEQUENCE TO ACHIEVE GLOBAL PLANARITY USING A COMBINATION OF FIXED ABRASIVE AND HIGH SELECTIVITY SLURRY FOR PRE-METAL DIELECTRIC CMP APPLICATIONS 11-11-2010
55. 20100283240 EXTERNALLY REPLACEABLE VACUUM CHAMBER TO CHAMBER FLANGE SEAL 11-11-2010
56. 20100282603 HEATED SUBSTRATE SUPPORT FOR CHEMICAL VAPOR DEPOSITION 11-11-2010
57. 20100280654 SUBSTRATE PROCESSING SEQUENCE IN A CARTESIAN ROBOT CLUSTER TOOL 11-04-2010
58. 20100279516 APPARATUS AND METHOD OF ALIGNING AND POSITIONING A COLD SUBSTRATE ON A HOT SURFACE 11-04-2010
59. 20100279439 AUTOMATED SUBSTRATE HANDLING AND FILM QUALITY INSPECTION IN SOLAR CELL PROCESSING 11-04-2010
60. 20100279020 METHOD OF FORMING IN-SITU PRE-GaN DEPOSITION LAYER IN HVPE 11-04-2010
61. 20100273334 MILLISECOND ANNEALING (DSA) EDGE PROTECTION 10-28-2010
62. 20100273318 SUBSTRATE PRETREATMENT FOR SUBSEQUENT HIGH TEMPERATURE GROUP III DEPOSITIONS 10-28-2010
63. 20100273291 DECONTAMINATION OF MOCVD CHAMBER USING NH3 PURGE AFTER IN-SITU CLEANING 10-28-2010
64. 20100273290 MOCVD SINGLE CHAMBER SPLIT PROCESS FOR LED MANUFACTURING 10-28-2010
65. 20100273279 PRODUCTION LINE FOR THE PRODUCTION OF MULTIPLE SIZED PHOTOVOLTAIC DEVICES 10-28-2010
66. 20100269896 MICROCRYSTALLINE SILICON ALLOYS FOR THIN FILM AND WAFER BASED SOLAR APPLICATIONS 10-28-2010
67. 20100267191 PLASMA ENHANCED THERMAL EVAPORATOR - The present invention generally provides a method for forming a photovoltaic device including evaporating a source 10-21-2010
68. 20100261340 CLUSTER TOOL FOR LEDS - The present invention generally provides apparatus and methods for forming LED structures 10-14-2010
69. 20100261302 DRY CLEANING OF SILICON SURFACE FOR SOLAR CELL APPLICATIONS 10-14-2010
70. 20100261071 METALLIZED FIBERS FOR ELECTROCHEMICAL ENERGY STORAGE 10-14-2010
71. 20100261058 COMPOSITE MATERIALS CONTAINING METALLIZED CARBON NANOTUBES AND NANOFIBERS 10-14-2010
72. 20100261040 MODIFICATION OF MAGNETIC PROPERTIES OF FILMS USING ION AND NEUTRAL BEAM IMPLANTATION 10-14-2010
73. 20100258758 HDD PATTERN APPARATUS USING LASER, E-BEAM, OR FOCUSED ION BEAM 10-14-2010
74. 20100258431 USE SPECIAL ION SOURCE APPARATUS AND IMPLANT WITH MOLECULAR IONS TO PROCESS HDD (HIGH DENSITY MAGNETIC DISKS) WITH PATTERNED MAGNETIC DOMAINS 10-14-2010
75. 20100258169 PULSED PLASMA DEPOSITION FOR FORMING MICROCRYSTALLINE SILICON LAYER FOR SOLAR APPLICATIONS 10-14-2010
76. 20100258052 HVPE PRECURSOR SOURCE HARDWARE - Embodiments disclosed herein generally relate to an HVPE chamber 10-14-2010
77. 20100258049 HVPE CHAMBER HARDWARE - Embodiments disclosed herein generally relate to an HVPE chamber 10-14-2010
78. 20100255660 SULFURIZATION OR SELENIZATION IN MOLTEN (LIQUID) STATE FOR THE PHOTOVOLTAIC APPLICATIONS 10-07-2010
79. 20100254787 POSITIONING DEVICE TO POSITION ONE OR MORE ELECTRONIC CIRCUIT BOARDS, IN PARTICULAR FOR PHOTOVOLTAIC CELLS, IN A METAL-DEPOSITION UNIT 10-07-2010
80. 20100252417 HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMITY AND STEP-COVERAGE OF THIS PROCESS 10-07-2010
81. 20100251828 METHOD AND APPARATUS FOR GAS FLOW MEASUREMENT 10-07-2010
82. 20100247767 GAS DELIVERY APPARATUS AND METHOD FOR ATOMIC LAYER DEPOSITION 09-30-2010
83. 20100245214 MIXING FREQUENCY AT MULTIPLE FEEDING POINTS 09-30-2010
84. 20100240172 METHODS OF MAKING AN EMITTER HAVING A DESIRED DOPANT PROFILE 09-23-2010
85. 20100239979 GRADED ARC FOR HIGH NA AND IMMERSION LITHOGRAPHY 09-23-2010
86. 20100239758 SURFACE PRE-TREATMENT FOR ENHANCEMENT OF NUCLEATION OF HIGH DIELECTRIC CONSTANT MATERIALS 09-23-2010
87. 20100230274 MINIMIZING MAGNETRON SUBSTRATE INTERACTION IN LARGE AREA SPUTTER COATING EQUIPMENT 09-16-2010
88. 20100230039 LARGE AREA DISSOLVABLE TEMPLATE LITHOGRAPHY 09-16-2010
89. 20100227431 CRYSTALLINE SILICON SOLAR CELLS ON LOW PURITY SUBSTRATE 09-09-2010
90. 20100227061 LOW TEMPERATURE ALD Si02 - The present invention generally comprises a silicon dioxide atomic layer deposition method 09-09-2010
91. 20100224481 GAS FLOW SET-UP FOR MULTIPLE, INTERACTING REACTIVE SPUTTER SOURCES 09-09-2010
92. 20100224243 ADHESION BETWEEN AZO AND AG FOR THE BACK CONTACT IN TANDEM JUNCTION CELL BY METAL ALLOY 09-09-2010
93. 20100224130 ROTATING SUBSTRATE SUPPORT AND METHODS OF USE 09-09-2010
94. 20100221583 HDD PATTERN IMPLANT SYSTEM - Methods and apparatus for forming substrates having magnetically patterned surfaces is provided 09-02-2010
95. 20100218785 IN SITU PLASMA CLEAN FOR REMOVAL OF RESIDUE FROM PEDESTAL SURFACE WITHOUT BREAKING VACUUM 09-02-2010
96. 20100218784 COPPER DEPOSITION CHAMBER HAVING INTEGRATED BEVEL CLEAN WITH EDGE BEVEL REMOVAL DETECTION 09-02-2010
97. 20100216258 METHOD FOR MEASURING DOPANT CONCENTRATION DURING PLASMA ION IMPLANTATION 08-26-2010
98. 20100216026 Thin film electrochemical energy storage device with three-dimensional anodic structure 08-26-2010
99. 20100215854 HVPE SHOWERHEAD DESIGN - method and apparatus that may be utilized in deposition processes such as hydride vapor phase epitaxial deposition of metal 08-26-2010
100. 20100210060 DOUBLE ANNEAL PROCESS FOR AN IMPROVED RAPID THERMAL OXIDE PASSIVATED SOLAR CELL 08-19-2010
101. 20100206352 LOW-CONCENTRATION FLAT PROFILE PHOTOVOLTAIC MODULES 08-19-2010
102. 20100203391 MESOPOROUS CARBON MATERIAL FOR ENERGY STORAGE 08-12-2010
103. 20100203243 METHOD FOR FORMING A POLYSILICON FILM - method is provided for forming a poly-crystalline silicon film on a substrate 08-12-2010
104. 20100203242 SELF-CLEANING SUSCEPTOR FOR SOLAR CELL PROCESSING 08-12-2010
105. 20100200545 NON-CONTACT SUBSTRATE PROCESSING - Embodiments of the present invention provide apparatus and methods for supporting positioning or rotating a 08-12-2010
106. 20100200403 METROLOGY METHODS AND APPARATUS FOR NANOMATERIAL CHARACTERIZATION OF ENERGY STORAGE ELECTRODE STRUCTURES 08-12-2010
107. 20100197145 SILICON NITRIDE PASSIVATION FOR A SOLAR CELL 08-05-2010
108. 20100197138 METHOD AND APPARATUS FOR ETCHING - Embodiments of the invention relate to a substrate etching method and apparatus 08-05-2010
109. 20100197051 METROLOGY AND INSPECTION SUITE FOR A SOLAR PRODUCTION LINE 08-05-2010
110. 20100196626 GROUND RETURN FOR PLASMA PROCESSES - method and apparatus for providing an electrically symmetrical ground or return path for electrical current between 08-05-2010
111. 20100196599 STAGGERED DUAL PROCESS CHAMBERS USING ONE SINGLE FACET ON A TRANSFER MODULE 08-05-2010
112. 20100195096 HIGH EFFICIENCY MULTI WAVELENGTH LINE LIGHT SOURCE 08-05-2010
113. 20100193365 POROUS THREE DIMENSIONAL COPPER, TIN, COPPER-TIN, COPPER-TIN-COBALT, AND COPPER-TIN-COBALT-TITANIUM ELECTRODES FOR BATTERIES AND ULTRA CAPACITORS 08-05-2010
114. 20100190290 SOLAR CELL PATTERNING AND METALLIZATION - Embodiments of the present invention generally provide methods for forming conductive structures on the 07-29-2010
115. 20100184290 SUBSTRATE SUPPORT WITH GAS INTRODUCTION OPENINGS 07-22-2010
116. 20100181024 DIFFUSER SUPPORT - Embodiments of gas distribution apparatus comprise a diffuser support member coupled to a diffuser and movably disposed through a 07-22-2010
117. 20100178600 PROCESS FOR ETCHING A METAL LAYER SUITABLE FOR USE IN PHOTOMASK FABRICATION 07-15-2010
118. 20100173495 SUBSTRATE PROCESSING APPARATUS USING A BATCH PROCESSING CHAMBER 07-08-2010
119. 20100173484 SAFE HANDLING OF LOW ENERGY, HIGH DOSE ARSENIC, PHOSPHORUS, AND BORON IMPLANTED WAFERS 07-08-2010
120. 20100173448 HIGH FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION 07-08-2010
121. 20100170780 MAGNET BAR SUPPORT SYSTEM - apparatus and method for controlling local deposition rate in a physical vapor deposition process is provided 07-08-2010
122. 20100167527 METHOD OF DEPOSITING TUNGSTEN FILM WITH REDUCED RESISTIVITY AND IMPROVED SURFACE MORPHOLOGY 07-01-2010
123. 20100167526 METHOD FOR IMPROVING ELECTROMIGRATION LIFETIME OF COPPER INTERCONNECTION BY EXTENDED POST ANNEAL 07-01-2010
124. 20100167461 DRY CLEANING OF SILICON SURFACE FOR SOLAR CELL APPLICATIONS 07-01-2010
125. 20100163406 SUBSTRATE SUPPORT IN A REACTIVE SPUTTER CHAMBER 07-01-2010
126. 20100159634 EDGE FILM REMOVAL PROCESS FOR THIN FILM SOLAR CELL APPLICATIONS 06-24-2010
127. 20100158642 LARGE AREA SUBSTRATE PROCESSING SYSTEM WITH BETWEEN CHAMBER PLATFORM 06-24-2010
128. 20100151688 METHOD TO PREVENT THIN SPOT IN LARGE SIZE SYSTEM 06-17-2010
129. 20100151676 DENSIFICATION PROCESS FOR TITANIUM NITRIDE LAYER FOR SUBMICRON APPLICATIONS 06-17-2010
130. 20100151671 NOVEL AIR GAP INTEGRATION SCHEME - Methods are provided for forming a structure that includes an air gap 06-17-2010
131. 20100151318 THREE-DIMENSIONAL BATTERY WITH HYBRID NANO-CARBON LAYER 06-17-2010
132. 20100151127 APPARATUS AND METHOD FOR PREVENTING PROCESS SYSTEM CONTAMINATION 06-17-2010
133. 20100145513 METHOD FOR MONITORING THE POSITION OF A SEMICONDUCTOR PROCESSING ROBOT 06-10-2010
134. 20100144160 PLASMA REACTOR SUBSTRATE MOUNTING SURFACE TEXTURING 06-10-2010
135. 20100139889 Multiple Slot Load Lock Chamber and Method of Operation 06-10-2010
136. 20100139554 METHODS AND APPARATUS FOR MAKING GALLIUM NITRIDE AND GALLIUM ALUMINUM NITRIDE THIN FILMS 06-10-2010
137. 20100136793 EFFICIENT AND ACCURATE METHOD FOR REAL-TIME PREDICTION OF THE SELF-BIAS VOLTAGE OF A WAFER AND FEEDBACK CONTROL OF ESC VOLTAGE IN PLASMA PROCESSING CHAMBER 06-03-2010
138. 20100136261 MODULATION OF RF RETURNING STRAPS FOR UNIFORMITY CONTROL 06-03-2010
139. 20100136216 GAS DISTRIBUTION BLOCKER APPARATUS - Embodiments of the present invention generally provide apparatus and methods for altering the flow and pressure 06-03-2010
140. 20100133255 APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUBSTRATES 06-03-2010
141. 20100133094 TRANSPARENT CONDUCTIVE FILM WITH HIGH TRANSMITTANCE FORMED BY A REACTIVE SPUTTER DEPOSITION 06-03-2010
142. 20100132783 TRANSPARENT CONDUCTIVE FILM WITH HIGH SURFACE ROUGHNESS FORMED BY A REACTIVE SPUTTER DEPOSITION 06-03-2010
143. 20100132775 ADHESION BETWEEN AZO AND AG FOR THE BACK CONTACT IN TANDEM JUNCTION CELL BY METAL ALLOY 06-03-2010
144. 20100132759 CELL ISOLATION ON PHOTOVOLTAIC MODULES FOR HOT SPOT REDUCTION 06-03-2010
145. 20100130107 METHOD AND APPARATUS FOR LINEAR PAD CONDITIONING 05-27-2010
146. 20100130102 LOAD CUP SUBSTRATE SENSING - Embodiments of the present invention generally provide a load cup used in the transfer of substrates in a chemical 05-27-2010
147. 20100130101 TWO-LINE MIXING OF CHEMICAL AND ABRASIVE PARTICLES WITH ENDPOINT CONTROL FOR CHEMICAL MECHANICAL POLISHING 05-27-2010
148. 20100130013 SLURRY COMPOSITION FOR GST PHASE CHANGE MEMORY MATERIALS POLISHING 05-27-2010
149. 20100130007 BOTTOM UP PLATING BY ORGANIC SURFACE PASSIVATION AND DIFFERENTIAL PLATING RETARDATION 05-27-2010
150. 20100129982 INTEGRATION SEQUENCES WITH TOP SURFACE PROFILE MODIFICATION 05-27-2010
151. 20100129958 METHOD AND APPARATUS FOR TRENCH AND VIA PROFILE MODIFICATION 05-27-2010
152. 20100129535 Vapor Deposition Processes for Tantalum Carbide Nitride Materials 05-27-2010
153. 20100127201 INTERLOCKING VALVE CHAMBER AND LID - apparatus for isolating two regions at different pressures is provided comprising a chamber having a floor 05-27-2010
154. 20100126854 SPUTTERING TARGET - Embodiments of the present invention generally include a sputtering target capable of substantially reducing the amount of wasted 05-27-2010
155. 20100126849 APPARATUS AND METHOD FOR FORMING 3D NANOSTRUCTURE ELECTRODE FOR ELECTROCHEMICAL BATTERY AND CAPACITOR 05-27-2010
156. 20100126831 SELF CLEANING BELT CONVEYOR - Apparatus and methods relating to a self cleaning belt conveyor for transporting a substrate through a chamber are 05-27-2010
157. 20100122982 ELECTRON BEAM WELDING OF LARGE VACUUM CHAMBER BODY HAVING A HIGH EMISSIVITY COATING 05-20-2010
158. 20100122655 BALL SUPPORTED SHADOW FRAME - Embodiments disclosed herein generally include an alignment assembly for aligning a shadow frame on a susceptor 05-20-2010
159. 20100120245 PLASMA AND THERMAL ANNEAL TREATMENT TO IMPROVE OXIDATION RESISTANCE OF METAL-CONTAINING FILMS 05-13-2010
160. 20100120191 Method of forming front contacts to a silicon solar cell wiithout patterning 05-13-2010
161. 20100119734 LAMINAR FLOW IN A PRECURSOR SOURCE CANISTER 05-13-2010
162. 20100116823 HYDROFORMED FLUID CHANNELS - method and apparatus for providing a fluid channel on a surface that is subject to extreme temperatures is described 05-13-2010
163. 20100116205 PROCESS EQUIPMENT ARCHITECTURE - Embodiments of the present invention relate to improvements to single-substrate multi-chamber processing platform 05-13-2010
164. 20100112917 SELF CLEANING AND ADJUSTABLE SLURRY DELIVERY ARM 05-06-2010
165. 20100112903 DISHING AND DEFECT CONTROL OF CHEMICAL MECHANICAL POLISHING USING REAL-TIME ADJUSTABLE ADDITIVE DELIVERY 05-06-2010
166. 20100112794 DOPING PROFILE MODIFICATION IN P3I PROCESS 05-06-2010
167. 20100112793 CONFORMAL DOPING IN P3I CHAMBER - Methods for implanting ions into a substrate by a plasma immersion ion implanting process are provided 05-06-2010
168. 20100112215 CHEMICAL PRECURSOR AMPOULE FOR VAPOR DEPOSITION PROCESSES 05-06-2010
169. 20100112212 ADJUSTABLE GAS DISTRIBUTION APPARATUS - Embodiments of the present invention generally provide apparatus and methods for altering the contour of a gas 05-06-2010
170. 20100111650 AUTOMATIC SUBSTRATE LOADING STATION - Embodiments of the present invention provide method and apparatus for automatically loading substrates to a 05-06-2010
171. 20100111511 USE OF INFRARED CAMERA FOR REAL-TIME TEMPERATURE MONITORING AND CONTROL 05-06-2010
172. 20100108641 LAVACOAT PRE-CLEAN AND PRE-HEAT - Embodiments described herein provide methods of surface preparation using an electromagnetic beam prior to 05-06-2010
173. 20100108500 ENCAPSULATED SPUTTERING TARGET - Embodiments of the invention provide encapsulated sputtering targets and methods for preparing such targets prior to a 05-06-2010
174. 20100108119 INTEGRATED BYPASS DIODE ASSEMBLIES FOR BACK CONTACT SOLAR CELLS AND MODULES 05-06-2010
175. 20100107927 ELECTROLESS DEPOSITION PROCESS ON A SILICON CONTACT 05-06-2010
176. 20100107672 DUAL SUBSTRATE LOADLOCK PROCESS EQUIPMENT 05-06-2010
177. 20100105302 POLISHING PAD CONDITIONER - Embodiments of the present invention generally provide an improved conditioning module and conditioning disks for improved 04-29-2010
178. 20100104772 ELECTRODE AND POWER COUPLING SCHEME FOR UNIFORM PROCESS IN A LARGE-AREA PECVD CHAMBER 04-29-2010
179. 20100104771 ELECTRODE AND POWER COUPLING SCHEME FOR UNIFORM PROCESS IN A LARGE-AREA PECVD CHAMBER 04-29-2010
180. 20100104754 MULTIPLE GAS FEED APPARATUS AND METHOD - Embodiments of the present invention generally provide apparatus and methods for introducing process gases into 04-29-2010
181. 20100102417 VAPOR DEPOSITION METHOD FOR TERNARY COMPOUNDS 04-29-2010
182. 20100102376 Atomic Layer Deposition Processes for Non-Volatile Memory Devices 04-29-2010
183. 20100101771 HEATED COOLING PLATE FOR E-CHUCKS AND PEDESTALS 04-29-2010
184. 20100101602 PLASMA CLEANING APPARATUS AND METHOD - Embodiments of the present invention generally include an apparatus for plasma cleaning and a method for plasma 04-29-2010
185. 20100099342 PAD CONDITIONER AUTO DISK CHANGE - method and apparatus for replacing a polishing pad conditioning disk is a chemical mechanical polishing system is 04-22-2010
186. 20100099340 TEXTURED PLATEN - Embodiments described herein generally relate to the planarization of substrates 04-22-2010
187. 20100099339 POLISHING PAD EDGE EXTENSION - method and apparatus for providing a substantially uniform pressure to a polishing surface from a conditioning element is 04-22-2010
188. 20100099270 ATOMIC LAYER DEPOSITION APPARATUS - method and apparatus for atomic layer deposition is described 04-22-2010
189. 20100099266 ETCH REACTOR SUITABLE FOR ETCHING HIGH ASPECT RATIO FEATURES 04-22-2010
190. 20100099263 NF3/H2 REMOTE PLASMA PROCESS WITH HIGH ETCH SELECTIVITY OF PSG/BPSG OVER THERMAL OXIDE AND LOW DENSITY SURFACE DEFECTS 04-22-2010
191. 20100099251 METHOD FOR NITRIDATION PRETREATMENT - In one embodiment a method for fabricating a damascene structure is provided which includes exposing a dielectric 04-22-2010
192. 20100098882 PLASMA SOURCE FOR CHAMBER CLEANING AND PROCESS 04-22-2010
193. 20100098873 PATTERNING OF MAGNETIC THIN FILM USING ENERGIZED IONS 04-22-2010
194. 20100098518 IN/OUT DOOR FOR A VACUUM CHAMBER - load lock chamber sized for a large area substrate is provided 04-22-2010
195. 20100096360 COMPOSITIONS AND METHODS FOR BARRIER LAYER POLISHING 04-22-2010
196. 20100096273 CU SURFACE PLASMA TREATMENT TO IMPROVE GAPFILL WINDOW 04-22-2010
197. 20100096256 PATTERNING OF MAGNETIC THIN FILM USING ENERGIZED IONS AND THERMAL EXCITATION 04-22-2010
198. 20100096255 GAP FILL IMPROVEMENT METHODS FOR PHASE-CHANGE MATERIALS 04-22-2010
199. 20100096253 PVD CU SEED OVERHANG RE-SPUTTERING WITH ENHANCED CU IONIZATION 04-22-2010
200. 20100095891 METHOD AND APPARATUS FOR CLEANING A CVD CHAMBER 04-22-2010
201. 20100093187 Method for Depositing Conformal Amorphous Carbon Film by Plasma-Enhanced Chemical Vapor Deposition (PECVD) 04-15-2010
202. 20100093170 METHOD FOR FORMING TUNGSTEN MATERIALS DURING VAPOR DEPOSITION PROCESSES 04-15-2010
203. 20100093151 OXIDE ETCH WITH NH4-NF3 CHEMISTRY - The present invention generally provides apparatus and methods for selectively removing various oxides on a 04-15-2010
204. 20100089748 CONTROL OF EROSION PROFILE ON A DIELECTRIC RF SPUTTER TARGET 04-15-2010
205. 20100089319 RF RETURN PATH FOR LARGE PLASMA PROCESSING CHAMBER 04-15-2010
206. 20100089315 SHUTTER DISK FOR PHYSICAL VAPOR DEPOSITION CHAMBER 04-15-2010
207. 20100087062 HIGH TEMPERATURE BD DEVELOPMENT FOR MEMORY APPLICATIONS 04-08-2010
208. 20100087052 DOPANT ACTIVATION ANNEAL TO ACHIEVE LESS DOPANT DIFFUSION (BETTER USJ PROFILE) AND HIGHER ACTIVATION PERCENTAGE 04-08-2010
209. 20100087028 ADVANCED PLATFORM FOR PROCESSING CRYSTALLINE SILICON SOLAR CELLS 04-08-2010
210. 20100086380 SCISSOR LIFT TRANSFER ROBOT - method and apparatus for a transfer robot that may be used in a vacuum environment is described 04-08-2010
211. 20100084398 BALANCED PURGE SLIT VALVE - Methods and apparatus for providing a gas to a slit valve opening are provided herein 04-08-2010
212. 20100084023 FLOW CONTROL MODULE FOR A FLUID DELIVERY SYSTEM 04-08-2010
213. 20100081360 USE OF PAD CONDITIONING IN TEMPERATURE CONTROLLED CMP 04-01-2010
214. 20100081291 Very Low Dielectric Constant Plasma-Enhanced CVD Films 04-01-2010
215. 20100080933 MULTI-ELECTRODE PECVD SOURCE - Embodiments of the present invention generally relate to methods and apparatus for plasma generation in plasma processes 04-01-2010
216. 20100078044 APPARATUS AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE USING PRESSURIZED FLUID 04-01-2010
217. 20100078041 BRUSH BOX CLEANER MODULE WITH FORCE CONTROL 04-01-2010
218. 20100078039 METHOD AND APPRATUS FOR MASK PELLICLE ADHESIVE RESIDUE CLEANING 04-01-2010
219. 20100077593 SELF-ALIGNING UTILITY AUTOCOUPLER - apparatus and method for coupling utilities is provided 04-01-2010
220. 20100075499 METHOD AND APPARATUS FOR METAL SILICIDE FORMATION 03-25-2010
221. 20100075494 INTEGRATION OF ALD TANTALUM NITRIDE FOR COPPER METALLIZATION 03-25-2010
222. 20100075490 DEFECT-FREE JUNCTION FORMATION USING LASER MELT ANNEALING OF OCTADECABORANE SELF-AMORPHIZING IMPLANTS 03-25-2010
223. 20100075488 CVD REACTOR WITH MULTIPLE PROCESSING LEVELS AND DUAL-AXIS MOTORIZED LIFT MECHANISM 03-25-2010
224. 20100075485 INTEGRATED EMITTER FORMATION AND PASSIVATION 03-25-2010
225. 20100075453 SYSTEM ARCHITECTURE AND METHOD FOR SOLAR PANEL FORMATION 03-25-2010
226. 20100073011 LIGHT SOAKING SYSTEM AND TEST METHOD FOR SOLAR CELLS 03-25-2010
227. 20100068898 MANAGING THERMAL BUDGET IN ANNEALING OF SUBSTRATES 03-18-2010
228. 20100068835 THIN FILM SCRIBE PROCESS - method and apparatus for improving a thin film scribing procedure is presented 03-18-2010
229. 20100065547 MANAGING THERMAL BUDGET IN ANNEALING OF SUBSTRATES 03-18-2010
230. 20100065213 ETCHING CHAMBER HAVING FLOW EQUALIZER AND LOWER LINER 03-18-2010
231. 20100062694 CARRIER HEAD USING FLEXURE RESTRAINTS FOR RETAINING RING ALIGNMENT 03-11-2010
232. 20100062614 IN-SITU CHAMBER TREATMENT AND DEPOSITION PROCESS 03-11-2010
233. 20100062149 METHOD FOR TUNING A DEPOSITION RATE DURING AN ATOMIC LAYER DEPOSITION PROCESS 03-11-2010
234. 20100061032 ELECTROSTATIC CHUCK ELECTRICAL BALANCING CIRCUIT REPAIR 03-11-2010
235. 20100059693 SCRIBE PROCESS MONITORING METHODOLOGY - One embodiment of the present invention sets forth a computer-implemented method for tuning laser scribe 03-11-2010
236. 20100059500 APPARATUS WITH STRAIN RELEASE FEATURE FOR HIGH TEMPERATURE PROCESSES 03-11-2010
237. 20100059181 LOW SLOPED EDGE RING FOR PLASMA PROCESSING CHAMBER 03-11-2010
238. 20100059110 MICROCRYSTALLINE SILICON ALLOYS FOR THIN FILM AND WAFER BASED SOLAR APPLICATIONS 03-11-2010
239. 20100056030 MECHANISM FOR DETECTING SHAFT MOTION, AND CONDITIONER HEAD 03-04-2010
240. 20100055901 LASER MATERIAL REMOVAL METHODS AND APPARATUS 03-04-2010
241. 20100055822 BACK CONTACT SOLAR CELLS USING PRINTED DIELECTRIC BARRIER 03-04-2010
242. 20100054905 LOAD LOCK CHAMBER FOR LARGE AREA SUBSTRATE PROCESSING SYSTEM 03-04-2010
243. 20100052706 CONSISTANT AND QUANTITATIVE METHOD FOR TCO DELAMINATION EVALUATION 03-04-2010
244. 20100051111 SLIT VALVE CONTROL - Embodiments disclosed herein generally relate to methods for sealing a processing chamber with a slit valve door 03-04-2010
245. 20100051098 HIGH QUALITY TCO-SILICON INTERFACE CONTACT STRUCTURE FOR HIGH EFFICIENCY THIN FILM SILICON SOLAR CELLS 03-04-2010
246. 20100051085 BACK CONTACT SOLAR CELL MODULES - Embodiments of the invention contemplate the formation of a high efficiency solar cell using a novel processing 03-04-2010
247. 20100050534 SLOTTED TSSL DOOR TO COUPLE O-RING WITH MOVING MATING PART 03-04-2010
248. 20100048030 METHOD TO IMPROVE THE STEP COVERAGE AND PATTERN LOADING FOR DIELECTRIC FILMS 02-25-2010
249. 20100047954 PHOTOVOLTAIC PRODUCTION LINE - The present invention generally relates to a system that can be used to form a photovoltaic device 02-25-2010
250. 20100041316 METHOD FOR AN IMPROVED CHEMICAL MECHANICAL POLISHING SYSTEM 02-18-2010
251. 20100039747 ELECTROSTATIC CHUCK ASSEMBLY - Embodiments of the present invention provide a cost effective electrostatic chuck assembly capable of operating over a 02-18-2010
252. 20100037823 SHOWERHEAD AND SHADOW FRAME - The present invention generally relates to a gas distribution showerhead and a shadow frame for an apparatus 02-18-2010
253. 20100035525 IN-SITU PERFORMANCE PREDICTION OF PAD CONDITIONING DISK BY CLOSED LOOP TORQUE MONITORING 02-11-2010
254. 20100035518 CLOSED LOOP CONTROL OF PAD PROFILE BASED ON METROLOGY FEEDBACK 02-11-2010
255. 20100034625 MAGNETIC PAD FOR END-EFFECTORS - Embodiments of the present invention relate to apparatus and method for supporting and transferring large area 02-11-2010
256. 20100029178 SMART CONDITIONER RINSE STATION - method and apparatus for monitoring polishing pad conditioning mechanisms is provided 02-04-2010
257. 20100029094 Method and Apparatus for Forming a High Quality Low Temperature Silicon Nitride Layer 02-04-2010
258. 20100022100 BI-LAYER CAPPING OF LOW-K DIELECTRIC FILMS 01-28-2010
259. 20100021273 CONCRETE VACUUM CHAMBER - The present invention embodies processing systems and vacuum chambers equipped to process substrates for flat panel displays 01-28-2010
260. 20100018548 SUPERIMPOSITION OF RAPID PERIODIC AND EXTENSIVE POST MULTIPLE SUBSTRATE UV-OZONE CLEAN SEQUENCES FOR HIGH THROUGHPUT AND STABLE SUBSTRATE TO SUBSTRATE PERFORMANCE 01-28-2010
261. 20100018460 METHOD FOR FORMING SILICON-CONTAINING MATERIALS DURING A PHOTOEXCITATION DEPOSITION PROCESS 01-28-2010
262. 20100015816 METHODS TO PROMOTE ADHESION BETWEEN BARRIER LAYER AND POROUS LOW-K FILM DEPOSITED FROM MULTIPLE LIQUID PRECURSORS 01-21-2010
263. 20100015756 HYBRID HETEROJUNCTION SOLAR CELL FABRICATION USING A DOPING LAYER MASK 01-21-2010
264. 20100015751 HYBRID HETEROJUNCTION SOLAR CELL FABRICATION USING A METAL LAYER MASK 01-21-2010
265. 20100015749 RAPID THERMAL OXIDE PASSIVATED SOLAR CELL WITH IMPROVED JUNCTION 01-21-2010
266. 20100013626 SUBSTRATE LIFT PIN SENSOR - Embodiments disclosed herein include a method and apparatus for supporting a substrate 01-21-2010
267. 20100013572 APPARATUS FOR MULTIPLE FREQUENCY POWER APPLICATION 01-21-2010
268. 20100012273 Method and System for Supplying a Cleaning Gas Into a Process Chamber 01-21-2010
269. 20100011785 TUBE DIFFUSER FOR LOAD LOCK CHAMBER - Embodiments disclosed herein generally provide a load lock chamber capable of controlling the temperature of the 01-21-2010
270. 20100006425 METHODS OF FORMING A LAYER FOR BARRIER APPLICATIONS IN AN INTERCONNECT STRUCTURE 01-14-2010
271. 20100006167 CHEMICAL DELIVERY APPARATUS FOR CVD OR ALD 01-14-2010
272. 20100006032 CHAMBER COMPONENTS FOR CVD APPLICATIONS - Apparatus for use with a processing chamber are provided 01-14-2010
273. 20100003902 MODULAR BASE-PLATE SEMICONDUCTOR POLISHER ARCHITECTURE 01-07-2010
274. 20100003828 METHODS FOR ADJUSTING CRITICAL DIMENSION UNIFORMITY IN AN ETCH PROCESS WITH A HIGHLY CONCENTRATED UNSATURATED HYDROCARBON GAS 01-07-2010
275. 20100003780 METHODS AND APPARATUS FOR DEPOSITING A MICROCRYSTALLINE SILICON FILM FOR PHOTOVOLTAIC DEVICE 01-07-2010
276. 20100003406 APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION 01-07-2010
277. 20100003020 APPARATUS AND METHOD FOR MEASURING RADIATION ENERGY DURING THERMAL PROCESSING 01-07-2010
278. 20100001346 Treatment of Gate Dielectric for Making High Performance Metal Oxide and Metal Oxynitride Thin Film Transistors 01-07-2010
279. 20100001274 Capping Layers for Metal Oxynitride TFTS 01-07-2010
280. 20100001272 THIN FILM TRANSISTORS USING MULTIPLE ACTIVE CHANNEL LAYERS 01-07-2010
281. 20090325387 METHODS AND APPARATUS FOR IN-SITU CHAMBER DRY CLEAN DURING PHOTOMASK PLASMA ETCHING 12-31-2009
282. 20090325381 PREVENTION AND REDUCTION OF SOLVENT AND SOLUTION PENETRATION INTO POROUS DIELECTRICS USING A THIN BARRIER LAYER 12-31-2009
283. 20090321019 RF POWER DELIVERY SYSTEM IN A SEMICONDUCTOR APPARATUS 12-31-2009
284. 20090320875 DUAL CHAMBER MEGASONIC CLEANER - Embodiments described herein relate to semiconductor device manufacturing and more particularly to a vertically 12-31-2009
285. 20090318060 CLOSED-LOOP CONTROL FOR EFFECTIVE PAD CONDITIONING 12-24-2009
286. 20090316749 SUBSTRATE TEMPERATURE MEASUREMENT BY INFRARED TRANSMISSION IN AN ETCH PROCESS 12-24-2009
287. 20090315030 METHODS FOR FORMING AN AMORPHOUS SILICON FILM IN DISPLAY DEVICES 12-24-2009
288. 20090314433 CATHODE WITH INNER AND OUTER ELECTRODES AT DIFFERENT HEIGHTS 12-24-2009
289. 20090314370 CHEMICAL DELIVERY APPARATUS FOR CVD OR ALD 12-24-2009
290. 20090314309 METHOD AND SYSTEM FOR SUPPLYING A CLEANING GAS INTO A PROCESS CHAMBER 12-24-2009
291. 20090314211 BIG FOOT LIFT PIN - Embodiments described herein generally provide a lift pin assembly having increased wafer placement accuracy 12-24-2009
292. 20090314208 PEDESTAL HEATER FOR LOW TEMPERATURE PECVD APPLICATION 12-24-2009
293. 20090314201 ACCURATE CONVEYANCE SYSTEM USEFUL FOR SCREEN PRINTING 12-24-2009
294. 20090311439 Short Thermal Profile Oven Useful For Screen Printing 12-17-2009
295. 20090308860 SHORT THERMAL PROFILE OVEN USEFUL FOR SCREEN PRINTING 12-17-2009
296. 20090308739 WAFER PROCESSING DEPOSITION SHIELDING COMPONENTS 12-17-2009
297. 20090308732 APPARATUS AND METHOD FOR UNIFORM DEPOSITION 12-17-2009
298. 20090308318 APPARATUS AND METHOD FOR HYBRID CHEMICAL PROCESSING 12-17-2009
299. 20090305610 MULTIPLE WINDOW PAD ASSEMBLY - method and apparatus for detecting and obtaining a metric indicative of a polishing process is described 12-10-2009
300. 20090305609 CMP PAD IDENTIFICATION AND LAYER RATIO MODELING 12-10-2009
301. 20090305515 METHOD AND APPARATUS FOR UV CURING WITH WATER VAPOR 12-10-2009
302. 20090305514 METHOD OF MODIFYING INTERLAYER ADHESION - Methods are provided for processing a substrate for depositing an adhesion layer having a low dielectric 12-10-2009
303. 20090305500 Contact Clean by Remote Plasma and Repair of Silicide Surface 12-10-2009
304. 20090305441 NEXT GENERATION SCREEN PRINTING SYSTEM - Embodiments of the present invention provide an apparatus and method for processing substrates using a multiple 12-10-2009
305. 20090302002 METHOD AND APPARATUS FOR REMOVING POLYMER FROM A SUBSTRATE 12-10-2009
306. 20090301567 METHOD AND APPARATUS FOR DAMPENING PRESSURE FLUCTUATIONS IN A FLUID DELIVERY SYSTEM 12-10-2009
307. 20090296774 METHOD AND APPARATUS FOR DETECTING THE SUBSTRATE TEMPERATURE IN A LASER ANNEAL SYSTEM 12-03-2009
308. 20090293907 METHOD OF SUBSTRATE POLYMER REMOVAL - Methods for cleaning a substrate are provided 12-03-2009
309. 20090288591 Crystal Growth Apparatus for Solar Cell Manufacturing 11-26-2009
310. 20090287446 PHOTOVOLTAIC CELL REFERENCE MODULE FOR SOLAR TESTING 11-19-2009
311. 20090286402 METHOD FOR CRITICAL DIMENSION SHRINK USING CONFORMAL PECVD FILMS 11-19-2009
312. 20090283252 GAS HEATER - method and apparatus for heating or cooling a fluid 11-19-2009
313. 20090283039 ROBUST OUTLET PLUMBING FOR HIGH POWER FLOW REMOTE PLASMA SOURCE 11-19-2009
314. 20090283036 SHADOW FRAME HAVING ALIGNMENT INSERTS - The present invention generally includes a shadow frame with alignment inserts that may permit the shadow frame 11-19-2009
315. 20090280727 POLISHING SYSTEM WITH THREE HEADED CAROUSEL 11-12-2009
316. 20090280640 DEPOSITION AND DENSIFICATION PROCESS FOR TITANIUM NITRIDE BARRIER LAYERS 11-12-2009
317. 20090280597 Surface cleaning and texturing process for crystalline solar cells 11-12-2009
318. 20090280580 CMP PAD THICKNESS AND PROFILE MONITORING SYSTEM 11-12-2009
319. 20090278081 PAD PROPERTIES USING NANOPARTICLE ADDITIVES 11-12-2009
320. 20090277894 METHOD FOR REDUCING STRAY LIGHT IN A RAPID THERMAL PROCESSING CHAMBER BY POLARIZATION 11-12-2009
321. 20090277874 METHOD AND APPARATUS FOR REMOVING POLYMER FROM A SUBSTRATE 11-12-2009
322. 20090277388 HEATER WITH DETACHABLE SHAFT - Embodiments of the present invention generally include an apparatus for uniform heat distribution across the surface of a 11-12-2009
323. 20090277006 METHOD FOR FORMING AN ELECTRICAL CONNECTION 11-12-2009
324. 20090275215 SUITABLY SHORT WAVELENGTH LIGHT FOR LASER ANNEALING OF SILICON IN DSA TYPE SYSTEMS 11-05-2009
325. 20090274830 ROLL TO ROLL OLED PRODUCTION SYSTEM - The present invention generally relates to a method and an apparatus for processing one or more substrates on a 11-05-2009
326. 20090274454 SYSTEM FOR NON RADIAL TEMPERATURE CONTROL FOR ROTATING SUBSTRATES 11-05-2009
327. 20090272717 METHOD AND APPARATUS OF A SUBSTRATE ETCHING SYSTEM AND PROCESS 11-05-2009
328. 20090272647 PROCESS KIT FOR RF PHYSICAL VAPOR DEPOSITION 11-05-2009
329. 20090270015 HIGH THROUGHPUT CHEMICAL MECHANICAL POLISHING SYSTEM 10-29-2009
330. 20090269923 ADHESION AND ELECTROMIGRATION IMPROVEMENT BETWEEN DIELECTRIC AND CONDUCTIVE LAYERS 10-29-2009
331. 20090269512 NONPLANAR FACEPLATE FOR A PLASMA PROCESSING CHAMBER 10-29-2009
332. 20090269507 SELECTIVE COBALT DEPOSITION ON COPPER SURFACES 10-29-2009
333. 20090266139 REAL TIME LEAD-LINE CHARACTERIZATION FOR MFC FLOW VERIFICATION 10-29-2009
334. 20090264056 SUBSTRATE HOLDER WITH LIQUID SUPPORTING SURFACE 10-22-2009
335. 20090264049 PLATEN EXHAUST FOR CHEMICAL MECHANICAL POLISHING SYSTEM 10-22-2009
336. 20090263972 BORON NITRIDE AND BORON-NITRIDE DERIVED MATERIALS DEPOSITION METHOD 10-22-2009
337. 20090263961 HARDWARE SET FOR GROWTH OF HIGH K & CAPPING MATERIAL FILMS 10-22-2009
338. 20090263930 MICROCRYSTALLINE SILICON DEPOSITION FOR THIN FILM SOLAR APPLICATIONS 10-22-2009
339. 20090263215 END EFFECTOR FOR A CLUSTER TOOL - Embodiments of the present invention generally provide an apparatus and method for transferring substrates in a 10-22-2009
340. 20090261331 LOW TEMPERATURE THIN FILM TRANSISTOR PROCESS, DEVICE PROPERTY, AND DEVICE STABILITY IMPROVEMENT 10-22-2009
341. 20090260982 WAFER PROCESSING DEPOSITION SHIELDING COMPONENTS 10-22-2009
342. 20090258574 POLISHING SYSTEM HAVING A TRACK - Embodiments described herein relate to a track system in a polishing system 10-15-2009
343. 20090258484 METHODS FOR FABRICATING DUAL MATERIAL GATE IN A SEMICONDUCTOR DEVICE 10-15-2009
344. 20090258162 PLASMA PROCESSING APPARATUS AND METHOD - The present invention generally includes a plasma enhanced chemical vapor deposition processing chamber having 10-15-2009
345. 20090257927 FOLDED COAXIAL RESONATORS - method for constructing a distributed element coaxial resonator includes folding a coaxial resonator to provide a structure 10-15-2009
346. 20090256581 SOLAR PARAMETRIC TESTING MODULE AND PROCESSES 10-15-2009
347. 20090255892 METHOD AND APPARATUS TO REMOVE AND REPLACE FACTORY INTERFACE TRACK 10-15-2009
348. 20090255798 METHOD TO PREVENT PARASITIC PLASMA GENERATION IN GAS FEEDTHRU OF LARGE SIZE PECVD CHAMBER 10-15-2009
349. 20090250955 WAFER TRANSFER BLADE - Projections 22 of the blade 16 provided on a blade surface in a wafer-loading region 18b of a body 18 support a wafer W loaded on 10-08-2009
350. 20090250169 LOWER LINER WITH INTEGRATED FLOW EQUALIZER AND IMPROVED CONDUCTANCE 10-08-2009
351. 20090242957 ATOMIC LAYER DEPOSITION PROCESSES FOR NON-VOLATILE MEMORY DEVICES 10-01-2009
352. 20090239359 INTEGRATED PROCESS SYSTEM AND PROCESS SEQUENCE FOR PRODUCTION OF THIN FILM TRANSISTOR ARRAYS USING DOPED OR COMPOUNDED METAL OXIDE SEMICONDUCTOR 09-24-2009
353. 20090238734 SUSCEPTOR WITH ROLL-FORMED SURFACE AND METHOD FOR MAKING SAME 09-24-2009
354. 20090236597 PROCESS TO MAKE METAL OXIDE THIN FILM TRANSISTOR ARRAY WITH ETCH STOPPING LAYER 09-24-2009
355. 20090236315 SHIELDED LID HEATER ASSEMBLY - shielded lid heater lid heater suitable for use with a plasma processing chamber a plasma processing chamber having a 09-24-2009
356. 20090236214 TUNABLE GROUND PLANES IN PLASMA CHAMBERS 09-24-2009
357. 20090233424 THIN FILM METAL OXYNITRIDE SEMICONDUCTORS 09-17-2009
358. 20090233387 LINEAR PLASMA SOURCE FOR DYNAMIC (MOVING SUBSTRATE) PLASMA PROCESSING 09-17-2009
359. 20090233384 METHOD FOR MEASURING DOPANT CONCENTRATION DURING PLASMA ION IMPLANTATION 09-17-2009
360. 20090232986 HEATED VALVE MANIFOLD FOR AMPOULE - Embodiments of the invention provide an apparatus and a method for generating a gaseous chemical precursor that may 09-17-2009
361. 20090232630 TENDON ENHANCED END EFFECTOR - end effector assembly for a substrate transfer robot is described 09-17-2009
362. 20090230425 WATER-BARRIER ENCAPSULATION METHOD - The present invention generally relates to organic light emitting diode structures and methods for their 09-17-2009
363. 20090230089 ELECTRICAL CONTROL OF PLASMA UNIFORMITY USING EXTERNAL CIRCUIT 09-17-2009
364. 20090221217 SOLAR PANEL EDGE DELETION MODULE - The present invention generally relates to an edge deletion module positioned within an automated solar cell 09-03-2009
365. 20090221150 ETCH RATE AND CRITICAL DIMENSION UNIFORMITY BY SELECTION OF FOCUS RING MATERIAL 09-03-2009
366. 20090221149 MULTIPLE PORT GAS INJECTION SYSTEM UTILIZED IN A SEMICONDUCTOR PROCESSING SYSTEM 09-03-2009
367. 20090220865 METHOD AND APPARATUS FOR SOURCE FIELD SHAPING IN A PLASMA ETCH REACTOR 09-03-2009
368. 20090218324 DIRECT REAL-TIME MONITORING AND FEEDBACK CONTROL OF RF PLASMA OUTPUT FOR WAFER PROCESSING 09-03-2009
369. 20090218317 METHOD TO CONTROL UNIFORMITY USING TRI-ZONE SHOWERHEAD 09-03-2009
370. 20090218315 METHOD AND SYSTEM FOR CONTROLLING CENTER-TO-EDGE DISTRIBUTION OF SPECIES WITHIN A PLASMA 09-03-2009
371. 20090218314 ADVANCED PROCESS SENSING AND CONTROL USING NEAR INFRARED SPECTRAL REFLECTOMETRY 09-03-2009
372. 20090218043 GAS FLOW EQUALIZER PLATE SUITABLE FOR USE IN A SUBSTRATE PROCESS CHAMBER 09-03-2009
373. 20090217953 DRIVE ROLLER FOR A CLEANING SYSTEM - drive roller for use in a semiconductor substrate cleaning system is provided 09-03-2009
374. 20090215264 PROCESS FOR SELECTIVE GROWTH OF FILMS DURING ECP PLATING 08-27-2009
375. 20090215260 METHODS OF FORMING A BARRIER LAYER IN AN INTERCONNECT STRUCTURE 08-27-2009
376. 20090214798 APPARATUS AND METHOD FOR FRONT SIDE PROTECTION DURING BACKSIDE CLEANING 08-27-2009
377. 20090211071 METHOD AND APPARATUS FOR FORMING AN ELECTRICAL CONNECTION ON A SOLAR CELL 08-27-2009
378. 20090209112 MILLISECOND ANNEALING (DSA) EDGE PROTECTION 08-20-2009
379. 20090205703 APPARATUS AND METHOD OF MOUNTING AND SUPPORTING A SOLAR PANEL 08-20-2009
380. 20090203197 NOVEL METHOD FOR CONFORMAL PLASMA IMMERSED ION IMPLANTATION ASSISTED BY ATOMIC LAYER DEPOSITION 08-13-2009
381. 20090202710 ATOMIC LAYER DEPOSITION OF TANTALUM-CONTAINING MATERIALS USING THE TANTALUM PRECURSOR TAIMATA 08-13-2009
382. 20090200553 HIGH TEMPERATURE THIN FILM TRANSISTOR ON SODA LIME GLASS 08-13-2009
383. 20090200552 MICROCRYSTALLINE SILICON THIN FILM TRANSISTOR 08-13-2009
384. 20090200551 MICROCRYSTALLINE SILICON THIN FILM TRANSISTOR 08-13-2009
385. 20090200279 AUTOMATIC FOCUS AND EMISSIVITY MEASUREMENTS FOR A SUBSTRATE SYSTEM 08-13-2009
386. 20090199765 HIGH EFFICIENCY ELECTRO-STATIC CHUCKS FOR SEMICONDUCTOR WAFER PROCESSING 08-13-2009
387. 20090197406 SEQUENTIAL DEPOSITION OF TANTALUM NITRIDE USING A TANTALUM-CONTAINING PRECURSOR AND A NITROGEN-CONTAINING PRECURSOR 08-06-2009
388. 20090197086 ELIMINATION OF PHOTORESIST MATERIAL COLLAPSE AND POISONING IN 45-NM FEATURE SIZE USING DRY OR IMMERSION LITHOGRAPHY 08-06-2009
389. 20090196724 EDGE CONTACT GRIPPER - The present invention generally provides a method and apparatus for supporting and transferring a substrate 08-06-2009
390. 20090195777 DOSIMETRY USING OPTICAL EMISSION SPECTROSCOPY/RESIDUAL GAS ANALYZER IN CONJUNCTION WITH ION CURRENT 08-06-2009
391. 20090195262 IN-LINE ELECTRON BEAM TEST SYSTEM - method and apparatus for testing a plurality of electronic devices formed on a large area substrate is described 08-06-2009
392. 20090194026 PROCESSING SYSTEM FOR FABRICATING COMPOUND NITRIDE SEMICONDUCTOR DEVICES 08-06-2009
393. 20090194024 CVD APPARATUS - Embodiments of the present invention generally relate to methods and apparatus for chemical vapor deposition on a substrate 08-06-2009
394. 20090191711 HARDMASK OPEN PROCESS WITH ENHANCED CD SPACE SHRINK AND REDUCTION 07-30-2009
395. 20090191703 PROCESS WITH SATURATION AT LOW ETCH AMOUNT FOR HIGH CONTACT BOTTOM CLEANING EFFICIENCY FOR CHEMICAL DRY CLEAN PROCESS 07-30-2009
396. 20090188625 ETCHING CHAMBER HAVING FLOW EQUALIZER AND LOWER LINER 07-30-2009
397. 20090188603 METHOD AND APPARATUS FOR CONTROLLING LAMINATOR TEMPERATURE ON A SOLAR CELL 07-30-2009
398. 20090188102 AUTOMATED SOLAR CELL ELECTRICAL CONNECTION APPARATUS 07-30-2009
399. 20090186282 CONTAMINATION PREVENTION IN EXTREME ULTRAVIOLET LITHOGRAPHY 07-23-2009
400. 20090184093 HIGH TEMPERATURE FINE GRAIN ALUMINUM HEATER 07-23-2009
401. 20090183322 ELECTROSTATIC SURFACE CLEANING - Embodiments of the present invention generally provide apparatus and methods for cleaning a substrate, such as a mask 07-23-2009
402. 20090179085 HEATED SHOWERHEAD ASSEMBLY - The present invention generally comprises a heated showerhead assembly that may be used to supply processing gases into a 07-16-2009
403. 20090178927 METHODS AND COMPOSITIONS FOR ELECTROPHORETIC METALLIZATION DEPOSITION 07-16-2009
404. 20090178617 RF GROUNDING OF CATHODE IN PROCESS CHAMBER 07-16-2009
405. 20090163042 THERMAL REACTOR WITH IMPROVED GAS FLOW DISTRIBUTION 06-25-2009
406. 20090163033 METHODS FOR EXTENDING CHAMBER COMPONENT LIFE TIME 06-25-2009
407. 20090162996 REMOVAL OF SURFACE DOPANTS FROM A SUBSTRATE 06-25-2009
408. 20090162952 APPARATUS AND METHOD FOR CONTROLLING EDGE PERFORMANCE IN AN INDUCTIVELY COUPLED PLASMA CHAMBER 06-25-2009
409. 20090162570 APPARATUS AND METHOD FOR PROCESSING A SUBSTRATE USING INDUCTIVELY COUPLED PLASMA TECHNOLOGY 06-25-2009
410. 20090162551 HAFNIUM OXIDE ALD PROCESS - method and apparatus for performing ALD deposition of hafnium oxide on a substrate is provided 06-25-2009
411. 20090162259 HIGH EFFICIENCY UV CURING SYSTEM - ultraviolet cure chamber enables curing a dielectric material disposed on a substrate and in situ cleaning thereof 06-25-2009
412. 20090159573 FOUR SURFACES COOLING BLOCK - cooling block for coupling a remote plasma source to a resistor is disclosed 06-25-2009
413. 20090159566 METHOD AND APPARATUS FOR CONTROLLING TEMPERATURE OF A SUBSTRATE 06-25-2009
414. 20090159425 METHOD OF CORRECTING BASELINE SKEW BY A NOVEL MOTORIZED SOURCE COIL ASSEMBLY 06-25-2009
415. 20090159424 DUAL ZONE GAS INJECTION NOZZLE - The present invention generally provides apparatus and method for processing a substrate 06-25-2009
416. 20090158265 IMPLEMENTATION OF ADVANCED ENDPOINT FUNCTIONS WITHIN THIRD PARTY SOFTWARE BY USING A PLUG-IN APPROACH 06-18-2009
417. 20090156004 METHOD FOR FORMING TUNGSTEN MATERIALS DURING VAPOR DEPOSITION PROCESSES 06-18-2009
418. 20090156003 METHOD FOR DEPOSITING TUNGSTEN-CONTAINING LAYERS BY VAPOR DEPOSITION TECHNIQUES 06-18-2009
419. 20090155025 LIFT PIN FOR SUBSTRATE PROCESSING - lift pin is provided for manipulating a substrate above a support surface of a substrate support and uniformly 06-18-2009
420. 20090151636 RPSC AND RF FEEDTHROUGH - The present invention generally comprises an apparatus having an RF choke and a remote plasma source combined into a single 06-18-2009
421. 20090149008 METHOD FOR DEPOSITING GROUP III/V COMPOUNDS 06-11-2009
422. 20090148764 METHOD FOR HIGH VOLUME MANUFACTURING OF THIN FILM BATTERIES 06-11-2009
423. 20090148033 OPTICAL INSPECTION APPARATUS FOR SUBSTRATE DEFECT DETECTION 06-11-2009
424. 20090146264 THIN FILM TRANSISTOR ON SODA LIME GLASS WITH BARRIER LAYER 06-11-2009
425. 20090145760 ELECTROPHORETIC SOLAR CELL METALLIZATION PROCESS AND APPARATUS 06-11-2009
426. 20090145360 METHOD AND APPARATUS FOR CLEANING A CVD CHAMBER 06-11-2009
427. 20090142880 Solar Cell Contact Formation Process Using A Patterned Etchant Material 06-04-2009
428. 20090142878 PLASMA TREATMENT BETWEEN DEPOSITION PROCESSES 06-04-2009
429. 20090142875 METHOD OF MAKING AN IMPROVED SELECTIVE EMITTER FOR SILICON SOLAR CELLS 06-04-2009
430. 20090142512 APPARATUS AND METHOD FOR DEPOSITING ELECTRICALLY CONDUCTIVE PASTING MATERIAL 06-04-2009
431. 20090142474 RUTHENIUM AS AN UNDERLAYER FOR TUNGSTEN FILM DEPOSITION 06-04-2009
432. 20090139568 Crystalline Solar Cell Metallization Methods 06-04-2009
433. 20090137132 DECREASING THE ETCH RATE OF SILICON NITRIDE BY CARBON ADDITION 05-28-2009
434. 20090136652 SHOWERHEAD DESIGN WITH PRECURSOR SOURCE - method and apparatus that may be utilized in deposition processes such as hydride vapor phase epitaxial 05-28-2009
435. 20090132189 METHOD FOR DETERMINING PLASMA CHARACTERISTICS 05-21-2009
436. 20090130856 METHOD FOR MONITORING PROCESS DRIFT USING PLASMA CHARACTERISTICS 05-21-2009
437. 20090130837 IN SITU DEPOSITION OF A LOW K DIELECTRIC LAYER, BARRIER LAYER, ETCH STOP, AND ANTI-REFLECTIVE COATING FOR DAMASCENE APPLICATION 05-21-2009
438. 20090130827 INTRINSIC AMORPHOUS SILICON LAYER - Embodiments of the present invention may include an improved thin film solar cell device that is formed by 05-21-2009
439. 20090121157 PULSE TRAIN ANNEALING METHOD AND APPARATUS 05-14-2009
440. 20090120924 PULSE TRAIN ANNEALING METHOD AND APPARATUS 05-14-2009
441. 20090120803 Pad for electrochemical processing - Systems and methods for electrochemically processing 05-14-2009
442. 20090120799 MULTIPLE-STEP ELECTRODEPOSITION PROCESS FOR DIRECT COPPER PLATING ON BARRIER METALS 05-14-2009
443. 20090117745 METHODS FOR SELECTIVELY ETCHING A BARRIER LAYER IN DUAL DAMASCENE APPLICATIONS 05-07-2009
444. 20090114157 AMPOULE SPLASH GUARD APPARATUS - Embodiments of the invention provide an apparatus for generating a precursor gas used in a vapor deposition process 05-07-2009
445. 20090114153 METHOD AND APPARATUS FOR SEALING AN OPENING OF A PROCESSING CHAMBER 05-07-2009
446. 20090111280 METHOD FOR REMOVING OXIDES - method for removing native oxides from a substrate surface is provided 04-30-2009
447. 20090111264 PLASMA-ENHANCED CYCLIC LAYER DEPOSITION PROCESS FOR BARRIER LAYERS 04-30-2009
448. 20090110520 ADVANCED FI BLADE FOR HIGH TEMPERATURE EXTRACTION 04-30-2009
449. 20090107955 OFFSET LINER FOR CHAMBER EVACUATION - The present invention generally includes a chamber liner spaced from a chamber wall to permit processing gases to 04-30-2009
450. 20090107626 ADHESION IMPROVEMENT OF DIELECTRIC BARRIER TO COPPER BY THE ADDITION OF THIN INTERFACE LAYER 04-30-2009
451. 20090107549 PERCOLATING AMORPHOUS SILICON SOLAR CELL 04-30-2009
452. 20090105873 METHOD OF DYNAMIC TEMPERATURE CONTROL DURING MICROCRYSTALLINE SI GROWTH 04-23-2009
453. 20090104733 MICROCRYSTALLINE SILICON DEPOSITION FOR THIN FILM SOLAR APPLICATIONS 04-23-2009
454. 20090104732 CVD PROCESS GAS FLOW, PUMPING AND/OR BOOSTING 04-23-2009
455. 20090104541 PLASMA SURFACE TREATMENT TO PREVENT PATTERN COLLAPSE IN IMMERSION LITHOGRAPHY 04-23-2009
456. 20090104376 GAS DIFFUSION SHOWER HEAD DESIGN FOR LARGE AREA PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION 04-23-2009
457. 20090104342 PHOTOVOLTAIC FABRICATION PROCESS MONITORING AND CONTROL USING DIAGNOSTIC DEVICES 04-23-2009
458. 20090102502 PROCESS TESTERS AND TESTING METHODOLOGY FOR THIN-FILM PHOTOVOLTAIC DEVICES 04-23-2009
459. 20090101201 NIP-NIP THIN-FILM PHOTOVOLTAIC STRUCTURE 04-23-2009
460. 20090101069 RF RETURN PLATES FOR BACKING PLATE SUPPORT 04-23-2009
461. 20090098276 MULTI-GAS STRAIGHT CHANNEL SHOWERHEAD - method and apparatus that may be utilized for chemical vapor deposition and/or hydride vapor phase epitaxial 04-16-2009
462. 20090097184 ELECTROSTATIC CHUCK ASSEMBLY - The present invention generally comprises an electrostatic chuck base an electrostatic chuck assembly 04-16-2009
463. 20090095621 SUPPORT ASSEMBLY - method and apparatus for removing native oxides from a substrate surface is provided 04-16-2009
464. 20090095334 SHOWERHEAD ASSEMBLY - method and apparatus for removing native oxides from a substrate surface is provided 04-16-2009
465. 20090095222 MULTI-GAS SPIRAL CHANNEL SHOWERHEAD - method and apparatus that may be utilized for chemical vapor deposition and/or hydride vapor phase epitaxial 04-16-2009
466. 20090095221 MULTI-GAS CONCENTRIC INJECTION SHOWERHEAD 04-16-2009
467. 20090093132 METHODS TO OBTAIN LOW K DIELECTRIC BARRIER WITH SUPERIOR ETCH RESISTIVITY 04-09-2009
468. 20090093128 METHODS FOR HIGH TEMPERATURE DEPOSITION OF AN AMORPHOUS CARBON LAYER 04-09-2009
469. 20090093112 METHODS AND APPARATUS OF CREATING AIRGAP IN DIELECTRIC LAYERS FOR THE REDUCTION OF RC DELAY 04-09-2009
470. 20090093100 METHOD FOR FORMING AN AIR GAP IN MULTILEVEL INTERCONNECT STRUCTURE 04-09-2009
471. 20090093080 SOLAR CELLS AND METHODS AND APPARATUSES FOR FORMING THE SAME INCLUDING I-LAYER AND N-LAYER CHAMBER CLEANING 04-09-2009
472. 20090092466 MULTI-LEVEL LOAD LOCK CHAMBER, TRANSFER CHAMBER, AND ROBOT SUITABLE FOR INTERFACING WITH SAME 04-09-2009
473. 20090091817 HIGH SPEED PHASE SCRAMBLING OF A COHERENT BEAM USING PLASMA 04-09-2009
474. 20090090952 PLASMA SURFACE TREATMENT FOR SI AND METAL NANOCRYSTAL NUCLEATION 04-09-2009
475. 20090090883 CHAMBER ISOLATION VALVE RF GROUNDING - Embodiments described herein provide a method and apparatus for grounding a chamber isolation valve 04-09-2009
476. 20090088050 CONDUCTIVE POLISHING ARTICLE FOR ELECTROCHEMICAL MECHANICAL POLISHING 04-02-2009
477. 20090087983 ALUMINUM CONTACT INTEGRATION ON COBALT SILICIDE JUNCTION 04-02-2009
478. 20090087982 SELECTIVE RUTHENIUM DEPOSITION ON COPPER MATERIALS 04-02-2009
479. 20090087977 LOW TEMPERATURE CONFORMAL OXIDE FORMATION AND APPLICATIONS 04-02-2009
480. 20090087585 DEPOSITION PROCESSES FOR TITANIUM NITRIDE BARRIER AND ALUMINUM 04-02-2009
481. 20090084413 VAPOR DRYER HAVING HYDROPHILIC END EFFECTOR 04-02-2009
482. 20090081884 METHOD OF IMPROVING OXIDE GROWTH RATE OF SELECTIVE OXIDATION PROCESSES 03-26-2009
483. 20090081868 VAPOR DEPOSITION PROCESSES FOR TANTALUM CARBIDE NITRIDE MATERIALS 03-26-2009
484. 20090081866 VAPOR DEPOSITION OF TUNGSTEN MATERIALS - Embodiments of the invention provide an improved process for depositing tungsten-containing materials 03-26-2009
485. 20090078916 TANTALUM CARBIDE NITRIDE MATERIALS BY VAPOR DEPOSITION PROCESSES 03-26-2009
486. 20090078198 CHAMBER COMPONENTS WITH INCREASED PYROMETRY VISIBILITY 03-26-2009
487. 20090077805 PHOTOVOLTAIC PRODUCTION LINE - The present invention generally relates to a system that can be used to form a photovoltaic device 03-26-2009
488. 20090077804 PRODUCTION LINE MODULE FOR FORMING MULTIPLE SIZED PHOTOVOLTAIC DEVICES 03-26-2009
489. 20090071403 PECVD PROCESS CHAMBER WITH COOLED BACKING PLATE 03-19-2009
490. 20090068783 METHODS OF EMITTER FORMATION IN SOLAR CELLS 03-12-2009
491. 20090068433 CERAMIC COVER WAFERS OF ALUMINUM NITRIDE OR BERYLLIUM OXIDE 03-12-2009
492. 20090068356 HIGH PRODUCTIVITY PLASMA PROCESSING CHAMBER 03-12-2009
493. 20090067956 CLUSTER TOOL ARCHITECTURE FOR PROCESSING A SUBSTRATE 03-12-2009
494. 20090065816 MODULATING THE STRESS OF POLY-CRYSTALINE SILICON FILMS AND SURROUNDING LAYERS THROUGH THE USE OF DOPANTS AND MULTI-LAYER SILICON FILMS WITH CONTROLLED CRYSTAL STRUCTURE 03-12-2009
495. 20090064934 SOURCE GAS FLOW PATH CONTROL IN PECVD SYSTEM TO CONTROL A BY-PRODUCT FILM DEPOSITION ON INSIDE CHAMBER 03-12-2009
496. 20090064929 CLUSTER TOOL ARCHITECTURE FOR PROCESSING A SUBSTRATE 03-12-2009
497. 20090064928 CLUSTER TOOL ARCHITECTURE FOR PROCESSING A SUBSTRATE 03-12-2009
498. 20090061743 METHOD OF SOFT PAD PREPARATION TO REDUCE REMOVAL RATE RAMP-UP EFFECT AND TO STABILIZE DEFECT RATE 03-05-2009
499. 20090061741 ECMP POLISHING SEQUENCE TO IMPROVE PLANARITY AND DEFECT PERFORMANCE 03-05-2009
500. 20090061617 EDGE BEAD REMOVAL PROCESS WITH ECMP TECHNOLOGY 03-05-2009
501. 20090060687 TRANSFER CHAMBER WITH ROLLING DIAPHRAGM - Embodiments of the invention include a vacuum transfer chamber having one rolling or more rolling diaphragm 03-05-2009
502. 20090057264 HIGH THROUGHPUT LOW TOPOGRAPHY COPPER CMP PROCESS 03-05-2009
503. 20090056743 METHOD OF CLEANING PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION CHAMBER 03-05-2009
504. 20090056626 APPARATUS FOR CYCLICAL DEPOSITING OF THIN FILMS 03-05-2009
505. 20090053902 LOW DIELECTRIC (LOW K) BARRIER FILMS WITH OXYGEN DOPING BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) 02-26-2009
506. 20090053893 ATOMIC LAYER DEPOSITION OF TUNGSTEN MATERIALS 02-26-2009
507. 20090053847 METHODS AND APPARATUS FOR DEPOSITING A MICROCRYSTALLINE SILICON FILM FOR PHOTOVOLTAIC DEVICE 02-26-2009
508. 20090053426 COBALT DEPOSITION ON BARRIER SURFACES - Embodiments of the invention provide processes for depositing a cobalt layer on a barrier layer and subsequently 02-26-2009
509. 20090050884 THIN FILM TRANSISTORS USING THIN FILM SEMICONDUCTOR MATERIALS 02-26-2009
510. 20090050270 SENSORS FOR DYNAMICALLY DETECTING SUBSTRATE BREAKAGE AND MISALIGNMENT OF A MOVING SUBSTRATE 02-26-2009
511. 20090047446 UNIFORMITY CONTROL FOR LOW FLOW PROCESS AND CHAMBER TO CHAMBER MATCHING 02-19-2009
512. 20090046750 INCREASED NANOSECOND LASER PULSE-TO-PULSE ENERGY REPEATABILITY USING ACTIVE LASER PULSE ENERGY CONTROL 02-19-2009
513. 20090045182 PULSED LASER ANNEAL SYSTEM ARCHITECTURE - Embodiments of the present invention provide method and apparatus for annealing semiconductor substrates 02-19-2009
514. 20090044753 METHODS TO IMPROVE THE IN-FILM DEFECTIVITY OF PECVD AMORPHOUS CARBON FILMS 02-19-2009
515. 20090042481 METHOD OF CALIBRATING OR COMPENSATING SENSOR FOR MEASURING PROPERTY OF A TARGET SURFACE 02-12-2009
516. 20090036037 APPARATUS FOR CONDITIONING PROCESSING PADS 02-05-2009
517. 20090036032 TEMPERATURE CONTROL FOR ECMP PROCESS - Methods for polishing a substrate are provided 02-05-2009
518. 20090035944 METHODS OF FOR FORMING ULTRA THIN STRUCTURES ON A SUBSTRATE 02-05-2009
519. 20090034072 METHOD AND APPARATUS FOR DECORRELATION OF SPATIALLY AND TEMPORALLY COHERENT LIGHT 02-05-2009
520. 20090034071 METHOD FOR PARTITIONING AND INCOHERENTLY SUMMING A COHERENT BEAM 02-05-2009
521. 20090032511 Apparatus and method of improving beam shaping and beam homogenization 02-05-2009
522. 20090032408 ELECTROLYTE RETAINING ON A ROTATING PLATEN BY DIRECTIONAL AIR FLOW 02-05-2009
523. 20090029560 Apparatus and method for single substrate processing 01-29-2009
524. 20090029544 ADHESION AND MINIMIZING OXIDATION ON ELECTROLESS CO ALLOY FILMS FOR INTEGRATION WITH LOW K INTER-METAL DIELECTRIC AND ETCH STOP 01-29-2009
525. 20090029528 METHOD AND APPARATUS FOR CLEANING A SUBSTRATE SURFACE 01-29-2009
526. 20090029502 APPARATUSES AND METHODS OF SUBSTRATE TEMPERATURE CONTROL DURING THIN FILM SOLAR MANUFACTURING 01-29-2009
527. 20090025749 METHOD FOR VERTICAL TRANSFER OF SEMICONDUCTOR SUBSTRATES IN A CLEANING MODULE 01-29-2009
528. 20090023241 CLEAN RATE IMPROVEMENT BY PRESSURE CONTROLLED REMOTE PLASMA SOURCE 01-22-2009
529. 20090022908 PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION TECHNOLOGY FOR LARGE-SIZE PROCESSING 01-22-2009
530. 20090022905 RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PROCESSING APPARATUS 01-22-2009
531. 20090020802 INTEGRATED SCHEME FOR FORMING INTER-POLY DIELECTRICS FOR NON-VOLATILE MEMORY DEVICES 01-22-2009
532. 20090020154 MULTI-JUNCTION SOLAR CELLS AND METHODS AND APPARATUSES FOR FORMING THE SAME 01-22-2009
533. 20090017640 BORON DERIVED MATERIALS DEPOSITION METHOD 01-15-2009
534. 20090017639 NOVEL SILICON PRECURSORS TO MAKE ULTRA LOW-K FILMS OF K<2.2 WITH HIGH MECHANICAL PROPERTIES BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION 01-15-2009
535. 20090017637 METHOD AND APPARATUS FOR BATCH PROCESSING IN A VERTICAL REACTOR 01-15-2009
536. 20090017635 APPARATUS AND METHOD FOR PROCESSING A SUBSTRATE EDGE REGION 01-15-2009
537. 20090017231 NOVEL SILICON PRECURSORS TO MAKE ULTRA LOW-K FILMS WITH HIGH MECHANICAL PROPERTIES BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION 01-15-2009
538. 20090017228 APPARATUS AND METHOD FOR CENTERING A SUBSTRATE IN A PROCESS CHAMBER 01-15-2009
539. 20090016406 NOVEL METHOD FOR MONITORING AND CALIBRATING TEMPERATURE IN SEMICONDUCTOR PROCESSING CHAMBERS 01-15-2009
540. 20090014409 ENDPOINT DETECTION FOR PHOTOMASK ETCHING 01-15-2009
541. 20090014324 INTEGRATED APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUBSTRATES 01-15-2009
542. 20090014323 HIGH TEMPERATURE CATHODE FOR PLASMA ETCHING 01-15-2009
543. 20090014127 SYSTEMS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND BEVEL EDGE ETCHING 01-15-2009
544. 20090012643 METHOD OF ACHIEVING HIGH PRODUCTIVITY FAULT TOLERANT PHOTOVOLTAIC FACTORY WITH BATCH ARRAY TRANSFER ROBOTS 01-08-2009
545. 20090011578 METHODS TO FABRICATE MOSFET DEVICES USING A SELECTIVE DEPOSITION PROCESS 01-08-2009
546. 20090011129 METHOD AND APPARATUS FOR PROVIDING PRECURSOR GAS TO A PROCESSING CHAMBER 01-08-2009
547. 20090010626 PROCESSING MULTILAYER SEMICONDUCTORS WITH MULTIPLE HEAT SOURCES 01-08-2009
548. 20090008600 METHOD AND COMPOSITION FOR POLISHING A SUBSTRATE 01-08-2009
549. 20090008239 REMOTE INDUCTIVELY COUPLED PLASMA SOURCE FOR CVD CHAMBER CLEANING 01-08-2009
550. 20090007846 DIFFUSER GRAVITY SUPPORT - apparatus and method for supporting a substantial center portion of a gas distribution plate is disclosed 01-08-2009
551. 20090004875 METHODS OF TRIMMING AMORPHOUS CARBON FILM FOR FORMING ULTRA THIN STRUCTURES ON A SUBSTRATE 01-01-2009
552. 20090004870 METHODS FOR HIGH TEMPERATURE ETCHING A HIGH-K MATERIAL GATE STRUCTURE 01-01-2009
553. 20090004850 PROCESS FOR FORMING COBALT AND COBALT SILICIDE MATERIALS IN TUNGSTEN CONTACT APPLICATIONS 01-01-2009
554. 20090004405 Thermal Batch Reactor with Removable Susceptors 01-01-2009
555. 20090000551 METHODS AND APPARATUS FOR DEPOSITING A UNIFORM SILICON FILM WITH FLOW GRADIENT DESIGNS 01-01-2009
556. 20080318441 PROCESS SEQUENCE FOR DOPED SILICON FILL OF DEEP TRENCHES 12-25-2008
557. 20080317973 DIFFUSER SUPPORT - Embodiments of gas distribution apparatus comprise a diffuser support member coupled to a diffuser and moveably disposed through a 12-25-2008
558. 20080317954 PULSED DEPOSITION PROCESS FOR TUNGSTEN NUCLEATION 12-25-2008
559. 20080314571 ANNULAR BAFFLE - baffle assembly for an etching apparatus is disclosed 12-25-2008
560. 20080314522 APPARATUS AND METHOD TO CONFINE PLASMA AND REDUCE FLOW RESISTANCE IN A PLASMA REACTOR 12-25-2008
561. 20080314317 SHOWERHEAD DESIGN WITH PRECURSOR PRE-MIXING 12-25-2008
562. 20080314311 HVPE SHOWERHEAD DESIGN - method and apparatus that may be utilized in deposition processes such as hydride vapor phase epitaxial deposition of metal 12-25-2008
563. 20080305629 TUNGSTEN NITRIDE ATOMIC LAYER DEPOSITION PROCESSES 12-11-2008
564. 20080305246 APPARATUS FOR DEPOSITING A UNIFORM SILICON FILM AND METHODS FOR MANUFACTURING THE SAME 12-11-2008
565. 20080302303 METHODS AND APPARATUS FOR DEPOSITING A UNIFORM SILICON FILM WITH FLOW GRADIENT DESIGNS 12-11-2008
566. 20080299735 METHODS FOR FORMING A TRANSISTOR - Methods are provided for depositing materials in forming semiconductor devices on a substrate, such as metal oxide 12-04-2008
567. 20080296352 BONDING METHOD FOR CYLINDRICAL TARGET - The present invention generally comprises a method and apparatus for bonding a cylindrical sputtering target to 12-04-2008
568. 20080296142 SWINGING MAGNETS TO IMPROVE TARGET UTILIZATION 12-04-2008
569. 20080293343 PAD WITH SHALLOW CELLS FOR ELECTROCHEMICAL MECHANICAL PROCESSING 11-27-2008
570. 20080292811 CHAMBER IDLE PROCESS FOR IMPROVED REPEATABILITY OF FILMS 11-27-2008
571. 20080292798 BORON NITRIDE AND BORON NITRIDE-DERIVED MATERIALS DEPOSITION METHOD 11-27-2008
572. 20080292433 BATCH EQUIPMENT ROBOTS AND METHODS OF ARRAY TO ARRAY WORK-PIECE TRANSFER FOR PHOTOVOLTAIC FACTORY 11-27-2008
573. 20080291428 FULL SPECTRUM ADAPTIVE FILTERING (FSAF) FOR LOW OPEN AREA ENDPOINT DETECTION 11-27-2008
574. 20080289687 METHODS FOR DEPOSITING A SILICON LAYER ON A LASER SCRIBED TRANSMITTING CONDUCTIVE OXIDE LAYER SUITABLE FOR USE IN SOLAR CELL APPLICATIONS 11-27-2008
575. 20080289686 METHOD AND APPARATUS FOR DEPOSITING A SILICON LAYER ON A TRANSMITTING CONDUCTIVE OXIDE LAYER SUITABLE FOR USE IN SOLAR CELL APPLICATIONS 11-27-2008
576. 20080289575 METHODS AND APPARATUS FOR DEPOSITING A GROUP III-V FILM USING A HYDRIDE VAPOR PHASE EPITAXY PROCESS 11-27-2008
577. 20080289284 PROCESS CHAMBER AND LOAD-LOCK SPLIT FRAME CONSTRUCTION 11-27-2008
578. 20080286463 RF SHUTTER - The present invention generally comprises an RF shutter assembly for use in a plasma processing apparatus 11-20-2008
579. 20080284760 LOCALIZATION OF DRIVER FAILURES WITHIN LIQUID CRYSTAL DISPLAYS 11-20-2008
580. 20080282982 APPARATUS AND METHOD FOR DEPOSITION OVER LARGE AREA SUBSTRATES 11-20-2008
581. 20080281457 METHOD OF ACHIEVING HIGH PRODUCTIVITY FAULT TOLERANT PHOTOVOLTAIC FACTORY WITH BATCH ARRAY TRANSFER ROBOTS 11-13-2008
582. 20080280457 METHOD OF IMPROVING INITIATION LAYER FOR LOW-K DIELECTRIC FILM BY DIGITAL LIQUID FLOW METER 11-13-2008
583. 20080280453 APPARATUS AND METHOD FOR SUPPORTING, POSITIONING AND ROTATING A SUBSTRATE IN A PROCESSING CHAMBER 11-13-2008
584. 20080280438 METHODS FOR DEPOSITING TUNGSTEN LAYERS EMPLOYING ATOMIC LAYER DEPOSITION TECHNIQUES 11-13-2008
585. 20080280413 METHODS FOR FORMING A TRANSISTOR - Methods are provided for depositing materials in forming semiconductor devices on a substrate, such as metal oxide 11-13-2008
586. 20080280212 METHOD FOR PHOTOMASK FABRICATION UTILIZING A CARBON HARD MASK 11-13-2008
587. 20080279672 BATCH EQUIPMENT ROBOTS AND METHODS OF STACK TO ARRAY WORK-PIECE TRANSFER FOR PHOTOVOLTAIC FACTORY 11-13-2008
588. 20080279658 BATCH EQUIPMENT ROBOTS AND METHODS WITHIN EQUIPMENT WORK-PIECE TRANSFER FOR PHOTOVOLTAIC FACTORY 11-13-2008
589. 20080277787 METHOD AND PAD DESIGN FOR THE REMOVAL OF BARRIER MATERIAL BY ELECTROCHEMICAL MECHANICAL PROCESSING 11-13-2008
590. 20080276868 RIGID RF TRANSMISSION LINE WITH EASY REMOVAL SECTION 11-13-2008
591. 20080276867 TRANSFER CHAMBER WITH VACUUM EXTENSION FOR SHUTTER DISKS 11-13-2008
592. 20080276864 APPARATUS AND METHOD FOR SUPPORTING, POSITIONING AND ROTATING A SUBSTRATE IN A PROCESSING CHAMBER 11-13-2008
593. 20080276860 CROSS FLOW APPARATUS AND METHOD FOR HYDRIDE VAPOR PHASE DEPOSITION 11-13-2008
594. 20080274626 METHOD FOR DEPOSITING A HIGH QUALITY SILICON DIELECTRIC FILM ON A GERMANIUM SUBSTRATE WITH HIGH QUALITY INTERFACE 11-06-2008
595. 20080274299 APPARATUS AND METHOD FOR HYBRID CHEMICAL PROCESSING 11-06-2008
596. 20080274279 NOBLE METAL LAYER FORMATION FOR COPPER FILM DEPOSITION 11-06-2008
597. 20080271309 HEATED SUBSTRATE SUPPORT AND METHOD OF FABRICATING SAME 11-06-2008
598. 20080268753 NON-CONTACT WET WAFER HOLDER - load cup configured to speed up substrate transferring to and from a carrier head and to reduce corrosion during the 10-30-2008
599. 20080268645 METHOD FOR FRONT END OF LINE FABRICATION 10-30-2008
600. 20080268636 DEPOSITION METHODS FOR BARRIER AND TUNGSTEN MATERIALS 10-30-2008
601. 20080268635 PROCESS FOR FORMING COBALT AND COBALT SILICIDE MATERIALS IN COPPER CONTACT APPLICATIONS 10-30-2008
602. 20080268617 METHODS FOR SUBSTRATE SURFACE CLEANING SUITABLE FOR FABRICATING SILICON-ON-INSULATOR STRUCTURES 10-30-2008
603. 20080268173 PECVD PROCESS CHAMBER BACKING PLATE REINFORCEMENT 10-30-2008
604. 20080268171 APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION 10-30-2008
605. 20080268154 METHODS FOR DEPOSITING A HIGH-K DIELECTRIC MATERIAL USING CHEMICAL VAPOR DEPOSITION PROCESS 10-30-2008
606. 20080264777 THIN FILM SEMICONDUCTOR MATERIAL PRODUCED THROUGH REACTIVE SPUTTERING OF ZINC TARGET USING NITROGEN GASES 10-30-2008
607. 20080264480 MULTI-JUNCTION SOLAR CELLS AND METHODS AND APPARATUSES FOR FORMING THE SAME 10-30-2008
608. 20080261800 EROSION RESISTANCE ENHANCED QUARTZ USED IN PLASMA ETCH CHAMBER 10-23-2008
609. 20080261413 PRETREATMENT PROCESSES WITHIN A BATCH ALD REACTOR 10-23-2008
610. 20080261335 ENDPOINT DETECTION FOR PHOTOMASK ETCHING 10-23-2008
611. 20080258091 FLOATING SLIT VALVE FOR TRANSFER CHAMBER INTERFACE 10-23-2008
612. 20080257260 Batch wafer handling system - The present invention generally provides a batch processing system having a processing chamber and a loading chamber 10-23-2008
613. 20080254722 PAD CONDITIONER - is provided for conditioning a polishing pad in chemical mechanical planarization 10-16-2008
614. 20080254713 PAD ASSEMBLIES FOR ELECTROCHEMICALLY ASSISTED PLANARIZATION 10-16-2008
615. 20080254613 METHODS FOR FORMING METAL INTERCONNECT STRUCTURE FOR THIN FILM TRANSISTOR APPLICATIONS 10-16-2008
616. 20080254233 PLASMA-INDUCED CHARGE DAMAGE CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION PROCESSES 10-16-2008
617. 20080254203 SILICON NITRIDE PASSIVATION FOR A SOLAR CELL 10-16-2008
618. 20080251137 IN-SITU MONITOR OF INJECTION VALVE - The present invention generally provides methods and apparatus for monitoring performance of an injection valve 10-16-2008
619. 20080251019 SYSTEM AND METHOD FOR TRANSFERRING A SUBSTRATE INTO AND OUT OF A REDUCED VOLUME CHAMBER ACCOMMODATING MULTIPLE SUBSTRATES 10-16-2008
620. 20080246101 METHOD OF POLY-SILICON GRAIN STRUCTURE FORMATION 10-09-2008
621. 20080245414 METHODS FOR FORMING A PHOTOVOLTAIC DEVICE WITH LOW CONTACT RESISTANCE 10-09-2008
622. 20080242202 EXTENDED PAD LIFE FOR ECMP AND BARRIER REMOVAL 10-02-2008
623. 20080241419 DEVICE THAT ENABLES PLASMA IGNITION AND COMPLETE FARADAY SHIELDING OF CAPACITIVE COUPLING FOR AN INDUCTIVELY-COUPLED PLASMA 10-02-2008
624. 20080241355 THIN FILM TRANSISTOR DEVICES HAVING HIGH ELECTRON MOBILITY AND STABILITY 10-02-2008
625. 20080236615 METHOD OF PROCESSING WAFERS IN A SEQUENTIAL FASHION 10-02-2008
626. 20080233022 METHOD OF FABRICATING PLASMA REACTOR PARTS 09-25-2008
627. 20080230518 GAS FLOW DIFFUSER - method and apparatus for providing flow into a processing chamber are provided 09-25-2008
628. 20080230154 ABSORBER LAYER FOR DSA PROCESSING - method of processing a substrate comprising depositing a layer comprising amorphous carbon on the substrate and then 09-25-2008
629. 20080227291 FORMATION OF COMPOSITE TUNGSTEN FILMS - Embodiments of the invention provide methods for depositing tungsten materials 09-18-2008
630. 20080223440 MULTI-JUNCTION SOLAR CELLS AND METHODS AND APPARATUSES FOR FORMING THE SAME 09-18-2008
631. 20080220150 MICROBATCH DEPOSITION CHAMBER WITH RADIANT HEATING 09-11-2008
632. 20080219815 HIGH TEMPERATURE ANTI-DROOP END EFFECTOR FOR SUBSTRATE TRANSFER 09-11-2008
633. 20080216743 CHEMICAL PRECURSOR AMPOULE FOR VAPOR DEPOSITION PROCESSES 09-11-2008
634. 20080216077 SOFTWARE SEQUENCER FOR INTEGRATED SUBSTRATE PROCESSING SYSTEM 09-04-2008
635. 20080214014 ABSORBER LAYER CANDIDATES AND TECHNIQUES FOR APPLICATION 09-04-2008
636. 20080210307 CONTROL OF SLIT VALVE DOOR SEAL PRESSURE 09-04-2008
637. 20080210163 Independent Radiant Gas Preheating for Precursor Disassociation Control and Gas Reaction Kinetics in Low Temperature CVD Systems 09-04-2008
638. 20080206987 PROCESS FOR TUNGSTEN NITRIDE DEPOSITION BY A TEMPERATURE CONTROLLED LID ASSEMBLY 08-28-2008
639. 20080203056 METHODS FOR ETCHING HIGH ASPECT RATIO FEATURES 08-28-2008
640. 20080202610 METHOD AND APPARATUS FOR CONTROLLING GAS FLOW TO A PROCESSING CHAMBER 08-28-2008
641. 20080202609 METHOD AND APPARATUS FOR CONTROLLING GAS FLOW TO A PROCESSING CHAMBER 08-28-2008
642. 20080202588 METHOD AND APPARATUS FOR CONTROLLING GAS FLOW TO A PROCESSING CHAMBER 08-28-2008
643. 20080202425 TEMPERATURE CONTROLLED LID ASSEMBLY FOR TUNGSTEN NITRIDE DEPOSITION 08-28-2008
644. 20080199282 CLUSTER TOOL ARCHITECTURE FOR PROCESSING A SUBSTRATE 08-21-2008
645. 20080198895 SUBSTRATE TEMPERATURE MEASUREMENT BY INFRARED TRANSMISSION 08-21-2008
646. 20080196661 PLASMA SPRAYED DEPOSITION RING ISOLATOR - substrate processing chamber component including a deposition ring for protecting exposed portions of a 08-21-2008